O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12Advances in the fabrication of graphene transistors on flexible substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30Anti-stiction coating for mechanically tunable photonic crystal devices
31Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40Breakdown and Protection of ALD Moisture Barrier Thin Films
41Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42Capacitance spectroscopy of gate-defined electronic lattices
43Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52Charge effects of ultrafine FET with nanodot type floating gate
53Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
60Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
61Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
62Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
63Damage evaluation in graphene underlying atomic layer deposition dielectrics
64DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
65Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
66Demonstration of flexible thin film transistors with GaN channels
67Densification of Thin Aluminum Oxide Films by Thermal Treatments
68Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76Dynamic tuning of plasmon resonance in the visible using graphene
77Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
81Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
82Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
83Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
84Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
85Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
86Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
87Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
88Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
89Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
90Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
91Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
92Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
93Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
94Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
95Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
96Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
97Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
99Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
100Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
101Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
102Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
103Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
104Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
105Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
106Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
107Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
108Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
109Energy-enhanced atomic layer deposition for more process and precursor versatility
110Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
111Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
112Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
113Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
114Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
115Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
116Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
117Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
118Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
119Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
120Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
121Experimental verification of electro-refractive phase modulation in graphene
122Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
123Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
124Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
125Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
126Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
127Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
128Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
129Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
130First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
131Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
132Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
133Flexible, light trapping substrates for organic photovoltaics
134Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
135Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
136Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
137Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
138Hafnia and alumina on sulphur passivated germanium
139High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
140High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
141High-efficiency embedded transmission grating
142High-Reflective Coatings For Ground and Space Based Applications
143High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
144Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
145Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
146Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
147Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
148Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
149Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
150Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
151Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
152Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
153Improved understanding of recombination at the Si/Al2O3 interface
154Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
155Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
156Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
157Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
158Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
159In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
160In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
161In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
162Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
163Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
164Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
165Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
166Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
167Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
168Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
169Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
170Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
171Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
172Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
173Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
174Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
175Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
176Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
177Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
178Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
179Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
180Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
181Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
182Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
183Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
184Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
185Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
186Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
187Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
188Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
189Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
190Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
191Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
192Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
193Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
194Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
195Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
196Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
197Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
198Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
199Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
200MANOS performance dependence on ALD Al2O3 oxidation source
201Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
202Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
203Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
204Method of Fabrication for Encapsulated Polarizing Resonant Gratings
205Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
206Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
207Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
208Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
209Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
210Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
211Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
212Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
213N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
214Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
215Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
216Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
217Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
218Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
219Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
220On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
221On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
222On the equilibrium concentration of boron-oxygen defects in crystalline silicon
223On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
224Optical display film as flexible and light trapping substrate for organic photovoltaics
225Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
226Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
227Optimization of the Surface Structure on Black Silicon for Surface Passivation
228Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
229Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
230Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
231Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
232Passivation effects of atomic-layer-deposited aluminum oxide
233Patterned deposition by plasma enhanced spatial atomic layer deposition
234PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
235Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
236Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
237Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
238Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
239Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
240Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
241Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
242Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
243Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
244Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
245Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
246Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
247Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
248Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
249Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
250Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
251Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
252Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
253Propagation Effects in Carbon Nanoelectronics
254Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
255Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
256Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
257Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
258Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
259Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
260Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
261Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
262Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
263Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
264Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
265Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
266Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
267Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
268Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
269Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
270Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
271Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
272Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
273Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
274Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
275Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
276Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
277Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
278Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
279Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
280Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
281Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
282Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
283Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
284Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
285Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
286The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
287The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
288The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
289Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
290Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
291Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
292Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
293TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
294Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
295Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
296Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
297Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
298Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
299Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
300Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
301Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
302Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
303Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
304Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
305Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
306Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
307Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
308Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
309Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
310Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
311Very high frequency plasma reactant for atomic layer deposition
312Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
313Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
314Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
315Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
316Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
317Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
318Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
319Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
320Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
321Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
322Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
323Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
324Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
325Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
326Composite materials and nanoporous thin layers made by atomic layer deposition
327Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
328Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
329Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
330Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
331Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
332Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
333Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
334Optical and Electrical Properties of AlxTi1-xO Films
335Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
336Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
337Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
338Atomic Layer Deposition of Gold Metal
339Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
340Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
341Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
342Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
343High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
344Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
345Plasma-enhanced atomic layer deposition of BaTiO3
346Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
347Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
348Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
349A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
350Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
351Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
352Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
353Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
354Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
355Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
356Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
357Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
358Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
359Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
360Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
361Radical Enhanced Atomic Layer Deposition of Metals and Oxides
362Radical Enhanced Atomic Layer Deposition of Metals and Oxides
363Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
364Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
365Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
366Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
367Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
368Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
369Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
370Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
371Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
372Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
373Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
374Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
375Plasma enhanced atomic layer deposition of Fe2O3 thin films
376Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
377Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
378The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
379Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
380Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
381Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
382Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
383Electrical characteristics of β-Ga2O3 thin films grown by PEALD
384Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
385Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
386Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
387Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
388Plasma enhanced atomic layer deposition of Ga2O3 thin films
389Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
390Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
391RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
392Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
393Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
394Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
395Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
396Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
397Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
398Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
399Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
400Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
401Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
402Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
403Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
404Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
405A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
406An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
407Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
408Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
409Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
410Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
411Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
412AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
413Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
414Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
415Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
416Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
417Characteristics of HfO2 thin films grown by plasma atomic layer deposition
418Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
419Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
420Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
421Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
422Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
423Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
424Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
425Damage evaluation in graphene underlying atomic layer deposition dielectrics
426Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
427Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
428Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
429Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
430Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
431Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
432Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
433Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
434Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
435Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
436Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
437Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
438Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
439Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
440Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
441Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
442Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
443Hafnia and alumina on sulphur passivated germanium
444HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
445Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
446Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
447Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
448Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
449In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
450Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
451Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
452Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
453Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
454Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
455Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
456Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
457Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
458Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
459Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
460Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
461Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
462Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
463Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
464Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
465Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
466Optical properties and bandgap evolution of ALD HfSiOx films
467Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
468Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
469Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
470Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
471Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
472Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
473Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
474Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
475Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
476Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
477Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
478Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
479Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
480Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
481Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
482The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
483The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
484The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
485Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
486Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
487Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
488Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
489Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
490Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
491Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
492Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
493Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
494Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
495Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
496Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
497Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
498HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
499Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
500Annealing behavior of ferroelectric Si-doped HfO2 thin films
501Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
502Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
503Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
504Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
505Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
506Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
507Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
508Optical properties and bandgap evolution of ALD HfSiOx films
509TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
510The effects of layering in ferroelectric Si-doped HfO2 thin films
511Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
512Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
513Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
514Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
515Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
516Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
517Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
518Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
519High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
520High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
521Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
522Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
523On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
524Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
525Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
526High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
527Systematic efficiency study of line-doubled zone plates
528TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
529IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
530Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
531Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
532Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
533Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
534Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
535Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
536Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
537Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
538Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
539Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
540Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
541Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
542Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
543Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
544In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
545Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
546Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
547Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
548Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
549Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
550Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
551Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
552Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
553The important role of water in growth of monolayer transition metal dichalcogenides
554Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
555Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
556Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
557Radical Enhanced Atomic Layer Deposition of Metals and Oxides
558Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
559Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
560Radical Enhanced Atomic Layer Deposition of Metals and Oxides
561Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
562Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
563Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
564Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
565Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
566Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
567Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
568Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
569Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
570Encapsulation method for atom probe tomography analysis of nanoparticles
571Growth of silica nanowires in vacuum
572In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
573Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
574Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
575Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
576Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
577Remote Plasma ALD of Platinum and Platinum Oxide Films
578Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
579Room-Temperature Atomic Layer Deposition of Platinum
580Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
581Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
582Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
583Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
584Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
585Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
586Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
587Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
588The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
589Remote Plasma ALD of Platinum and Platinum Oxide Films
590Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
591Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
592Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
593Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
594Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
595Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
596High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
597Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
598In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
599Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
600Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
601Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
602Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
603Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
604(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
605ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
606Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
607Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
608Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
609Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
610Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
611Radical Enhanced Atomic Layer Deposition of Metals and Oxides
612Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
613Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
614Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
615'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
616A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
617Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
618Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
619Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
620Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
621Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
622Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
623Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
624Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
625Atomic layer deposition of metal-oxide thin films on cellulose fibers
626Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
627Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
628Breakdown and Protection of ALD Moisture Barrier Thin Films
629Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
630Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
631Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
632Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
633Comparative study of ALD SiO2 thin films for optical applications
634Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
635Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
636Designing high performance precursors for atomic layer deposition of silicon oxide
637Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
638Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
639Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
640Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
641Energy-enhanced atomic layer deposition for more process and precursor versatility
642Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
643Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
644Gate Insulator for High Mobility Oxide TFT
645Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
646High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
647High-Reflective Coatings For Ground and Space Based Applications
648Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
649Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
650Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
651Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
652Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
653Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
654Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
655Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
656Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
657Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
658Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
659Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
660Modal properties of a strip-loaded horizontal slot waveguide
661Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
662Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
663On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
664On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
665Optical properties and bandgap evolution of ALD HfSiOx films
666PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
667Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
668Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
669Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
670Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
671Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
672Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
673Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
674Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
675Radical Enhanced Atomic Layer Deposition of Metals and Oxides
676Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
677Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
678Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
679Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
680Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
681Single-Cell Photonic Nanocavity Probes
682Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
683Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
684Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
685Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
686Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
687Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
688Symmetrical Al2O3-based passivation layers for p- and n-type silicon
689Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
690Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
691Trapped charge densities in Al2O3-based silicon surface passivation layers
692Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
693Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
694A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
695Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
696Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
697Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
698Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
699Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
700Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
701Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
702In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
703Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
704Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
705Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
706Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
707SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
708Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
709Surface and sensing properties of PE-ALD SnO2 thin film
710Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
711Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
712Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
713Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
714Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
715Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
716Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
717Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
718Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
719Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
720Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
721Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
722Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
723Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
724Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
725Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
726Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
727Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
728Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
729Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
730Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
731Radical Enhanced Atomic Layer Deposition of Metals and Oxides
732Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
733Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
734Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
735Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
736Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
737Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
738Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
739Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
740Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
741Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
742Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
743Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
744Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
745Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
746Trilayer Tunnel Selectors for Memristor Memory Cells
747Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
748Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
749A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
750Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
751An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
752Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
753Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
754Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
755Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
756Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
757Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
758Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
759Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
760Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
761Biofilm prevention on cochlear implants
762Bipolar resistive switching in amorphous titanium oxide thin film
763Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
764Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
765Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
766Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
767Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
768Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
769Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
770Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
771Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
772Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
773Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
774Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
775Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
776Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
777Energy-enhanced atomic layer deposition for more process and precursor versatility
778Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
779Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
780Epitaxial 1D electron transport layers for high-performance perovskite solar cells
781Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
782Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
783Flexible Memristive Memory Array on Plastic Substrates
784Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
785Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
786Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
787Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
788Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
789Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
790Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
791High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
792High-efficiency embedded transmission grating
793Highly efficient and bending durable perovskite solar cells: toward a wearable power source
794Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
795Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
796Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
797In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
798In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
799In-gap states in titanium dioxide and oxynitride atomic layer deposited films
800Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
801Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
802Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
803Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
804Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
805Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
806Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
807Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
808Low temperature temporal and spatial atomic layer deposition of TiO2 films
809Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
810Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
811Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
812On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
813Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
814Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
815Oxygen migration in TiO2-based higher-k gate stacks
816Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
817Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
818Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
819Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
820Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
821Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
822Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
823Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
824Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
825Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
826Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
827Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
828Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
829Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
830Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
831Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
832Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
833Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
834Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
835Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
836Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
837Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
838The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
839The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
840The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
841Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
842Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
843TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
844Transient characterization of the electroforming process in TiO2 based resistive switching devices
845Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
846Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
847X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
848Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
849Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
850Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
851Optical and Electrical Properties of TixSi1-xOy Films
852Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
853Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
854Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
855Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
856Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
857Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
858Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
859Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
860In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
861Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
862Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
863The important role of water in growth of monolayer transition metal dichalcogenides
864Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
865Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
866Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
867Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
868Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
869Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
870Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
871Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
872Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
873Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
874Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
875Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
876Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
877Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
878Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
879Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
880Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
881Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
882Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
883Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
884Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
885Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
886Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
887Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
888Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
889Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
890Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
891Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
892Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
893Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
894Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
895Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
896Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
897Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
898Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
899Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
900Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
901Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
902Radical Enhanced Atomic Layer Deposition of Metals and Oxides
903Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
904Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
905Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
906Spectroscopy and control of near-surface defects in conductive thin film ZnO
907Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
908Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
909The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
910The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
911The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
912The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
913Top-down fabricated ZnO nanowire transistors for application in biosensors
914Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
915Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
916Plasma-enhanced atomic layer deposition of zinc phosphate
917Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
918Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
919Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
920Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
921Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
922Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
923Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
924Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
925Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
926Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
927Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
928Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
929Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
930High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
931Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
932Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
933Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
934Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
935Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
936Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
937Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
938PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
939PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
940PEALD ZrO2 Films Deposition on TiN and Si Substrates
941Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
942Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
943Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
944Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
945Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
946Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
947Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
948The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
949The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
950Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
951Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
952ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
953ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
954ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
955Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
956Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
957Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
958Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation


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