O₂, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5	46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6	A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12	Advances in the fabrication of graphene transistors on flexible substrates
13	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20	ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30	Anti-stiction coating for mechanically tunable photonic crystal devices
31	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35	Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37	Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38	Band alignment of Al2O3 with (-201) β-Ga2O3
39	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40	Breakdown and Protection of ALD Moisture Barrier Thin Films
41	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42	Capacitance spectroscopy of gate-defined electronic lattices
43	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44	Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46	Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48	Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49	Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51	Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52	Charge effects of ultrafine FET with nanodot type floating gate
53	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
60	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
61	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
62	Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
63	Damage evaluation in graphene underlying atomic layer deposition dielectrics
64	DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
65	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
66	Demonstration of flexible thin film transistors with GaN channels
67	Densification of Thin Aluminum Oxide Films by Thermal Treatments
68	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69	Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71	DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74	Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76	Dynamic tuning of plasmon resonance in the visible using graphene
77	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80	Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
81	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
82	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
83	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
84	Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
85	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
86	Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
87	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
88	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
89	Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
90	Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
91	Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
92	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
93	Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
94	Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
95	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
96	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
97	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
98	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
99	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
100	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
101	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
102	Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
103	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
104	Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
105	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
106	Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
107	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
108	Energy-enhanced atomic layer deposition for more process and precursor versatility
109	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
110	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
111	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
112	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
113	Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
114	Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
115	Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
116	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
117	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
118	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
119	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
120	Experimental verification of electro-refractive phase modulation in graphene
121	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
122	Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
123	Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
124	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
125	Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
126	Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
127	Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
128	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
129	First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
130	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
131	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
132	Flexible, light trapping substrates for organic photovoltaics
133	Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
134	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
135	Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
136	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
137	Hafnia and alumina on sulphur passivated germanium
138	High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
139	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
140	High-efficiency embedded transmission grating
141	High-Reflective Coatings For Ground and Space Based Applications
142	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
143	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
144	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
145	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
146	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
147	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
148	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
149	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
150	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
151	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
152	Improved understanding of recombination at the Si/Al2O3 interface
153	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
154	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
155	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
156	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
157	Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
158	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
159	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
160	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
161	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
162	Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
163	Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
164	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
165	Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
166	Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
167	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
168	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
169	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
170	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
171	Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
172	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
173	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
174	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
175	Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
176	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
177	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
178	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
179	Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
180	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
181	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
182	Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
183	Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
184	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
185	Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
186	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
187	Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
188	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
189	Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
190	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
191	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
192	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
193	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
194	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
195	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
196	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
197	Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
198	MANOS performance dependence on ALD Al2O3 oxidation source
199	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
200	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
201	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
202	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
203	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
204	Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
205	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
206	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
207	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
208	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
209	Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
210	N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
211	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
212	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
213	Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
214	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
215	Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
216	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
217	On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
218	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
219	On the equilibrium concentration of boron-oxygen defects in crystalline silicon
220	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
221	Optical display film as flexible and light trapping substrate for organic photovoltaics
222	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
223	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
224	Optimization of the Surface Structure on Black Silicon for Surface Passivation
225	Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
226	Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
227	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
228	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
229	Passivation effects of atomic-layer-deposited aluminum oxide
230	Patterned deposition by plasma enhanced spatial atomic layer deposition
231	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
232	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
233	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
234	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
235	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
236	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
237	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
238	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
239	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
240	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
241	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
242	Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
243	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
244	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
245	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
246	Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
247	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
248	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
249	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
250	Propagation Effects in Carbon Nanoelectronics
251	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
252	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
253	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
254	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
255	Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
256	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
257	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
258	Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
259	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
260	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
261	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
262	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
263	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
264	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
265	Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
266	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
267	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
268	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
269	Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
270	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
271	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
272	Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
273	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
274	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
275	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
276	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
277	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
278	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
279	Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
280	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
281	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
282	Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
283	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
284	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
285	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
286	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
287	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
288	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
289	Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
290	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
291	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
292	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
293	Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
294	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
295	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
296	Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
297	Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
298	Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
299	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
300	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
301	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
302	Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
303	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
304	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
305	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
306	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
307	Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
308	Very high frequency plasma reactant for atomic layer deposition
309	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
310	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
311	Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
312	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
313	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
314	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
315	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
316	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
317	Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
318	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
319	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
320	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
321	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
322	Composite materials and nanoporous thin layers made by atomic layer deposition
323	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
324	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
325	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
326	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
327	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
328	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
329	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
330	Optical and Electrical Properties of AlxTi1-xO Films
331	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
332	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
333	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
334	Atomic Layer Deposition of Gold Metal
335	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
336	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
337	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
338	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
339	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
340	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
341	Plasma-enhanced atomic layer deposition of BaTiO3
342	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
343	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
344	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
345	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
346	Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
347	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
348	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
349	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
350	Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
351	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
352	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
353	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
354	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
355	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
356	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
357	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
358	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
359	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
360	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
361	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
362	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
363	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
364	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
365	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
366	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
367	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
368	Plasma enhanced atomic layer deposition of Fe2O3 thin films
369	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
370	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
371	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
372	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
373	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
374	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
375	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
376	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
377	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
378	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
379	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
380	Plasma enhanced atomic layer deposition of Ga2O3 thin films
381	Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
382	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
383	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
384	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
385	Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
386	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
387	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
388	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
389	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
390	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
391	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
392	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
393	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
394	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
395	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
396	A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
397	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
398	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
399	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
400	Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
401	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
402	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
403	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
404	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
405	Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
406	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
407	Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
408	Characteristics of HfO2 thin films grown by plasma atomic layer deposition
409	Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
410	Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
411	Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
412	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
413	Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
414	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
415	Damage evaluation in graphene underlying atomic layer deposition dielectrics
416	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
417	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
418	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
419	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
420	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
421	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
422	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
423	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
424	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
425	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
426	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
427	Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
428	Hafnia and alumina on sulphur passivated germanium
429	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
430	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
431	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
432	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
433	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
434	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
435	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
436	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
437	Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
438	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
439	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
440	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
441	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
442	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
443	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
444	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
445	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
446	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
447	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
448	Optical properties and bandgap evolution of ALD HfSiOx films
449	Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
450	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
451	Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
452	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
453	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
454	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
455	Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
456	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
457	Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
458	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
459	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
460	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
461	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
462	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
463	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
464	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
465	The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
466	Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
467	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
468	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
469	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
470	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
471	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
472	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
473	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
474	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
475	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
476	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
477	Annealing behavior of ferroelectric Si-doped HfO2 thin films
478	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
479	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
480	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
481	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
482	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
483	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
484	Optical properties and bandgap evolution of ALD HfSiOx films
485	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
486	The effects of layering in ferroelectric Si-doped HfO2 thin films
487	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
488	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
489	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
490	Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
491	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
492	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
493	Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
494	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
495	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
496	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
497	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
498	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
499	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
500	Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
501	High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
502	Systematic efficiency study of line-doubled zone plates
503	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
504	IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
505	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
506	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
507	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
508	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
509	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
510	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
511	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
512	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
513	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
514	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
515	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
516	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
517	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
518	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
519	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
520	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
521	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
522	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
523	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
524	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
525	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
526	The important role of water in growth of monolayer transition metal dichalcogenides
527	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
528	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
529	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
530	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
531	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
532	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
533	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
534	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
535	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
536	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
537	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
538	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
539	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
540	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
541	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
542	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
543	Encapsulation method for atom probe tomography analysis of nanoparticles
544	Growth of silica nanowires in vacuum
545	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
546	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
547	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
548	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
549	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
550	Remote Plasma ALD of Platinum and Platinum Oxide Films
551	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
552	Room-Temperature Atomic Layer Deposition of Platinum
553	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
554	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
555	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
556	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
557	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
558	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
559	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
560	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
561	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
562	Remote Plasma ALD of Platinum and Platinum Oxide Films
563	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
564	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
565	Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
566	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
567	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
568	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
569	High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
570	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
571	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
572	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
573	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
574	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
575	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
576	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
577	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
578	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
579	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
580	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
581	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
582	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
583	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
584	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
585	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
586	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
587	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
588	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
589	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
590	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
591	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
592	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
593	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
594	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
595	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
596	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
597	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
598	Atomic layer deposition of metal-oxide thin films on cellulose fibers
599	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
600	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
601	Breakdown and Protection of ALD Moisture Barrier Thin Films
602	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
603	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
604	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
605	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
606	Comparative study of ALD SiO2 thin films for optical applications
607	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
608	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
609	Designing high performance precursors for atomic layer deposition of silicon oxide
610	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
611	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
612	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
613	Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
614	Energy-enhanced atomic layer deposition for more process and precursor versatility
615	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
616	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
617	Gate Insulator for High Mobility Oxide TFT
618	Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
619	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
620	High-Reflective Coatings For Ground and Space Based Applications
621	Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
622	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
623	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
624	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
625	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
626	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
627	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
628	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
629	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
630	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
631	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
632	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
633	Modal properties of a strip-loaded horizontal slot waveguide
634	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
635	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
636	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
637	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
638	Optical properties and bandgap evolution of ALD HfSiOx films
639	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
640	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
641	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
642	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
643	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
644	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
645	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
646	Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
647	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
648	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
649	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
650	Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
651	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
652	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
653	Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
654	Single-Cell Photonic Nanocavity Probes
655	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
656	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
657	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
658	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
659	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
660	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
661	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
662	Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
663	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
664	Trapped charge densities in Al2O3-based silicon surface passivation layers
665	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
666	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
667	A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
668	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
669	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
670	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
671	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
672	Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
673	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
674	Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
675	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
676	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
677	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
678	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
679	Surface and sensing properties of PE-ALD SnO2 thin film
680	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
681	Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
682	Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
683	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
684	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
685	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
686	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
687	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
688	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
689	Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
690	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
691	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
692	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
693	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
694	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
695	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
696	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
697	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
698	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
699	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
700	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
701	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
702	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
703	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
704	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
705	Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
706	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
707	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
708	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
709	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
710	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
711	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
712	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
713	Trilayer Tunnel Selectors for Memristor Memory Cells
714	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
715	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
716	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
717	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
718	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
719	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
720	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
721	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
722	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
723	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
724	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
725	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
726	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
727	Biofilm prevention on cochlear implants
728	Bipolar resistive switching in amorphous titanium oxide thin film
729	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
730	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
731	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
732	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
733	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
734	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
735	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
736	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
737	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
738	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
739	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
740	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
741	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
742	Energy-enhanced atomic layer deposition for more process and precursor versatility
743	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
744	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
745	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
746	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
747	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
748	Flexible Memristive Memory Array on Plastic Substrates
749	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
750	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
751	Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
752	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
753	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
754	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
755	High-efficiency embedded transmission grating
756	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
757	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
758	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
759	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
760	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
761	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
762	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
763	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
764	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
765	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
766	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
767	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
768	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
769	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
770	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
771	Low temperature temporal and spatial atomic layer deposition of TiO2 films
772	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
773	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
774	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
775	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
776	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
777	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
778	Oxygen migration in TiO2-based higher-k gate stacks
779	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
780	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
781	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
782	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
783	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
784	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
785	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
786	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
787	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
788	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
789	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
790	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
791	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
792	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
793	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
794	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
795	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
796	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
797	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
798	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
799	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
800	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
801	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
802	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
803	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
804	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
805	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
806	Transient characterization of the electroforming process in TiO2 based resistive switching devices
807	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
808	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
809	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
810	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
811	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
812	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
813	Optical and Electrical Properties of TixSi1-xOy Films
814	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
815	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
816	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
817	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
818	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
819	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
820	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
821	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
822	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
823	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
824	The important role of water in growth of monolayer transition metal dichalcogenides
825	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
826	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
827	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
828	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
829	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
830	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
831	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
832	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
833	Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
834	Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
835	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
836	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
837	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
838	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
839	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
840	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
841	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
842	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
843	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
844	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
845	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
846	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
847	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
848	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
849	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
850	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
851	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
852	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
853	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
854	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
855	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
856	Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
857	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
858	Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
859	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
860	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
861	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
862	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
863	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
864	Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
865	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
866	Spectroscopy and control of near-surface defects in conductive thin film ZnO
867	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
868	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
869	The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
870	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
871	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
872	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
873	Top-down fabricated ZnO nanowire transistors for application in biosensors
874	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
875	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
876	Plasma-enhanced atomic layer deposition of zinc phosphate
877	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
878	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
879	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
880	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
881	Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
882	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
883	Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
884	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
885	Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
886	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
887	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
888	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
889	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
890	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
891	Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
892	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
893	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
894	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
895	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
896	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
897	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
898	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
899	PEALD ZrO2 Films Deposition on TiN and Si Substrates
900	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
901	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
902	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
903	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
904	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
905	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
906	The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
907	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
908	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
909	Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
910	ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
911	ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
912	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
913	Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
914	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
915	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
916	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

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