O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
2Damage evaluation in graphene underlying atomic layer deposition dielectrics
3Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
4Symmetrical Al2O3-based passivation layers for p- and n-type silicon
5Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
6Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
7XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
8Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
9Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
10Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
11PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
12Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
13Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
14Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
15Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
16Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
17Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
18Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
19Optical in situ monitoring of plasma-enhanced atomic layer deposition process
20Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
21HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
22Surface and sensing properties of PE-ALD SnO2 thin film
23Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
24Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
25Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
26Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
27Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
28A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
29Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
30Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
31Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
32Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
33Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
34Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
35Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
36Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
37Epitaxial 1D electron transport layers for high-performance perovskite solar cells
38Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
39Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
40Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
41Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
42Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
43PEALD ZrO2 Films Deposition on TiN and Si Substrates
44ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
45Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
46Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
47Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
48Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
49Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
50High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
51In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
52Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
53Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
54The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
55Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
56Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
57Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
58Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
59Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
60Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
61Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
62Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
63Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
64Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
65Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
66Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
67Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
68Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
69Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
70Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
71Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
72Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
73On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
74Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
75Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
76Plasma enhanced atomic layer deposition of Ga2O3 thin films
77Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
78Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
79Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
80Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
81The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
82Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
83Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
84Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
85Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
86Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
87Flexible, light trapping substrates for organic photovoltaics
88Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
89Radical Enhanced Atomic Layer Deposition of Metals and Oxides
90Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
91Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
92Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
93Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
94Sub-10-nm ferroelectric Gd-doped HfO2 layers
95Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
96Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
97The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
98Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
99Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
100Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
101Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
102Capacitance spectroscopy of gate-defined electronic lattices
103Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
104Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
105Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
106Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
107Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
108Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
109Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
110Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
111Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
112Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
113Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
114Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
115In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
116Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
117Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
118Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
119Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
120Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
121Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
122Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
123The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
124Breakdown and Protection of ALD Moisture Barrier Thin Films
125Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
126Transient characterization of the electroforming process in TiO2 based resistive switching devices
127Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
128Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
129Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
130Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
131Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
132Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
133Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
134High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
135Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
136Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
137Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
138Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
139Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
140Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
141Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
142Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
143Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
144Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
145Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
146Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
147Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
148Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
149Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
150A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
151Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
152Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
153Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
154Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
155HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
156In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
157Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
158In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
159Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
160Propagation Effects in Carbon Nanoelectronics
161Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
162Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
163A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
164Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
165Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
166Plasma-enhanced atomic layer deposition of BaTiO3
167A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
168From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
169Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
170Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
171Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
172Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
173Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
174Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
175Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
176Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
177Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
178Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
179ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
180First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
181Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
182Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
183Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
184Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
185Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
186Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
187Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
188Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
189Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
190Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
191Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
192Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
193Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
194Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
195HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
196Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
197Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
198Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
199Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
200Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
201Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
202Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
203Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
204Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
205Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
206Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
207Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
208Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
209Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
210Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
211Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
212Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
213Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
214Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
215Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
216Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
217Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
218Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
219Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
220AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
221Mechanical properties of thin-film Parylene-metal-Parylene devices
222Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
223Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
224Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
225Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
226Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
227Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
228Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
229Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
230Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
231Energy-enhanced atomic layer deposition for more process and precursor versatility
232Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
233Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
234A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
235Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
236Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
237Band alignment of Al2O3 with (-201) β-Ga2O3
238Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
239Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
240Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
241High-efficiency embedded transmission grating
242Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
243Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
244Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
245Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
246Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
247Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
248Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
249Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
250The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
251Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
252Oxygen migration in TiO2-based higher-k gate stacks
253Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
254Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
255Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
256Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
257Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
258The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
259Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
260Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
261Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
262Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
263Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
264Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
265Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
266Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
267Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
268Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
269A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
270Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
271An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
272Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
273IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
274Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
275Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
276Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
277Remote Plasma ALD of Platinum and Platinum Oxide Films
278MANOS performance dependence on ALD Al2O3 oxidation source
279Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
280Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
281Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
282Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
283Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
284Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
285Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
286Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
287Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
288Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
289Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
290In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
291Atomic layer deposition of metal-oxide thin films on cellulose fibers
292High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
293Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
294The important role of water in growth of monolayer transition metal dichalcogenides
295Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
296Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
297Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
298Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
299Patterned deposition by plasma enhanced spatial atomic layer deposition
300Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
301Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
302Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
303ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
304Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
305Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
306Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
307In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
308Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
309Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
310Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
311Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
312Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
313Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
314Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
315Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
316Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
317PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
318Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
319Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
320Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
321Single-Cell Photonic Nanocavity Probes
322Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
323Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
324Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
325Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
326Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
327Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
328Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
329DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
330Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
331On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
332Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
333Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
334Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
335PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
336Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
337Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
338Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
339On the equilibrium concentration of boron-oxygen defects in crystalline silicon
340Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
341On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
342Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
343Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
344An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
345Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
346Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
347Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
348Optical and Electrical Properties of TixSi1-xOy Films
349Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
350Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
351Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
352Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
353Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
354Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
355Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
356Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
357Densification of Thin Aluminum Oxide Films by Thermal Treatments
358Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
359Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
360Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
361Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
362Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
363AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
364Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
365Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
366Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
367Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
368Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
369Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
370Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
371Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
372Energy-enhanced atomic layer deposition for more process and precursor versatility
373Sub-7-nm textured ZrO2 with giant ferroelectricity
374Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
375Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
376Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
377Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
378Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
379On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
380Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
381Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
382SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
383Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
384Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
385Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
386Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
387Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
388Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
389Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
390Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
391Optical properties and bandgap evolution of ALD HfSiOx films
392Growth of silica nanowires in vacuum
393Radical Enhanced Atomic Layer Deposition of Metals and Oxides
394Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
395Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
396Radical Enhanced Atomic Layer Deposition of Metals and Oxides
397Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
398Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
399Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
400Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
401Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
402Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
403Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
404Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
405Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
406Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
407Atomic layer deposition of YMnO3 thin films
408Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
4091D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
410Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
411Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
412Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
413High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
414Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
415Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
416Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
417Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
418Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
419Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
420Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
421Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
422Comparative study of ALD SiO2 thin films for optical applications
423Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
424In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
425Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
426Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
427Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
428Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
429In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
430ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
431Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
432Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
433Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
434Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
435Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
436Modal properties of a strip-loaded horizontal slot waveguide
437Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
438Radical Enhanced Atomic Layer Deposition of Metals and Oxides
439Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
440Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
441Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
442Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
443Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
444Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
445Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
446Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
447Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
448Passivation effects of atomic-layer-deposited aluminum oxide
449Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
450MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
451ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
452Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
453Atomic Layer Deposition of Gold Metal
454Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
455Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
456Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
457Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
458Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
459Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
460Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
461Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
462Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
463Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
464Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
465Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
466Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
467Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
468Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
469Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
470Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
471Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
472Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
473Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
474Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
475Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
476Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
477Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
478Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
479Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
480Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
481Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
482Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
483Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
484Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
485Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
486Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
487Top-down fabricated ZnO nanowire transistors for application in biosensors
488Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
489Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
490Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
491Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
492The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
493Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
494Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
495Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
496Optical display film as flexible and light trapping substrate for organic photovoltaics
497A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
498Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
499Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
500Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
501Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
502Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
503Gate Insulator for High Mobility Oxide TFT
504Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
505Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
506Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
507Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
508Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
509Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
510High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
511Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
512AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
513Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
514Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
515Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
516Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
517Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
518The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
519The important role of water in growth of monolayer transition metal dichalcogenides
520Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
521Trapped charge densities in Al2O3-based silicon surface passivation layers
522Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
523Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
524Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
525Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
526Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
527Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
528Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
529Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
530Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
531High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
532Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
533Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
534Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
535Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
536Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
537Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
538Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
539Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
540Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
541Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
542Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
543Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
544Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
545Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
546Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
547Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
548Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
549High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
550Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
551Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
552Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
553Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
554Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
555Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
556Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
557Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
558RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
559Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
560Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
561Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
562Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
563Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
564Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
565ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
566Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
567Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
568Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
569Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
570Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
571Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
572Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
573Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
574Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
575Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
576Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
577Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
578Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
579Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
580Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
581New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
582Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
583Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
584Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
585Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
586Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
587Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
588Radical Enhanced Atomic Layer Deposition of Metals and Oxides
589Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
590Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
591Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
592PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
593Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
594Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
595Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
596Biofilm prevention on cochlear implants
597Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
598Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
599Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
600Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
601Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
602Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
603Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
604Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
605Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
606Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
607Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
608Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
609Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
610Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
611Trilayer Tunnel Selectors for Memristor Memory Cells
612Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
613α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
614Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
615Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
616Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
617Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
618Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
619Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
620Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
621Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
622Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
623Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
624Innovative remote plasma source for atomic layer deposition for GaN devices
625Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
626Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
6273D structure evolution using metastable atomic layer deposition based on planar silver templates
628Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
629High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
630Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
631Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
632Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
633Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
634Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
635Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
636Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
637Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
638Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
639Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
640Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
641Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
642Dynamic tuning of plasmon resonance in the visible using graphene
643Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
644Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
645Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
646Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
647Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
648Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
649Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
650Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
651Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
652On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
653Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
654Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
655Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
656Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
657Highly efficient and bending durable perovskite solar cells: toward a wearable power source
658Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
659Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
660PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
661DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
662Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
663Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
664Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
665Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
666Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
667Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
668Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
669Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
670AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
671Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
672Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
673Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
674Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
675Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
676Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
677Nonvolatile Capacitive Crossbar Array for In-Memory Computing
678Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
679Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
680Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
681Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
682Room-Temperature Atomic Layer Deposition of Platinum
683Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
684Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
685The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
686Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
687Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
688Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
689Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
690Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
691High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
692Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
693Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
694Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
695Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
696ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
697Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
698Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
699Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
700Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
701The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
702A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
703Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
704Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
705Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
706Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
707Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
708Nonvolatile Capacitive Crossbar Array for In-Memory Computing
709Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
710High-Reflective Coatings For Ground and Space Based Applications
711Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
712Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
713Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
714Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
715Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
716Optimization of the Surface Structure on Black Silicon for Surface Passivation
717Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
718Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
719Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
720Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
721Residual stress study of thin films deposited by atomic layer deposition
722On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
723Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
724Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
725Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
726Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
727Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
728Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
729Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
730Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
731Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
732ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
733Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
734Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
735Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
736Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
737Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
738Charge effects of ultrafine FET with nanodot type floating gate
739Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
740Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
741Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
742Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
743Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
744Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
745Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
746Residual stress study of thin films deposited by atomic layer deposition
747Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
748Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
749Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
750Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
751Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
752Radical Enhanced Atomic Layer Deposition of Metals and Oxides
753Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
754Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
755Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
756Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
757Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
758Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
759Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
760Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
761Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
762Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
763Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
764Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
765Systematic efficiency study of line-doubled zone plates
766Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
767Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
768Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
769Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
770Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
771Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
772Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
773Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
774Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
775Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
776Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
777Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
778Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
779Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
780Advances in the fabrication of graphene transistors on flexible substrates
781The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
782Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
783Radical Enhanced Atomic Layer Deposition of Metals and Oxides
784Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
785Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
786TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
787Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
788Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
789The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
790Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
791Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
792Impact of interface materials on side permeation in indirect encapsulation of organic electronics
793Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
794Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
795Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
796Hafnia and alumina on sulphur passivated germanium
797Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
798Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
799Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
800Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
801Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
802Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
803Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
804Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
805Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
806Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
807Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
808The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
809Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
810Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
811Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
812Impact of interface materials on side permeation in indirect encapsulation of organic electronics
813Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
814TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
815Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
816Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
817Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
818Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
819Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
820Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
821Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
822Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
823Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
824Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
825An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
826Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
827The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
828Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
829Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
830Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
831Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
832Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
833Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
834Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
835(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
83646-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
837Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
838Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
839Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
840Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
841Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
842Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
843Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
844Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
845Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
846Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
847Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
848Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
849Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
850Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
851Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
852Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
853Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
854Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
855A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
856Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
857Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
858Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
859Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
860Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
861Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
862Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
863Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
864On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
865Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
866Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
867Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
868Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
869Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
870Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
871Spectroscopy and control of near-surface defects in conductive thin film ZnO
872Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
873Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
874Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
875Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
876Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
877Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
878Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
879Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
880Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
881The effects of layering in ferroelectric Si-doped HfO2 thin films
882High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
883Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
884Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
885Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
886Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
887Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
888The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
889Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
890Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
891A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
892Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
893Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
894Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
895On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
896In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
897Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
898Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
899Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
900Experimental verification of electro-refractive phase modulation in graphene
901Ferroelectricity in hafnia controlled via surface electrochemical state
902A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
903Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
904Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
905Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
906Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
907TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
908Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
909Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
910Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
911Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
912Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
913Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
914Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
915Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
916Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
917Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
918An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
919Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
920Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
921Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
922Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
923Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
924Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
925The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
926Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
927In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
928High-Reflective Coatings For Ground and Space Based Applications
929Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
930Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
931Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
932Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
933Low temperature temporal and spatial atomic layer deposition of TiO2 films
934Characteristics of HfO2 thin films grown by plasma atomic layer deposition
935HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
936Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
937Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
938Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
939Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
940Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
941Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
942Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
943Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
944Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
945Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
946Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
947Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
948Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
949Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
950Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
951Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
952N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
953Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
954Optical properties and bandgap evolution of ALD HfSiOx films
955Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
956Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
957Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
958Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
959Atomic Layer Deposition of the Conductive Delafossite PtCoO2
960Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
961Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
962Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
963Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
964Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
965Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
966Annealing behavior of ferroelectric Si-doped HfO2 thin films
967Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
968A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
969Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
970Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
971Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
972Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
973Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
974High-efficiency embedded transmission grating
975Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
976Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
977Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
978Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
979Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
980Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
981Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
982Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
983Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
984Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
985Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
986Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
987Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
988On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
989Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
990Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
991Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
992Damage evaluation in graphene underlying atomic layer deposition dielectrics
993Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
994Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
995Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
996Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
997Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
998Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
999In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
1000Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
1001Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1002Topographically selective deposition
1003Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
1004Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1005Plasma-enhanced atomic layer deposition of zinc phosphate
1006Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1007Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1008Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
1009Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1010Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
1011Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1012Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1013Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
1014Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
1015Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
1016Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1017Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1018The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1019Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
1020Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1021Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1022Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1023Plasma-enhanced atomic layer deposition of BaTiO3
1024Optical and Electrical Properties of AlxTi1-xO Films
1025'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1026Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
1027Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
1028Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1029Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1030The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1031Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
1032Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
1033Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
1034Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
1035Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
1036Remote Plasma ALD of Platinum and Platinum Oxide Films
1037The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1038Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1039Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1040Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
1041Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
1042Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1043All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1044Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
1045Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
1046Composite materials and nanoporous thin layers made by atomic layer deposition
1047Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
1048Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
1049Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
1050Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1051Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1052All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1053Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
1054Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
1055Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
1056Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1057Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1058Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
1059Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
1060Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1061Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
1062Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1063A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
1064Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
1065Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1066Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1067Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
1068'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1069Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1070Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1071Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
1072Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
1073Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1074Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1075Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
1076Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
1077Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1078Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
1079Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1080Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1081Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1082Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1083Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1084Very high frequency plasma reactant for atomic layer deposition
1085Bipolar resistive switching in amorphous titanium oxide thin film
1086Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1087In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
1088Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1089Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1090Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1091Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
1092Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1093In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
1094Energy-enhanced atomic layer deposition for more process and precursor versatility
1095Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
1096Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1097Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1098Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1099Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1100Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
1101Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1102Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
1103Optical properties and bandgap evolution of ALD HfSiOx films
1104Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
1105Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1106Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1107Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
1108Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
1109Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
1110In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1111Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
1112Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
1113A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
1114Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
1115Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
1116Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
1117Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1118Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
1119Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
1120Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1121Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
1122Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
1123X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1124Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
1125Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
1126Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
1127High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
1128Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
1129Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1130Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
1131MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
1132Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
1133Method of Fabrication for Encapsulated Polarizing Resonant Gratings
1134XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1135Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
1136Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1137Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1138Anti-stiction coating for mechanically tunable photonic crystal devices
1139Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
1140High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
1141Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
1142Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1143Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1144Hafnia and alumina on sulphur passivated germanium
1145Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1146Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1147Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1148Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1149Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1150Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
1151Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
1152Flexible Memristive Memory Array on Plastic Substrates
1153Tuning size and coverage of Pd nanoparticles using atomic layer deposition
1154Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1155Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1156A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1157Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1158Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1159Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1160Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1161Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
1162Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
1163Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
1164Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1165Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1166The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1167Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1168Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
1169Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
1170Plasma-enhanced atomic layer deposition of BaTiO3
1171Improved understanding of recombination at the Si/Al2O3 interface
1172Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
1173Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1174Designing high performance precursors for atomic layer deposition of silicon oxide
1175A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1176Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
1177Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
1178Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
1179Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1180Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
1181Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
1182Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
1183Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
1184Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1185Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
1186Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
1187Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1188The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
1189Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1190Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
1191Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1192Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1193Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
1194Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
1195Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
1196Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
1197Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
1198Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1199Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
1200Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
1201Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
1202Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1203Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1204Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1205Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1206The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
1207Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1208Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
1209Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
1210Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1211The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1212Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1213Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
1214Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1215Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1216TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1217Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1218Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
1219Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1220Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
1221Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
1222Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
1223Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
1224Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1225Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1226Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1227Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
1228Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
1229Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1230Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
1231Breakdown and Protection of ALD Moisture Barrier Thin Films
1232Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1233Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
1234Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
1235Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1236Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1237Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
1238Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
1239Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
1240Encapsulation method for atom probe tomography analysis of nanoparticles
1241Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1242In-gap states in titanium dioxide and oxynitride atomic layer deposited films
1243Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
1244Plasma enhanced atomic layer deposition of Fe2O3 thin films
1245Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
1246Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1247Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1248Study on the resistive switching time of TiO2 thin films
1249Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
1250Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1251Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1252Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
1253Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
1254Fiber-matrix interface reinforcement using Atomic Layer Deposition
1255Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1256Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1257Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
1258Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
1259Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
1260Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1261Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1262Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
1263Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1264Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
1265Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
1266Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1267Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1268Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
1269Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
1270Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
1271Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
1272Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1273Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
1274Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
1275The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
1276Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
1277Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods