O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
11A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
12Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
13Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
14Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
15Advances in the fabrication of graphene transistors on flexible substrates
16Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
17Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
18Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
19Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
20Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
21Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
22Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
23ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
24AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
25AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
26AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
27Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
28Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
29Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
30An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
31Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
32Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
33Anti-stiction coating for mechanically tunable photonic crystal devices
34Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
35Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
36Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
37Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
38Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
39Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
40Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
41Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
42Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
43Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
44Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
45Band alignment of Al2O3 with (-201) β-Ga2O3
46Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
47Breakdown and Protection of ALD Moisture Barrier Thin Films
48Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
49Capacitance spectroscopy of gate-defined electronic lattices
50Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
51Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
52Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
53Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
54Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
55Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
56Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
57Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
58Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
59Charge effects of ultrafine FET with nanodot type floating gate
60Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
61Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
62Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
63Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
64Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
65Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
66Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
67Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
68Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
69Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
70Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
71Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
72Damage evaluation in graphene underlying atomic layer deposition dielectrics
73DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
74Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
75Densification of Thin Aluminum Oxide Films by Thermal Treatments
76Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
77Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
78Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
79DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
80Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
81Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
82Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
83Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
84Dynamic tuning of plasmon resonance in the visible using graphene
85Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
86Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
87Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
88Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
89Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
90Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
91Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
92Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
93Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
94Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
95Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
96Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
97Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
98Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
99Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
100Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
101Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
102Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
103Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
104Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
105Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
106Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
107Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
108Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
109Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
110Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
111Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
112Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
113Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
114Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
115Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
116Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
117Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
118Energy-enhanced atomic layer deposition for more process and precursor versatility
119Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
120Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
121Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
122Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
123Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
124Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
125Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
126Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
127Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
128Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
129Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
130Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
131Experimental verification of electro-refractive phase modulation in graphene
132Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
133Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
134Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
135Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
136Fiber-matrix interface reinforcement using Atomic Layer Deposition
137Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
138Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
139Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
140Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
141Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
142First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
143Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
144Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
145Flexible, light trapping substrates for organic photovoltaics
146Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
147Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
148Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
149Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
150Hafnia and alumina on sulphur passivated germanium
151High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
152High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
153High-efficiency embedded transmission grating
154High-Reflective Coatings For Ground and Space Based Applications
155High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
156Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
157Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
158Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
159Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
160Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
161Impact of interface materials on side permeation in indirect encapsulation of organic electronics
162Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
163Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
164Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
165Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
166Improved understanding of recombination at the Si/Al2O3 interface
167Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
168Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
169Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
170Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
171Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
172In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
173In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
174In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
175Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
176Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
177Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
178Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
179Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
180Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
181Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
182Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
183Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
184Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
185Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
186Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
187Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
188Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
189Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
190Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
191Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
192Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
193Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
194Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
195Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
196Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
197Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
198Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
199Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
200Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
201Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
202Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
203Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
204Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
205Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
206Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
207Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
208Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
209Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
210Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
211Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
212Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
213Lithium-Iron (III) Fluoride Battery with Double Surface Protection
214Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
215Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
216Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
217Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
218Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
219Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
220Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
221Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
222MANOS performance dependence on ALD Al2O3 oxidation source
223Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
224Mechanical properties of thin-film Parylene-metal-Parylene devices
225Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
226Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
227Method of Fabrication for Encapsulated Polarizing Resonant Gratings
228Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
229Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
230Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
231Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
232Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
233Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
234Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
235MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
236Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
237N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
238Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
239Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
240Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
241Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
242Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
243Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
244Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
245Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
246On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
247On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
248On the equilibrium concentration of boron-oxygen defects in crystalline silicon
249On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
250On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
251Optical display film as flexible and light trapping substrate for organic photovoltaics
252Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
253Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
254Optimization of the Surface Structure on Black Silicon for Surface Passivation
255Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
256Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
257Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
258Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
259Passivation effects of atomic-layer-deposited aluminum oxide
260Patterned deposition by plasma enhanced spatial atomic layer deposition
261PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
262Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
263Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
264Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
265Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
266Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
267Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
268Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
269Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
270Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
271Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
272Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
273Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
274Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
275Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
276Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
277Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
278Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
279Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
280Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
281Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
282Propagation Effects in Carbon Nanoelectronics
283Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
284Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
285Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
286Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
287Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
288Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
289Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
290Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
291Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
292Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
293Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
294Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
295Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
296Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
297Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
298Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
299Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
300Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
301Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
302Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
303Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
304Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
305Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
306Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
307Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
308Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
309Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
310Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
311Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
312Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
313Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
314Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
315Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
316Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
317Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
318The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
319The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
320The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
321Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
322Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
323Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
324Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
325TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
326Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
327Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
328Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
329Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
330Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
331Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
332Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
333Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
334Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
335Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
336Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
337Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
338Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
339Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
340Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
341Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
342Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
343Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
344Very high frequency plasma reactant for atomic layer deposition
345Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
346Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
347Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
348Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
349Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
350Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
351Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
352Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
353Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
354Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
355Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
356Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
357Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
358Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
359Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
360Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
361Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
362Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
363Composite materials and nanoporous thin layers made by atomic layer deposition
364Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
365Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
366Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
367Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
368Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
369Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
370Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
371Optical and Electrical Properties of AlxTi1-xO Films
372Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
373Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
374Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
375Atomic Layer Deposition of Gold Metal
376Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
377Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
378Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
379Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
380Plasma-enhanced atomic layer deposition of BaTiO3
381High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
382Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
383Plasma-enhanced atomic layer deposition of BaTiO3
384Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
385Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
386Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
387Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
388Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
389Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
390A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
391Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
392Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
393Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
394Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
395Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
396Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
397Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
398Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
399Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
400Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
401Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
402Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
403Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
404Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
405Radical Enhanced Atomic Layer Deposition of Metals and Oxides
406Radical Enhanced Atomic Layer Deposition of Metals and Oxides
407Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
408Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
409Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
410Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
411Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
412Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
413Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
414Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
415Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
416Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
417Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
418Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
419Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
420Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
421Plasma enhanced atomic layer deposition of Fe2O3 thin films
422Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
423Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
424Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
425Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
426The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
427Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
428Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
429Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
430Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
431Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
432Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
433Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
434Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
435Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
436Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
437Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
438Plasma enhanced atomic layer deposition of Ga2O3 thin films
439Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
440Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
441RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
442Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
443Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
444Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
445Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
446Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
447Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
448Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
449Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
450Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
451Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
452Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
453Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
454Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
455A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
456An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
457Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
458Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
459Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
460Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
461Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
462AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
463Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
464Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
465Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
466Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
467Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
468Characteristics of HfO2 thin films grown by plasma atomic layer deposition
469Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
470Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
471Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
472Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
473Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
474Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
475Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
476Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
477Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
478Damage evaluation in graphene underlying atomic layer deposition dielectrics
479Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
480Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
481Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
482Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
483Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
484Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
485Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
486Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
487Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
488Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
489Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
490Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
491Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
492Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
493Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
494Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
495Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
496Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
497Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
498Hafnia and alumina on sulphur passivated germanium
499HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
500Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
501Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
502Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
503Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
504In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
505Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
506Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
507Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
508Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
509Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
510Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
511Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
512Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
513Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
514Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
515Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
516Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
517Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
518Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
519Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
520Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
521Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
522Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
523Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
524Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
525On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
526Optical properties and bandgap evolution of ALD HfSiOx films
527Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
528PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
529Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
530Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
531Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
532Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
533Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
534Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
535Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
536Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
537Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
538Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
539Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
540Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
541Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
542Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
543The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
544The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
545The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
546The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
547The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
548Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
549Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
550Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
551Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
552Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
553Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
554Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
555Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
556Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
557Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
558Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
559Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
560Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
561HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
562Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
563The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
564Annealing behavior of ferroelectric Si-doped HfO2 thin films
565Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
566Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
567Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
568Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
569Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
570Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
571Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
572Optical properties and bandgap evolution of ALD HfSiOx films
573TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
574The effects of layering in ferroelectric Si-doped HfO2 thin films
575Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
576Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
577Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
578Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
579New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
580Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
581Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
582All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
583Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
584Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
585Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
586Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
587High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
588High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
589Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
590Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
591On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
592Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
593Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
594High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
595Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
596Systematic efficiency study of line-doubled zone plates
597TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
598IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
599Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
600Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
601Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
602Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
603Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
604Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
605Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
606The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
607XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
608Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
609Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
610Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
611Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
612Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
613Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
614Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
615Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
616Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
617Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
618Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
619In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
620Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
621Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
622Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
623Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
624Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
625Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
626Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
627Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
628Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
629The important role of water in growth of monolayer transition metal dichalcogenides
630Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
631Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
632Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
633Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
634Radical Enhanced Atomic Layer Deposition of Metals and Oxides
635Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
636Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
637Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
638Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
639Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
640Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
641Radical Enhanced Atomic Layer Deposition of Metals and Oxides
642Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
643Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
644Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
645Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
646Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
647Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
648Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
649Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
650Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
651Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
652Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
653Encapsulation method for atom probe tomography analysis of nanoparticles
654Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
655Growth of silica nanowires in vacuum
656In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
657Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
658Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
659Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
660Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
661Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
662Remote Plasma ALD of Platinum and Platinum Oxide Films
663Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
664Room-Temperature Atomic Layer Deposition of Platinum
665Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
666Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
667Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
668Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
669Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
670Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
671Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
672Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
673The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
674Remote Plasma ALD of Platinum and Platinum Oxide Films
675Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
676Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
677Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
678Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
679Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
680Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
681High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
682Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
683In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
684Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
685Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
686Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
687Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
688Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
689(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
690ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
691Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
692Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
693Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
694Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
695Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
696Radical Enhanced Atomic Layer Deposition of Metals and Oxides
697Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
698Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
699Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
700Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
701'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7023D structure evolution using metastable atomic layer deposition based on planar silver templates
703A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
704A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
705Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
706Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
707Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
708An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
709Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
710Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
711Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
712Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
713Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
714Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
715Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
716Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
717Atomic layer deposition of metal-oxide thin films on cellulose fibers
718Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
719Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
720Breakdown and Protection of ALD Moisture Barrier Thin Films
721Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
722Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
723Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
724Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
725Comparative study of ALD SiO2 thin films for optical applications
726Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
727Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
728Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
729Designing high performance precursors for atomic layer deposition of silicon oxide
730Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
731Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
732Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
733Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
734Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
735Energy-enhanced atomic layer deposition for more process and precursor versatility
736Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
737Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
738Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
739Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
740Gate Insulator for High Mobility Oxide TFT
741Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
742High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
743High-Reflective Coatings For Ground and Space Based Applications
744Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
745Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
746Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
747Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
748Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
749Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
750Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
751Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
752Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
753Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
754Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
755Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
756Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
757Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
758Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
759Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
760Modal properties of a strip-loaded horizontal slot waveguide
761Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
762Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
763Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
764Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
765Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
766On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
767On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
768Optical properties and bandgap evolution of ALD HfSiOx films
769PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
770Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
771Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
772Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
773Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
774Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
775Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
776Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
777Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
778Radical Enhanced Atomic Layer Deposition of Metals and Oxides
779Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
780Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
781Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
782Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
783Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
784Single-Cell Photonic Nanocavity Probes
785Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
786Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
787Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
788Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
789Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
790Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
791Symmetrical Al2O3-based passivation layers for p- and n-type silicon
792Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
793Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
794Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
795Trapped charge densities in Al2O3-based silicon surface passivation layers
796Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
797Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
798A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
799Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
800Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
801Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
802Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
803Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
804Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
805Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
806Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
807In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
808Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
809Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
810Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
811Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
812SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
813Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
814Surface and sensing properties of PE-ALD SnO2 thin film
815Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
816Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
817Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
818Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
819Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
820Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
821Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
822Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
823Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
824Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
825Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
826Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
827Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
828Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
829Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
830Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
831Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
832Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
833Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
834Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
835Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
836Radical Enhanced Atomic Layer Deposition of Metals and Oxides
837Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
838Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
839Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
840Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
841Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
842Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
843Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
844Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
845Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
846Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
847Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
848Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
849Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
850Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
851Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
852Topographically selective deposition
853Trilayer Tunnel Selectors for Memristor Memory Cells
854Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
855Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
856A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
857Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
858An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
859Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
860Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
861Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
862Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
863Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
864Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
865Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
866Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
867Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
868Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
869Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
870Biofilm prevention on cochlear implants
871Bipolar resistive switching in amorphous titanium oxide thin film
872Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
873Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
874Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
875Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
876Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
877Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
878Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
879Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
880Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
881Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
882Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
883Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
884Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
885Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
886Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
887Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
888Energy-enhanced atomic layer deposition for more process and precursor versatility
889Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
890Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
891Epitaxial 1D electron transport layers for high-performance perovskite solar cells
892Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
893Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
894Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
895Flexible Memristive Memory Array on Plastic Substrates
896Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
897Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
898Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
899Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
900Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
901Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
902Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
903High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
904High-efficiency embedded transmission grating
905Highly efficient and bending durable perovskite solar cells: toward a wearable power source
906Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
907Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
908Impact of interface materials on side permeation in indirect encapsulation of organic electronics
909Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
910Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
911In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
912In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
913In-gap states in titanium dioxide and oxynitride atomic layer deposited films
914Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
915Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
916Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
917Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
918Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
919Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
920Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
921Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
922Lithium-Iron (III) Fluoride Battery with Double Surface Protection
923Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
924Low temperature temporal and spatial atomic layer deposition of TiO2 films
925Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
926Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
927Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
928MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
929Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
930On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
931Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
932Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
933Oxygen migration in TiO2-based higher-k gate stacks
934Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
935Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
936Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
937Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
938Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
939Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
940Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
941Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
942Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
943Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
944Plasma-enhanced atomic layer deposition of BaTiO3
945Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
946Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
947Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
948Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
949Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
950Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
951Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
952Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
953Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
954Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
955Study on the resistive switching time of TiO2 thin films
956Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
957Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
958Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
959Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
960The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
961The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
962The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
963The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
964The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
965Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
966Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
967TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
968Transient characterization of the electroforming process in TiO2 based resistive switching devices
969Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
970Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
971X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
972Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
973Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
974Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
975Optical and Electrical Properties of TixSi1-xOy Films
976Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
977Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
978Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
979Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
980Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
981Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
982Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
983Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
984Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
985Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
986In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
987Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
988Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
989Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
990The important role of water in growth of monolayer transition metal dichalcogenides
991Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
992Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
993Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
994Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
995Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
996Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
997Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
998Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
999Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1000Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1001Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1002Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1003Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1004Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1005Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1006A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1007Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1008All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1009Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1010Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1011Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
1012Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1013Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1014Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1015Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1016Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1017Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1018Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1019Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1020Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1021Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1022From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1023Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1024Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1025Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1026Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1027Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1028Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1029Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1030Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1031Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1032Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1033Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1034Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1035Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1036Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1037Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1038Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1039Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1040Spectroscopy and control of near-surface defects in conductive thin film ZnO
1041Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1042Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1043The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1044The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1045The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1046The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1047The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1048Top-down fabricated ZnO nanowire transistors for application in biosensors
1049Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1050Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1051Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1052ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1053ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1054Plasma-enhanced atomic layer deposition of zinc phosphate
1055Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1056Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1057Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1058Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1059Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1060Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1061Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1062Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1063Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1064Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1065Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1066Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1067Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1068Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1069High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1070Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1071Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1072Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1073Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1074Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1075Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1076Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1077Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1078Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1079PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1080PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1081PEALD ZrO2 Films Deposition on TiN and Si Substrates
1082Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1083Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1084Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1085Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1086Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1087Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1088Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1089Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1090The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1091The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1092Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1093Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1094XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1095ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1096ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1097ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1098Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1099Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1100Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1101Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation