O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
2Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
3Plasma-enhanced atomic layer deposition of BaTiO3
4Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
5Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
6Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
7Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
8Growth of silica nanowires in vacuum
9Optical in situ monitoring of plasma-enhanced atomic layer deposition process
10Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
11Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
12Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
13Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
14Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
15α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
16Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
17Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
18All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
19Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
20Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
21Study on the resistive switching time of TiO2 thin films
22Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
23Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
24High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
25Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
26Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
27Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
28Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
29Trapped charge densities in Al2O3-based silicon surface passivation layers
30Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
31Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
32Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
33Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
34Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
35Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
36Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
37Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
38Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
39Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
40In-gap states in titanium dioxide and oxynitride atomic layer deposited films
41Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
42Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
43Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
44Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
45Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
46Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
47Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
48Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
49Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
50Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
51On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
52Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
53Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
54Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
55Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
56Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
57Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
58Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
59Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
60Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
61High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
62Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
63Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
64Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
65Hafnia and alumina on sulphur passivated germanium
66Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
67Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
68Impact of interface materials on side permeation in indirect encapsulation of organic electronics
69Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
70Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
71Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
72Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
73Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
74Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
75Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
76Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
77Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
78Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
79Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
80Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
81A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
82Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
83Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
84Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
85Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
86Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
87Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
88Composite materials and nanoporous thin layers made by atomic layer deposition
89Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
90Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
91Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
92MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
93Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
94Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
95Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
96Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
97In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
98Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
99Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
100Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
101Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
102Radical Enhanced Atomic Layer Deposition of Metals and Oxides
103The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
104Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
105Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
106Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
107Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
108Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
109Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
110Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
111In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
112Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
113Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
114A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
115Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
116Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
117Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
118Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
119Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
120Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
121Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
122Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
123Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
124Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
125Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
126Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
127Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
128Energy-enhanced atomic layer deposition for more process and precursor versatility
129Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
130Mechanical properties of thin-film Parylene-metal-Parylene devices
131Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
132Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
133Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
134Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
135Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
136Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
137Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
138Band alignment of Al2O3 with (-201) β-Ga2O3
139Lithium-Iron (III) Fluoride Battery with Double Surface Protection
140A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
141Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
142Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
143Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
144An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
145Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
146Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
147Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
148Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
149Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
150Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
151Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
152Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
153Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
154Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
155Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
156Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
157Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
158Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
159ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
160Spectroscopy and control of near-surface defects in conductive thin film ZnO
161Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
162Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
163Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
164Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
165Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
166Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
167Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
168Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
169Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
170Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
171Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
172Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
173MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
174Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
175Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
176Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
177Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
178Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
179Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
180Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
181Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
182Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
183Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
184Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
185Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
186Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
187Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
188Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
189Transient characterization of the electroforming process in TiO2 based resistive switching devices
190Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
191Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
192Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
193Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
194Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
195Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
196Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
197Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
198Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
199Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
200Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
201Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
202Radical Enhanced Atomic Layer Deposition of Metals and Oxides
203Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
204Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
205Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
206Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
207Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
208Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
209Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
210Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
211Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
212Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
213Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
214Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
215Plasma enhanced atomic layer deposition of Ga2O3 thin films
216Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
217Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
218Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
219ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
220Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
221Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
222Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
223Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
224Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
225Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
226Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
227Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
228Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
229PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
230Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
231Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
232SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
233Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
234Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
235Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
236Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
237Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
238On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
239Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
240Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
241Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
242TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
243Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
244Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
245The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
246Plasma-enhanced atomic layer deposition of BaTiO3
247Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
248PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
2493D structure evolution using metastable atomic layer deposition based on planar silver templates
250On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
251Top-down fabricated ZnO nanowire transistors for application in biosensors
252Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
253Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
254Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
255Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
256Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
257Gate Insulator for High Mobility Oxide TFT
258Bipolar resistive switching in amorphous titanium oxide thin film
259Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
260Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
261Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
262Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
263Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
264Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
265Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
266Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
267Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
268The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
269Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
270Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
271Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
272Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
273Plasma-enhanced atomic layer deposition of zinc phosphate
274Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
275Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
276Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
277Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
278Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
279Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
280Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
281Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
282Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
283Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
284Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
285In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
286Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
287Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
288The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
289Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
290In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
291Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
292Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
293Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
294Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
295Optical properties and bandgap evolution of ALD HfSiOx films
296Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
297Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
298Hafnia and alumina on sulphur passivated germanium
299Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
300Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
301Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
302'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
303Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
304Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
305Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
306Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
307Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
308Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
309Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
310Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
311Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
312Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
313Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
314Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
315Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
316Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
317Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
318Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
319Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
320Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
321Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
322Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
323Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
324Plasma enhanced atomic layer deposition of Fe2O3 thin films
325Experimental verification of electro-refractive phase modulation in graphene
326Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
327Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
328Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
329Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
330Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
331Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
332Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
333Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
334Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
335Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
336Method of Fabrication for Encapsulated Polarizing Resonant Gratings
337Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
338Patterned deposition by plasma enhanced spatial atomic layer deposition
339Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
340Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
341Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
342Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
343Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
344Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
345Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
346High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
347Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
348Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
349Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
350Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
351Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
352Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
353Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
354Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
355High-Reflective Coatings For Ground and Space Based Applications
356The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
357Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
358Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
359Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
360Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
361Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
362Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
363In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
364Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
365Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
366Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
367Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
368Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
369Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
370Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
371Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
372DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
373Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
374Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
375A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
376Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
377Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
378Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
379Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
380Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
381Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
382Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
383Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
384Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
385Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
386Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
387Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
388Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
389Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
390Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
391Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
392IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
393Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
394Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
395Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
396Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
397A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
398Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
399Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
400Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
401A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
402Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
403Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
404Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
405Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
406Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
407Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
408Modal properties of a strip-loaded horizontal slot waveguide
409Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
410Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
411Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
412Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
413Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
414Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
415Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
416Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
417A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
418Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
419Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
420Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
421Atomic layer deposition of YMnO3 thin films
422Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
423Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
424Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
425High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
426Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
427Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
428Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
429Dynamic tuning of plasmon resonance in the visible using graphene
430Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
431Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
432Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
433Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
434HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
435Radical Enhanced Atomic Layer Deposition of Metals and Oxides
436TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
437Single-Cell Photonic Nanocavity Probes
438Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
439Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
440Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
441Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
442Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
443Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
444A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
445Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
446Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
447On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
448Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
449Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
450Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
451Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
452Biofilm prevention on cochlear implants
453On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
454Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
455Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
456Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
457Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
458Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
459Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
460Atomic layer deposition of metal-oxide thin films on cellulose fibers
461Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
462Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
463Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
464Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
465Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
466Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
467Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
468Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
469Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
470Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
471Sub-10-nm ferroelectric Gd-doped HfO2 layers
472Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
473Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
47446-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
475Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
476Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
477Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
478Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
479Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
480Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
481An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
482Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
483Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
484Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
485Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
486The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
487Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
488Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
489Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
490Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
491Topographically selective deposition
492A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
493In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
494Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
495On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
496Highly efficient and bending durable perovskite solar cells: toward a wearable power source
497Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
498Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
499Radical Enhanced Atomic Layer Deposition of Metals and Oxides
500Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
501Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
502Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
503Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
504Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
505Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
506Radical Enhanced Atomic Layer Deposition of Metals and Oxides
507Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
508Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
509Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
510Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
511In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
512High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
513Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
514Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
515Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
516Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
517In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
518Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
519Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
520Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
521Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
522Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
523Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
524Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
525Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
526Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
527In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
528Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
529Lithium-Iron (III) Fluoride Battery with Double Surface Protection
530Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
531PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
532Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
533Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
534Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
535Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
536Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
537Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
538Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
539High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
540Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
541Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
542Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
543Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
544The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
545The important role of water in growth of monolayer transition metal dichalcogenides
546Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
547Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
548Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
549Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
550Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
551Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
552Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
553The important role of water in growth of monolayer transition metal dichalcogenides
554Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
555Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
556Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
557Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
558Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
559Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
560Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
561Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
562Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
563Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
564Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
565First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
566Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
567Tuning size and coverage of Pd nanoparticles using atomic layer deposition
568Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
569Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
570In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
571Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
572Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
573Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
574Propagation Effects in Carbon Nanoelectronics
575On the equilibrium concentration of boron-oxygen defects in crystalline silicon
576Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
577New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
578Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
579Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
580Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
581Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
582Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
583Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
584Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
585Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
586Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
587Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
588Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
589Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
590Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
591Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
592High-efficiency embedded transmission grating
593Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
594AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
595Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
596Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
597Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
598Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
599Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
600Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
601Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
602The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
603Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
604Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
605Passivation effects of atomic-layer-deposited aluminum oxide
606Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
607Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
608Radical Enhanced Atomic Layer Deposition of Metals and Oxides
609Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
610Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
611Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
612Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
613Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
614Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
615Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
616Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
617HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
618Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
619Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
620Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
621Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
622Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
623Energy-enhanced atomic layer deposition for more process and precursor versatility
624Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
625Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
626Oxygen migration in TiO2-based higher-k gate stacks
627In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
628Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
629Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
630Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
631Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
632Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
633Charge effects of ultrafine FET with nanodot type floating gate
634Optical properties and bandgap evolution of ALD HfSiOx films
635High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
636Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
637Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
638Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
639Optical display film as flexible and light trapping substrate for organic photovoltaics
640Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
641Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
642Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
643Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
644Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
645Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
646Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
647Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
648Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
649Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
650Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
651Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
652The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
653Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
654Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
655Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
656Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
657Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
658High-efficiency embedded transmission grating
659Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
660Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
661Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
662Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
663Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
664Radical Enhanced Atomic Layer Deposition of Metals and Oxides
665XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
666Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
667Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
668Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
669Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
670Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
671A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
672Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
673Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
674Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
675Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
676Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
677Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
678Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
679Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
680Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
681Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
682Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
683Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
684Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
685Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
686Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
687Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
688Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
689On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
690Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
691Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
692Comparative study of ALD SiO2 thin films for optical applications
693Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
694Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
695Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
696Residual stress study of thin films deposited by atomic layer deposition
697Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
698Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
699N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
700Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
701Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
702Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
703Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
704Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
705Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
706Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
707Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
708Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
709Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
710Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
711Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
712Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
713Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
714Energy-enhanced atomic layer deposition for more process and precursor versatility
715Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
716Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
717Optimization of the Surface Structure on Black Silicon for Surface Passivation
718Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
719Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
720Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
721Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
722Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
723Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
724Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
725Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
726An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
727Remote Plasma ALD of Platinum and Platinum Oxide Films
728Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
729Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
730Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
731Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
732Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
733Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
734Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
735Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
736Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
737Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
738Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
739Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
740Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
741Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
742Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
743A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
744Systematic efficiency study of line-doubled zone plates
745AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
746Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
747Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
748Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
749Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
750ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
751Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
752Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
753Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
754Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
755Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
756Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
757High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
758Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
759Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
760Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
761Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
762Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
763Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
764Room-Temperature Atomic Layer Deposition of Platinum
765Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
766Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
767Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
768Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
769Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
770Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
771Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
772All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
773Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
774Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
775Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
776Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
777Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
778Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
779Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
780Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
781Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
782Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
783Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
784Encapsulation method for atom probe tomography analysis of nanoparticles
785Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
786Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
787Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
788Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
789Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
790HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
791The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
792The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
793Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
794Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
795Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
796Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
797Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
798Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
799The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
800Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
801Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
802Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
803Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
804Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
805Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
806Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
807Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
808Characteristics of HfO2 thin films grown by plasma atomic layer deposition
809High-Reflective Coatings For Ground and Space Based Applications
810Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
811Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
812Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
813Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
814Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
815Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
816Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
817Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
818Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
819Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
820Residual stress study of thin films deposited by atomic layer deposition
821Flexible, light trapping substrates for organic photovoltaics
822Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
823On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
824Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
825Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
826Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
827The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
828From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
829Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
830Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
831Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
832Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
833Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
834Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
835Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
836Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
837X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
838Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
839Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
840(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
841Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
842Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
843Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
844Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
845Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
846Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
847Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
848Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
849Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
850Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
851Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
852Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
853Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
854Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
855Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
856Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
857Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
858Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
859Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
860Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
861Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
862Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
863Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
864Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
865Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
866Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
867Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
868Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
869Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
870RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
871Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
872Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
873Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
874Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
875Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
876Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
877Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
878Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
879Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
880Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
881Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
882Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
883Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
884Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
885Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
886Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
887Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
888Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
889Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
890Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
891Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
892Remote Plasma ALD of Platinum and Platinum Oxide Films
893Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
894Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
895Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
896Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
897Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
898Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
899Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
900Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
901Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
902Very high frequency plasma reactant for atomic layer deposition
903Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
904Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
905Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
906AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
907Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
908Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
909Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
910Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
911Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
912Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
913Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
914Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
915Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
916Lithium-Iron (III) Fluoride Battery with Double Surface Protection
917AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
918Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
919Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
920Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
921Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
922Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
923Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
924Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
925Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
926Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
927Optical and Electrical Properties of AlxTi1-xO Films
928Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
929Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
930Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
931Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
932The effects of layering in ferroelectric Si-doped HfO2 thin films
933Sub-7-nm textured ZrO2 with giant ferroelectricity
934Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
935Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
936Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
937Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
938Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
939Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
940The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
941Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
942Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
943Atomic Layer Deposition of Gold Metal
944Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
945Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
946Radical Enhanced Atomic Layer Deposition of Metals and Oxides
947Densification of Thin Aluminum Oxide Films by Thermal Treatments
948Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
949Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
950Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
951Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
952Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
953The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
954Low temperature temporal and spatial atomic layer deposition of TiO2 films
955Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
956Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
957Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
958HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
959High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
960Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
961Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
962Breakdown and Protection of ALD Moisture Barrier Thin Films
963Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
964Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
965Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
966Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
967Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
968Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
969Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
970An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
971Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
972Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
973Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
974Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
975Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
976Surface and sensing properties of PE-ALD SnO2 thin film
977Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
978Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
979Innovative remote plasma source for atomic layer deposition for GaN devices
980Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
981Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
982Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
983Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
984Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
985Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
986Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
987Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
988Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
989Symmetrical Al2O3-based passivation layers for p- and n-type silicon
990Damage evaluation in graphene underlying atomic layer deposition dielectrics
991Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
992Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
993Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
994The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
995Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
996Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
997Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
998Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
999Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1000Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
1001Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1002Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
1003Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
1004Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
1005Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
1006Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
1007Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
1008Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1009Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1010Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1011Optical properties and bandgap evolution of ALD HfSiOx films
1012The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1013Designing high performance precursors for atomic layer deposition of silicon oxide
1014Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1015Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
10161D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
1017Epitaxial 1D electron transport layers for high-performance perovskite solar cells
1018Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
1019Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
1020Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1021Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
1022'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1023Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
1024Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1025Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
1026Advances in the fabrication of graphene transistors on flexible substrates
1027Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1028Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1029Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
1030Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1031Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1032Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
1033Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
1034Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
1035Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1036Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
1037PEALD ZrO2 Films Deposition on TiN and Si Substrates
1038Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
1039Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
1040Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1041Atomic Layer Deposition of the Conductive Delafossite PtCoO2
1042Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
1043Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1044Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1045The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1046Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1047Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
1048Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
1049Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
1050Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
1051Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
1052Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
1053Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
1054Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1055Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
1056Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1057Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
1058The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1059In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1060Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
1061Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
1062Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1063Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
1064Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
1065Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
1066Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
1067Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
1068PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1069Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1070Anti-stiction coating for mechanically tunable photonic crystal devices
1071Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1072Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
1073Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1074Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
1075A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1076Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
1077Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
1078Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1079Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
1080Optical and Electrical Properties of TixSi1-xOy Films
1081Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
1082Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
1083Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
1084Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
1085Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
1086Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
1087Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
1088Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
1089Breakdown and Protection of ALD Moisture Barrier Thin Films
1090In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1091Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
1092Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
1093Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
1094Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
1095MANOS performance dependence on ALD Al2O3 oxidation source
1096Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1097Improved understanding of recombination at the Si/Al2O3 interface
1098Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1099Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
1100Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
1101Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1102Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
1103ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1104Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1105Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
1106Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1107The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
1108Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
1109Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
1110Fiber-matrix interface reinforcement using Atomic Layer Deposition
1111Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
1112Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
1113Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
1114Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
1115Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
1116Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1117Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
1118Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
1119Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1120Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1121Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
1122Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1123Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
1124Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1125Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
1126Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1127Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
1128Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
1129Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1130Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
1131Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
1132Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
1133Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1134Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
1135Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
1136Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
1137In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
1138Flexible Memristive Memory Array on Plastic Substrates
1139Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
1140Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
1141Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1142A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1143Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
1144Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
1145Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
1146Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
1147On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1148Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
1149Trilayer Tunnel Selectors for Memristor Memory Cells
1150Damage evaluation in graphene underlying atomic layer deposition dielectrics
1151High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
1152Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
1153Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1154Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1155Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
1156ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1157ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1158Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
1159Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1160Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
1161Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1162Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1163High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
1164Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1165Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1166Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
1167Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1168The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
1169TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1170Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
1171Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1172Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
1173Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1174Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
1175Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1176Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1177Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1178Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
1179Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1180Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
1181A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
1182Plasma-enhanced atomic layer deposition of BaTiO3
1183Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1184Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
1185Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
1186Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1187Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1188The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1189Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
1190PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1191A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
1192Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1193Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
1194Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1195Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
1196The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
1197Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1198Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1199Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1200ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1201TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
1202Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1203Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1204Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1205Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
1206Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1207Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
1208A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
1209Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
1210Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
1211The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
1212Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1213Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
1214Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1215Annealing behavior of ferroelectric Si-doped HfO2 thin films
1216Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1217Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
1218DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
1219Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1220Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1221High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
1222Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1223Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
1224Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
1225Capacitance spectroscopy of gate-defined electronic lattices
1226Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
1227Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
1228Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
1229Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
1230Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
1231XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1232Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
1233Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
1234Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1235Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1236Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
1237Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
1238Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition