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Oxygen, O2, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 837 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12Advances in the fabrication of graphene transistors on flexible substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
31Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
32Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
33Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
34Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
35Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
36Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
37Band alignment of Al2O3 with (-201) β-Ga2O3
38Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
39Breakdown and Protection of ALD Moisture Barrier Thin Films
40Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
41Capacitance spectroscopy of gate-defined electronic lattices
42Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
43Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
44Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
45Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
46Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
47Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
48Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
49Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
50Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
51Charge effects of ultrafine FET with nanodot type floating gate
52Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
53Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
54Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
55Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
56Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
57Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
58Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
59Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
60Damage evaluation in graphene underlying atomic layer deposition dielectrics
61DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
62Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
63Demonstration of flexible thin film transistors with GaN channels
64Densification of Thin Aluminum Oxide Films by Thermal Treatments
65Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
66Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
67Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
68DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
69Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
70Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
71Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
72Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
73Dynamic tuning of plasmon resonance in the visible using graphene
74Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
75Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
76Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
77Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
78Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
79Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
80Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
81Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
82Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
83Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
84Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
85Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
86Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
87Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
88Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
89Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
90Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
91Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
92Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
93Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
94Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
95Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
96Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
97Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
98Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
99Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
100Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
101Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
102Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
103Energy-enhanced atomic layer deposition for more process and precursor versatility
104Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
105Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
106Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
107Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
108Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
109Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
110Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
111Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
112Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
113Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
114Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
115Experimental verification of electro-refractive phase modulation in graphene
116Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
117Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
118Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
119Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
120Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
121Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
122Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
123Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
124Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
125Flexible, light trapping substrates for organic photovoltaics
126Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
127Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
128Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
129Hafnia and alumina on sulphur passivated germanium
130High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
131High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
132High-efficiency embedded transmission grating
133High-Reflective Coatings For Ground and Space Based Applications
134Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
135Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
136Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
137Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
138Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
139Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
140Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
141Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
142Improved understanding of recombination at the Si/Al2O3 interface
143Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
144Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
145Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
146Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
147Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
148In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
149In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
150In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
151Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
152Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
153Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
154Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
155Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
156Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
157Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
158Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
159Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
160Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
161Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
162Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
163Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
164Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
165Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
166Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
167Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
168Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
169Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
170Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
171Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
172Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
173Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
174Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
175Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
176Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
177Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
178Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
179Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
180Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
181Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
182Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
183Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
184Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
185Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
186Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
187MANOS performance dependence on ALD Al2O3 oxidation source
188Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
189Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
190Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
191Method of Fabrication for Encapsulated Polarizing Resonant Gratings
192Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
193Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
194Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
195Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
196Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
197Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
198Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
199N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
200Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
201Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
202Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
203Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
204Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
205Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
206On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
207On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
208On the equilibrium concentration of boron-oxygen defects in crystalline silicon
209On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
210Optical display film as flexible and light trapping substrate for organic photovoltaics
211Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
212Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
213Optimization of the Surface Structure on Black Silicon for Surface Passivation
214Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
215Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
216Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
217Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
218Passivation effects of atomic-layer-deposited aluminum oxide
219Patterned deposition by plasma enhanced spatial atomic layer deposition
220PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
221Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
222Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
223Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
224Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
225Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
226Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
227Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
228Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
229Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
230Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
231Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
232Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
233Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
234Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
235Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
236Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
237Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
238Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
239Propagation Effects in Carbon Nanoelectronics
240Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
241Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
242Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
243Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
244Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
245Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
246Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
247Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
248Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
249Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
250Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
251Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
252Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
253Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
254Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
255Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
256Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
257Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
258Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
259Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
260Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
261Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
262Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
263Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
264Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
265Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
266Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
267Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
268Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
269Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
270Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
271Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
272The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
273The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
274The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
275Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
276Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
277Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
278TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
279Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
280Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
281Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
282Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
283Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
284Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
285Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
286Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
287Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
288Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
289Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
290Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
291Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
292Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
293Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
294Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
295Very high frequency plasma reactant for atomic layer deposition
296Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
297Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
298Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
299Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
300Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
301Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
302Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
303Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
304Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
305Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
306Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
307Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
308Composite materials and nanoporous thin layers made by atomic layer deposition
309Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
310Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
311Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
312Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
313Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
314Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
315Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
316Optical and Electrical Properties of AlxTi1-xO Films
317Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
318Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
319Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
320Atomic Layer Deposition of Gold Metal
321Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
322Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
323Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
324Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
325High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
326Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
327Plasma-enhanced atomic layer deposition of BaTiO3
328Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
329Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
330Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
331A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
332Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
333Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
334Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
335Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
336Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
337Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
338Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
339Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
340Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
341Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
342Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
343Radical Enhanced Atomic Layer Deposition of Metals and Oxides
344Radical Enhanced Atomic Layer Deposition of Metals and Oxides
345Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
346Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
347Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
348Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
349Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
350Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
351Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
352Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
353Plasma enhanced atomic layer deposition of Fe2O3 thin films
354Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
355Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
356The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
357Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
358Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
359Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
360Electrical characteristics of β-Ga2O3 thin films grown by PEALD
361Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
362Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
363Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
364Plasma enhanced atomic layer deposition of Ga2O3 thin films
365Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
366Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
367RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
368Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
369Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
370Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
371Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
372Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
373Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
374Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
375Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
376Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
377Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
378Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
379A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
380An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
381Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
382Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
383AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
384Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
385Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
386Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
387Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
388Damage evaluation in graphene underlying atomic layer deposition dielectrics
389Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
390Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
391Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
392Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
393Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
394Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
395Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
396Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
397Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
398Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
399Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
400Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
401Hafnia and alumina on sulphur passivated germanium
402HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
403Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
404Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
405Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
406Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
407In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
408Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
409Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
410Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
411Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
412Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
413Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
414Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
415Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
416Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
417Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
418Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
419Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
420Optical properties and bandgap evolution of ALD HfSiOx films
421Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
422Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
423Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
424Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
425Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
426Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
427Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
428Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
429Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
430Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
431Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
432Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
433The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
434The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
435The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
436Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
437Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
438Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
439Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
440Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
441Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
442Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
443HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
444Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
445Annealing behavior of ferroelectric Si-doped HfO2 thin films
446Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
447Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
448Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
449Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
450Optical properties and bandgap evolution of ALD HfSiOx films
451TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
452The effects of layering in ferroelectric Si-doped HfO2 thin films
453Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
454Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
455Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
456High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
457High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
458Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
459Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
460On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
461High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
462Systematic efficiency study of line-doubled zone plates
463TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
464IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
465Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
466Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
467Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
468Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
469Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
470Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
471Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
472Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
473Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
474Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
475Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
476Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
477In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
478Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
479Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
480Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
481Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
482Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
483Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
484Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
485The important role of water in growth of monolayer transition metal dichalcogenides
486Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
487Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
488Radical Enhanced Atomic Layer Deposition of Metals and Oxides
489Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
490Radical Enhanced Atomic Layer Deposition of Metals and Oxides
491Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
492Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
493Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
494Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
495Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
496Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
497Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
498Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
499Encapsulation method for atom probe tomography analysis of nanoparticles
500Growth of silica nanowires in vacuum
501In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
502Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
503Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
504Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
505Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
506Remote Plasma ALD of Platinum and Platinum Oxide Films
507Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
508Room-Temperature Atomic Layer Deposition of Platinum
509Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
510Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
511Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
512Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
513Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
514Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
515Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
516Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
517The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
518Remote Plasma ALD of Platinum and Platinum Oxide Films
519Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
520Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
521Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
522Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
523Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
524Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
525In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
526Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
527Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
528Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
529Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
530Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
531(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
532ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
533Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
534Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
535Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
536Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
537Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
538Radical Enhanced Atomic Layer Deposition of Metals and Oxides
539Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
540Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
541Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
542'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
543A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
544Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
545Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
546Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
547Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
548Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
549Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
550Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
551Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
552Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
553Breakdown and Protection of ALD Moisture Barrier Thin Films
554Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
555Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
556Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
557Comparative study of ALD SiO2 thin films for optical applications
558Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
559Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
560Designing high performance precursors for atomic layer deposition of silicon oxide
561Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
562Energy-enhanced atomic layer deposition for more process and precursor versatility
563Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
564Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
565Gate Insulator for High Mobility Oxide TFT
566Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
567High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
568High-Reflective Coatings For Ground and Space Based Applications
569Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
570Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
571Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
572Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
573Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
574Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
575Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
576Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
577Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
578Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
579Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
580Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
581Modal properties of a strip-loaded horizontal slot waveguide
582Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
583Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
584On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
585On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
586Optical properties and bandgap evolution of ALD HfSiOx films
587PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
588Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
589Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
590Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
591Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
592Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
593Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
594Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
595Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
596Radical Enhanced Atomic Layer Deposition of Metals and Oxides
597Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
598Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
599Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
600Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
601Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
602Single-Cell Photonic Nanocavity Probes
603Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
604Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
605Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
606Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
607Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
608Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
609Symmetrical Al2O3-based passivation layers for p- and n-type silicon
610Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
611Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
612Trapped charge densities in Al2O3-based silicon surface passivation layers
613Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
614Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
615A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
616Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
617Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
618Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
619Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
620Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
621Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
622Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
623Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
624Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
625SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
626Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
627Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
628Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
629Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
630Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
631Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
632Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
633Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
634Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
635Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
636Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
637Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
638Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
639Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
640Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
641Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
642Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
643Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
644Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
645Radical Enhanced Atomic Layer Deposition of Metals and Oxides
646Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
647Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
648Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
649Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
650Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
651Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
652Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
653Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
654Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
655Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
656Trilayer Tunnel Selectors for Memristor Memory Cells
657Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
658A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
659Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
660An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
661Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
662Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
663Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
664Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
665Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
666Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
667Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
668Biofilm prevention on cochlear implants
669Bipolar resistive switching in amorphous titanium oxide thin film
670Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
671Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
672Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
673Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
674Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
675Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
676Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
677Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
678Energy-enhanced atomic layer deposition for more process and precursor versatility
679Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
680Epitaxial 1D electron transport layers for high-performance perovskite solar cells
681Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
682Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
683Flexible Memristive Memory Array on Plastic Substrates
684Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
685Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
686Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
687Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
688High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
689High-efficiency embedded transmission grating
690Highly efficient and bending durable perovskite solar cells: toward a wearable power source
691Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
692Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
693Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
694In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
695In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
696In-gap states in titanium dioxide and oxynitride atomic layer deposited films
697Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
698Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
699Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
700Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
701Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
702Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
703Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
704Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
705Low temperature temporal and spatial atomic layer deposition of TiO2 films
706Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
707Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
708Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
709On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
710Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
711Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
712Oxygen migration in TiO2-based higher-k gate stacks
713Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
714Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
715Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
716Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
717Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
718Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
719Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
720Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
721Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
722Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
723Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
724Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
725Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
726Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
727Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
728Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
729Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
730Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
731Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
732Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
733Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
734The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
735The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
736The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
737Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
738Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
739TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
740Transient characterization of the electroforming process in TiO2 based resistive switching devices
741Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
742Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
743X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
744Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
745Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
746Optical and Electrical Properties of TixSi1-xOy Films
747Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
748Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
749Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
750Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
751Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
752Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
753Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
754Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
755Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
756The important role of water in growth of monolayer transition metal dichalcogenides
757Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
758Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
759Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
760Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
761Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
762Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
763Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
764Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
765Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
766Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
767Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
768Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
769Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
770Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
771Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
772Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
773Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
774Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
775Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
776Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
777Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
778Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
779Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
780Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
781Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
782Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
783Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
784Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
785Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
786Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
787Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
788Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
789Radical Enhanced Atomic Layer Deposition of Metals and Oxides
790Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
791Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
792Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
793Spectroscopy and control of near-surface defects in conductive thin film ZnO
794Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
795Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
796The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
797The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
798The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
799The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
800Top-down fabricated ZnO nanowire transistors for application in biosensors
801Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
802Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
803Plasma-enhanced atomic layer deposition of zinc phosphate
804Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
805Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
806Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
807Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
808Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
809Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
810Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
811Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
812Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
813Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
814High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
815Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
816Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
817Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
818Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
819Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
820Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
821Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
822PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
823PEALD ZrO2 Films Deposition on TiN and Si Substrates
824Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
825Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
826Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
827Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
828Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
829Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
830The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
831Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
832Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
833ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
834ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
835Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
836Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
837Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation


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