O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12Advances in the fabrication of graphene transistors on flexible substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30Anti-stiction coating for mechanically tunable photonic crystal devices
31Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40Breakdown and Protection of ALD Moisture Barrier Thin Films
41Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42Capacitance spectroscopy of gate-defined electronic lattices
43Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52Charge effects of ultrafine FET with nanodot type floating gate
53Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
57Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
58Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
59Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
60Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
61Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
62Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
63Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
64Damage evaluation in graphene underlying atomic layer deposition dielectrics
65DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
66Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
67Densification of Thin Aluminum Oxide Films by Thermal Treatments
68Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76Dynamic tuning of plasmon resonance in the visible using graphene
77Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
81Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
82Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
83Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
84Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
85Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
86Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
87Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
88Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
89Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
90Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
91Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
92Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
93Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
94Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
95Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
96Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
97Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
99Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
100Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
101Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
102Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
103Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
104Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
105Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
106Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
107Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
108Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
109Energy-enhanced atomic layer deposition for more process and precursor versatility
110Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
111Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
112Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
113Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
114Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
115Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
116Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
117Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
118Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
119Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
120Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
121Experimental verification of electro-refractive phase modulation in graphene
122Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
123Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
124Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
125Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
126Fiber-matrix interface reinforcement using Atomic Layer Deposition
127Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
128Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
129Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
130Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
131First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
132Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
133Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
134Flexible, light trapping substrates for organic photovoltaics
135Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
136Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
137Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
138Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
139Hafnia and alumina on sulphur passivated germanium
140High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
141High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
142High-efficiency embedded transmission grating
143High-Reflective Coatings For Ground and Space Based Applications
144High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
145Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
146Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
147Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
148Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
149Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
150Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
151Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
152Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
153Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
154Improved understanding of recombination at the Si/Al2O3 interface
155Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
156Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
157Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
158Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
159Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
160In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
161In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
162In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
163Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
164Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
165Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
166Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
167Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
168Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
169Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
170Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
171Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
172Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
173Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
174Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
175Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
176Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
177Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
178Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
179Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
180Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
181Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
182Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
183Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
184Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
185Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
186Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
187Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
188Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
189Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
190Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
191Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
192Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
193Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
194Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
195Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
196Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
197Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
198Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
199Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
200Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
201Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
202MANOS performance dependence on ALD Al2O3 oxidation source
203Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
204Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
205Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
206Method of Fabrication for Encapsulated Polarizing Resonant Gratings
207Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
208Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
209Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
210Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
211Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
212Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
213Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
214Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
215N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
216Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
217Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
218Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
219Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
220Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
221Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
222On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
223On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
224On the equilibrium concentration of boron-oxygen defects in crystalline silicon
225On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
226Optical display film as flexible and light trapping substrate for organic photovoltaics
227Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
228Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
229Optimization of the Surface Structure on Black Silicon for Surface Passivation
230Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
231Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
232Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
233Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
234Passivation effects of atomic-layer-deposited aluminum oxide
235Patterned deposition by plasma enhanced spatial atomic layer deposition
236PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
237Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
238Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
239Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
240Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
241Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
242Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
243Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
244Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
245Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
246Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
247Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
248Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
249Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
250Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
251Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
252Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
253Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
254Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
255Propagation Effects in Carbon Nanoelectronics
256Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
257Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
258Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
259Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
260Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
261Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
262Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
263Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
264Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
265Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
266Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
267Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
268Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
269Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
270Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
271Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
272Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
273Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
274Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
275Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
276Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
277Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
278Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
279Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
280Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
281Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
282Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
283Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
284Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
285Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
286Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
287Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
288Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
289The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
290The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
291The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
292Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
293Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
294Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
295Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
296TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
297Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
298Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
299Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
300Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
301Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
302Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
303Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
304Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
305Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
306Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
307Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
308Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
309Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
310Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
311Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
312Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
313Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
314Very high frequency plasma reactant for atomic layer deposition
315Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
316Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
317Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
318Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
319Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
320Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
321Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
322Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
323Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
324Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
325Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
326Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
327Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
328Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
329Composite materials and nanoporous thin layers made by atomic layer deposition
330Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
331Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
332Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
333Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
334Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
335Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
336Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
337Optical and Electrical Properties of AlxTi1-xO Films
338Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
339Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
340Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
341Atomic Layer Deposition of Gold Metal
342Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
343Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
344Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
345Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
346High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
347Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
348Plasma-enhanced atomic layer deposition of BaTiO3
349Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
350Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
351Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
352A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
353Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
354Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
355Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
356Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
357Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
358Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
359Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
360Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
361Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
362Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
363Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
364Radical Enhanced Atomic Layer Deposition of Metals and Oxides
365Radical Enhanced Atomic Layer Deposition of Metals and Oxides
366Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
367Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
368Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
369Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
370Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
371Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
372Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
373Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
374Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
375Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
376Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
377Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
378Plasma enhanced atomic layer deposition of Fe2O3 thin films
379Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
380Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
381Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
382The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
383Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
384Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
385Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
386Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
387Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
388Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
389Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
390Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
391Plasma enhanced atomic layer deposition of Ga2O3 thin films
392Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
393Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
394RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
395Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
396Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
397Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
398Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
399Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
400Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
401Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
402Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
403Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
404Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
405Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
406Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
407Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
408A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
409An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
410Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
411Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
412Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
413Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
414Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
415AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
416Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
417Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
418Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
419Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
420Characteristics of HfO2 thin films grown by plasma atomic layer deposition
421Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
422Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
423Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
424Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
425Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
426Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
427Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
428Damage evaluation in graphene underlying atomic layer deposition dielectrics
429Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
430Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
431Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
432Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
433Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
434Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
435Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
436Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
437Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
438Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
439Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
440Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
441Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
442Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
443Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
444Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
445Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
446Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
447Hafnia and alumina on sulphur passivated germanium
448HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
449Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
450Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
451Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
452Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
453In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
454Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
455Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
456Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
457Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
458Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
459Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
460Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
461Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
462Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
463Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
464Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
465Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
466Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
467Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
468Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
469Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
470Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
471Optical properties and bandgap evolution of ALD HfSiOx films
472Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
473PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
474Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
475Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
476Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
477Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
478Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
479Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
480Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
481Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
482Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
483Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
484Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
485Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
486Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
487Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
488The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
489The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
490The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
491The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
492The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
493Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
494Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
495Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
496Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
497Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
498Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
499Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
500Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
501Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
502Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
503Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
504Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
505Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
506HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
507Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
508The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
509Annealing behavior of ferroelectric Si-doped HfO2 thin films
510Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
511Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
512Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
513Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
514Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
515Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
516Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
517Optical properties and bandgap evolution of ALD HfSiOx films
518TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
519The effects of layering in ferroelectric Si-doped HfO2 thin films
520Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
521Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
522Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
523Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
524Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
525Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
526Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
527Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
528High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
529High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
530Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
531Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
532On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
533Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
534Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
535High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
536Systematic efficiency study of line-doubled zone plates
537TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
538IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
539Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
540Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
541Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
542Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
543Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
544Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
545Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
546The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
547Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
548Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
549Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
550Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
551Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
552Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
553Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
554In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
555Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
556Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
557Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
558Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
559Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
560Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
561Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
562Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
563The important role of water in growth of monolayer transition metal dichalcogenides
564Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
565Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
566Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
567Radical Enhanced Atomic Layer Deposition of Metals and Oxides
568Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
569Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
570Radical Enhanced Atomic Layer Deposition of Metals and Oxides
571Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
572Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
573Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
574Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
575Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
576Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
577Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
578Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
579Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
580Encapsulation method for atom probe tomography analysis of nanoparticles
581Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
582Growth of silica nanowires in vacuum
583In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
584Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
585Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
586Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
587Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
588Remote Plasma ALD of Platinum and Platinum Oxide Films
589Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
590Room-Temperature Atomic Layer Deposition of Platinum
591Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
592Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
593Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
594Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
595Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
596Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
597Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
598Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
599The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
600Remote Plasma ALD of Platinum and Platinum Oxide Films
601Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
602Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
603Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
604Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
605Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
606Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
607High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
608Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
609In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
610Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
611Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
612Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
613Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
614Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
615(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
616ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
617Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
618Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
619Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
620Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
621Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
622Radical Enhanced Atomic Layer Deposition of Metals and Oxides
623Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
624Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
625Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
626'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
627A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
628A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
629Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
630Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
631Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
632Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
633Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
634Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
635Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
636Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
637Atomic layer deposition of metal-oxide thin films on cellulose fibers
638Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
639Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
640Breakdown and Protection of ALD Moisture Barrier Thin Films
641Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
642Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
643Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
644Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
645Comparative study of ALD SiO2 thin films for optical applications
646Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
647Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
648Designing high performance precursors for atomic layer deposition of silicon oxide
649Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
650Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
651Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
652Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
653Energy-enhanced atomic layer deposition for more process and precursor versatility
654Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
655Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
656Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
657Gate Insulator for High Mobility Oxide TFT
658Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
659High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
660High-Reflective Coatings For Ground and Space Based Applications
661Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
662Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
663Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
664Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
665Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
666Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
667Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
668Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
669Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
670Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
671Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
672Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
673Modal properties of a strip-loaded horizontal slot waveguide
674Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
675Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
676Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
677Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
678On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
679On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
680Optical properties and bandgap evolution of ALD HfSiOx films
681PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
682Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
683Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
684Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
685Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
686Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
687Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
688Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
689Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
690Radical Enhanced Atomic Layer Deposition of Metals and Oxides
691Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
692Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
693Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
694Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
695Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
696Single-Cell Photonic Nanocavity Probes
697Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
698Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
699Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
700Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
701Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
702Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
703Symmetrical Al2O3-based passivation layers for p- and n-type silicon
704Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
705Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
706Trapped charge densities in Al2O3-based silicon surface passivation layers
707Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
708Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
709A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
710Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
711Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
712Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
713Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
714Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
715Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
716Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
717In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
718Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
719Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
720Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
721Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
722SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
723Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
724Surface and sensing properties of PE-ALD SnO2 thin film
725Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
726Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
727Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
728Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
729Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
730Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
731Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
732Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
733Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
734Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
735Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
736Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
737Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
738Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
739Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
740Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
741Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
742Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
743Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
744Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
745Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
746Radical Enhanced Atomic Layer Deposition of Metals and Oxides
747Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
748Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
749Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
750Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
751Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
752Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
753Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
754Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
755Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
756Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
757Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
758Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
759Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
760Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
761Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
762Trilayer Tunnel Selectors for Memristor Memory Cells
763Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
764Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
765A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
766Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
767An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
768Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
769Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
770Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
771Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
772Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
773Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
774Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
775Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
776Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
777Biofilm prevention on cochlear implants
778Bipolar resistive switching in amorphous titanium oxide thin film
779Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
780Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
781Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
782Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
783Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
784Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
785Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
786Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
787Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
788Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
789Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
790Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
791Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
792Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
793Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
794Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
795Energy-enhanced atomic layer deposition for more process and precursor versatility
796Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
797Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
798Epitaxial 1D electron transport layers for high-performance perovskite solar cells
799Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
800Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
801Flexible Memristive Memory Array on Plastic Substrates
802Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
803Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
804Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
805Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
806Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
807Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
808Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
809High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
810High-efficiency embedded transmission grating
811Highly efficient and bending durable perovskite solar cells: toward a wearable power source
812Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
813Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
814Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
815In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
816In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
817In-gap states in titanium dioxide and oxynitride atomic layer deposited films
818Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
819Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
820Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
821Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
822Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
823Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
824Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
825Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
826Low temperature temporal and spatial atomic layer deposition of TiO2 films
827Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
828Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
829Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
830On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
831Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
832Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
833Oxygen migration in TiO2-based higher-k gate stacks
834Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
835Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
836Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
837Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
838Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
839Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
840Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
841Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
842Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
843Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
844Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
845Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
846Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
847Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
848Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
849Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
850Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
851Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
852Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
853Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
854Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
855Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
856The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
857The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
858The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
859Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
860Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
861TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
862Transient characterization of the electroforming process in TiO2 based resistive switching devices
863Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
864Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
865X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
866Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
867Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
868Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
869Optical and Electrical Properties of TixSi1-xOy Films
870Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
871Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
872Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
873Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
874Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
875Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
876Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
877Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
878In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
879Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
880Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
881The important role of water in growth of monolayer transition metal dichalcogenides
882Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
883Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
884Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
885Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
886Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
887Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
888Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
889Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
890Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
891Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
892Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
893Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
894Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
895Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
896Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
897Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
898Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
899Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
900Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
901Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
902Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
903Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
904Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
905Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
906Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
907Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
908Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
909Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
910Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
911Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
912Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
913Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
914Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
915Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
916Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
917Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
918Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
919Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
920Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
921Radical Enhanced Atomic Layer Deposition of Metals and Oxides
922Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
923Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
924Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
925Spectroscopy and control of near-surface defects in conductive thin film ZnO
926Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
927Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
928The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
929The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
930The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
931The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
932Top-down fabricated ZnO nanowire transistors for application in biosensors
933Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
934Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
935ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
936Plasma-enhanced atomic layer deposition of zinc phosphate
937Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
938Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
939Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
940Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
941Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
942Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
943Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
944Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
945Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
946Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
947Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
948Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
949Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
950High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
951Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
952Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
953Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
954Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
955Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
956Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
957Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
958PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
959PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
960PEALD ZrO2 Films Deposition on TiN and Si Substrates
961Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
962Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
963Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
964Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
965Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
966Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
967Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
968The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
969The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
970Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
971Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
972ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
973ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
974ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
975Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
976Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
977Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
978Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation


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