Oxygen, O₂, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 837 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5	46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6	A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12	Advances in the fabrication of graphene transistors on flexible substrates
13	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20	ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
31	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
32	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
33	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
34	Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
35	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
36	Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
37	Band alignment of Al2O3 with (-201) β-Ga2O3
38	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
39	Breakdown and Protection of ALD Moisture Barrier Thin Films
40	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
41	Capacitance spectroscopy of gate-defined electronic lattices
42	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
43	Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
44	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
45	Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
46	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
47	Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
48	Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
49	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
50	Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
51	Charge effects of ultrafine FET with nanodot type floating gate
52	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
53	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
54	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
55	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
56	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
57	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
58	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
59	Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
60	Damage evaluation in graphene underlying atomic layer deposition dielectrics
61	DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
62	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
63	Demonstration of flexible thin film transistors with GaN channels
64	Densification of Thin Aluminum Oxide Films by Thermal Treatments
65	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
66	Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
67	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
68	DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
69	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
70	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
71	Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
72	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
73	Dynamic tuning of plasmon resonance in the visible using graphene
74	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
75	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
76	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
77	Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
78	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
79	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
80	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
81	Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
82	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
83	Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
84	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
85	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
86	Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
87	Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
88	Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
89	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
90	Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
91	Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
92	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
93	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
94	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
95	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
96	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
97	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
98	Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
99	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
100	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
101	Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
102	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
103	Energy-enhanced atomic layer deposition for more process and precursor versatility
104	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
105	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
106	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
107	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
108	Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
109	Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
110	Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
111	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
112	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
113	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
114	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
115	Experimental verification of electro-refractive phase modulation in graphene
116	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
117	Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
118	Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
119	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
120	Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
121	Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
122	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
123	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
124	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
125	Flexible, light trapping substrates for organic photovoltaics
126	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
127	Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
128	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
129	Hafnia and alumina on sulphur passivated germanium
130	High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
131	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
132	High-efficiency embedded transmission grating
133	High-Reflective Coatings For Ground and Space Based Applications
134	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
135	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
136	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
137	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
138	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
139	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
140	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
141	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
142	Improved understanding of recombination at the Si/Al2O3 interface
143	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
144	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
145	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
146	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
147	Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
148	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
149	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
150	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
151	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
152	Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
153	Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
154	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
155	Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
156	Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
157	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
158	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
159	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
160	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
161	Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
162	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
163	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
164	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
165	Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
166	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
167	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
168	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
169	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
170	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
171	Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
172	Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
173	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
174	Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
175	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
176	Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
177	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
178	Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
179	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
180	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
181	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
182	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
183	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
184	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
185	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
186	Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
187	MANOS performance dependence on ALD Al2O3 oxidation source
188	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
189	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
190	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
191	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
192	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
193	Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
194	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
195	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
196	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
197	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
198	Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
199	N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
200	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
201	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
202	Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
203	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
204	Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
205	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
206	On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
207	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
208	On the equilibrium concentration of boron-oxygen defects in crystalline silicon
209	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
210	Optical display film as flexible and light trapping substrate for organic photovoltaics
211	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
212	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
213	Optimization of the Surface Structure on Black Silicon for Surface Passivation
214	Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
215	Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
216	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
217	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
218	Passivation effects of atomic-layer-deposited aluminum oxide
219	Patterned deposition by plasma enhanced spatial atomic layer deposition
220	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
221	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
222	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
223	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
224	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
225	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
226	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
227	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
228	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
229	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
230	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
231	Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
232	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
233	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
234	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
235	Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
236	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
237	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
238	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
239	Propagation Effects in Carbon Nanoelectronics
240	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
241	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
242	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
243	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
244	Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
245	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
246	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
247	Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
248	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
249	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
250	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
251	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
252	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
253	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
254	Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
255	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
256	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
257	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
258	Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
259	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
260	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
261	Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
262	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
263	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
264	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
265	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
266	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
267	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
268	Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
269	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
270	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
271	Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
272	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
273	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
274	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
275	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
276	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
277	Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
278	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
279	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
280	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
281	Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
282	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
283	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
284	Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
285	Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
286	Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
287	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
288	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
289	Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
290	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
291	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
292	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
293	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
294	Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
295	Very high frequency plasma reactant for atomic layer deposition
296	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
297	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
298	Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
299	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
300	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
301	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
302	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
303	Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
304	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
305	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
306	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
307	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
308	Composite materials and nanoporous thin layers made by atomic layer deposition
309	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
310	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
311	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
312	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
313	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
314	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
315	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
316	Optical and Electrical Properties of AlxTi1-xO Films
317	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
318	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
319	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
320	Atomic Layer Deposition of Gold Metal
321	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
322	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
323	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
324	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
325	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
326	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
327	Plasma-enhanced atomic layer deposition of BaTiO3
328	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
329	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
330	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
331	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
332	Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
333	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
334	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
335	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
336	Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
337	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
338	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
339	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
340	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
341	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
342	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
343	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
344	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
345	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
346	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
347	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
348	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
349	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
350	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
351	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
352	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
353	Plasma enhanced atomic layer deposition of Fe2O3 thin films
354	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
355	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
356	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
357	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
358	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
359	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
360	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
361	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
362	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
363	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
364	Plasma enhanced atomic layer deposition of Ga2O3 thin films
365	Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
366	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
367	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
368	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
369	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
370	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
371	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
372	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
373	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
374	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
375	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
376	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
377	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
378	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
379	A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
380	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
381	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
382	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
383	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
384	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
385	Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
386	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
387	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
388	Damage evaluation in graphene underlying atomic layer deposition dielectrics
389	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
390	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
391	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
392	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
393	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
394	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
395	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
396	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
397	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
398	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
399	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
400	Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
401	Hafnia and alumina on sulphur passivated germanium
402	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
403	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
404	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
405	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
406	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
407	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
408	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
409	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
410	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
411	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
412	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
413	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
414	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
415	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
416	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
417	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
418	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
419	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
420	Optical properties and bandgap evolution of ALD HfSiOx films
421	Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
422	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
423	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
424	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
425	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
426	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
427	Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
428	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
429	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
430	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
431	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
432	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
433	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
434	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
435	The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
436	Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
437	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
438	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
439	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
440	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
441	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
442	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
443	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
444	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
445	Annealing behavior of ferroelectric Si-doped HfO2 thin films
446	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
447	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
448	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
449	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
450	Optical properties and bandgap evolution of ALD HfSiOx films
451	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
452	The effects of layering in ferroelectric Si-doped HfO2 thin films
453	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
454	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
455	Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
456	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
457	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
458	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
459	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
460	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
461	High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
462	Systematic efficiency study of line-doubled zone plates
463	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
464	IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
465	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
466	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
467	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
468	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
469	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
470	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
471	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
472	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
473	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
474	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
475	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
476	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
477	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
478	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
479	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
480	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
481	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
482	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
483	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
484	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
485	The important role of water in growth of monolayer transition metal dichalcogenides
486	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
487	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
488	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
489	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
490	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
491	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
492	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
493	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
494	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
495	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
496	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
497	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
498	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
499	Encapsulation method for atom probe tomography analysis of nanoparticles
500	Growth of silica nanowires in vacuum
501	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
502	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
503	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
504	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
505	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
506	Remote Plasma ALD of Platinum and Platinum Oxide Films
507	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
508	Room-Temperature Atomic Layer Deposition of Platinum
509	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
510	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
511	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
512	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
513	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
514	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
515	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
516	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
517	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
518	Remote Plasma ALD of Platinum and Platinum Oxide Films
519	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
520	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
521	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
522	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
523	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
524	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
525	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
526	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
527	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
528	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
529	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
530	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
531	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
532	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
533	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
534	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
535	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
536	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
537	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
538	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
539	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
540	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
541	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
542	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
543	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
544	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
545	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
546	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
547	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
548	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
549	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
550	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
551	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
552	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
553	Breakdown and Protection of ALD Moisture Barrier Thin Films
554	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
555	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
556	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
557	Comparative study of ALD SiO2 thin films for optical applications
558	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
559	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
560	Designing high performance precursors for atomic layer deposition of silicon oxide
561	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
562	Energy-enhanced atomic layer deposition for more process and precursor versatility
563	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
564	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
565	Gate Insulator for High Mobility Oxide TFT
566	Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
567	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
568	High-Reflective Coatings For Ground and Space Based Applications
569	Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
570	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
571	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
572	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
573	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
574	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
575	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
576	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
577	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
578	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
579	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
580	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
581	Modal properties of a strip-loaded horizontal slot waveguide
582	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
583	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
584	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
585	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
586	Optical properties and bandgap evolution of ALD HfSiOx films
587	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
588	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
589	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
590	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
591	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
592	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
593	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
594	Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
595	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
596	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
597	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
598	Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
599	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
600	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
601	Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
602	Single-Cell Photonic Nanocavity Probes
603	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
604	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
605	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
606	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
607	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
608	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
609	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
610	Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
611	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
612	Trapped charge densities in Al2O3-based silicon surface passivation layers
613	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
614	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
615	A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
616	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
617	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
618	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
619	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
620	Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
621	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
622	Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
623	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
624	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
625	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
626	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
627	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
628	Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
629	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
630	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
631	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
632	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
633	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
634	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
635	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
636	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
637	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
638	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
639	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
640	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
641	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
642	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
643	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
644	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
645	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
646	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
647	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
648	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
649	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
650	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
651	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
652	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
653	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
654	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
655	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
656	Trilayer Tunnel Selectors for Memristor Memory Cells
657	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
658	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
659	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
660	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
661	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
662	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
663	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
664	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
665	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
666	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
667	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
668	Biofilm prevention on cochlear implants
669	Bipolar resistive switching in amorphous titanium oxide thin film
670	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
671	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
672	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
673	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
674	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
675	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
676	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
677	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
678	Energy-enhanced atomic layer deposition for more process and precursor versatility
679	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
680	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
681	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
682	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
683	Flexible Memristive Memory Array on Plastic Substrates
684	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
685	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
686	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
687	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
688	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
689	High-efficiency embedded transmission grating
690	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
691	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
692	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
693	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
694	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
695	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
696	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
697	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
698	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
699	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
700	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
701	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
702	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
703	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
704	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
705	Low temperature temporal and spatial atomic layer deposition of TiO2 films
706	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
707	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
708	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
709	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
710	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
711	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
712	Oxygen migration in TiO2-based higher-k gate stacks
713	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
714	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
715	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
716	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
717	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
718	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
719	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
720	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
721	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
722	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
723	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
724	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
725	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
726	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
727	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
728	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
729	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
730	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
731	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
732	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
733	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
734	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
735	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
736	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
737	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
738	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
739	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
740	Transient characterization of the electroforming process in TiO2 based resistive switching devices
741	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
742	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
743	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
744	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
745	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
746	Optical and Electrical Properties of TixSi1-xOy Films
747	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
748	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
749	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
750	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
751	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
752	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
753	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
754	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
755	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
756	The important role of water in growth of monolayer transition metal dichalcogenides
757	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
758	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
759	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
760	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
761	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
762	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
763	Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
764	Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
765	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
766	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
767	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
768	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
769	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
770	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
771	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
772	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
773	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
774	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
775	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
776	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
777	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
778	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
779	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
780	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
781	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
782	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
783	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
784	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
785	Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
786	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
787	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
788	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
789	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
790	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
791	Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
792	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
793	Spectroscopy and control of near-surface defects in conductive thin film ZnO
794	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
795	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
796	The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
797	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
798	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
799	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
800	Top-down fabricated ZnO nanowire transistors for application in biosensors
801	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
802	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
803	Plasma-enhanced atomic layer deposition of zinc phosphate
804	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
805	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
806	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
807	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
808	Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
809	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
810	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
811	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
812	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
813	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
814	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
815	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
816	Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
817	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
818	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
819	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
820	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
821	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
822	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
823	PEALD ZrO2 Films Deposition on TiN and Si Substrates
824	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
825	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
826	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
827	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
828	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
829	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
830	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
831	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
832	Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
833	ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
834	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
835	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
836	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
837	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

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