O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1279 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
2Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
3High-Reflective Coatings For Ground and Space Based Applications
4Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
5ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
6Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
7Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
8Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
9Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
10Radical Enhanced Atomic Layer Deposition of Metals and Oxides
11Oxygen migration in TiO2-based higher-k gate stacks
12Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
13Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
14Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
15Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
16Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
17Experimental verification of electro-refractive phase modulation in graphene
18Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
19Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
20Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
21Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
22Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
23Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
24Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
25Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
26Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
27Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
28Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
29Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
303D structure evolution using metastable atomic layer deposition based on planar silver templates
31Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
32Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
33The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
34Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
35Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
36Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
37Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
38Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
39The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
40In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
41Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
42Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
43AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
44On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
45Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
46Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
47Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
48Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
49Lithium-Iron (III) Fluoride Battery with Double Surface Protection
50Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
51Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
52Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
53Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
54Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
55Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
56Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
57Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
58Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
59Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
60Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
61N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
62Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
63Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
64Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
65Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
66Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
67Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
68Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
69Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
70Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
71A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
72Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
73Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
74Improved understanding of recombination at the Si/Al2O3 interface
75Atomic Layer Deposition of the Conductive Delafossite PtCoO2
76A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
77Residual stress study of thin films deposited by atomic layer deposition
78Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
79Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
80Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
81Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
82Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
83Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
84Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
85Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
86Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
87Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
88Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
89The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
90The important role of water in growth of monolayer transition metal dichalcogenides
91Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
92Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
93Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
94Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
95Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
96Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
97Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
98Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
99Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
100Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
101Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
102Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
103Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
104Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
105Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
106Very high frequency plasma reactant for atomic layer deposition
107Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
108High-efficiency embedded transmission grating
109Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
110Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
111Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
112The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
113Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
114Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
115Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
116Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
117Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
118The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
119Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
120Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
121Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
122Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
123Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
124The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
125Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
126Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
127Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
128Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
129Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
130Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
131Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
132Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
133Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
134High-efficiency embedded transmission grating
135Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
136High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
137Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
138Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
139Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
140Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
141Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
142Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
143Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
144Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
145Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
146Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
147Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
148Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
149Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
150Flexible Memristive Memory Array on Plastic Substrates
151Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
152Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
153High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
154Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
155Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
156Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
157Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
158Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
159Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
160In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
161Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
162Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
163Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
164MANOS performance dependence on ALD Al2O3 oxidation source
165Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
166Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
167Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
168'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
169Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
170Passivation effects of atomic-layer-deposited aluminum oxide
171The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
172Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
173Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
174Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
175Remote Plasma ALD of Platinum and Platinum Oxide Films
176Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
177Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
178Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
179A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
180The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
181PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
182α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
183Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
184Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
185Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
186Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
187Anti-stiction coating for mechanically tunable photonic crystal devices
188Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
189Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
190Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
191Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
192Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
193Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
194Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
195Atomic layer deposition of YMnO3 thin films
196Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
197Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
198Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
199Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
200Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
201The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
202Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
203Trilayer Tunnel Selectors for Memristor Memory Cells
204Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
205Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
206Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
207Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
208Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
209Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
210Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
211Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
212Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
213Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
214Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
215Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
216Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
217ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
218On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
219Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
220Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
221On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
222Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
223Plasma-enhanced atomic layer deposition of BaTiO3
224Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
225Topographically selective deposition
22646-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
227Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
228Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
229Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
230Atomic layer deposition of metal-oxide thin films on cellulose fibers
231Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
232High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
233Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
234Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
235Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
236Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
237Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
238Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
239Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
240Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
241Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
242Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
243On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
244PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
245A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
246Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
247Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
248Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
249Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
250Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
251Study on the resistive switching time of TiO2 thin films
252Plasma-enhanced atomic layer deposition of BaTiO3
253Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
254Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
255A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
256Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
257RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
258Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
259Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
260Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
261Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
262Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
263Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
264Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
265Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
266Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
267Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
268Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
269Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
270Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
271Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
272Breakdown and Protection of ALD Moisture Barrier Thin Films
273Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
274Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
275Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
276Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
277Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
278Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
279Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
280TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
281Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
282Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
283Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
284Radical Enhanced Atomic Layer Deposition of Metals and Oxides
285Low temperature temporal and spatial atomic layer deposition of TiO2 films
286Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
287Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
288On the equilibrium concentration of boron-oxygen defects in crystalline silicon
289Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
290Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
291Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
292Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
293Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
294SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
295Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
296Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
297Epitaxial 1D electron transport layers for high-performance perovskite solar cells
298Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
299PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
300Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
301Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
302Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
303Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
304Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
305Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
306Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
307The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
308Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
309Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
310Optimization of the Surface Structure on Black Silicon for Surface Passivation
311A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
312Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
313Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
314Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
315Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
316Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
317Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
318Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
319Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
320The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
321Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
322Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
323Fiber-matrix interface reinforcement using Atomic Layer Deposition
324Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
325Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
326Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
327Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
328The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
329Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
330Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
331Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
332Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
333Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
334An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
335Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
336Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
337Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
338Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
339Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
340Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
341Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
342Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
343Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
344Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
345Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
346Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
347Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
348Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
349Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
350Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
351Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
352AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
353Modal properties of a strip-loaded horizontal slot waveguide
354Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
355Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
356Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
357A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
358Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
359Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
360Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
361Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
362Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
363Radical Enhanced Atomic Layer Deposition of Metals and Oxides
364Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
365Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
366Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
367Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
368Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
369Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
370Bipolar resistive switching in amorphous titanium oxide thin film
371Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
372Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
373Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
374Hafnia and alumina on sulphur passivated germanium
375Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
376Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
377Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
378Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
379Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
380Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
381On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
382Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
383Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
384Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
385Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
386Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
387Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
388New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
389AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
390Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
391Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
392Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
393The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
394High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
395Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
396Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
397Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
398Plasma enhanced atomic layer deposition of Ga2O3 thin films
399Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
400Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
401Tuning size and coverage of Pd nanoparticles using atomic layer deposition
402Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
403Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
404Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
405Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
406Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
407Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
408Residual stress study of thin films deposited by atomic layer deposition
409Innovative remote plasma source for atomic layer deposition for GaN devices
410Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
411In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
412A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
413Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
414Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
415Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
416Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
417Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
418In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
419Encapsulation method for atom probe tomography analysis of nanoparticles
420Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
421Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
422Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
423Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
424Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
425Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
426Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
427Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
428Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
429Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
430Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
431Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
432Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
433Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
434Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
435Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
436Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
437Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
438Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
439Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
440Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
441Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
442A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
443Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
444Surface and sensing properties of PE-ALD SnO2 thin film
445Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
446Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
447Systematic efficiency study of line-doubled zone plates
448Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
449Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
450Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
451Plasma-enhanced atomic layer deposition of zinc phosphate
452Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
453First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
454Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
455Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
456Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
457Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
458Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
459Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
460Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
461Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
462Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
463Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
464Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
465Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
466Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
467Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
468Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
469Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
470A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
471Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
472Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
473Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
474Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
475High-Reflective Coatings For Ground and Space Based Applications
476Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
477Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
478Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
479Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
480Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
481Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
482Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
483Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
484Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
485Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
486Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
487Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
488TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
489Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
490Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
491Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
492Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
493Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
494Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
495Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
496Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
497Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
498Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
499On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
500Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
501Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
502Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
503Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
504Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
505Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
506Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
507HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
508Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
509The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
510Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
511Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
512High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
513Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
514Optical and Electrical Properties of AlxTi1-xO Films
515Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
516Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
517Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
518Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
519Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
520Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
521Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
522Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
523Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
524Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
525Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
526Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
527Optical and Electrical Properties of TixSi1-xOy Films
528XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
529Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
530Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
531ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
532Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
533Optical properties and bandgap evolution of ALD HfSiOx films
534Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
535Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
536Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
537Lithium-Iron (III) Fluoride Battery with Double Surface Protection
538Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
539Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
540On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
541Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
542Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
543Plasma-enhanced atomic layer deposition of BaTiO3
544MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
545Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
546Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
547Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
548On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
549Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
550Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
551Sub-10-nm ferroelectric Gd-doped HfO2 layers
552Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
553The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
554Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
555Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
556Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
557Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
558PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
559Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
560Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
561Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
562Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
563Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
564Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
565Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
566High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
567Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
568Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
569Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
570Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
571Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
572Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
573Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
574Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
575Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
576Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
577Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
578Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
579Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
580A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
581Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
582Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
583Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
584Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
585In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
586Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
587Propagation Effects in Carbon Nanoelectronics
588Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
589Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
590Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
591Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
592Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
593Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
594Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
595Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
596Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
597Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
598Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
599Symmetrical Al2O3-based passivation layers for p- and n-type silicon
600Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
601Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
602Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
603Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
604Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
605Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
606The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
607Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
608Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
609Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
610Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
611Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
612Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
613Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
614Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
615Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
616Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
617Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
618Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
619Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
620High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
621Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
622Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
623Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
624Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
625Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
626On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
627Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
628Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
629High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
630Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
631ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
632Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
633Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
634Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
635Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
636Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
637Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
638Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
639Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
640MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
641Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
642Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
643Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
644Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
645Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
646Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
647Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
648Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
649Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
650Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
651A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
652Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
653PEALD ZrO2 Films Deposition on TiN and Si Substrates
654DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
655Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
656Characteristics of HfO2 thin films grown by plasma atomic layer deposition
657Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
658Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
659Room-Temperature Atomic Layer Deposition of Platinum
660Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
661Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
662Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
663Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
664Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
665Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
666The effects of layering in ferroelectric Si-doped HfO2 thin films
667Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
668'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
669Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
670Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
671Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
672Flexible, light trapping substrates for organic photovoltaics
673Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
674ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
675The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
676Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
677Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
678Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
679Patterned deposition by plasma enhanced spatial atomic layer deposition
680Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
681Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
682Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
683Spectroscopy and control of near-surface defects in conductive thin film ZnO
684Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
685Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
686Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
687Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
688Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
689Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
690Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
691Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
692Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
693Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
694Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
695Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
696Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
697Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
698Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
699Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
700Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
701Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
702Energy-enhanced atomic layer deposition for more process and precursor versatility
703Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
704Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
705Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
706Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
707Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
708Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
709Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
710Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
711All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
712Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
713Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
714Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
715Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
716Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
717Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
718Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
719Damage evaluation in graphene underlying atomic layer deposition dielectrics
720Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
721Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
722Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
723In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
724Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
725Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
726Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
727Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
728Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
729Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
730Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
731Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
732Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
733Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
734Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
735Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
736Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
737Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
738Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
739Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
740Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
741Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
742Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
743Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
744In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
745Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
746Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
747Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
748Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
749Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
750Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
751Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
752Damage evaluation in graphene underlying atomic layer deposition dielectrics
753Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
754Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
755Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
756Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
757Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
758Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
759Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
760Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
761Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
762High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
763Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
764Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
765Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
766Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
767Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
768Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
769Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
770Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
771Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
772Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
773Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
774Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
775Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
776Transient characterization of the electroforming process in TiO2 based resistive switching devices
777The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
778Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
779Nonvolatile Capacitive Crossbar Array for In-Memory Computing
780Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
781Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
782A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
783Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
784Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
785Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
786Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
787Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
788All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
789Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
790Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
791Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
792Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
793Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
794Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
795Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
796Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
797Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
798Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
799Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
8001D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
801In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
802Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
803Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
804In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
805Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
806Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
807Capacitance spectroscopy of gate-defined electronic lattices
808The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
809Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
810Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
811Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
812Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
813Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
814Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
815Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
816Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
817Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
818Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
819Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
820Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
821Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
822Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
823Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
824Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
825The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
826Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
827Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
828Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
829Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
830Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
831Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
832Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
833Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
834Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
835Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
836Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
837Designing high performance precursors for atomic layer deposition of silicon oxide
838Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
839Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
840Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
841Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
842Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
843Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
844Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
845Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
846Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
847Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
848Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
849Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
850Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
851HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
852Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
853Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
854Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
855Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
856Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
857Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
858Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
859Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
860Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
861Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
862Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
863Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
864Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
865Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
866Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
867Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
868Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
869Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
870Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
871Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
872Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
873Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
874Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
875Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
876Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
877Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
878Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
879Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
880Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
881Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
882Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
883Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
884Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
885Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
886Growth of silica nanowires in vacuum
887Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
888TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
889Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
890Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
891Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
892Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
893Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
894Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
895Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
896Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
897Sub-7-nm textured ZrO2 with giant ferroelectricity
898Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
899Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
900Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
901Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
902Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
903Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
904Radical Enhanced Atomic Layer Deposition of Metals and Oxides
905Trapped charge densities in Al2O3-based silicon surface passivation layers
906Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
907Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
908Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
909Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
910Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
911Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
912Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
913ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
914Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
915Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
916Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
917Radical Enhanced Atomic Layer Deposition of Metals and Oxides
918Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
919Radical Enhanced Atomic Layer Deposition of Metals and Oxides
920Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
921HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
922Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
923Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
924ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
925Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
926Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
927Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
928Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
929Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
930In-gap states in titanium dioxide and oxynitride atomic layer deposited films
931Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
932Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
933Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
934Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
935Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
936Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
937Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
938Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
939Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
940Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
941In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
942Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
943Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
944Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
945Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
946Optical properties and bandgap evolution of ALD HfSiOx films
947Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
948Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
949Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
950Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
951Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
952Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
953Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
954AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
955Comparative study of ALD SiO2 thin films for optical applications
956Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
957Advances in the fabrication of graphene transistors on flexible substrates
958Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
959Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
960Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
961A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
962In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
963Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
964Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
965Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
966Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
967Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
968Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
969Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
970Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
971Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
972Annealing behavior of ferroelectric Si-doped HfO2 thin films
973Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
974Optical properties and bandgap evolution of ALD HfSiOx films
975Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
976Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
977Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
978Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
979Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
980Radical Enhanced Atomic Layer Deposition of Metals and Oxides
981Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
982Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
983Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
984Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
985Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
986Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
987Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
988Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
989Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
990Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
991Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
992Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
993Charge effects of ultrafine FET with nanodot type floating gate
994Energy-enhanced atomic layer deposition for more process and precursor versatility
995Breakdown and Protection of ALD Moisture Barrier Thin Films
996Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
997In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
998Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
999High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1000Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1001Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
1002Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
1003Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
1004Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
1005Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
1006Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1007Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
1008Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1009Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
1010Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
1011Single-Cell Photonic Nanocavity Probes
1012Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
1013The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1014Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
1015Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1016Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
1017Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1018Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1019Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
1020Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1021Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
1022ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1023Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
1024Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
1025Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
1026Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1027Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
1028Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
1029Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
1030Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
1031Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
1032Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1033Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1034Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
1035PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1036The important role of water in growth of monolayer transition metal dichalcogenides
1037A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
1038Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1039Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
1040Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
1041Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
1042Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1043Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
1044Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1045Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
1046Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
1047Optical in situ monitoring of plasma-enhanced atomic layer deposition process
1048Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1049Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
1050Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
1051Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1052Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1053Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1054Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1055Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1056Atomic Layer Deposition of Gold Metal
1057Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1058Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
1059Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
1060Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
1061Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
1062Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
1063Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
1064Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1065Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
1066Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
1067Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
1068Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1069Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1070Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1071Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
1072Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
1073Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
1074Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
1075Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
1076Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1077Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1078Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1079The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1080Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1081Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
1082Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
1083Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1084Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
1085Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1086Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
1087Densification of Thin Aluminum Oxide Films by Thermal Treatments
1088Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1089An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
1090Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
1091Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1092Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
1093Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1094The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
1095Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1096Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1097Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
1098Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1099Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
1100Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1101Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
1102Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
1103Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1104Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1105TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1106IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
1107HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
1108Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1109Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
1110Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
1111Hafnia and alumina on sulphur passivated germanium
1112Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
1113Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
1114Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1115Mechanical properties of thin-film Parylene-metal-Parylene devices
1116Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1117Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
1118(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
1119Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
1120Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1121Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
1122Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1123Composite materials and nanoporous thin layers made by atomic layer deposition
1124Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
1125Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1126Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
1127Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
1128Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
1129Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
1130Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1131Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
1132Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1133Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1134Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
1135XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1136Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1137High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
1138Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
1139Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1140Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
1141Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
1142Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1143Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
1144Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1145Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1146Ferroelectricity in hafnia controlled via surface electrochemical state
1147Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1148Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
1149Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1150Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
1151Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1152Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1153Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
1154Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1155Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
1156Band alignment of Al2O3 with (-201) β-Ga2O3
1157Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
1158Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
1159Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
1160Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
1161Highly efficient and bending durable perovskite solar cells: toward a wearable power source
1162Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1163Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
1164Gate Insulator for High Mobility Oxide TFT
1165Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
1166Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
1167Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
1168Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
1169Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
1170In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
1171Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
1172Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1173Remote Plasma ALD of Platinum and Platinum Oxide Films
1174Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
1175Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
1176Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
1177Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1178Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1179Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
1180Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
1181Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1182Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1183Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
1184Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1185X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1186Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
1187Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
1188Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1189Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1190Top-down fabricated ZnO nanowire transistors for application in biosensors
1191Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1192Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
1193Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
1194Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1195In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
1196Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
1197Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
1198Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
1199Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1200The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
1201Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
1202Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1203Optical display film as flexible and light trapping substrate for organic photovoltaics
1204Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1205A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
1206Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1207Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1208Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1209Biofilm prevention on cochlear implants
1210Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1211DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
1212Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
1213Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
1214Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
1215Plasma enhanced atomic layer deposition of Fe2O3 thin films
1216From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1217Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
1218Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
1219Dynamic tuning of plasmon resonance in the visible using graphene
1220Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1221Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
1222Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
1223Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1224Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1225Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1226Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1227Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
1228Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
1229Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1230Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
1231An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
1232Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
1233Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1234Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
1235Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
1236Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1237Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
1238An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
1239Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
1240Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
1241Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1242Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
1243Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
1244Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1245Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1246Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1247Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
1248Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1249Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
1250Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1251Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
1252Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
1253Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
1254Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1255Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
1256Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
1257Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
1258Nonvolatile Capacitive Crossbar Array for In-Memory Computing
1259Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1260Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
1261Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
1262Energy-enhanced atomic layer deposition for more process and precursor versatility
1263Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1264Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1265Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
1266Method of Fabrication for Encapsulated Polarizing Resonant Gratings
1267Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
1268Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1269Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1270Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
1271Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1272High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
1273Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1274Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1275Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1276Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
1277Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene