O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
11A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
12Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
13Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
14Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
15Advances in the fabrication of graphene transistors on flexible substrates
16Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
17Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
18Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
19Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
20Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
21Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
22Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
23ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
24AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
25AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
26AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
27Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
28Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
29Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
30Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
31An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
32Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
33Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
34Anti-stiction coating for mechanically tunable photonic crystal devices
35Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
36Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
37Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
38Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
39Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
40Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
41Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
42Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
43Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
44Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
45Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
46Band alignment of Al2O3 with (-201) β-Ga2O3
47Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
48Breakdown and Protection of ALD Moisture Barrier Thin Films
49Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
50Capacitance spectroscopy of gate-defined electronic lattices
51Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
52Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
53Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
54Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
55Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
56Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
57Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
58Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
59Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
60Charge effects of ultrafine FET with nanodot type floating gate
61Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
62Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
63Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
64Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
65Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
66Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
67Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
68Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
69Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
70Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
71Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
72Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
73Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
74Damage evaluation in graphene underlying atomic layer deposition dielectrics
75DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
76Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
77Densification of Thin Aluminum Oxide Films by Thermal Treatments
78Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
79Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
80Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
81DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
82Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
83Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
84Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
85Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
86Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
87Dynamic tuning of plasmon resonance in the visible using graphene
88Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
89Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
90Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
91Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
92Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
93Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
94Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
95Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
96Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
97Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
98Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
99Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
100Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
101Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
102Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
103Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
104Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
105Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
106Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
107Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
108Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
109Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
110Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
111Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
112Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
113Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
114Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
115Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
116Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
117Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
118Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
119Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
120Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
121Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
122Energy-enhanced atomic layer deposition for more process and precursor versatility
123Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
124Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
125Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
126Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
127Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
128Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
129Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
130Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
131Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
132Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
133Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
134Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
135Experimental verification of electro-refractive phase modulation in graphene
136Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
137Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
138Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
139Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
140Fiber-matrix interface reinforcement using Atomic Layer Deposition
141Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
142Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
143Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
144Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
145Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
146First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
147Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
148Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
149Flexible, light trapping substrates for organic photovoltaics
150Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
151Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
152Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
153Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
154Hafnia and alumina on sulphur passivated germanium
155High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
156High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
157High-efficiency embedded transmission grating
158High-Reflective Coatings For Ground and Space Based Applications
159High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
160Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
161Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
162Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
163Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
164Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
165Impact of interface materials on side permeation in indirect encapsulation of organic electronics
166Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
167Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
168Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
169Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
170Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
171Improved understanding of recombination at the Si/Al2O3 interface
172Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
173Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
174Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
175Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
176Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
177In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
178In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
179In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
180In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
181Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
182Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
183Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
184Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
185Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
186Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
187Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
188Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
189Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
190Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
191Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
192Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
193Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
194Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
195Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
196Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
197Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
198Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
199Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
200Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
201Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
202Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
203Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
204Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
205Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
206Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
207Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
208Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
209Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
210Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
211Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
212Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
213Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
214Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
215Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
216Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
217Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
218Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
219Lithium-Iron (III) Fluoride Battery with Double Surface Protection
220Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
221Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
222Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
223Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
224Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
225Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
226Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
227Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
228MANOS performance dependence on ALD Al2O3 oxidation source
229Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
230Mechanical properties of thin-film Parylene-metal-Parylene devices
231Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
232Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
233Method of Fabrication for Encapsulated Polarizing Resonant Gratings
234Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
235Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
236Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
237Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
238Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
239Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
240Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
241MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
242Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
243N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
244Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
245Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
246Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
247Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
248Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
249Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
250Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
251Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
252On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
253On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
254On the equilibrium concentration of boron-oxygen defects in crystalline silicon
255On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
256On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
257Optical display film as flexible and light trapping substrate for organic photovoltaics
258Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
259Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
260Optimization of the Surface Structure on Black Silicon for Surface Passivation
261Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
262Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
263Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
264Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
265Passivation effects of atomic-layer-deposited aluminum oxide
266Patterned deposition by plasma enhanced spatial atomic layer deposition
267PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
268Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
269Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
270Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
271Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
272Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
273Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
274Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
275Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
276Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
277Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
278Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
279Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
280Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
281Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
282Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
283Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
284Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
285Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
286Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
287Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
288Propagation Effects in Carbon Nanoelectronics
289Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
290Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
291Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
292Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
293Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
294Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
295Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
296Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
297Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
298Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
299Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
300Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
301Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
302Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
303Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
304Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
305Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
306Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
307Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
308Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
309Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
310Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
311Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
312Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
313Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
314Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
315Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
316Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
317Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
318Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
319Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
320Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
321Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
322Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
323Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
324Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
325Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
326Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
327Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
328The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
329The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
330The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
331Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
332Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
333Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
334Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
335Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
336TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
337Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
338Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
339Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
340Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
341Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
342Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
343Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
344Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
345Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
346Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
347Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
348Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
349Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
350Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
351Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
352Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
353Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
354Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
355Very high frequency plasma reactant for atomic layer deposition
356Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
357Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
358Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
359Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
360Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
361Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
362Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
363Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
364Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
365Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
366Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
367Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
368Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
369Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
370Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
371Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
372Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
373Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
374Composite materials and nanoporous thin layers made by atomic layer deposition
375Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
376Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
377Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
378Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
379Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
380Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
381Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
382Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
383Optical and Electrical Properties of AlxTi1-xO Films
384Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
385Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
386Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
387Atomic Layer Deposition of Gold Metal
388Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
389Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
390Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
391Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
392Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
393Plasma-enhanced atomic layer deposition of BaTiO3
394High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
395Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
396Plasma-enhanced atomic layer deposition of BaTiO3
397Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
398Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
399Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
400Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
401Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
402Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
403Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
404Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
405Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
406Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
407Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
408A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
409Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
410Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
411Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
412Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
413Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
414Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
415Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
416Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
417Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
418Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
419Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
420Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
421Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
422Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
423Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
424Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
425Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
426Radical Enhanced Atomic Layer Deposition of Metals and Oxides
427Radical Enhanced Atomic Layer Deposition of Metals and Oxides
428Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
429Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
430Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
431Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
432Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
433Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
434Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
435Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
436Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
437Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
438Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
439Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
440Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
441Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
442Plasma enhanced atomic layer deposition of Fe2O3 thin films
443Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
444Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
445Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
446Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
447The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
448Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
449Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
450Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
451Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
452Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
453Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
454Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
455Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
456Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
457Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
458Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
459Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
460Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
461Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
462Plasma enhanced atomic layer deposition of Ga2O3 thin films
463Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
464Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
465Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
466Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
467RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
468Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
469Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
470α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
471Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
472Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
473Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
474Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
475Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
476Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
477Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
478Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
479Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
480Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
481Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
482A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
483An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
484Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
485Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
486Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
487Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
488Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
489AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
490Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
491Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
492Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
493Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
494Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
495Characteristics of HfO2 thin films grown by plasma atomic layer deposition
496Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
497Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
498Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
499Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
500Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
501Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
502Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
503Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
504Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
505Damage evaluation in graphene underlying atomic layer deposition dielectrics
506Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
507Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
508Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
509Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
510Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
511Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
512Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
513Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
514Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
515Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
516Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
517Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
518Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
519Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
520Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
521Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
522Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
523Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
524Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
525Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
526Hafnia and alumina on sulphur passivated germanium
527HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
528HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
529Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
530Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
531Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
532Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
533In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
534Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
535Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
536Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
537Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
538Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
539Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
540Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
541Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
542Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
543Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
544Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
545Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
546Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
547Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
548Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
549Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
550Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
551Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
552Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
553Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
554Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
555Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
556On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
557Optical properties and bandgap evolution of ALD HfSiOx films
558Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
559PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
560Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
561Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
562Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
563Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
564Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
565Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
566Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
567Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
568Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
569Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
570Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
571Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
572Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
573Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
574Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
575The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
576The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
577The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
578The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
579The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
580Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
581Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
582Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
583Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
584Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
585Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
586Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
587Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
588Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
589Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
590Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
591Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
592Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
593HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
594Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
595The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
596Annealing behavior of ferroelectric Si-doped HfO2 thin films
597Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
598Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
599Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
600Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
601Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
602Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
603Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
604Optical properties and bandgap evolution of ALD HfSiOx films
605Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
606TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
607The effects of layering in ferroelectric Si-doped HfO2 thin films
608Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
609Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
610Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
611Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
612Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
613Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
614New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
615Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
616Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
617All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
618Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
619Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
620Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
621Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
622High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
623High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
624Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
625Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
626On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
627Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
628Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
629Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
630High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
631Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
632Systematic efficiency study of line-doubled zone plates
633TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
634IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
635Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
636Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
637Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
638Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
639Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
640Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
641Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
642The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
643XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
644Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
645Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
646Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
647Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
648Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
649Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
650Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
651Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
652Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
653Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
654Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
655Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
656In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
657Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
658Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
659Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
660Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
661Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
662Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
663Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
664Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
665Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
666Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
667Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
668Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
669The important role of water in growth of monolayer transition metal dichalcogenides
670Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
671Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
672Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
673Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
674Radical Enhanced Atomic Layer Deposition of Metals and Oxides
675Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
676Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
677Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
678Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
679Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
680Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
681Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
682Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
683Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
684Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
685Radical Enhanced Atomic Layer Deposition of Metals and Oxides
686Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
687Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
688Tuning size and coverage of Pd nanoparticles using atomic layer deposition
689Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
690Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
691Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
692Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
693Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
694Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
695Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
696Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
697Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
698Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
699Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
700Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
701Encapsulation method for atom probe tomography analysis of nanoparticles
702Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
703Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
704Growth of silica nanowires in vacuum
705In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
706Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
707Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
708Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
709Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
710Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
711Remote Plasma ALD of Platinum and Platinum Oxide Films
712Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
713Room-Temperature Atomic Layer Deposition of Platinum
714Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
715Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
716Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
717Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
718Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
719Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
720Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
721Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
722The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
723Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
724Remote Plasma ALD of Platinum and Platinum Oxide Films
725Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
726Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
727Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
728Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
729Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
730Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
731High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
732Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
733In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
734Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
735Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
736Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
737Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
738Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
739Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
740(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
741ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
742Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
743Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
744Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
745Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
746Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
747Radical Enhanced Atomic Layer Deposition of Metals and Oxides
748Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
749Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
750Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
751Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
752Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
753Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
754'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7553D structure evolution using metastable atomic layer deposition based on planar silver templates
756A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
757A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
758Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
759Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
760Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
761An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
762Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
763Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
764Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
765Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
766Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
767Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
768Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
769Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
770Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
771Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
772Atomic layer deposition of metal-oxide thin films on cellulose fibers
773Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
774Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
775Breakdown and Protection of ALD Moisture Barrier Thin Films
776Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
777Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
778Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
779Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
780Comparative study of ALD SiO2 thin films for optical applications
781Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
782Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
783Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
784Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
785Designing high performance precursors for atomic layer deposition of silicon oxide
786Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
787Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
788Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
789Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
790Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
791Energy-enhanced atomic layer deposition for more process and precursor versatility
792Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
793Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
794Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
795Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
796Gate Insulator for High Mobility Oxide TFT
797Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
798HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
799High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
800High-Reflective Coatings For Ground and Space Based Applications
801Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
802Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
803Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
804Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
805Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
806Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
807Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
808Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
809Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
810Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
811Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
812Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
813Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
814Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
815Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
816Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
817Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
818Modal properties of a strip-loaded horizontal slot waveguide
819Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
820Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
821Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
822Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
823Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
824On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
825On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
826Optical properties and bandgap evolution of ALD HfSiOx films
827PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
828Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
829Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
830Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
831Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
832Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
833Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
834Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
835Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
836Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
837Radical Enhanced Atomic Layer Deposition of Metals and Oxides
838Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
839Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
840Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
841Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
842Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
843Single-Cell Photonic Nanocavity Probes
844Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
845Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
846Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
847Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
848Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
849Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
850Symmetrical Al2O3-based passivation layers for p- and n-type silicon
851Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
852Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
853Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
854Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
855Trapped charge densities in Al2O3-based silicon surface passivation layers
856Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
857Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
858Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
859A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
860Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
861Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
862Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
863Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
864Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
865Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
866Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
867Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
868Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
869Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
870Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
871Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
872In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
873Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
874Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
875Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
876Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
877Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
878SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
879Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
880Surface and sensing properties of PE-ALD SnO2 thin film
881Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
882Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
883Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
884Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
885Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
886Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
887Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
888Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
889Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
890Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
891Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
892Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
893Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
894Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
895Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
896Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
897Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
898Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
899Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
900Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
901Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
902Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
903Radical Enhanced Atomic Layer Deposition of Metals and Oxides
904Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
905Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
906Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
907Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
908Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
909Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
910Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
911Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
912Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
913Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
914Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
915Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
916Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
917Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
918Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
919Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
920Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
921Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
922Topographically selective deposition
923Trilayer Tunnel Selectors for Memristor Memory Cells
924Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
925Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
926A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
927Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
928An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
929Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
930Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
931Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
932Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
933Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
934Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
935Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
936Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
937Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
938Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
939Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
940Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
941Biofilm prevention on cochlear implants
942Bipolar resistive switching in amorphous titanium oxide thin film
943Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
944Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
945Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
946Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
947Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
948Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
949Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
950Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
951Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
952Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
953Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
954Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
955Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
956Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
957Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
958Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
959Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
960Energy-enhanced atomic layer deposition for more process and precursor versatility
961Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
962Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
963Epitaxial 1D electron transport layers for high-performance perovskite solar cells
964Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
965Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
966Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
967Flexible Memristive Memory Array on Plastic Substrates
968Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
969Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
970Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
971Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
972Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
973Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
974Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
975Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
976High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
977High-efficiency embedded transmission grating
978Highly efficient and bending durable perovskite solar cells: toward a wearable power source
979Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
980Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
981Impact of interface materials on side permeation in indirect encapsulation of organic electronics
982Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
983Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
984Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
985In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
986In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
987In-gap states in titanium dioxide and oxynitride atomic layer deposited films
988Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
989Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
990Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
991Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
992Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
993Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
994Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
995Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
996Lithium-Iron (III) Fluoride Battery with Double Surface Protection
997Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
998Low temperature temporal and spatial atomic layer deposition of TiO2 films
999Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1000Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1001Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
1002MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
1003Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1004On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1005Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
1006Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
1007Oxygen migration in TiO2-based higher-k gate stacks
1008Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
1009Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
1010Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
1011Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1012Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
1013Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1014Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
1015Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
1016Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1017Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1018Plasma-enhanced atomic layer deposition of BaTiO3
1019Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1020Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1021Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1022Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1023Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
1024Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
1025Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1026Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1027Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1028Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1029Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1030Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1031Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
1032Study on the resistive switching time of TiO2 thin films
1033Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
1034Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1035Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
1036Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1037The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1038The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
1039The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1040The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1041The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1042Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1043Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
1044Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1045Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1046TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1047Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1048Transient characterization of the electroforming process in TiO2 based resistive switching devices
1049Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1050Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
1051X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1052Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
1053Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1054Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1055Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
1056Optical and Electrical Properties of TixSi1-xOy Films
1057Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
1058Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
1059Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1060Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
1061Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1062Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
1063Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1064Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1065Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
1066Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
1067Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1068In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
1069Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1070Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1071Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1072The important role of water in growth of monolayer transition metal dichalcogenides
1073Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
1074Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
1075Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1076Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
1077Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1078Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1079Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1080Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1081Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1082Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1083Atomic layer deposition of YMnO3 thin films
1084Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1085Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1086Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1087Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1088Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1089A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1090Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1091All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1092Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1093Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1094Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
1095Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1096Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1097Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1098Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1099Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1100Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1101Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1102Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1103Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1104Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1105From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1106Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1107Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1108Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1109Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1110Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1111Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1112Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1113Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1114Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1115Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1116Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1117Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1118Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1119Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1120Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1121Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1122Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1123Spectroscopy and control of near-surface defects in conductive thin film ZnO
1124Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1125Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1126The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1127The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1128The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1129The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1130The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1131Top-down fabricated ZnO nanowire transistors for application in biosensors
1132Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1133Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1134Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1135ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1136ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1137Plasma-enhanced atomic layer deposition of zinc phosphate
1138Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1139Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1140Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1141Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1142Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1143Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1144Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1145Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1146Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1147Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1148Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
1149Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1150Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1151Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1152Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1153High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1154Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1155Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1156Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1157Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1158In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1159Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1160Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1161Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1162Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1163Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1164Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1165PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1166PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1167PEALD ZrO2 Films Deposition on TiN and Si Substrates
1168Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1169Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1170Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1171Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1172Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1173Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1174Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1175Sub-7-nm textured ZrO2 with giant ferroelectricity
1176Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1177Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1178Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1179The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1180The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1181Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1182Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1183XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1184ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1185ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1186ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1187Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1188Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1189Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1190Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1191In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics