O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
11A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
12Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
13Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
14Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
15Advances in the fabrication of graphene transistors on flexible substrates
16Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
17Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
18Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
19Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
20Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
21Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
22Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
23ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
24AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
25AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
26AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
27Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
28Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
29Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
30Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
31An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
32Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
33Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
34Anti-stiction coating for mechanically tunable photonic crystal devices
35Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
36Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
37Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
38Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
39Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
40Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
41Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
42Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
43Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
44Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
45Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
46Band alignment of Al2O3 with (-201) β-Ga2O3
47Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
48Breakdown and Protection of ALD Moisture Barrier Thin Films
49Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
50Capacitance spectroscopy of gate-defined electronic lattices
51Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
52Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
53Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
54Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
55Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
56Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
57Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
58Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
59Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
60Charge effects of ultrafine FET with nanodot type floating gate
61Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
62Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
63Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
64Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
65Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
66Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
67Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
68Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
69Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
70Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
71Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
72Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
73Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
74Damage evaluation in graphene underlying atomic layer deposition dielectrics
75DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
76Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
77Densification of Thin Aluminum Oxide Films by Thermal Treatments
78Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
79Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
80Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
81DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
82Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
83Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
84Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
85Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
86Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
87Dynamic tuning of plasmon resonance in the visible using graphene
88Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
89Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
90Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
91Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
92Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
93Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
94Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
95Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
96Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
97Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
98Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
99Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
100Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
101Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
102Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
103Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
104Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
105Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
106Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
107Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
108Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
109Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
110Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
111Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
112Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
113Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
114Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
115Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
116Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
117Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
118Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
119Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
120Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
121Energy-enhanced atomic layer deposition for more process and precursor versatility
122Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
123Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
124Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
125Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
126Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
127Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
128Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
129Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
130Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
131Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
132Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
133Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
134Experimental verification of electro-refractive phase modulation in graphene
135Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
136Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
137Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
138Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
139Fiber-matrix interface reinforcement using Atomic Layer Deposition
140Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
141Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
142Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
143Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
144Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
145First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
146Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
147Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
148Flexible, light trapping substrates for organic photovoltaics
149Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
150Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
151Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
152Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
153Hafnia and alumina on sulphur passivated germanium
154High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
155High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
156High-efficiency embedded transmission grating
157High-Reflective Coatings For Ground and Space Based Applications
158High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
159Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
160Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
161Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
162Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
163Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
164Impact of interface materials on side permeation in indirect encapsulation of organic electronics
165Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
166Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
167Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
168Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
169Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
170Improved understanding of recombination at the Si/Al2O3 interface
171Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
172Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
173Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
174Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
175Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
176In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
177In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
178In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
179In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
180Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
181Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
182Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
183Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
184Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
185Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
186Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
187Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
188Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
189Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
190Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
191Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
192Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
193Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
194Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
195Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
196Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
197Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
198Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
199Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
200Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
201Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
202Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
203Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
204Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
205Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
206Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
207Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
208Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
209Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
210Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
211Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
212Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
213Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
214Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
215Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
216Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
217Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
218Lithium-Iron (III) Fluoride Battery with Double Surface Protection
219Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
220Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
221Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
222Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
223Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
224Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
225Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
226Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
227MANOS performance dependence on ALD Al2O3 oxidation source
228Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
229Mechanical properties of thin-film Parylene-metal-Parylene devices
230Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
231Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
232Method of Fabrication for Encapsulated Polarizing Resonant Gratings
233Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
234Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
235Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
236Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
237Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
238Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
239Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
240MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
241Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
242N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
243Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
244Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
245Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
246Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
247Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
248Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
249Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
250Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
251On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
252On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
253On the equilibrium concentration of boron-oxygen defects in crystalline silicon
254On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
255On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
256Optical display film as flexible and light trapping substrate for organic photovoltaics
257Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
258Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
259Optimization of the Surface Structure on Black Silicon for Surface Passivation
260Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
261Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
262Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
263Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
264Passivation effects of atomic-layer-deposited aluminum oxide
265Patterned deposition by plasma enhanced spatial atomic layer deposition
266PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
267Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
268Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
269Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
270Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
271Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
272Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
273Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
274Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
275Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
276Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
277Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
278Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
279Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
280Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
281Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
282Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
283Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
284Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
285Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
286Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
287Propagation Effects in Carbon Nanoelectronics
288Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
289Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
290Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
291Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
292Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
293Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
294Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
295Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
296Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
297Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
298Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
299Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
300Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
301Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
302Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
303Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
304Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
305Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
306Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
307Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
308Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
309Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
310Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
311Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
312Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
313Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
314Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
315Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
316Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
317Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
318Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
319Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
320Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
321Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
322Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
323Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
324Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
325Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
326The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
327The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
328The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
329Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
330Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
331Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
332Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
333Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
334TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
335Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
336Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
337Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
338Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
339Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
340Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
341Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
342Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
343Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
344Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
345Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
346Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
347Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
348Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
349Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
350Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
351Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
352Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
353Very high frequency plasma reactant for atomic layer deposition
354Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
355Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
356Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
357Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
358Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
359Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
360Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
361Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
362Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
363Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
364Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
365Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
366Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
367Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
368Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
369Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
370Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
371Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
372Composite materials and nanoporous thin layers made by atomic layer deposition
373Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
374Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
375Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
376Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
377Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
378Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
379Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
380Optical and Electrical Properties of AlxTi1-xO Films
381Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
382Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
383Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
384Atomic Layer Deposition of Gold Metal
385Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
386Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
387Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
388Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
389Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
390Plasma-enhanced atomic layer deposition of BaTiO3
391High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
392Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
393Plasma-enhanced atomic layer deposition of BaTiO3
394Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
395Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
396Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
397Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
398Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
399Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
400Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
401Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
402Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
403A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
404Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
405Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
406Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
407Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
408Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
409Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
410Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
411Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
412Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
413Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
414Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
415Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
416Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
417Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
418Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
419Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
420Radical Enhanced Atomic Layer Deposition of Metals and Oxides
421Radical Enhanced Atomic Layer Deposition of Metals and Oxides
422Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
423Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
424Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
425Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
426Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
427Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
428Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
429Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
430Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
431Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
432Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
433Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
434Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
435Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
436Plasma enhanced atomic layer deposition of Fe2O3 thin films
437Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
438Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
439Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
440Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
441The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
442Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
443Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
444Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
445Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
446Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
447Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
448Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
449Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
450Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
451Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
452Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
453Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
454Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
455Plasma enhanced atomic layer deposition of Ga2O3 thin films
456Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
457Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
458Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
459Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
460RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
461Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
462Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
463α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
464Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
465Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
466Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
467Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
468Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
469Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
470Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
471Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
472Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
473Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
474Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
475A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
476An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
477Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
478Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
479Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
480Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
481Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
482AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
483Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
484Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
485Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
486Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
487Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
488Characteristics of HfO2 thin films grown by plasma atomic layer deposition
489Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
490Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
491Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
492Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
493Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
494Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
495Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
496Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
497Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
498Damage evaluation in graphene underlying atomic layer deposition dielectrics
499Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
500Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
501Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
502Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
503Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
504Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
505Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
506Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
507Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
508Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
509Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
510Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
511Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
512Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
513Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
514Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
515Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
516Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
517Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
518Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
519Hafnia and alumina on sulphur passivated germanium
520HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
521HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
522Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
523Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
524Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
525Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
526In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
527Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
528Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
529Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
530Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
531Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
532Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
533Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
534Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
535Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
536Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
537Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
538Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
539Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
540Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
541Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
542Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
543Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
544Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
545Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
546Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
547Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
548On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
549Optical properties and bandgap evolution of ALD HfSiOx films
550Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
551PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
552Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
553Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
554Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
555Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
556Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
557Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
558Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
559Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
560Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
561Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
562Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
563Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
564Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
565Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
566Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
567The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
568The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
569The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
570The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
571The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
572Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
573Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
574Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
575Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
576Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
577Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
578Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
579Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
580Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
581Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
582Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
583Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
584Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
585HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
586Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
587The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
588Annealing behavior of ferroelectric Si-doped HfO2 thin films
589Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
590Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
591Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
592Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
593Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
594Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
595Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
596Optical properties and bandgap evolution of ALD HfSiOx films
597Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
598TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
599The effects of layering in ferroelectric Si-doped HfO2 thin films
600Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
601Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
602Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
603Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
604Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
605New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
606Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
607Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
608All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
609Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
610Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
611Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
612Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
613High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
614High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
615Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
616Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
617On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
618Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
619Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
620High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
621Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
622Systematic efficiency study of line-doubled zone plates
623TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
624IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
625Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
626Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
627Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
628Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
629Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
630Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
631Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
632The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
633XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
634Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
635Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
636Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
637Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
638Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
639Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
640Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
641Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
642Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
643Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
644Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
645Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
646In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
647Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
648Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
649Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
650Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
651Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
652Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
653Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
654Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
655Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
656Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
657Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
658Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
659The important role of water in growth of monolayer transition metal dichalcogenides
660Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
661Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
662Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
663Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
664Radical Enhanced Atomic Layer Deposition of Metals and Oxides
665Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
666Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
667Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
668Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
669Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
670Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
671Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
672Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
673Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
674Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
675Radical Enhanced Atomic Layer Deposition of Metals and Oxides
676Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
677Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
678Tuning size and coverage of Pd nanoparticles using atomic layer deposition
679Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
680Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
681Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
682Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
683Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
684Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
685Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
686Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
687Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
688Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
689Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
690Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
691Encapsulation method for atom probe tomography analysis of nanoparticles
692Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
693Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
694Growth of silica nanowires in vacuum
695In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
696Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
697Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
698Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
699Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
700Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
701Remote Plasma ALD of Platinum and Platinum Oxide Films
702Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
703Room-Temperature Atomic Layer Deposition of Platinum
704Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
705Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
706Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
707Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
708Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
709Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
710Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
711Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
712The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
713Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
714Remote Plasma ALD of Platinum and Platinum Oxide Films
715Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
716Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
717Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
718Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
719Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
720Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
721High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
722Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
723In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
724Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
725Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
726Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
727Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
728Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
729Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
730(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
731ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
732Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
733Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
734Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
735Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
736Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
737Radical Enhanced Atomic Layer Deposition of Metals and Oxides
738Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
739Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
740Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
741Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
742Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
743Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
744'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7453D structure evolution using metastable atomic layer deposition based on planar silver templates
746A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
747A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
748Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
749Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
750Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
751An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
752Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
753Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
754Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
755Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
756Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
757Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
758Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
759Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
760Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
761Atomic layer deposition of metal-oxide thin films on cellulose fibers
762Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
763Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
764Breakdown and Protection of ALD Moisture Barrier Thin Films
765Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
766Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
767Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
768Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
769Comparative study of ALD SiO2 thin films for optical applications
770Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
771Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
772Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
773Designing high performance precursors for atomic layer deposition of silicon oxide
774Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
775Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
776Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
777Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
778Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
779Energy-enhanced atomic layer deposition for more process and precursor versatility
780Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
781Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
782Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
783Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
784Gate Insulator for High Mobility Oxide TFT
785Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
786HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
787High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
788High-Reflective Coatings For Ground and Space Based Applications
789Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
790Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
791Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
792Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
793Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
794Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
795Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
796Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
797Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
798Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
799Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
800Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
801Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
802Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
803Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
804Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
805Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
806Modal properties of a strip-loaded horizontal slot waveguide
807Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
808Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
809Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
810Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
811Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
812On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
813On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
814Optical properties and bandgap evolution of ALD HfSiOx films
815PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
816Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
817Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
818Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
819Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
820Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
821Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
822Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
823Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
824Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
825Radical Enhanced Atomic Layer Deposition of Metals and Oxides
826Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
827Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
828Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
829Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
830Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
831Single-Cell Photonic Nanocavity Probes
832Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
833Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
834Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
835Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
836Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
837Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
838Symmetrical Al2O3-based passivation layers for p- and n-type silicon
839Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
840Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
841Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
842Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
843Trapped charge densities in Al2O3-based silicon surface passivation layers
844Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
845Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
846Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
847A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
848Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
849Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
850Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
851Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
852Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
853Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
854Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
855Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
856Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
857Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
858Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
859In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
860Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
861Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
862Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
863Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
864Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
865SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
866Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
867Surface and sensing properties of PE-ALD SnO2 thin film
868Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
869Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
870Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
871Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
872Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
873Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
874Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
875Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
876Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
877Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
878Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
879Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
880Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
881Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
882Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
883Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
884Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
885Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
886Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
887Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
888Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
889Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
890Radical Enhanced Atomic Layer Deposition of Metals and Oxides
891Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
892Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
893Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
894Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
895Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
896Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
897Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
898Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
899Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
900Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
901Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
902Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
903Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
904Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
905Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
906Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
907Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
908Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
909Topographically selective deposition
910Trilayer Tunnel Selectors for Memristor Memory Cells
911Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
912Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
913A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
914Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
915An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
916Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
917Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
918Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
919Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
920Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
921Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
922Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
923Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
924Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
925Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
926Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
927Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
928Biofilm prevention on cochlear implants
929Bipolar resistive switching in amorphous titanium oxide thin film
930Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
931Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
932Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
933Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
934Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
935Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
936Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
937Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
938Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
939Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
940Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
941Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
942Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
943Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
944Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
945Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
946Energy-enhanced atomic layer deposition for more process and precursor versatility
947Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
948Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
949Epitaxial 1D electron transport layers for high-performance perovskite solar cells
950Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
951Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
952Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
953Flexible Memristive Memory Array on Plastic Substrates
954Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
955Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
956Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
957Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
958Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
959Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
960Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
961Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
962High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
963High-efficiency embedded transmission grating
964Highly efficient and bending durable perovskite solar cells: toward a wearable power source
965Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
966Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
967Impact of interface materials on side permeation in indirect encapsulation of organic electronics
968Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
969Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
970Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
971In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
972In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
973In-gap states in titanium dioxide and oxynitride atomic layer deposited films
974Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
975Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
976Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
977Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
978Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
979Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
980Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
981Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
982Lithium-Iron (III) Fluoride Battery with Double Surface Protection
983Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
984Low temperature temporal and spatial atomic layer deposition of TiO2 films
985Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
986Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
987Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
988MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
989Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
990On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
991Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
992Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
993Oxygen migration in TiO2-based higher-k gate stacks
994Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
995Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
996Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
997Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
998Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
999Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1000Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
1001Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
1002Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1003Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1004Plasma-enhanced atomic layer deposition of BaTiO3
1005Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1006Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1007Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1008Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1009Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
1010Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
1011Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1012Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1013Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1014Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1015Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1016Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1017Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
1018Study on the resistive switching time of TiO2 thin films
1019Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
1020Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1021Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
1022Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1023The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1024The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
1025The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1026The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1027The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1028Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1029Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1030Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1031TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1032Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1033Transient characterization of the electroforming process in TiO2 based resistive switching devices
1034Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1035Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
1036X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1037Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
1038Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1039Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1040Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
1041Optical and Electrical Properties of TixSi1-xOy Films
1042Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
1043Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
1044Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1045Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
1046Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1047Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
1048Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1049Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1050Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
1051Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
1052Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1053In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
1054Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1055Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1056Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1057The important role of water in growth of monolayer transition metal dichalcogenides
1058Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
1059Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
1060Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1061Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
1062Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1063Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1064Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1065Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1066Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1067Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1068Atomic layer deposition of YMnO3 thin films
1069Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1070Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1071Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1072Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1073Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1074A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1075Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1076All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1077Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1078Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1079Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
1080Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1081Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1082Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1083Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1084Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1085Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1086Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1087Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1088Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1089Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1090From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1091Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1092Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1093Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1094Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1095Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1096Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1097Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1098Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1099Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1100Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1101Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1102Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1103Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1104Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1105Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1106Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1107Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1108Spectroscopy and control of near-surface defects in conductive thin film ZnO
1109Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1110Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1111The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1112The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1113The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1114The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1115The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1116Top-down fabricated ZnO nanowire transistors for application in biosensors
1117Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1118Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1119Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1120ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1121ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1122Plasma-enhanced atomic layer deposition of zinc phosphate
1123Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1124Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1125Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1126Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1127Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1128Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1129Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1130Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1131Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1132Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1133Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1134Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1135Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1136Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1137High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1138Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1139Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1140Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1141Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1142In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1143Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1144Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1145Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1146Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1147Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1148Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1149PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1150PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1151PEALD ZrO2 Films Deposition on TiN and Si Substrates
1152Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1153Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1154Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1155Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1156Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1157Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1158Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1159Sub-7-nm textured ZrO2 with giant ferroelectricity
1160Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1161Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1162Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1163The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1164The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1165Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1166Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1167XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1168ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1169ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1170ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1171Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1172Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1173Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1174Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1175In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics