O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12Advances in the fabrication of graphene transistors on flexible substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30Anti-stiction coating for mechanically tunable photonic crystal devices
31Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40Breakdown and Protection of ALD Moisture Barrier Thin Films
41Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42Capacitance spectroscopy of gate-defined electronic lattices
43Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52Charge effects of ultrafine FET with nanodot type floating gate
53Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
60Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
61Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
62Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
63Damage evaluation in graphene underlying atomic layer deposition dielectrics
64DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
65Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
66Demonstration of flexible thin film transistors with GaN channels
67Densification of Thin Aluminum Oxide Films by Thermal Treatments
68Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76Dynamic tuning of plasmon resonance in the visible using graphene
77Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
81Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
82Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
83Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
84Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
85Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
86Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
87Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
88Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
89Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
90Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
91Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
92Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
93Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
94Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
95Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
96Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
97Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
98Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
99Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
100Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
101Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
102Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
103Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
104Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
105Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
106Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
107Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
108Energy-enhanced atomic layer deposition for more process and precursor versatility
109Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
110Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
111Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
112Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
113Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
114Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
115Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
116Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
117Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
118Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
119Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
120Experimental verification of electro-refractive phase modulation in graphene
121Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
122Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
123Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
124Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
125Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
126Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
127Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
128Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
129First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
130Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
131Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
132Flexible, light trapping substrates for organic photovoltaics
133Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
134Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
135Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
136Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
137Hafnia and alumina on sulphur passivated germanium
138High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
139High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
140High-efficiency embedded transmission grating
141High-Reflective Coatings For Ground and Space Based Applications
142High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
143Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
144Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
145Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
146Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
147Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
148Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
149Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
150Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
151Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
152Improved understanding of recombination at the Si/Al2O3 interface
153Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
154Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
155Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
156Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
157Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
158In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
159In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
160In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
161Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
162Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
163Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
164Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
165Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
166Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
167Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
168Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
169Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
170Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
171Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
172Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
173Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
174Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
175Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
176Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
177Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
178Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
179Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
180Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
181Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
182Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
183Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
184Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
185Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
186Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
187Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
188Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
189Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
190Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
191Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
192Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
193Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
194Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
195Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
196Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
197Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
198MANOS performance dependence on ALD Al2O3 oxidation source
199Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
200Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
201Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
202Method of Fabrication for Encapsulated Polarizing Resonant Gratings
203Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
204Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
205Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
206Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
207Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
208Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
209Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
210N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
211Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
212Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
213Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
214Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
215Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
216Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
217On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
218On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
219On the equilibrium concentration of boron-oxygen defects in crystalline silicon
220On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
221Optical display film as flexible and light trapping substrate for organic photovoltaics
222Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
223Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
224Optimization of the Surface Structure on Black Silicon for Surface Passivation
225Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
226Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
227Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
228Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
229Passivation effects of atomic-layer-deposited aluminum oxide
230Patterned deposition by plasma enhanced spatial atomic layer deposition
231PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
232Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
233Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
234Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
235Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
236Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
237Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
238Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
239Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
240Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
241Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
242Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
243Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
244Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
245Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
246Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
247Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
248Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
249Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
250Propagation Effects in Carbon Nanoelectronics
251Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
252Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
253Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
254Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
255Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
256Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
257Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
258Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
259Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
260Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
261Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
262Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
263Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
264Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
265Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
266Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
267Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
268Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
269Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
270Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
271Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
272Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
273Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
274Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
275Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
276Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
277Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
278Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
279Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
280Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
281Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
282Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
283The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
284The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
285The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
286Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
287Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
288Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
289Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
290TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
291Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
292Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
293Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
294Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
295Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
296Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
297Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
298Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
299Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
300Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
301Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
302Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
303Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
304Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
305Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
306Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
307Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
308Very high frequency plasma reactant for atomic layer deposition
309Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
310Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
311Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
312Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
313Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
314Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
315Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
316Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
317Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
318Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
319Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
320Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
321Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
322Composite materials and nanoporous thin layers made by atomic layer deposition
323Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
324Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
325Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
326Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
327Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
328Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
329Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
330Optical and Electrical Properties of AlxTi1-xO Films
331Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
332Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
333Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
334Atomic Layer Deposition of Gold Metal
335Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
336Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
337Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
338Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
339High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
340Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
341Plasma-enhanced atomic layer deposition of BaTiO3
342Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
343Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
344Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
345A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
346Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
347Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
348Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
349Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
350Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
351Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
352Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
353Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
354Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
355Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
356Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
357Radical Enhanced Atomic Layer Deposition of Metals and Oxides
358Radical Enhanced Atomic Layer Deposition of Metals and Oxides
359Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
360Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
361Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
362Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
363Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
364Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
365Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
366Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
367Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
368Plasma enhanced atomic layer deposition of Fe2O3 thin films
369Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
370Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
371The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
372Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
373Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
374Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
375Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
376Electrical characteristics of β-Ga2O3 thin films grown by PEALD
377Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
378Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
379Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
380Plasma enhanced atomic layer deposition of Ga2O3 thin films
381Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
382Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
383RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
384Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
385Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
386Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
387Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
388Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
389Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
390Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
391Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
392Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
393Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
394Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
395Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
396A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
397An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
398Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
399Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
400Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
401Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
402Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
403AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
404Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
405Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
406Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
407Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
408Characteristics of HfO2 thin films grown by plasma atomic layer deposition
409Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
410Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
411Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
412Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
413Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
414Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
415Damage evaluation in graphene underlying atomic layer deposition dielectrics
416Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
417Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
418Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
419Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
420Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
421Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
422Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
423Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
424Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
425Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
426Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
427Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
428Hafnia and alumina on sulphur passivated germanium
429HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
430Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
431Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
432Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
433Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
434In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
435Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
436Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
437Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
438Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
439Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
440Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
441Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
442Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
443Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
444Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
445Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
446Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
447Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
448Optical properties and bandgap evolution of ALD HfSiOx films
449Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
450Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
451Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
452Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
453Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
454Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
455Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
456Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
457Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
458Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
459Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
460Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
461Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
462Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
463The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
464The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
465The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
466Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
467Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
468Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
469Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
470Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
471Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
472Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
473Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
474Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
475HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
476Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
477Annealing behavior of ferroelectric Si-doped HfO2 thin films
478Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
479Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
480Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
481Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
482Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
483Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
484Optical properties and bandgap evolution of ALD HfSiOx films
485TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
486The effects of layering in ferroelectric Si-doped HfO2 thin films
487Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
488Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
489Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
490Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
491Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
492Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
493Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
494High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
495High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
496Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
497Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
498On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
499Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
500Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
501High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
502Systematic efficiency study of line-doubled zone plates
503TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
504IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
505Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
506Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
507Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
508Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
509Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
510Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
511Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
512Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
513Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
514Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
515Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
516Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
517In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
518Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
519Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
520Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
521Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
522Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
523Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
524Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
525Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
526The important role of water in growth of monolayer transition metal dichalcogenides
527Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
528Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
529Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
530Radical Enhanced Atomic Layer Deposition of Metals and Oxides
531Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
532Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
533Radical Enhanced Atomic Layer Deposition of Metals and Oxides
534Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
535Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
536Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
537Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
538Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
539Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
540Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
541Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
542Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
543Encapsulation method for atom probe tomography analysis of nanoparticles
544Growth of silica nanowires in vacuum
545In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
546Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
547Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
548Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
549Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
550Remote Plasma ALD of Platinum and Platinum Oxide Films
551Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
552Room-Temperature Atomic Layer Deposition of Platinum
553Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
554Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
555Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
556Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
557Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
558Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
559Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
560Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
561The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
562Remote Plasma ALD of Platinum and Platinum Oxide Films
563Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
564Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
565Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
566Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
567Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
568Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
569High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
570Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
571In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
572Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
573Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
574Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
575Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
576Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
577(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
578ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
579Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
580Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
581Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
582Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
583Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
584Radical Enhanced Atomic Layer Deposition of Metals and Oxides
585Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
586Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
587Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
588'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
589A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
590Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
591Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
592Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
593Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
594Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
595Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
596Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
597Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
598Atomic layer deposition of metal-oxide thin films on cellulose fibers
599Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
600Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
601Breakdown and Protection of ALD Moisture Barrier Thin Films
602Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
603Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
604Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
605Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
606Comparative study of ALD SiO2 thin films for optical applications
607Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
608Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
609Designing high performance precursors for atomic layer deposition of silicon oxide
610Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
611Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
612Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
613Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
614Energy-enhanced atomic layer deposition for more process and precursor versatility
615Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
616Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
617Gate Insulator for High Mobility Oxide TFT
618Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
619High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
620High-Reflective Coatings For Ground and Space Based Applications
621Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
622Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
623Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
624Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
625Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
626Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
627Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
628Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
629Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
630Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
631Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
632Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
633Modal properties of a strip-loaded horizontal slot waveguide
634Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
635Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
636On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
637On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
638Optical properties and bandgap evolution of ALD HfSiOx films
639PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
640Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
641Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
642Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
643Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
644Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
645Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
646Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
647Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
648Radical Enhanced Atomic Layer Deposition of Metals and Oxides
649Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
650Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
651Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
652Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
653Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
654Single-Cell Photonic Nanocavity Probes
655Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
656Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
657Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
658Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
659Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
660Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
661Symmetrical Al2O3-based passivation layers for p- and n-type silicon
662Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
663Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
664Trapped charge densities in Al2O3-based silicon surface passivation layers
665Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
666Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
667A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
668Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
669Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
670Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
671Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
672Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
673Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
674Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
675Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
676Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
677SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
678Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
679Surface and sensing properties of PE-ALD SnO2 thin film
680Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
681Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
682Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
683Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
684Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
685Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
686Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
687Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
688Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
689Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
690Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
691Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
692Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
693Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
694Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
695Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
696Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
697Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
698Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
699Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
700Radical Enhanced Atomic Layer Deposition of Metals and Oxides
701Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
702Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
703Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
704Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
705Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
706Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
707Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
708Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
709Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
710Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
711Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
712Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
713Trilayer Tunnel Selectors for Memristor Memory Cells
714Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
715A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
716Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
717An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
718Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
719Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
720Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
721Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
722Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
723Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
724Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
725Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
726Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
727Biofilm prevention on cochlear implants
728Bipolar resistive switching in amorphous titanium oxide thin film
729Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
730Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
731Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
732Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
733Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
734Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
735Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
736Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
737Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
738Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
739Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
740Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
741Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
742Energy-enhanced atomic layer deposition for more process and precursor versatility
743Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
744Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
745Epitaxial 1D electron transport layers for high-performance perovskite solar cells
746Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
747Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
748Flexible Memristive Memory Array on Plastic Substrates
749Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
750Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
751Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
752Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
753Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
754High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
755High-efficiency embedded transmission grating
756Highly efficient and bending durable perovskite solar cells: toward a wearable power source
757Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
758Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
759Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
760In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
761In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
762In-gap states in titanium dioxide and oxynitride atomic layer deposited films
763Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
764Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
765Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
766Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
767Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
768Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
769Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
770Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
771Low temperature temporal and spatial atomic layer deposition of TiO2 films
772Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
773Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
774Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
775On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
776Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
777Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
778Oxygen migration in TiO2-based higher-k gate stacks
779Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
780Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
781Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
782Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
783Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
784Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
785Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
786Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
787Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
788Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
789Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
790Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
791Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
792Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
793Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
794Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
795Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
796Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
797Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
798Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
799Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
800The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
801The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
802The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
803Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
804Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
805TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
806Transient characterization of the electroforming process in TiO2 based resistive switching devices
807Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
808Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
809X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
810Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
811Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
812Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
813Optical and Electrical Properties of TixSi1-xOy Films
814Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
815Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
816Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
817Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
818Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
819Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
820Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
821Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
822Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
823Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
824The important role of water in growth of monolayer transition metal dichalcogenides
825Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
826Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
827Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
828Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
829Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
830Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
831Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
832Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
833Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
834Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
835Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
836Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
837Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
838Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
839Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
840Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
841Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
842Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
843Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
844Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
845Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
846Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
847Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
848Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
849Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
850Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
851Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
852Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
853Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
854Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
855Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
856Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
857Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
858Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
859Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
860Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
861Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
862Radical Enhanced Atomic Layer Deposition of Metals and Oxides
863Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
864Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
865Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
866Spectroscopy and control of near-surface defects in conductive thin film ZnO
867Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
868Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
869The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
870The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
871The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
872The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
873Top-down fabricated ZnO nanowire transistors for application in biosensors
874Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
875Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
876Plasma-enhanced atomic layer deposition of zinc phosphate
877Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
878Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
879Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
880Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
881Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
882Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
883Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
884Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
885Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
886Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
887Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
888Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
889High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
890Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
891Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
892Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
893Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
894Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
895Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
896Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
897PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
898PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
899PEALD ZrO2 Films Deposition on TiN and Si Substrates
900Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
901Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
902Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
903Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
904Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
905Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
906The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
907The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
908Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
909Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
910ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
911ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
912ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
913Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
914Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
915Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
916Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation


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