O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
2Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
3Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
4Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
5Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
6Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
7Flexible Memristive Memory Array on Plastic Substrates
8Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
9Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
10Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
11AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
12Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
13Band alignment of Al2O3 with (-201) β-Ga2O3
14Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
15Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
16Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
17Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
18Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
19Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
20The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
21Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
22ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
23Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
24Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
25Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
26High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
27Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
28Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
29Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
30High-Reflective Coatings For Ground and Space Based Applications
31Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
32From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
33Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
34Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
35Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
36A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
37Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
38Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
39Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
40Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
41Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
42Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
43A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
44Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
45Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
46Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
47Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
48Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
49Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
50The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
51AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
52Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
53Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
54Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
55In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
56Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
57Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
58Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
59Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
60In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
61Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
62Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
63Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
64Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
65Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
66Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
67Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
68Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
69Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
70Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
71Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
72Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
73Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
74Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
75Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
76Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
77Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
78High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
79Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
80Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
81Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
82Optical and Electrical Properties of TixSi1-xOy Films
83Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
84Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
85Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
86Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
87Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
88Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
89Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
90Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
91Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
92Radical Enhanced Atomic Layer Deposition of Metals and Oxides
93Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
94Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
95The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
96Topographically selective deposition
97Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
98The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
99Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
100Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
101Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
102Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
103Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
10446-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
105Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
106Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
107Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
108Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
109Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
110Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
111Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
112Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
113Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
114Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
115Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
116Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
117Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
118MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
119Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
120Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
121Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
122Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
123Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
124Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
125Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
126All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
127Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
128High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
129Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
130Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
131Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
132Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
133The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
134Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
135Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
136Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
137ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
138Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
139Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
140Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
141Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
142Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
143Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
144Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
145Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
146Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
147Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
148Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
149Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
150Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
151Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
152The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
153Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
154Gate Insulator for High Mobility Oxide TFT
155Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
156Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
157Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
158Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
159Remote Plasma ALD of Platinum and Platinum Oxide Films
160Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
161Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
162Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
163Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
164Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
165Atomic layer deposition of YMnO3 thin films
166Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
167Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
168Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
169Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
170Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
171Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
172Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
173Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
174Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
175In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
176Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
177Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
178Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
179Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
180Transient characterization of the electroforming process in TiO2 based resistive switching devices
181On the equilibrium concentration of boron-oxygen defects in crystalline silicon
182A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
183Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
184Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
185Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
186Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
187Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
188Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
189Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
190Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
191Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
192Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
193Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
194Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
195Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
196Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
197Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
198Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
199Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
200Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
201Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
202Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
203Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
204Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
205Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
206Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
207The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
208The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
209On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
210Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
211Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
212Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
213Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
214TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
215Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
216Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
217Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
218Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
219Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
220Advances in the fabrication of graphene transistors on flexible substrates
221Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
222Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
223Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
224Damage evaluation in graphene underlying atomic layer deposition dielectrics
225Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
226Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
227Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
228Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
229Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
230Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
231In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
232Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
233Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
234Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
235Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
236Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
237Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
238Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
239Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
240High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
241Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
242Top-down fabricated ZnO nanowire transistors for application in biosensors
243Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
244Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
245Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
246Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
247Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
248Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
249Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
250Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
251Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
252Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
253Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
254Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
255Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
256Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
257ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
258Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
259Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
260Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
261Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
262Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
263Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
264Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
265Optical display film as flexible and light trapping substrate for organic photovoltaics
266HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
267Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
268MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
269Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
270Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
271The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
272Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
273Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
274Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
275Atomic layer deposition of metal-oxide thin films on cellulose fibers
276A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
277Sub-7-nm textured ZrO2 with giant ferroelectricity
278Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
279Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
280Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
281Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
282Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
283Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
284Optical properties and bandgap evolution of ALD HfSiOx films
285Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
286The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
287Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
288Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
289Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
290In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
291Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
292Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
293Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
294Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
295Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
296HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
297Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
298Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
299The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
300Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
301Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
302Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
303Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
304Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
305Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
306Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
307Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
308Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
309Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
310Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
311Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
312Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
313Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
314Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
315Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
316Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
317Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
318Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
319Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
320Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
321Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
322New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
323PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
324Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
325Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
326Fiber-matrix interface reinforcement using Atomic Layer Deposition
327Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
328The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
329DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
330Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
331Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
332Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
333Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
334On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
335Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
336Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
337Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
338In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
339Tuning size and coverage of Pd nanoparticles using atomic layer deposition
340Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
341Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
342Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
343Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
344Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
345Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
346Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
347Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
348Breakdown and Protection of ALD Moisture Barrier Thin Films
349Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
350Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
351Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
352Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
353Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
354Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
355Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
356Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
357Remote Plasma ALD of Platinum and Platinum Oxide Films
358Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
359Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
360Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
361In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
362Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
363Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
364Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
365Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
366Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
367Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
368Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
369Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
370Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
371Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
372Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
373Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
374Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
375Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
376Systematic efficiency study of line-doubled zone plates
377Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
378Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
379Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
380Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
381Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
382Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
383Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
384Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
385Energy-enhanced atomic layer deposition for more process and precursor versatility
386Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
387Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
388Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
389Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
390Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
391Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
392An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
393Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
394Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
395Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
396Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
397Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
398Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
399Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
400On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
401Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
402Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
403Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
404Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
405Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
406RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
407Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
408Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
409Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
410Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
411Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
412Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
413Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
414Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
415The effects of layering in ferroelectric Si-doped HfO2 thin films
416On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
417Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
418Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
419Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
420Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
421Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
422Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
423Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
424Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
425Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
426Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
427Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
428Composite materials and nanoporous thin layers made by atomic layer deposition
429Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
430Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
431An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
432Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
433Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
434Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
435Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
436Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
437Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
438Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
439Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
440Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
441Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
442Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
443Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
444Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
445Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
446Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
447Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
448Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
449Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
450Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
451X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
452Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
453Bipolar resistive switching in amorphous titanium oxide thin film
454Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
455Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
456Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
457Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
458PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
459Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
460Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
461Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
462Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
463Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
464Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
465Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
466Highly efficient and bending durable perovskite solar cells: toward a wearable power source
467Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
468Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
469Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
470A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
471Radical Enhanced Atomic Layer Deposition of Metals and Oxides
472Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
473Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
474Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
475Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
476An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
477Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
478Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
479Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
480TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
481Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
482On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
483Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
484Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
485Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
486Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
487Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
488Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
489Experimental verification of electro-refractive phase modulation in graphene
490In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
491Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
492Sub-10-nm ferroelectric Gd-doped HfO2 layers
493Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
494The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
495Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
496Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
497Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
498Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
499Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
500Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
501Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
502Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
503Radical Enhanced Atomic Layer Deposition of Metals and Oxides
504High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
505Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
506Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
507Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
508High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
509Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
510Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
511Oxygen migration in TiO2-based higher-k gate stacks
512Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
513Optical properties and bandgap evolution of ALD HfSiOx films
514Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
515Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
516Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
517Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
518Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
519Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
520Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
521Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
522Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
523Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
524Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
525Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
526Charge effects of ultrafine FET with nanodot type floating gate
527Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
528Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
529Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
530Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
531Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
532Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
533Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
534(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
535Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
536Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
537Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
538Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
539Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
540Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
541Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
542Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
543Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
544Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
545Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
546Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
547Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
548Radical Enhanced Atomic Layer Deposition of Metals and Oxides
549Lithium-Iron (III) Fluoride Battery with Double Surface Protection
550Propagation Effects in Carbon Nanoelectronics
551Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
552High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
553Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
554Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
555Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
556Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
557Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
558Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
559Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
560The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
561Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
562Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
563Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
564Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
565Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
566Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
567Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
568Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
569Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
570Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
571Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
572Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
573Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
574Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
575Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
576Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
577Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
578Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
579Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
580Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
581Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
582Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
583Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
584Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
585Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
586Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
587Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
588Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
589MANOS performance dependence on ALD Al2O3 oxidation source
590PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
591Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
592Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
593Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
594XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
595Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
596Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
597Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
598Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
599Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
600Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
601Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
602HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
603Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
604Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
605Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
606Densification of Thin Aluminum Oxide Films by Thermal Treatments
607Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
608Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
609Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
610High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
611Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
612Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
613Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
614Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
615TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
616Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
617Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
618Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
619Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
620Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
621Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
622Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
623Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
624Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
625Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
626Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
627In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
628Method of Fabrication for Encapsulated Polarizing Resonant Gratings
629Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
630Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
631Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
632Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
633Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
634Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
635A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
636Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
637Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
638Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
639Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
640Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
641Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
642ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
643Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
644Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
645Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
646Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
647Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
648A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
649Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
650Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
651Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
652Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
653High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
654Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
655Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
656Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
657Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
658Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
659PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
660Study on the resistive switching time of TiO2 thin films
661Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
662Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
663Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
664Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
665Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
666Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
667Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
668Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
669Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
670Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
671Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
672Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
673Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
674DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
675Radical Enhanced Atomic Layer Deposition of Metals and Oxides
676Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
677Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
678Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
679Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
680Radical Enhanced Atomic Layer Deposition of Metals and Oxides
681Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
682Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
683Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
684Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
685Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
686Modal properties of a strip-loaded horizontal slot waveguide
687Impact of interface materials on side permeation in indirect encapsulation of organic electronics
688Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
689Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
690Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
691Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
692Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
693Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
694Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
695Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
696Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
697Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
698Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
699High-efficiency embedded transmission grating
700Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
701Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
702Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
703Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
704A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
705High-efficiency embedded transmission grating
706Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
707The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
708Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
709Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
710Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
711Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
712Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
713Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
714Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
715N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
716A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
717Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
718Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
719Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
720Residual stress study of thin films deposited by atomic layer deposition
721Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
722Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
723Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
724Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
725Breakdown and Protection of ALD Moisture Barrier Thin Films
726Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
727A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
728Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
729Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
730Energy-enhanced atomic layer deposition for more process and precursor versatility
731Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
732Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
733Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
734Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
735Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
736Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
737Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
738Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
739Dynamic tuning of plasmon resonance in the visible using graphene
740Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
741Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
742Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
743Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
744Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
745Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
746Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
747Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
748Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
749Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
750Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
751Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
752Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
753Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
754Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
755Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
756HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
757Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
758Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
759Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
760Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
761Improved understanding of recombination at the Si/Al2O3 interface
762Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
7631D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
764The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
765Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
766Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
767Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
768Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
769Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
770Residual stress study of thin films deposited by atomic layer deposition
771Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
7723D structure evolution using metastable atomic layer deposition based on planar silver templates
773Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
774Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
775Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
776Anti-stiction coating for mechanically tunable photonic crystal devices
777Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
778Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
779Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
780Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
781Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
782Plasma enhanced atomic layer deposition of Fe2O3 thin films
783Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
784Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
785Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
786Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
787Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
788Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
789Optical properties and bandgap evolution of ALD HfSiOx films
790In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
791Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
792Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
793Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
794Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
795Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
796Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
797Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
798Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
799Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
800Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
801Lithium-Iron (III) Fluoride Battery with Double Surface Protection
802Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
803Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
804Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
805Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
806Epitaxial 1D electron transport layers for high-performance perovskite solar cells
807Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
808Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
809Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
810Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
811Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
812Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
813Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
814All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
815Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
816Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
817Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
818Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
819PEALD ZrO2 Films Deposition on TiN and Si Substrates
820On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
821Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
822Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
823Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
824A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
825Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
826Plasma-enhanced atomic layer deposition of BaTiO3
827Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
828First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
829Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
830On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
831Annealing behavior of ferroelectric Si-doped HfO2 thin films
832Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
833Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
834Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
835Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
836Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
837Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
838Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
839In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
840An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
841Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
842Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
843Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
844Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
845Innovative remote plasma source for atomic layer deposition for GaN devices
846Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
847Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
848Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
849Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
850Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
851Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
852Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
853Room-Temperature Atomic Layer Deposition of Platinum
854Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
855Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
856Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
857Characteristics of HfO2 thin films grown by plasma atomic layer deposition
858Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
859Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
860Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
861Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
862Spectroscopy and control of near-surface defects in conductive thin film ZnO
863Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
864Comparative study of ALD SiO2 thin films for optical applications
865Trapped charge densities in Al2O3-based silicon surface passivation layers
866Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
867Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
868Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
869IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
870Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
871Radical Enhanced Atomic Layer Deposition of Metals and Oxides
872Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
873Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
874Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
875Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
876Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
877Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
878Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
879Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
880Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
881Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
882Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
883Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
884On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
885Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
886Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
887Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
888Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
889Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
890Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
891Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
892Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
893Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
894Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
895Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
896Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
897Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
898Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
899Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
900Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
901AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
902Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
903Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
904Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
905Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
906Optical and Electrical Properties of AlxTi1-xO Films
907A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
908Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
909Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
910The important role of water in growth of monolayer transition metal dichalcogenides
911Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
912Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
913Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
914Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
915Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
916Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
917Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
918Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
919Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
920Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
921Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
922Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
923Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
924Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
925Surface and sensing properties of PE-ALD SnO2 thin film
926Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
927Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
928Radical Enhanced Atomic Layer Deposition of Metals and Oxides
929Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
930Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
931Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
932Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
933Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
934Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
935Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
936Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
937Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
938Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
939Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
940Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
941Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
942Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
943Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
944Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
945Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
946Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
947Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
948Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
949Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
950Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
951Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
952Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
953Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
954Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
955Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
956Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
957Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
958Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
959Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
960Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
961Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
962Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
963Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
964Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
965Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
966Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
967Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
968TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
969Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
970Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
971Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
972Capacitance spectroscopy of gate-defined electronic lattices
973Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
974Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
975SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
976Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
977Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
978Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
979Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
980Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
981In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
982Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
983Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
984Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
985Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
986Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
987Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
988Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
989Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
990The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
991Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
992Passivation effects of atomic-layer-deposited aluminum oxide
993Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
994Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
995Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
996Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
997Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
998Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
999Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
1000Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
1001Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
1002Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1003A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
1004Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
1005Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
1006Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
1007In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
1008Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1009Single-Cell Photonic Nanocavity Probes
1010Hafnia and alumina on sulphur passivated germanium
1011A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1012Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1013Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1014Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
1015Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
1016Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1017Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
1018Biofilm prevention on cochlear implants
1019Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1020Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
1021Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
1022Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
1023Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
1024Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1025AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
1026Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
1027Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
1028Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
1029ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1030Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
1031Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
1032Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
1033Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
1034Designing high performance precursors for atomic layer deposition of silicon oxide
1035Atomic Layer Deposition of Gold Metal
1036Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
1037The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
1038Optimization of the Surface Structure on Black Silicon for Surface Passivation
1039Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1040Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
1041The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1042Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
1043Mechanical properties of thin-film Parylene-metal-Parylene devices
1044Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1045Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
1046Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
1047Plasma-enhanced atomic layer deposition of BaTiO3
1048Flexible, light trapping substrates for organic photovoltaics
1049Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
1050Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1051Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1052Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1053Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
1054Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
1055Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
1056Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
1057Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
1058Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
1059Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
1060A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
1061Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
1062Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1063Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1064Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1065Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
1066Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
1067Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
1068Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1069Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1070Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
1071Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
1072Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1073Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
1074Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
1075Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
1076Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1077Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1078Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1079Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
1080Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
1081Growth of silica nanowires in vacuum
1082Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
1083Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
1084Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1085Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1086High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
1087Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
1088Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
1089Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
1090Hafnia and alumina on sulphur passivated germanium
1091Optical in situ monitoring of plasma-enhanced atomic layer deposition process
1092Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1093Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
1094Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
1095Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1096Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
1097ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1098Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
1099Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
1100Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1101Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1102Plasma-enhanced atomic layer deposition of zinc phosphate
1103Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1104Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1105Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1106A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
1107Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1108Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
1109Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1110Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
1111Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
1112Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1113High-Reflective Coatings For Ground and Space Based Applications
1114The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1115Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
1116Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1117Energy-enhanced atomic layer deposition for more process and precursor versatility
1118Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1119Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
1120High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
1121Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1122Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1123Trilayer Tunnel Selectors for Memristor Memory Cells
1124Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
1125Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
1126Low temperature temporal and spatial atomic layer deposition of TiO2 films
1127Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1128Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1129Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1130Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
1131Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
1132Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
1133Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1134Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1135Plasma-enhanced atomic layer deposition of BaTiO3
1136Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
1137Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1138Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
1139Atomic Layer Deposition of the Conductive Delafossite PtCoO2
1140Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
1141Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
1142The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
1143Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
1144ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
1145The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1146α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
1147High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
1148Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
1149Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
1150The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1151Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
1152Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
1153The important role of water in growth of monolayer transition metal dichalcogenides
1154Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1155Encapsulation method for atom probe tomography analysis of nanoparticles
1156Patterned deposition by plasma enhanced spatial atomic layer deposition
1157Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1158Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
1159Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1160Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
1161Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1162Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1163Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
1164Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1165'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1166Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1167Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
1168Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1169Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
1170Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1171Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
1172Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
1173Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
1174Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
1175Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
1176'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1177Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
1178Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1179Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
1180Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1181Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1182Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
1183Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1184Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
1185Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
1186Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
1187Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
1188Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1189Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
1190Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
1191In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
1192Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1193Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
1194Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
1195The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
1196Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
1197On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1198Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1199Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1200Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1201Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
1202Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1203Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
1204Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1205Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1206Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1207Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
1208PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1209Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1210Damage evaluation in graphene underlying atomic layer deposition dielectrics
1211Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1212Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1213Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1214Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
1215Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
1216Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
1217Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
1218Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1219Very high frequency plasma reactant for atomic layer deposition
1220Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
1221Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1222Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
1223Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1224Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
1225In-gap states in titanium dioxide and oxynitride atomic layer deposited films
1226Plasma enhanced atomic layer deposition of Ga2O3 thin films
1227Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
1228Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
1229Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
1230Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
1231Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1232Symmetrical Al2O3-based passivation layers for p- and n-type silicon
1233Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
1234Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1235XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1236Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
1237Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
1238Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates