O₂, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5	46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6	A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12	Advances in the fabrication of graphene transistors on flexible substrates
13	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20	ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30	Anti-stiction coating for mechanically tunable photonic crystal devices
31	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35	Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37	Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38	Band alignment of Al2O3 with (-201) β-Ga2O3
39	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40	Breakdown and Protection of ALD Moisture Barrier Thin Films
41	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42	Capacitance spectroscopy of gate-defined electronic lattices
43	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44	Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46	Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48	Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49	Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51	Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52	Charge effects of ultrafine FET with nanodot type floating gate
53	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56	Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
57	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
58	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
59	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
60	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
61	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
62	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
63	Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
64	Damage evaluation in graphene underlying atomic layer deposition dielectrics
65	DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
66	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
67	Densification of Thin Aluminum Oxide Films by Thermal Treatments
68	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69	Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71	DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74	Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76	Dynamic tuning of plasmon resonance in the visible using graphene
77	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
81	Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
82	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
83	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
84	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
85	Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
86	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
87	Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
88	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
89	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
90	Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
91	Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
92	Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
93	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
94	Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
95	Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
96	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
97	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
99	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
100	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
101	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
102	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
103	Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
104	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
105	Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
106	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
107	Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
108	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
109	Energy-enhanced atomic layer deposition for more process and precursor versatility
110	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
111	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
112	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
113	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
114	Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
115	Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
116	Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
117	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
118	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
119	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
120	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
121	Experimental verification of electro-refractive phase modulation in graphene
122	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
123	Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
124	Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
125	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
126	Fiber-matrix interface reinforcement using Atomic Layer Deposition
127	Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
128	Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
129	Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
130	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
131	First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
132	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
133	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
134	Flexible, light trapping substrates for organic photovoltaics
135	Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
136	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
137	Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
138	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
139	Hafnia and alumina on sulphur passivated germanium
140	High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
141	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
142	High-efficiency embedded transmission grating
143	High-Reflective Coatings For Ground and Space Based Applications
144	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
145	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
146	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
147	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
148	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
149	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
150	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
151	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
152	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
153	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
154	Improved understanding of recombination at the Si/Al2O3 interface
155	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
156	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
157	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
158	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
159	Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
160	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
161	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
162	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
163	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
164	Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
165	Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
166	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
167	Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
168	Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
169	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
170	Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
171	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
172	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
173	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
174	Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
175	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
176	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
177	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
178	Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
179	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
180	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
181	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
182	Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
183	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
184	Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
185	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
186	Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
187	Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
188	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
189	Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
190	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
191	Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
192	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
193	Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
194	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
195	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
196	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
197	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
198	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
199	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
200	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
201	Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
202	MANOS performance dependence on ALD Al2O3 oxidation source
203	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
204	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
205	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
206	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
207	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
208	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
209	Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
210	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
211	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
212	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
213	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
214	Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
215	N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
216	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
217	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
218	Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
219	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
220	Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
221	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
222	On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
223	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
224	On the equilibrium concentration of boron-oxygen defects in crystalline silicon
225	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
226	Optical display film as flexible and light trapping substrate for organic photovoltaics
227	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
228	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
229	Optimization of the Surface Structure on Black Silicon for Surface Passivation
230	Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
231	Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
232	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
233	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
234	Passivation effects of atomic-layer-deposited aluminum oxide
235	Patterned deposition by plasma enhanced spatial atomic layer deposition
236	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
237	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
238	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
239	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
240	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
241	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
242	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
243	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
244	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
245	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
246	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
247	Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
248	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
249	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
250	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
251	Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
252	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
253	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
254	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
255	Propagation Effects in Carbon Nanoelectronics
256	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
257	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
258	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
259	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
260	Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
261	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
262	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
263	Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
264	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
265	Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
266	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
267	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
268	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
269	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
270	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
271	Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
272	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
273	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
274	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
275	Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
276	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
277	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
278	Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
279	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
280	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
281	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
282	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
283	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
284	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
285	Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
286	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
287	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
288	Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
289	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
290	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
291	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
292	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
293	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
294	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
295	Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
296	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
297	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
298	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
299	Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
300	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
301	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
302	Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
303	Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
304	Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
305	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
306	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
307	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
308	Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
309	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
310	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
311	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
312	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
313	Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
314	Very high frequency plasma reactant for atomic layer deposition
315	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
316	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
317	Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
318	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
319	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
320	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
321	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
322	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
323	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
324	Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
325	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
326	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
327	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
328	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
329	Composite materials and nanoporous thin layers made by atomic layer deposition
330	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
331	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
332	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
333	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
334	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
335	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
336	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
337	Optical and Electrical Properties of AlxTi1-xO Films
338	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
339	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
340	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
341	Atomic Layer Deposition of Gold Metal
342	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
343	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
344	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
345	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
346	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
347	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
348	Plasma-enhanced atomic layer deposition of BaTiO3
349	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
350	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
351	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
352	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
353	Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
354	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
355	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
356	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
357	Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
358	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
359	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
360	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
361	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
362	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
363	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
364	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
365	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
366	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
367	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
368	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
369	Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
370	Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
371	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
372	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
373	Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
374	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
375	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
376	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
377	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
378	Plasma enhanced atomic layer deposition of Fe2O3 thin films
379	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
380	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
381	Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
382	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
383	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
384	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
385	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
386	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
387	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
388	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
389	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
390	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
391	Plasma enhanced atomic layer deposition of Ga2O3 thin films
392	Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
393	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
394	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
395	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
396	Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
397	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
398	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
399	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
400	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
401	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
402	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
403	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
404	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
405	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
406	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
407	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
408	A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
409	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
410	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
411	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
412	Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
413	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
414	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
415	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
416	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
417	Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
418	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
419	Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
420	Characteristics of HfO2 thin films grown by plasma atomic layer deposition
421	Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
422	Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
423	Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
424	Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
425	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
426	Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
427	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
428	Damage evaluation in graphene underlying atomic layer deposition dielectrics
429	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
430	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
431	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
432	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
433	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
434	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
435	Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
436	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
437	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
438	Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
439	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
440	Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
441	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
442	Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
443	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
444	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
445	Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
446	Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
447	Hafnia and alumina on sulphur passivated germanium
448	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
449	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
450	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
451	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
452	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
453	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
454	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
455	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
456	Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
457	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
458	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
459	Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
460	Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
461	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
462	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
463	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
464	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
465	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
466	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
467	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
468	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
469	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
470	Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
471	Optical properties and bandgap evolution of ALD HfSiOx films
472	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
473	PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
474	Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
475	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
476	Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
477	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
478	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
479	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
480	Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
481	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
482	Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
483	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
484	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
485	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
486	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
487	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
488	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
489	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
490	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
491	The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
492	The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
493	Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
494	Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
495	Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
496	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
497	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
498	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
499	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
500	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
501	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
502	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
503	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
504	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
505	Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
506	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
507	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
508	The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
509	Annealing behavior of ferroelectric Si-doped HfO2 thin films
510	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
511	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
512	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
513	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
514	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
515	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
516	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
517	Optical properties and bandgap evolution of ALD HfSiOx films
518	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
519	The effects of layering in ferroelectric Si-doped HfO2 thin films
520	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
521	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
522	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
523	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
524	Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
525	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
526	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
527	Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
528	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
529	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
530	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
531	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
532	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
533	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
534	Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
535	High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
536	Systematic efficiency study of line-doubled zone plates
537	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
538	IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
539	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
540	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
541	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
542	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
543	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
544	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
545	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
546	The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
547	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
548	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
549	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
550	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
551	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
552	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
553	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
554	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
555	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
556	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
557	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
558	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
559	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
560	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
561	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
562	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
563	The important role of water in growth of monolayer transition metal dichalcogenides
564	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
565	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
566	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
567	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
568	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
569	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
570	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
571	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
572	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
573	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
574	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
575	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
576	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
577	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
578	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
579	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
580	Encapsulation method for atom probe tomography analysis of nanoparticles
581	Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
582	Growth of silica nanowires in vacuum
583	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
584	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
585	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
586	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
587	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
588	Remote Plasma ALD of Platinum and Platinum Oxide Films
589	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
590	Room-Temperature Atomic Layer Deposition of Platinum
591	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
592	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
593	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
594	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
595	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
596	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
597	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
598	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
599	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
600	Remote Plasma ALD of Platinum and Platinum Oxide Films
601	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
602	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
603	Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
604	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
605	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
606	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
607	High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
608	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
609	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
610	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
611	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
612	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
613	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
614	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
615	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
616	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
617	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
618	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
619	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
620	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
621	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
622	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
623	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
624	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
625	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
626	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
627	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
628	A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
629	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
630	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
631	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
632	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
633	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
634	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
635	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
636	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
637	Atomic layer deposition of metal-oxide thin films on cellulose fibers
638	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
639	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
640	Breakdown and Protection of ALD Moisture Barrier Thin Films
641	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
642	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
643	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
644	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
645	Comparative study of ALD SiO2 thin films for optical applications
646	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
647	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
648	Designing high performance precursors for atomic layer deposition of silicon oxide
649	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
650	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
651	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
652	Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
653	Energy-enhanced atomic layer deposition for more process and precursor versatility
654	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
655	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
656	Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
657	Gate Insulator for High Mobility Oxide TFT
658	Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
659	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
660	High-Reflective Coatings For Ground and Space Based Applications
661	Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
662	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
663	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
664	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
665	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
666	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
667	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
668	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
669	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
670	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
671	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
672	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
673	Modal properties of a strip-loaded horizontal slot waveguide
674	Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
675	Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
676	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
677	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
678	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
679	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
680	Optical properties and bandgap evolution of ALD HfSiOx films
681	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
682	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
683	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
684	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
685	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
686	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
687	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
688	Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
689	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
690	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
691	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
692	Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
693	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
694	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
695	Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
696	Single-Cell Photonic Nanocavity Probes
697	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
698	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
699	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
700	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
701	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
702	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
703	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
704	Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
705	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
706	Trapped charge densities in Al2O3-based silicon surface passivation layers
707	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
708	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
709	A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
710	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
711	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
712	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
713	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
714	Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
715	Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
716	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
717	In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
718	Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
719	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
720	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
721	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
722	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
723	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
724	Surface and sensing properties of PE-ALD SnO2 thin film
725	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
726	Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
727	Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
728	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
729	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
730	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
731	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
732	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
733	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
734	Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
735	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
736	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
737	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
738	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
739	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
740	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
741	Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
742	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
743	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
744	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
745	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
746	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
747	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
748	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
749	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
750	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
751	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
752	Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
753	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
754	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
755	Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
756	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
757	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
758	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
759	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
760	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
761	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
762	Trilayer Tunnel Selectors for Memristor Memory Cells
763	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
764	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
765	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
766	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
767	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
768	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
769	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
770	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
771	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
772	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
773	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
774	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
775	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
776	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
777	Biofilm prevention on cochlear implants
778	Bipolar resistive switching in amorphous titanium oxide thin film
779	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
780	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
781	Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
782	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
783	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
784	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
785	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
786	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
787	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
788	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
789	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
790	Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
791	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
792	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
793	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
794	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
795	Energy-enhanced atomic layer deposition for more process and precursor versatility
796	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
797	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
798	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
799	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
800	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
801	Flexible Memristive Memory Array on Plastic Substrates
802	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
803	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
804	Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
805	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
806	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
807	Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
808	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
809	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
810	High-efficiency embedded transmission grating
811	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
812	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
813	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
814	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
815	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
816	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
817	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
818	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
819	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
820	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
821	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
822	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
823	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
824	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
825	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
826	Low temperature temporal and spatial atomic layer deposition of TiO2 films
827	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
828	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
829	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
830	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
831	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
832	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
833	Oxygen migration in TiO2-based higher-k gate stacks
834	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
835	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
836	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
837	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
838	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
839	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
840	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
841	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
842	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
843	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
844	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
845	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
846	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
847	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
848	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
849	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
850	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
851	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
852	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
853	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
854	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
855	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
856	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
857	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
858	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
859	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
860	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
861	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
862	Transient characterization of the electroforming process in TiO2 based resistive switching devices
863	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
864	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
865	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
866	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
867	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
868	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
869	Optical and Electrical Properties of TixSi1-xOy Films
870	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
871	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
872	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
873	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
874	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
875	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
876	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
877	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
878	In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
879	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
880	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
881	The important role of water in growth of monolayer transition metal dichalcogenides
882	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
883	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
884	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
885	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
886	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
887	Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
888	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
889	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
890	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
891	Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
892	Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
893	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
894	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
895	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
896	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
897	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
898	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
899	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
900	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
901	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
902	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
903	Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
904	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
905	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
906	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
907	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
908	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
909	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
910	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
911	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
912	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
913	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
914	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
915	Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
916	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
917	Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
918	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
919	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
920	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
921	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
922	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
923	Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
924	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
925	Spectroscopy and control of near-surface defects in conductive thin film ZnO
926	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
927	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
928	The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
929	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
930	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
931	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
932	Top-down fabricated ZnO nanowire transistors for application in biosensors
933	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
934	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
935	ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
936	Plasma-enhanced atomic layer deposition of zinc phosphate
937	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
938	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
939	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
940	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
941	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
942	Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
943	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
944	Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
945	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
946	Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
947	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
948	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
949	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
950	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
951	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
952	Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
953	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
954	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
955	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
956	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
957	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
958	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
959	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
960	PEALD ZrO2 Films Deposition on TiN and Si Substrates
961	Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
962	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
963	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
964	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
965	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
966	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
967	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
968	The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
969	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
970	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
971	Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
972	ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
973	ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
974	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
975	Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
976	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
977	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
978	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

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