O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
11Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
12Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
13Advances in the fabrication of graphene transistors on flexible substrates
14Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
15Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
16Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
17Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
18Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
19Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
20Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
21ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
22AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
23AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
24AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
25Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
26Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
27Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
28An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
29Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
30Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
31Anti-stiction coating for mechanically tunable photonic crystal devices
32Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
33Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
34Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
35Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
36Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
37Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
38Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
39Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
40Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
41Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
42Band alignment of Al2O3 with (-201) β-Ga2O3
43Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
44Breakdown and Protection of ALD Moisture Barrier Thin Films
45Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
46Capacitance spectroscopy of gate-defined electronic lattices
47Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
48Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
49Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
50Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
51Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
52Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
53Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
54Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
55Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
56Charge effects of ultrafine FET with nanodot type floating gate
57Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
58Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
59Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
60Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
61Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
62Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
63Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
64Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
65Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
66Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
67Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
68Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
69Damage evaluation in graphene underlying atomic layer deposition dielectrics
70DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
71Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
72Densification of Thin Aluminum Oxide Films by Thermal Treatments
73Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
74Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
75Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
76DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
77Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
78Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
79Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
80Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
81Dynamic tuning of plasmon resonance in the visible using graphene
82Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
83Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
84Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
85Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
86Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
87Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
88Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
89Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
90Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
91Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
92Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
93Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
94Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
95Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
96Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
97Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
98Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
99Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
100Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
101Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
102Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
103Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
104Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
105Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
106Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
107Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
108Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
109Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
110Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
111Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
112Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
113Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
114Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
115Energy-enhanced atomic layer deposition for more process and precursor versatility
116Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
117Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
118Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
119Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
120Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
121Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
122Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
123Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
124Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
125Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
126Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
127Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
128Experimental verification of electro-refractive phase modulation in graphene
129Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
130Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
131Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
132Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
133Fiber-matrix interface reinforcement using Atomic Layer Deposition
134Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
135Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
136Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
137Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
138Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
139First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
140Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
141Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
142Flexible, light trapping substrates for organic photovoltaics
143Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
144Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
145Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
146Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
147Hafnia and alumina on sulphur passivated germanium
148High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
149High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
150High-efficiency embedded transmission grating
151High-Reflective Coatings For Ground and Space Based Applications
152High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
153Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
154Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
155Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
156Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
157Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
158Impact of interface materials on side permeation in indirect encapsulation of organic electronics
159Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
160Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
161Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
162Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
163Improved understanding of recombination at the Si/Al2O3 interface
164Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
165Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
166Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
167Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
168Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
169In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
170In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
171In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
172Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
173Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
174Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
175Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
176Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
177Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
178Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
179Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
180Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
181Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
182Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
183Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
184Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
185Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
186Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
187Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
188Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
189Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
190Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
191Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
192Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
193Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
194Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
195Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
196Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
197Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
198Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
199Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
200Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
201Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
202Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
203Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
204Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
205Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
206Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
207Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
208Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
209Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
210Lithium-Iron (III) Fluoride Battery with Double Surface Protection
211Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
212Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
213Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
214Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
215Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
216Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
217Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
218Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
219MANOS performance dependence on ALD Al2O3 oxidation source
220Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
221Mechanical properties of thin-film Parylene-metal-Parylene devices
222Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
223Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
224Method of Fabrication for Encapsulated Polarizing Resonant Gratings
225Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
226Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
227Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
228Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
229Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
230Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
231Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
232MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
233Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
234N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
235Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
236Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
237Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
238Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
239Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
240Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
241Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
242On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
243On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
244On the equilibrium concentration of boron-oxygen defects in crystalline silicon
245On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
246On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
247Optical display film as flexible and light trapping substrate for organic photovoltaics
248Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
249Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
250Optimization of the Surface Structure on Black Silicon for Surface Passivation
251Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
252Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
253Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
254Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
255Passivation effects of atomic-layer-deposited aluminum oxide
256Patterned deposition by plasma enhanced spatial atomic layer deposition
257PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
258Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
259Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
260Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
261Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
262Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
263Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
264Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
265Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
266Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
267Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
268Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
269Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
270Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
271Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
272Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
273Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
274Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
275Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
276Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
277Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
278Propagation Effects in Carbon Nanoelectronics
279Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
280Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
281Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
282Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
283Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
284Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
285Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
286Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
287Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
288Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
289Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
290Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
291Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
292Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
293Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
294Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
295Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
296Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
297Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
298Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
299Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
300Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
301Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
302Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
303Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
304Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
305Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
306Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
307Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
308Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
309Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
310Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
311Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
312Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
313Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
314The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
315The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
316The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
317Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
318Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
319Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
320Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
321TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
322Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
323Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
324Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
325Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
326Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
327Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
328Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
329Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
330Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
331Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
332Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
333Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
334Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
335Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
336Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
337Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
338Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
339Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
340Very high frequency plasma reactant for atomic layer deposition
341Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
342Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
343Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
344Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
345Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
346Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
347Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
348Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
349Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
350Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
351Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
352Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
353Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
354Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
355Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
356Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
357Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
358Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
359Composite materials and nanoporous thin layers made by atomic layer deposition
360Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
361Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
362Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
363Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
364Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
365Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
366Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
367Optical and Electrical Properties of AlxTi1-xO Films
368Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
369Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
370Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
371Atomic Layer Deposition of Gold Metal
372Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
373Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
374Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
375Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
376Plasma-enhanced atomic layer deposition of BaTiO3
377High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
378Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
379Plasma-enhanced atomic layer deposition of BaTiO3
380Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
381Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
382Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
383Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
384Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
385Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
386A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
387Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
388Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
389Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
390Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
391Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
392Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
393Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
394Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
395Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
396Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
397Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
398Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
399Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
400Radical Enhanced Atomic Layer Deposition of Metals and Oxides
401Radical Enhanced Atomic Layer Deposition of Metals and Oxides
402Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
403Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
404Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
405Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
406Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
407Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
408Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
409Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
410Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
411Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
412Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
413Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
414Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
415Plasma enhanced atomic layer deposition of Fe2O3 thin films
416Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
417Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
418Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
419The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
420Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
421Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
422Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
423Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
424Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
425Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
426Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
427Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
428Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
429Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
430Plasma enhanced atomic layer deposition of Ga2O3 thin films
431Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
432Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
433RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
434Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
435Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
436Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
437Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
438Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
439Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
440Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
441Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
442Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
443Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
444Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
445Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
446Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
447A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
448An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
449Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
450Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
451Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
452Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
453Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
454AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
455Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
456Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
457Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
458Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
459Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
460Characteristics of HfO2 thin films grown by plasma atomic layer deposition
461Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
462Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
463Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
464Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
465Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
466Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
467Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
468Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
469Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
470Damage evaluation in graphene underlying atomic layer deposition dielectrics
471Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
472Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
473Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
474Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
475Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
476Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
477Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
478Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
479Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
480Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
481Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
482Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
483Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
484Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
485Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
486Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
487Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
488Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
489Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
490Hafnia and alumina on sulphur passivated germanium
491HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
492Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
493Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
494Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
495Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
496In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
497Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
498Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
499Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
500Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
501Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
502Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
503Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
504Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
505Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
506Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
507Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
508Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
509Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
510Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
511Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
512Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
513Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
514Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
515Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
516On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
517Optical properties and bandgap evolution of ALD HfSiOx films
518Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
519PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
520Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
521Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
522Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
523Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
524Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
525Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
526Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
527Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
528Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
529Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
530Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
531Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
532Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
533Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
534The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
535The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
536The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
537The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
538The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
539Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
540Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
541Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
542Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
543Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
544Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
545Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
546Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
547Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
548Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
549Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
550Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
551Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
552HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
553Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
554The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
555Annealing behavior of ferroelectric Si-doped HfO2 thin films
556Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
557Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
558Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
559Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
560Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
561Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
562Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
563Optical properties and bandgap evolution of ALD HfSiOx films
564TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
565The effects of layering in ferroelectric Si-doped HfO2 thin films
566Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
567Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
568Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
569Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
570New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
571Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
572Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
573All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
574Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
575Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
576Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
577Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
578High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
579High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
580Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
581Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
582On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
583Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
584Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
585High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
586Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
587Systematic efficiency study of line-doubled zone plates
588TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
589IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
590Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
591Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
592Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
593Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
594Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
595Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
596Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
597The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
598XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
599Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
600Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
601Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
602Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
603Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
604Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
605Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
606Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
607Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
608Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
609Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
610In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
611Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
612Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
613Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
614Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
615Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
616Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
617Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
618Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
619Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
620The important role of water in growth of monolayer transition metal dichalcogenides
621Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
622Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
623Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
624Radical Enhanced Atomic Layer Deposition of Metals and Oxides
625Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
626Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
627Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
628Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
629Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
630Radical Enhanced Atomic Layer Deposition of Metals and Oxides
631Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
632Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
633Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
634Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
635Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
636Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
637Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
638Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
639Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
640Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
641Encapsulation method for atom probe tomography analysis of nanoparticles
642Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
643Growth of silica nanowires in vacuum
644In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
645Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
646Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
647Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
648Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
649Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
650Remote Plasma ALD of Platinum and Platinum Oxide Films
651Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
652Room-Temperature Atomic Layer Deposition of Platinum
653Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
654Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
655Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
656Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
657Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
658Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
659Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
660Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
661The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
662Remote Plasma ALD of Platinum and Platinum Oxide Films
663Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
664Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
665Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
666Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
667Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
668Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
669High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
670Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
671In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
672Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
673Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
674Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
675Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
676Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
677(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
678ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
679Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
680Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
681Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
682Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
683Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
684Radical Enhanced Atomic Layer Deposition of Metals and Oxides
685Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
686Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
687Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
688Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
689'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
690A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
691A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
692Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
693Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
694Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
695An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
696Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
697Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
698Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
699Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
700Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
701Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
702Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
703Atomic layer deposition of metal-oxide thin films on cellulose fibers
704Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
705Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
706Breakdown and Protection of ALD Moisture Barrier Thin Films
707Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
708Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
709Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
710Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
711Comparative study of ALD SiO2 thin films for optical applications
712Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
713Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
714Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
715Designing high performance precursors for atomic layer deposition of silicon oxide
716Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
717Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
718Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
719Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
720Energy-enhanced atomic layer deposition for more process and precursor versatility
721Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
722Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
723Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
724Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
725Gate Insulator for High Mobility Oxide TFT
726Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
727High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
728High-Reflective Coatings For Ground and Space Based Applications
729Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
730Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
731Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
732Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
733Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
734Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
735Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
736Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
737Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
738Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
739Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
740Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
741Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
742Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
743Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
744Modal properties of a strip-loaded horizontal slot waveguide
745Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
746Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
747Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
748Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
749Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
750On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
751On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
752Optical properties and bandgap evolution of ALD HfSiOx films
753PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
754Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
755Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
756Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
757Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
758Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
759Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
760Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
761Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
762Radical Enhanced Atomic Layer Deposition of Metals and Oxides
763Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
764Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
765Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
766Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
767Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
768Single-Cell Photonic Nanocavity Probes
769Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
770Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
771Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
772Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
773Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
774Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
775Symmetrical Al2O3-based passivation layers for p- and n-type silicon
776Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
777Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
778Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
779Trapped charge densities in Al2O3-based silicon surface passivation layers
780Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
781Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
782A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
783Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
784Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
785Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
786Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
787Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
788Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
789Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
790In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
791Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
792Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
793Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
794Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
795SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
796Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
797Surface and sensing properties of PE-ALD SnO2 thin film
798Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
799Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
800Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
801Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
802Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
803Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
804Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
805Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
806Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
807Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
808Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
809Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
810Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
811Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
812Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
813Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
814Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
815Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
816Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
817Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
818Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
819Radical Enhanced Atomic Layer Deposition of Metals and Oxides
820Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
821Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
822Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
823Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
824Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
825Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
826Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
827Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
828Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
829Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
830Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
831Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
832Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
833Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
834Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
835Topographically selective deposition
836Trilayer Tunnel Selectors for Memristor Memory Cells
837Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
838Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
839A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
840Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
841An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
842Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
843Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
844Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
845Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
846Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
847Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
848Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
849Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
850Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
851Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
852Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
853Biofilm prevention on cochlear implants
854Bipolar resistive switching in amorphous titanium oxide thin film
855Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
856Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
857Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
858Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
859Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
860Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
861Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
862Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
863Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
864Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
865Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
866Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
867Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
868Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
869Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
870Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
871Energy-enhanced atomic layer deposition for more process and precursor versatility
872Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
873Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
874Epitaxial 1D electron transport layers for high-performance perovskite solar cells
875Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
876Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
877Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
878Flexible Memristive Memory Array on Plastic Substrates
879Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
880Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
881Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
882Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
883Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
884Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
885Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
886High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
887High-efficiency embedded transmission grating
888Highly efficient and bending durable perovskite solar cells: toward a wearable power source
889Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
890Impact of interface materials on side permeation in indirect encapsulation of organic electronics
891Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
892Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
893In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
894In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
895In-gap states in titanium dioxide and oxynitride atomic layer deposited films
896Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
897Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
898Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
899Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
900Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
901Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
902Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
903Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
904Lithium-Iron (III) Fluoride Battery with Double Surface Protection
905Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
906Low temperature temporal and spatial atomic layer deposition of TiO2 films
907Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
908Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
909Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
910MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
911Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
912On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
913Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
914Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
915Oxygen migration in TiO2-based higher-k gate stacks
916Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
917Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
918Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
919Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
920Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
921Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
922Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
923Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
924Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
925Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
926Plasma-enhanced atomic layer deposition of BaTiO3
927Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
928Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
929Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
930Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
931Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
932Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
933Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
934Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
935Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
936Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
937Study on the resistive switching time of TiO2 thin films
938Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
939Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
940Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
941Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
942The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
943The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
944The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
945The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
946The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
947Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
948Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
949TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
950Transient characterization of the electroforming process in TiO2 based resistive switching devices
951Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
952Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
953X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
954Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
955Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
956Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
957Optical and Electrical Properties of TixSi1-xOy Films
958Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
959Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
960Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
961Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
962Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
963Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
964Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
965Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
966Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
967Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
968In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
969Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
970Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
971Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
972The important role of water in growth of monolayer transition metal dichalcogenides
973Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
974Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
975Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
976Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
977Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
978Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
979Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
980Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
981Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
982Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
983Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
984Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
985Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
986Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
987Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
988All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
989Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
990Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
991Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
992Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
993Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
994Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
995Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
996Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
997Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
998Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
999Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1000Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1001Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1002Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1003Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1004Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1005Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1006Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1007Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1008Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1009Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1010Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1011Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1012Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1013Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1014Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1015Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1016Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1017Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1018Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1019Spectroscopy and control of near-surface defects in conductive thin film ZnO
1020Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1021Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1022The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1023The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1024The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1025The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1026The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1027Top-down fabricated ZnO nanowire transistors for application in biosensors
1028Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1029Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1030Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1031ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1032Plasma-enhanced atomic layer deposition of zinc phosphate
1033Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1034Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1035Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1036Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1037Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1038Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1039Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1040Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1041Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1042Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1043Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1044Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1045Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1046Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1047High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1048Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1049Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1050Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1051Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1052Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1053Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1054Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1055Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1056Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1057PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1058PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1059PEALD ZrO2 Films Deposition on TiN and Si Substrates
1060Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1061Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1062Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1063Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1064Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1065Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1066Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1067Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1068The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1069The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1070Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1071Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1072XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1073ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1074ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1075ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1076Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1077Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1078Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1079Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation