O₂, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5	46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6	A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12	Advances in the fabrication of graphene transistors on flexible substrates
13	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20	ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30	Anti-stiction coating for mechanically tunable photonic crystal devices
31	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35	Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37	Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38	Band alignment of Al2O3 with (-201) β-Ga2O3
39	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40	Breakdown and Protection of ALD Moisture Barrier Thin Films
41	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42	Capacitance spectroscopy of gate-defined electronic lattices
43	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44	Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46	Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48	Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49	Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51	Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52	Charge effects of ultrafine FET with nanodot type floating gate
53	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
60	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
61	Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
62	Damage evaluation in graphene underlying atomic layer deposition dielectrics
63	DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
64	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
65	Demonstration of flexible thin film transistors with GaN channels
66	Densification of Thin Aluminum Oxide Films by Thermal Treatments
67	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
68	Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
69	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
70	DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
71	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
72	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
73	Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
74	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
75	Dynamic tuning of plasmon resonance in the visible using graphene
76	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
77	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
78	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
79	Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
80	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
81	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
82	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
83	Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
84	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
85	Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
86	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
87	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
88	Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
89	Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
90	Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
91	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
92	Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
93	Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
94	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
95	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
96	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
97	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
98	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
99	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
100	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
101	Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
102	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
103	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
104	Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
105	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
106	Energy-enhanced atomic layer deposition for more process and precursor versatility
107	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
108	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
109	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
110	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
111	Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
112	Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
113	Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
114	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
115	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
116	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
117	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
118	Experimental verification of electro-refractive phase modulation in graphene
119	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
120	Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
121	Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
122	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
123	Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
124	Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
125	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
126	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
127	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
128	Flexible, light trapping substrates for organic photovoltaics
129	Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
130	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
131	Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
132	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
133	Hafnia and alumina on sulphur passivated germanium
134	High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
135	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
136	High-efficiency embedded transmission grating
137	High-Reflective Coatings For Ground and Space Based Applications
138	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
139	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
140	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
141	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
142	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
143	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
144	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
145	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
146	Improved understanding of recombination at the Si/Al2O3 interface
147	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
148	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
149	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
150	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
151	Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
152	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
153	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
154	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
155	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
156	Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
157	Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
158	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
159	Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
160	Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
161	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
162	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
163	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
164	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
165	Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
166	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
167	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
168	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
169	Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
170	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
171	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
172	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
173	Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
174	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
175	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
176	Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
177	Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
178	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
179	Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
180	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
181	Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
182	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
183	Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
184	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
185	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
186	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
187	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
188	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
189	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
190	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
191	Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
192	MANOS performance dependence on ALD Al2O3 oxidation source
193	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
194	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
195	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
196	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
197	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
198	Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
199	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
200	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
201	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
202	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
203	Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
204	N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
205	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
206	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
207	Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
208	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
209	Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
210	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
211	On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
212	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
213	On the equilibrium concentration of boron-oxygen defects in crystalline silicon
214	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
215	Optical display film as flexible and light trapping substrate for organic photovoltaics
216	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
217	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
218	Optimization of the Surface Structure on Black Silicon for Surface Passivation
219	Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
220	Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
221	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
222	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
223	Passivation effects of atomic-layer-deposited aluminum oxide
224	Patterned deposition by plasma enhanced spatial atomic layer deposition
225	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
226	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
227	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
228	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
229	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
230	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
231	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
232	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
233	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
234	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
235	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
236	Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
237	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
238	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
239	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
240	Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
241	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
242	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
243	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
244	Propagation Effects in Carbon Nanoelectronics
245	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
246	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
247	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
248	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
249	Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
250	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
251	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
252	Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
253	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
254	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
255	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
256	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
257	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
258	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
259	Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
260	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
261	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
262	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
263	Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
264	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
265	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
266	Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
267	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
268	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
269	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
270	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
271	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
272	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
273	Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
274	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
275	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
276	Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
277	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
278	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
279	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
280	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
281	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
282	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
283	Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
284	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
285	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
286	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
287	Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
288	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
289	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
290	Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
291	Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
292	Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
293	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
294	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
295	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
296	Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
297	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
298	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
299	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
300	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
301	Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
302	Very high frequency plasma reactant for atomic layer deposition
303	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
304	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
305	Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
306	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
307	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
308	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
309	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
310	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
311	Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
312	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
313	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
314	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
315	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
316	Composite materials and nanoporous thin layers made by atomic layer deposition
317	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
318	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
319	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
320	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
321	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
322	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
323	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
324	Optical and Electrical Properties of AlxTi1-xO Films
325	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
326	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
327	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
328	Atomic Layer Deposition of Gold Metal
329	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
330	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
331	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
332	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
333	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
334	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
335	Plasma-enhanced atomic layer deposition of BaTiO3
336	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
337	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
338	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
339	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
340	Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
341	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
342	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
343	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
344	Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
345	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
346	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
347	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
348	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
349	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
350	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
351	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
352	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
353	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
354	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
355	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
356	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
357	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
358	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
359	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
360	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
361	Plasma enhanced atomic layer deposition of Fe2O3 thin films
362	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
363	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
364	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
365	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
366	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
367	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
368	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
369	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
370	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
371	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
372	Plasma enhanced atomic layer deposition of Ga2O3 thin films
373	Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
374	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
375	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
376	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
377	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
378	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
379	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
380	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
381	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
382	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
383	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
384	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
385	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
386	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
387	A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
388	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
389	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
390	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
391	Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
392	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
393	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
394	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
395	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
396	Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
397	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
398	Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
399	Characteristics of HfO2 thin films grown by plasma atomic layer deposition
400	Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
401	Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
402	Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
403	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
404	Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
405	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
406	Damage evaluation in graphene underlying atomic layer deposition dielectrics
407	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
408	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
409	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
410	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
411	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
412	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
413	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
414	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
415	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
416	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
417	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
418	Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
419	Hafnia and alumina on sulphur passivated germanium
420	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
421	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
422	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
423	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
424	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
425	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
426	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
427	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
428	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
429	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
430	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
431	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
432	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
433	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
434	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
435	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
436	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
437	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
438	Optical properties and bandgap evolution of ALD HfSiOx films
439	Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
440	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
441	Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
442	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
443	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
444	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
445	Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
446	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
447	Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
448	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
449	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
450	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
451	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
452	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
453	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
454	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
455	The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
456	Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
457	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
458	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
459	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
460	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
461	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
462	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
463	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
464	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
465	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
466	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
467	Annealing behavior of ferroelectric Si-doped HfO2 thin films
468	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
469	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
470	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
471	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
472	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
473	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
474	Optical properties and bandgap evolution of ALD HfSiOx films
475	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
476	The effects of layering in ferroelectric Si-doped HfO2 thin films
477	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
478	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
479	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
480	Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
481	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
482	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
483	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
484	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
485	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
486	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
487	Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
488	High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
489	Systematic efficiency study of line-doubled zone plates
490	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
491	IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
492	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
493	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
494	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
495	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
496	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
497	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
498	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
499	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
500	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
501	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
502	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
503	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
504	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
505	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
506	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
507	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
508	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
509	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
510	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
511	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
512	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
513	The important role of water in growth of monolayer transition metal dichalcogenides
514	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
515	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
516	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
517	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
518	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
519	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
520	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
521	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
522	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
523	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
524	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
525	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
526	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
527	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
528	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
529	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
530	Encapsulation method for atom probe tomography analysis of nanoparticles
531	Growth of silica nanowires in vacuum
532	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
533	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
534	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
535	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
536	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
537	Remote Plasma ALD of Platinum and Platinum Oxide Films
538	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
539	Room-Temperature Atomic Layer Deposition of Platinum
540	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
541	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
542	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
543	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
544	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
545	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
546	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
547	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
548	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
549	Remote Plasma ALD of Platinum and Platinum Oxide Films
550	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
551	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
552	Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
553	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
554	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
555	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
556	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
557	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
558	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
559	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
560	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
561	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
562	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
563	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
564	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
565	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
566	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
567	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
568	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
569	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
570	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
571	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
572	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
573	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
574	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
575	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
576	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
577	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
578	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
579	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
580	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
581	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
582	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
583	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
584	Atomic layer deposition of metal-oxide thin films on cellulose fibers
585	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
586	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
587	Breakdown and Protection of ALD Moisture Barrier Thin Films
588	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
589	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
590	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
591	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
592	Comparative study of ALD SiO2 thin films for optical applications
593	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
594	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
595	Designing high performance precursors for atomic layer deposition of silicon oxide
596	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
597	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
598	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
599	Energy-enhanced atomic layer deposition for more process and precursor versatility
600	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
601	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
602	Gate Insulator for High Mobility Oxide TFT
603	Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
604	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
605	High-Reflective Coatings For Ground and Space Based Applications
606	Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
607	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
608	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
609	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
610	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
611	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
612	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
613	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
614	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
615	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
616	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
617	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
618	Modal properties of a strip-loaded horizontal slot waveguide
619	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
620	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
621	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
622	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
623	Optical properties and bandgap evolution of ALD HfSiOx films
624	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
625	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
626	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
627	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
628	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
629	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
630	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
631	Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
632	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
633	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
634	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
635	Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
636	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
637	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
638	Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
639	Single-Cell Photonic Nanocavity Probes
640	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
641	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
642	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
643	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
644	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
645	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
646	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
647	Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
648	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
649	Trapped charge densities in Al2O3-based silicon surface passivation layers
650	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
651	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
652	A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
653	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
654	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
655	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
656	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
657	Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
658	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
659	Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
660	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
661	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
662	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
663	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
664	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
665	Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
666	Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
667	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
668	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
669	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
670	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
671	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
672	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
673	Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
674	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
675	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
676	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
677	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
678	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
679	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
680	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
681	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
682	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
683	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
684	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
685	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
686	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
687	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
688	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
689	Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
690	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
691	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
692	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
693	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
694	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
695	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
696	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
697	Trilayer Tunnel Selectors for Memristor Memory Cells
698	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
699	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
700	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
701	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
702	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
703	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
704	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
705	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
706	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
707	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
708	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
709	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
710	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
711	Biofilm prevention on cochlear implants
712	Bipolar resistive switching in amorphous titanium oxide thin film
713	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
714	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
715	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
716	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
717	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
718	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
719	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
720	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
721	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
722	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
723	Energy-enhanced atomic layer deposition for more process and precursor versatility
724	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
725	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
726	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
727	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
728	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
729	Flexible Memristive Memory Array on Plastic Substrates
730	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
731	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
732	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
733	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
734	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
735	High-efficiency embedded transmission grating
736	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
737	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
738	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
739	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
740	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
741	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
742	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
743	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
744	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
745	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
746	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
747	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
748	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
749	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
750	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
751	Low temperature temporal and spatial atomic layer deposition of TiO2 films
752	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
753	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
754	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
755	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
756	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
757	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
758	Oxygen migration in TiO2-based higher-k gate stacks
759	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
760	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
761	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
762	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
763	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
764	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
765	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
766	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
767	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
768	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
769	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
770	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
771	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
772	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
773	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
774	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
775	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
776	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
777	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
778	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
779	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
780	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
781	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
782	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
783	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
784	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
785	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
786	Transient characterization of the electroforming process in TiO2 based resistive switching devices
787	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
788	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
789	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
790	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
791	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
792	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
793	Optical and Electrical Properties of TixSi1-xOy Films
794	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
795	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
796	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
797	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
798	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
799	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
800	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
801	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
802	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
803	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
804	The important role of water in growth of monolayer transition metal dichalcogenides
805	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
806	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
807	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
808	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
809	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
810	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
811	Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
812	Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
813	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
814	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
815	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
816	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
817	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
818	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
819	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
820	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
821	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
822	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
823	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
824	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
825	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
826	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
827	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
828	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
829	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
830	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
831	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
832	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
833	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
834	Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
835	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
836	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
837	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
838	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
839	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
840	Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
841	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
842	Spectroscopy and control of near-surface defects in conductive thin film ZnO
843	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
844	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
845	The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
846	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
847	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
848	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
849	Top-down fabricated ZnO nanowire transistors for application in biosensors
850	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
851	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
852	Plasma-enhanced atomic layer deposition of zinc phosphate
853	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
854	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
855	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
856	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
857	Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
858	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
859	Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
860	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
861	Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
862	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
863	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
864	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
865	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
866	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
867	Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
868	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
869	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
870	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
871	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
872	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
873	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
874	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
875	PEALD ZrO2 Films Deposition on TiN and Si Substrates
876	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
877	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
878	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
879	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
880	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
881	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
882	The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
883	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
884	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
885	Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
886	ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
887	ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
888	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
889	Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
890	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
891	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
892	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

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