O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
2Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
3Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
4Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
6Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
7Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
8Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
9Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
10Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
11Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
12The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
13Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
14Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
15Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
16Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
17Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
18Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
19Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
20Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
21Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
22PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
23Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
24Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
25Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
26Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
27Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
28DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
29Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
30Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
31Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
32Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
33Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
34Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
35The important role of water in growth of monolayer transition metal dichalcogenides
36Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
37Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
38Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
39Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
40Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
41Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
42Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
43Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
44Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
45High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
46ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
47Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
48Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
49Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
50Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
51Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
52Radical Enhanced Atomic Layer Deposition of Metals and Oxides
53Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
54Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
55Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
5646-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
57Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
58In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
59Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
60Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
61Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
62Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
63Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
64Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
65PEALD ZrO2 Films Deposition on TiN and Si Substrates
66Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
67Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
68Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
69Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
70Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
71The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
72Atomic Layer Deposition of Gold Metal
73Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
74Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
75Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
76Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
77Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
78Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
79Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
80Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
81Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
82Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
83Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
84Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
85Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
86Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
87Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
88Plasma-enhanced atomic layer deposition of BaTiO3
89Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
90Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
91(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
92Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
93Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
94Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
95Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
96Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
97Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
98Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
99Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
100Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
101The important role of water in growth of monolayer transition metal dichalcogenides
102Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
103The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
104Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
105Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
106Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
107Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
108Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
109In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
110Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
111Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
112ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
113Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
114Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
115Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
116The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
117Annealing behavior of ferroelectric Si-doped HfO2 thin films
118Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
119Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
120Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
121Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
122Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
123Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
124On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
125Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
126Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
127Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
128Topographically selective deposition
129Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
130Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
131Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
132Gate Insulator for High Mobility Oxide TFT
133Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
134Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
135Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
136Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
137Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
138The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
139Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
140Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
141Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
142Residual stress study of thin films deposited by atomic layer deposition
143Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
144Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
145Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
146Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
147Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
148Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
149Room-Temperature Atomic Layer Deposition of Platinum
150Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
151Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
152Radical Enhanced Atomic Layer Deposition of Metals and Oxides
153Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
154Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
155Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
156Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
157Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
158Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
159Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
160Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
161Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
162High-efficiency embedded transmission grating
163The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
164Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
165Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
166Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
167Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
168Hafnia and alumina on sulphur passivated germanium
169Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
170Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
171Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
172Energy-enhanced atomic layer deposition for more process and precursor versatility
173Nonvolatile Capacitive Crossbar Array for In-Memory Computing
174Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
175A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
176Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
177Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
178Band alignment of Al2O3 with (-201) β-Ga2O3
179Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
180Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
181Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
182On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
183A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
184Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
185Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
186Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
187Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
188Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
189Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
190Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
191Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
192Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
193Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
194Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
195Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
196Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
197Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
198Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
199The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
200Improved understanding of recombination at the Si/Al2O3 interface
201AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
202Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
203Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
204Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
205The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
206Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
207Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
208Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
209Composite materials and nanoporous thin layers made by atomic layer deposition
210Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
211Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
212Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
213Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
214Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
215Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
216Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
217Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
218Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
219Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
220Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
221Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
222Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
223Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
224Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
225Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
226Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
227Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
228Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
229MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
230Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
231Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
232Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
233Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
234Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
235Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
236Densification of Thin Aluminum Oxide Films by Thermal Treatments
237Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
238Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
239Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
240Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
241Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
242Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
243Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
244Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
245Energy-enhanced atomic layer deposition for more process and precursor versatility
246Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
247Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
248Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
249Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
250Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
251Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
252Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
253Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
254Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
255High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
256Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
257Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
258Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
259Charge effects of ultrafine FET with nanodot type floating gate
260Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
261Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
262Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
263Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
264Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
265Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
266The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
267Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
268Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
269Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
270Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
271Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
272Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
273Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
274Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
275Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
276Plasma-enhanced atomic layer deposition of BaTiO3
277Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
278Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
279Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
280Plasma enhanced atomic layer deposition of Ga2O3 thin films
281Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
282Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
283Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
284Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
285Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
286Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
287Experimental verification of electro-refractive phase modulation in graphene
288Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
289Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
290Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
291Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
292Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
293Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
294Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
295Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
296Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
297Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
298Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
299Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
300Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
301AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
302Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
303Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
304Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
305Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
306Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
307Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
308Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
309Top-down fabricated ZnO nanowire transistors for application in biosensors
310Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
311Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
312Optical properties and bandgap evolution of ALD HfSiOx films
313Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
314A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
315Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
316Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
317Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
318Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
319Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
320Study on the resistive switching time of TiO2 thin films
321Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
322Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
323Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
324Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
325Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
326Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
327Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
328Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
329Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
330Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
331Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
332Bipolar resistive switching in amorphous titanium oxide thin film
333Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
334Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
335High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
336Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
337Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
338The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
339Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
340Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
341Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
342Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
343Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
344Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
345Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
346Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
347Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
348Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
349Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
350Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
351In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
352Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
353Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
354Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
355Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
356Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
357Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
358Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
359Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
360Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
361Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
362Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
363Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
364Designing high performance precursors for atomic layer deposition of silicon oxide
365Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
366Atomic layer deposition of YMnO3 thin films
367Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
368New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
369Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
370Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
371Flexible, light trapping substrates for organic photovoltaics
372Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
373Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
374AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
375Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
376On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
377Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
378Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
379Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
380Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
381Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
382Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
383Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
384Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
385Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
386Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
387Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
388Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
389Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
390Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
391On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
392Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
393Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
394Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
395Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
396Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
397Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
3983D structure evolution using metastable atomic layer deposition based on planar silver templates
399Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
400Impact of interface materials on side permeation in indirect encapsulation of organic electronics
401Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
402Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
403Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
404Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
405Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
406High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
407Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
408Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
409Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
410PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
411Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
412Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
413Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
414MANOS performance dependence on ALD Al2O3 oxidation source
415Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
416Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
417Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
418Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
419Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
420Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
421Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
422Fiber-matrix interface reinforcement using Atomic Layer Deposition
423In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
424Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
425High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
426Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
427Radical Enhanced Atomic Layer Deposition of Metals and Oxides
428Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
429Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
430Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
431Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
432An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
433Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
434Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
435Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
436Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
437Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
438Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
439Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
440Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
441Biofilm prevention on cochlear implants
442Epitaxial 1D electron transport layers for high-performance perovskite solar cells
443DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
444Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
445Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
446Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
447Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
448Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
449Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
450ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
451Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
452Radical Enhanced Atomic Layer Deposition of Metals and Oxides
453Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
454Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
455Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
456Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
457Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
458Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
459Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
460Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
461Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
462Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
463Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
464Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
465Atomic Layer Deposition of the Conductive Delafossite PtCoO2
466Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
467Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
468Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
469Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
470Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
471Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
472Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
473Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
474Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
475Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
476Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
477Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
478Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
479Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
480Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
481Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
482Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
483The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
484Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
485Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
486Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
487Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
488Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
489Plasma-enhanced atomic layer deposition of zinc phosphate
490Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
491Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
492Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
493Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
494Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
495Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
496Transient characterization of the electroforming process in TiO2 based resistive switching devices
497Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
498Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
499Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
500Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
501Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
502Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
503Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
504Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
505Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
506Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
507A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
508Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
509High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
510Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
511Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
512Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
513Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
514Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
515Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
516Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
517Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
518Trilayer Tunnel Selectors for Memristor Memory Cells
519Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
520Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
521The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
522Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
523Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
524Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
525Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
526Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
527Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
528Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
529Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
530Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
531Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
532Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
533Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
534Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
535Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
536Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
537Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
538Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
539Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
540Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
541Nonvolatile Capacitive Crossbar Array for In-Memory Computing
542Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
543Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
544Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
545N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
546Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
547Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
548Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
549Method of Fabrication for Encapsulated Polarizing Resonant Gratings
550Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
551Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
552Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
553Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
554Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
555Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
556SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
557Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
558Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
559A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
560Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
561Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
562Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
563Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
564Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
565Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
566Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
567In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
568Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
569Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
570Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
571Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
572Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
573Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
574The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
575Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
576Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
577Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
578Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
579Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
580Capacitance spectroscopy of gate-defined electronic lattices
581On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
582Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
583Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
584Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
585Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
586Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
587Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
588Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
589High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
590Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
591Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
592Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
593Spectroscopy and control of near-surface defects in conductive thin film ZnO
594An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
595Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
596Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
597Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
598Systematic efficiency study of line-doubled zone plates
599Encapsulation method for atom probe tomography analysis of nanoparticles
600On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
601Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
602Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
603Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
604Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
605Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
606Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
607Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
608Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
609Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
610Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
611Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
612Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
613Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
614Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
615Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
616Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
617Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
618Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
619Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
620Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
621Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
622Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
623Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
624Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
625Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
626Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
627Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
628Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
629Impact of interface materials on side permeation in indirect encapsulation of organic electronics
630Comparative study of ALD SiO2 thin films for optical applications
631Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
632Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
633Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
634Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
635Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
636Sub-10-nm ferroelectric Gd-doped HfO2 layers
637The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
638Innovative remote plasma source for atomic layer deposition for GaN devices
639Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
640Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
641Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
642Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
643Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
644Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
645Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
646Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
647Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
648Energy-enhanced atomic layer deposition for more process and precursor versatility
649Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
650Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
651Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
652Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
653Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
654Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
655Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
656Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
657Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
658Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
659Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
660Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
661XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
662Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
663Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
664Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
665Single-Cell Photonic Nanocavity Probes
666Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
667Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
668Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
669Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
670Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
671Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
672Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
673Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
674Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
675Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
676Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
677The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
678Plasma enhanced atomic layer deposition of Fe2O3 thin films
679Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
680Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
681The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
682Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
683In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
684Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
685Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
686Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
687Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
688Flexible Memristive Memory Array on Plastic Substrates
689Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
690HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
691Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
692Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
693Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
694Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
695Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
696Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
697Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
698Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
699Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
700Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
701Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
702Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
703Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
704Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
705Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
706Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
707Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
708In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
709Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
710On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
711Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
712Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
713Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
714Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
715Radical Enhanced Atomic Layer Deposition of Metals and Oxides
716Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
717Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
718Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
719Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
720High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
721Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
722RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
723Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
724Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
725Plasma-enhanced atomic layer deposition of BaTiO3
726Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
727Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
728Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
729TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
730Low temperature temporal and spatial atomic layer deposition of TiO2 films
731Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
732Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
733AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
734Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
735Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
736Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
737Anti-stiction coating for mechanically tunable photonic crystal devices
738Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
739Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
740Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
741Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
742Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
743Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
744Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
745Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
746X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
747Breakdown and Protection of ALD Moisture Barrier Thin Films
748Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
749Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
750Dynamic tuning of plasmon resonance in the visible using graphene
751Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
752Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
753Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
754Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
755Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
756Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
757Passivation effects of atomic-layer-deposited aluminum oxide
758HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
759Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
760A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
761Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
762Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
763Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
764In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
765ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
766Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
767Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
768Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
769Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
770Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
771Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
772Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
773Radical Enhanced Atomic Layer Deposition of Metals and Oxides
774Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
775The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
776Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
777Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
778Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
779Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
780Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
781Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
782Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
783Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
784Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
785Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
786Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
787Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
788The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
789Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
790In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
791On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
792Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
793Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
794Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
795Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
796Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
797Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
798Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
799Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
800Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
801Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
802Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
803Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
804Optical display film as flexible and light trapping substrate for organic photovoltaics
805Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
806Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
807Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
808Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
809A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
810Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
811Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
812Optimization of the Surface Structure on Black Silicon for Surface Passivation
813Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
814Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
815Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
816Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
817Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
818Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
819Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
820Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
821Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
822Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
823Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
824Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
825Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
826A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
827Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
828The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
829Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
830Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
831Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
832Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
833ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
834Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
835Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
836Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
837Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
838Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
839Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
840Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
841Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
842Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
843Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
844Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
845Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
846Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
847Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
848Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
849Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
850Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
851Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
852Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
853TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
854Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
855Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
856In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
857All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
858Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
859Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
860Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
861Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
862Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
863From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
864Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
865Trapped charge densities in Al2O3-based silicon surface passivation layers
866Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
867Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
868Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
869Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
870Highly efficient and bending durable perovskite solar cells: toward a wearable power source
871Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
872Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
873Remote Plasma ALD of Platinum and Platinum Oxide Films
874Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
875Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
876All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
877Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
878PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
879Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
880Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
881Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
882Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
883Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
884Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
885Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
886'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
887Lithium-Iron (III) Fluoride Battery with Double Surface Protection
888Lithium-Iron (III) Fluoride Battery with Double Surface Protection
889Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
890Atomic layer deposition of metal-oxide thin films on cellulose fibers
891Very high frequency plasma reactant for atomic layer deposition
892Optical and Electrical Properties of AlxTi1-xO Films
893Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
894Mechanical properties of thin-film Parylene-metal-Parylene devices
895Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
896Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
897Optical properties and bandgap evolution of ALD HfSiOx films
898Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
899Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
900Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
901Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
902Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
903High-Reflective Coatings For Ground and Space Based Applications
904Propagation Effects in Carbon Nanoelectronics
905Symmetrical Al2O3-based passivation layers for p- and n-type silicon
906Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
907Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
908Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
909Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
910Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
911Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
912PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
913Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
914Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
915Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
916Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
917Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
918Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
919Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
920Hafnia and alumina on sulphur passivated germanium
921On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
922Tuning size and coverage of Pd nanoparticles using atomic layer deposition
923Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
924Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
925Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
926Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
927Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
928Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
929Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
930Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
931Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
932A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
933Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
934Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
935Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
936Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
937Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
938Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
939Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
940XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
941Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
942Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
943Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
944Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
945Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
946Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
947Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
948Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
949Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
950Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
951Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
952Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
953Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
954Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
955Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
956Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
957A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
958Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
959Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
960Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
961Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
962IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
963Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
964Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
965Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
966Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
967Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
968The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
969Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
970Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
971Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
972HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
973Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
974Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
975Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
976Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
977Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
978Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
979Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
980Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
981Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
982Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
983Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
984Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
985Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
986Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
987Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
988Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
989Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
990Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
991Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
992Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
993Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
994Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
995Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
996Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
997High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
998Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
999Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
1000Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1001Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1002Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
1003Sub-7-nm textured ZrO2 with giant ferroelectricity
1004Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1005In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1006Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
1007Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
1008Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1009Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
1010Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
1011Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
1012Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
1013Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
1014High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
1015HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
1016Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
1017Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1018Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1019Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1020Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
1021Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
1022Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1023Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1024Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
1025Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1026High-Reflective Coatings For Ground and Space Based Applications
1027Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1028Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1029Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
1030Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
1031Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1032Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
10331D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
1034Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
1035TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1036Optical and Electrical Properties of TixSi1-xOy Films
1037Breakdown and Protection of ALD Moisture Barrier Thin Films
1038Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
1039Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1040Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
1041Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
1042Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1043Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1044Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
1045Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1046Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
1047Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
1048Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
1049Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1050Growth of silica nanowires in vacuum
1051Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1052Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
1053A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
1054Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1055Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
1056A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1057Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
1058Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1059Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1060Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1061MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
1062Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
1063High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
1064Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
1065Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1066Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1067Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1068Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
1069Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
1070Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1071Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
1072A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1073Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1074Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
1075Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1076Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1077Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
1078Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
1079Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
1080Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1081Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1082Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
1083Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
1084Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1085Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
1086Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
1087Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
1088Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
1089Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1090Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1091Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
1092Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1093Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
1094First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
1095Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
1096Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1097Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
1098Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1099Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1100Optical properties and bandgap evolution of ALD HfSiOx films
1101Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
1102Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1103Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1104Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1105The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
1106ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1107Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
1108Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1109Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1110Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
1111Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1112In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
1113Remote Plasma ALD of Platinum and Platinum Oxide Films
1114Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
1115Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
1116Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1117Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
1118Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
1119Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
1120Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
1121Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
1122Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1123Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1124Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1125Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
1126Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
1127Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
1128TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
1129Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
1130Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1131Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
1132Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
1133High-efficiency embedded transmission grating
1134Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
1135Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1136Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
1137Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
1138Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1139Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
1140Residual stress study of thin films deposited by atomic layer deposition
1141Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
1142ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1143Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1144Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
1145Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
1146In-gap states in titanium dioxide and oxynitride atomic layer deposited films
1147Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
1148Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
1149Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1150Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
1151Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
1152The effects of layering in ferroelectric Si-doped HfO2 thin films
1153A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
1154Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
1155Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
1156Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1157Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1158Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
1159On the equilibrium concentration of boron-oxygen defects in crystalline silicon
1160Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
1161Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
1162Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
1163High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
1164Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
1165Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1166Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
1167Damage evaluation in graphene underlying atomic layer deposition dielectrics
1168Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1169Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1170Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1171Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
1172PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
1173Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
1174Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
1175Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1176Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
1177Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1178Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
1179Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1180Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
1181Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
1182Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
1183Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1184The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1185Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1186Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
1187Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1188An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
1189Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
1190Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
1191Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1192Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
1193Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
1194'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1195The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1196Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
1197Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
1198Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
1199Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1200Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
1201Characteristics of HfO2 thin films grown by plasma atomic layer deposition
1202A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1203Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1204Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1205Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1206Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
1207Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1208Surface and sensing properties of PE-ALD SnO2 thin film
1209Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1210Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
1211Oxygen migration in TiO2-based higher-k gate stacks
1212Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1213Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1214Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
1215Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
1216Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1217Advances in the fabrication of graphene transistors on flexible substrates
1218Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1219Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1220Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
1221Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
1222Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
1223Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1224Damage evaluation in graphene underlying atomic layer deposition dielectrics
1225Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
1226Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
1227Optical in situ monitoring of plasma-enhanced atomic layer deposition process
1228Modal properties of a strip-loaded horizontal slot waveguide
1229Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
1230Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1231Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
1232Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
1233Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1234Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1235Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1236Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1237The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1238Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
1239In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
1240Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1241Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
1242In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1243Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
1244Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
1245A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
1246Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
1247Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1248Patterned deposition by plasma enhanced spatial atomic layer deposition
1249Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1250Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
1251Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
1252Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1253Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
1254Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
1255Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
1256α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
1257Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1258An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon