O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12Advances in the fabrication of graphene transistors on flexible substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30Anti-stiction coating for mechanically tunable photonic crystal devices
31Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40Breakdown and Protection of ALD Moisture Barrier Thin Films
41Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42Capacitance spectroscopy of gate-defined electronic lattices
43Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52Charge effects of ultrafine FET with nanodot type floating gate
53Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
57Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
58Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
59Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
60Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
61Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
62Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
63Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
64Damage evaluation in graphene underlying atomic layer deposition dielectrics
65DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
66Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
67Densification of Thin Aluminum Oxide Films by Thermal Treatments
68Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76Dynamic tuning of plasmon resonance in the visible using graphene
77Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
81Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
82Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
83Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
84Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
85Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
86Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
87Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
88Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
89Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
90Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
91Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
92Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
93Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
94Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
95Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
96Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
97Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
98Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
99Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
100Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
101Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
102Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
103Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
104Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
105Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
106Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
107Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
108Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
109Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
110Energy-enhanced atomic layer deposition for more process and precursor versatility
111Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
112Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
113Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
114Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
115Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
116Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
117Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
118Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
119Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
120Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
121Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
122Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
123Experimental verification of electro-refractive phase modulation in graphene
124Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
125Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
126Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
127Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
128Fiber-matrix interface reinforcement using Atomic Layer Deposition
129Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
130Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
131Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
132Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
133First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
134Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
135Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
136Flexible, light trapping substrates for organic photovoltaics
137Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
138Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
139Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
140Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
141Hafnia and alumina on sulphur passivated germanium
142High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
143High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
144High-efficiency embedded transmission grating
145High-Reflective Coatings For Ground and Space Based Applications
146High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
147Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
148Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
149Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
150Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
151Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
152Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
153Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
154Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
155Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
156Improved understanding of recombination at the Si/Al2O3 interface
157Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
158Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
159Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
160Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
161Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
162In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
163In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
164In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
165Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
166Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
167Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
168Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
169Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
170Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
171Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
172Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
173Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
174Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
175Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
176Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
177Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
178Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
179Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
180Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
181Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
182Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
183Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
184Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
185Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
186Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
187Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
188Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
189Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
190Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
191Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
192Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
193Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
194Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
195Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
196Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
197Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
198Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
199Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
200Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
201Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
202Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
203Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
204Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
205Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
206Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
207Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
208MANOS performance dependence on ALD Al2O3 oxidation source
209Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
210Mechanical properties of thin-film Parylene-metal-Parylene devices
211Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
212Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
213Method of Fabrication for Encapsulated Polarizing Resonant Gratings
214Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
215Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
216Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
217Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
218Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
219Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
220Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
221Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
222N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
223Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
224Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
225Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
226Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
227Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
228Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
229Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
230On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
231On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
232On the equilibrium concentration of boron-oxygen defects in crystalline silicon
233On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
234Optical display film as flexible and light trapping substrate for organic photovoltaics
235Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
236Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
237Optimization of the Surface Structure on Black Silicon for Surface Passivation
238Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
239Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
240Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
241Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
242Passivation effects of atomic-layer-deposited aluminum oxide
243Patterned deposition by plasma enhanced spatial atomic layer deposition
244PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
245Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
246Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
247Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
248Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
249Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
250Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
251Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
252Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
253Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
254Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
255Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
256Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
257Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
258Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
259Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
260Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
261Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
262Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
263Propagation Effects in Carbon Nanoelectronics
264Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
265Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
266Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
267Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
268Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
269Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
270Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
271Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
272Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
273Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
274Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
275Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
276Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
277Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
278Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
279Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
280Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
281Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
282Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
283Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
284Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
285Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
286Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
287Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
288Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
289Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
290Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
291Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
292Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
293Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
294Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
295Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
296Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
297The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
298The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
299The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
300Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
301Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
302Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
303Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
304TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
305Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
306Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
307Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
308Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
309Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
310Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
311Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
312Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
313Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
314Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
315Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
316Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
317Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
318Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
319Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
320Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
321Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
322Very high frequency plasma reactant for atomic layer deposition
323Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
324Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
325Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
326Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
327Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
328Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
329Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
330Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
331Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
332Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
333Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
334Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
335Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
336Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
337Composite materials and nanoporous thin layers made by atomic layer deposition
338Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
339Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
340Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
341Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
342Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
343Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
344Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
345Optical and Electrical Properties of AlxTi1-xO Films
346Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
347Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
348Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
349Atomic Layer Deposition of Gold Metal
350Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
351Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
352Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
353Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
354High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
355Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
356Plasma-enhanced atomic layer deposition of BaTiO3
357Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
358Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
359Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
360Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
361Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
362A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
363Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
364Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
365Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
366Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
367Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
368Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
369Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
370Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
371Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
372Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
373Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
374Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
375Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
376Radical Enhanced Atomic Layer Deposition of Metals and Oxides
377Radical Enhanced Atomic Layer Deposition of Metals and Oxides
378Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
379Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
380Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
381Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
382Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
383Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
384Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
385Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
386Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
387Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
388Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
389Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
390Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
391Plasma enhanced atomic layer deposition of Fe2O3 thin films
392Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
393Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
394Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
395The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
396Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
397Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
398Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
399Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
400Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
401Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
402Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
403Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
404Plasma enhanced atomic layer deposition of Ga2O3 thin films
405Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
406Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
407RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
408Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
409Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
410Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
411Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
412Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
413Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
414Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
415Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
416Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
417Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
418Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
419Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
420Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
421A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
422An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
423Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
424Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
425Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
426Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
427Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
428AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
429Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
430Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
431Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
432Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
433Characteristics of HfO2 thin films grown by plasma atomic layer deposition
434Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
435Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
436Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
437Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
438Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
439Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
440Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
441Damage evaluation in graphene underlying atomic layer deposition dielectrics
442Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
443Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
444Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
445Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
446Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
447Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
448Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
449Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
450Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
451Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
452Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
453Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
454Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
455Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
456Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
457Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
458Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
459Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
460Hafnia and alumina on sulphur passivated germanium
461HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
462Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
463Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
464Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
465Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
466In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
467Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
468Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
469Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
470Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
471Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
472Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
473Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
474Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
475Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
476Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
477Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
478Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
479Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
480Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
481Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
482Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
483Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
484Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
485Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
486Optical properties and bandgap evolution of ALD HfSiOx films
487Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
488PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
489Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
490Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
491Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
492Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
493Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
494Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
495Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
496Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
497Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
498Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
499Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
500Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
501Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
502Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
503The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
504The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
505The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
506The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
507The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
508Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
509Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
510Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
511Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
512Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
513Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
514Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
515Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
516Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
517Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
518Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
519Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
520Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
521HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
522Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
523The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
524Annealing behavior of ferroelectric Si-doped HfO2 thin films
525Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
526Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
527Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
528Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
529Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
530Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
531Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
532Optical properties and bandgap evolution of ALD HfSiOx films
533TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
534The effects of layering in ferroelectric Si-doped HfO2 thin films
535Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
536Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
537Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
538Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
539Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
540Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
541Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
542Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
543High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
544High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
545Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
546Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
547On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
548Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
549Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
550High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
551Systematic efficiency study of line-doubled zone plates
552TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
553IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
554Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
555Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
556Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
557Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
558Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
559Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
560Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
561The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
562Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
563Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
564Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
565Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
566Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
567Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
568Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
569In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
570Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
571Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
572Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
573Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
574Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
575Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
576Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
577Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
578The important role of water in growth of monolayer transition metal dichalcogenides
579Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
580Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
581Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
582Radical Enhanced Atomic Layer Deposition of Metals and Oxides
583Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
584Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
585Radical Enhanced Atomic Layer Deposition of Metals and Oxides
586Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
587Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
588Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
589Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
590Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
591Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
592Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
593Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
594Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
595Encapsulation method for atom probe tomography analysis of nanoparticles
596Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
597Growth of silica nanowires in vacuum
598In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
599Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
600Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
601Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
602Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
603Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
604Remote Plasma ALD of Platinum and Platinum Oxide Films
605Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
606Room-Temperature Atomic Layer Deposition of Platinum
607Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
608Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
609Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
610Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
611Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
612Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
613Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
614Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
615The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
616Remote Plasma ALD of Platinum and Platinum Oxide Films
617Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
618Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
619Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
620Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
621Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
622Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
623High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
624Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
625In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
626Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
627Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
628Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
629Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
630Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
631(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
632ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
633Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
634Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
635Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
636Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
637Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
638Radical Enhanced Atomic Layer Deposition of Metals and Oxides
639Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
640Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
641Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
642'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
643A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
644A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
645Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
646Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
647Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
648Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
649Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
650Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
651Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
652Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
653Atomic layer deposition of metal-oxide thin films on cellulose fibers
654Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
655Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
656Breakdown and Protection of ALD Moisture Barrier Thin Films
657Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
658Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
659Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
660Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
661Comparative study of ALD SiO2 thin films for optical applications
662Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
663Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
664Designing high performance precursors for atomic layer deposition of silicon oxide
665Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
666Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
667Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
668Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
669Energy-enhanced atomic layer deposition for more process and precursor versatility
670Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
671Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
672Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
673Gate Insulator for High Mobility Oxide TFT
674Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
675High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
676High-Reflective Coatings For Ground and Space Based Applications
677Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
678Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
679Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
680Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
681Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
682Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
683Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
684Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
685Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
686Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
687Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
688Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
689Modal properties of a strip-loaded horizontal slot waveguide
690Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
691Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
692Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
693Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
694On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
695On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
696Optical properties and bandgap evolution of ALD HfSiOx films
697PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
698Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
699Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
700Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
701Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
702Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
703Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
704Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
705Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
706Radical Enhanced Atomic Layer Deposition of Metals and Oxides
707Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
708Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
709Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
710Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
711Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
712Single-Cell Photonic Nanocavity Probes
713Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
714Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
715Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
716Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
717Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
718Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
719Symmetrical Al2O3-based passivation layers for p- and n-type silicon
720Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
721Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
722Trapped charge densities in Al2O3-based silicon surface passivation layers
723Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
724Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
725A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
726Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
727Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
728Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
729Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
730Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
731Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
732Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
733In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
734Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
735Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
736Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
737Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
738SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
739Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
740Surface and sensing properties of PE-ALD SnO2 thin film
741Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
742Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
743Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
744Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
745Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
746Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
747Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
748Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
749Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
750Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
751Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
752Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
753Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
754Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
755Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
756Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
757Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
758Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
759Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
760Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
761Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
762Radical Enhanced Atomic Layer Deposition of Metals and Oxides
763Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
764Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
765Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
766Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
767Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
768Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
769Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
770Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
771Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
772Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
773Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
774Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
775Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
776Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
777Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
778Trilayer Tunnel Selectors for Memristor Memory Cells
779Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
780Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
781A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
782Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
783An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
784Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
785Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
786Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
787Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
788Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
789Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
790Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
791Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
792Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
793Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
794Biofilm prevention on cochlear implants
795Bipolar resistive switching in amorphous titanium oxide thin film
796Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
797Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
798Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
799Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
800Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
801Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
802Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
803Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
804Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
805Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
806Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
807Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
808Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
809Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
810Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
811Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
812Energy-enhanced atomic layer deposition for more process and precursor versatility
813Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
814Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
815Epitaxial 1D electron transport layers for high-performance perovskite solar cells
816Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
817Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
818Flexible Memristive Memory Array on Plastic Substrates
819Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
820Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
821Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
822Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
823Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
824Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
825Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
826High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
827High-efficiency embedded transmission grating
828Highly efficient and bending durable perovskite solar cells: toward a wearable power source
829Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
830Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
831Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
832In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
833In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
834In-gap states in titanium dioxide and oxynitride atomic layer deposited films
835Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
836Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
837Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
838Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
839Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
840Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
841Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
842Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
843Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
844Low temperature temporal and spatial atomic layer deposition of TiO2 films
845Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
846Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
847Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
848Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
849On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
850Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
851Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
852Oxygen migration in TiO2-based higher-k gate stacks
853Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
854Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
855Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
856Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
857Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
858Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
859Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
860Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
861Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
862Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
863Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
864Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
865Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
866Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
867Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
868Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
869Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
870Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
871Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
872Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
873Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
874Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
875The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
876The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
877The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
878The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
879Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
880Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
881TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
882Transient characterization of the electroforming process in TiO2 based resistive switching devices
883Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
884Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
885X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
886Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
887Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
888Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
889Optical and Electrical Properties of TixSi1-xOy Films
890Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
891Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
892Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
893Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
894Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
895Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
896Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
897Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
898Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
899Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
900In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
901Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
902Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
903The important role of water in growth of monolayer transition metal dichalcogenides
904Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
905Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
906Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
907Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
908Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
909Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
910Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
911Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
912Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
913Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
914Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
915Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
916Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
917Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
918Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
919Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
920Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
921Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
922Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
923Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
924Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
925Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
926Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
927Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
928Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
929Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
930Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
931Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
932Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
933Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
934Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
935Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
936Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
937Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
938Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
939Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
940Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
941Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
942Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
943Radical Enhanced Atomic Layer Deposition of Metals and Oxides
944Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
945Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
946Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
947Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
948Spectroscopy and control of near-surface defects in conductive thin film ZnO
949Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
950Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
951The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
952The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
953The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
954The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
955The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
956Top-down fabricated ZnO nanowire transistors for application in biosensors
957Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
958Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
959Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
960ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
961Plasma-enhanced atomic layer deposition of zinc phosphate
962Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
963Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
964Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
965Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
966Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
967Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
968Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
969Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
970Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
971Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
972Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
973Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
974Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
975High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
976Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
977Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
978Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
979Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
980Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
981Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
982Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
983PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
984PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
985PEALD ZrO2 Films Deposition on TiN and Si Substrates
986Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
987Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
988Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
989Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
990Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
991Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
992Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
993Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
994The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
995The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
996Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
997Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
998ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
999ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1000ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1001Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1002Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1003Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1004Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation


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