O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
2Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
3Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
4Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
5PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
6Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
7Transient characterization of the electroforming process in TiO2 based resistive switching devices
8Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
9Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
10The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
11PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
12Radical Enhanced Atomic Layer Deposition of Metals and Oxides
13Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
14In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
15HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
16Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
17Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
18On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
19Systematic efficiency study of line-doubled zone plates
20Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
21Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
22Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
23Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
24Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
25Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
26Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
27Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
28Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
29Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
30Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
31Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
32Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
33Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
34Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
35Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
36Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
37Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
38Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
39DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
40Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
41Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
4246-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
43Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
44Fiber-matrix interface reinforcement using Atomic Layer Deposition
45AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
46Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
47Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
48Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
49Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
50Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
51Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
52Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
53Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
54Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
55The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
56Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
57Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
58Remote Plasma ALD of Platinum and Platinum Oxide Films
59Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
60Lithium-Iron (III) Fluoride Battery with Double Surface Protection
61Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
62Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
63Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
64Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
65Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
66Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
67Sub-7-nm textured ZrO2 with giant ferroelectricity
68Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
69Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
70Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
71Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
72Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
73Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
74Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
75Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
76Improved understanding of recombination at the Si/Al2O3 interface
77Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
78Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
79Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
80Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
81Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
82Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
83Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
84Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
85Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
86A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
87Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
88Single-Cell Photonic Nanocavity Probes
89Dynamic tuning of plasmon resonance in the visible using graphene
90Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
91Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
92Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
93XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
94Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
95Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
96In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
97Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
98Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
99The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
100Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
101In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
102Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
103Plasma-enhanced atomic layer deposition of BaTiO3
104Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
105Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
106Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
107Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
108Radical Enhanced Atomic Layer Deposition of Metals and Oxides
109Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
110Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
111High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
112Charge effects of ultrafine FET with nanodot type floating gate
113Plasma-enhanced atomic layer deposition of BaTiO3
114Oxygen migration in TiO2-based higher-k gate stacks
115Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
116Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
117Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
118Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
119Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
120Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
121Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
122Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
123Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
124Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
125Radical Enhanced Atomic Layer Deposition of Metals and Oxides
126Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
127Impact of interface materials on side permeation in indirect encapsulation of organic electronics
128Atomic layer deposition of metal-oxide thin films on cellulose fibers
129Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
130(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
131Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
132Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
133Room-Temperature Atomic Layer Deposition of Platinum
134Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
135Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
136Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
137Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
138Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
139Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
140Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
141On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
142Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
143Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
144Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
145Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
146Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
147Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
148Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
149Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
150Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
151Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
152Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
153Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
154Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
155Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
156In-gap states in titanium dioxide and oxynitride atomic layer deposited films
157Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
158Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
159Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
160Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
161Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
162Residual stress study of thin films deposited by atomic layer deposition
163Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
164Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
165Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
166Damage evaluation in graphene underlying atomic layer deposition dielectrics
167Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
168Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
169Radical Enhanced Atomic Layer Deposition of Metals and Oxides
170Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
171Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
172Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
173Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
174Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
175Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
176Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
177High-Reflective Coatings For Ground and Space Based Applications
178Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
179Radical Enhanced Atomic Layer Deposition of Metals and Oxides
180Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
181Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
182Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
183Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
184Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
185Hafnia and alumina on sulphur passivated germanium
186Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
187Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
188Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
189Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
190Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
191Bipolar resistive switching in amorphous titanium oxide thin film
192Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
193Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
194High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
195Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
196Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
197Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
198Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
199PEALD ZrO2 Films Deposition on TiN and Si Substrates
200Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
201Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
202Spectroscopy and control of near-surface defects in conductive thin film ZnO
203Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
204Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
205Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
206Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
207Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
208Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
209Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
210Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
211Plasma enhanced atomic layer deposition of Fe2O3 thin films
212Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
213Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
214Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
215Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
216Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
217Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
218Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
219Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
220Symmetrical Al2O3-based passivation layers for p- and n-type silicon
221Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
222The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
223Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
224Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
225Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
226Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
227Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
228Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
229Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
230Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
231Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
232Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
233Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
234Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
235Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
236Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
237Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
238Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
239Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
240Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
241Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
242Breakdown and Protection of ALD Moisture Barrier Thin Films
243Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
244Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
245Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
246Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
247Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
248Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
249Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
250Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
251Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
252Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
253Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
254High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
255Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
256Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
257Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
258Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
259A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
260Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
261Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
262X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
263Annealing behavior of ferroelectric Si-doped HfO2 thin films
264Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
265Radical Enhanced Atomic Layer Deposition of Metals and Oxides
266Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
267Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
268Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
269Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
270Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
271Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
272Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
273Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
274Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
275On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
276Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
277Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
278Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
279Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
280Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
281Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
282Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
283Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
284Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
285Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
286Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
287In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
288AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
289Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
290Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
291Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
292Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
293Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
294Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
295Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
296Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
297Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
298Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
299Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
300Patterned deposition by plasma enhanced spatial atomic layer deposition
301Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
302Remote Plasma ALD of Platinum and Platinum Oxide Films
303Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
304Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
305Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
306Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
307Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
308Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
309Biofilm prevention on cochlear implants
310Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
311In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
312Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
313Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
314High-Reflective Coatings For Ground and Space Based Applications
315Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
316Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
317Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
318Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
319Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
320Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
321Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
322Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
323Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
324Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
325Hafnia and alumina on sulphur passivated germanium
326ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
327Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
328Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
329Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
330Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
331The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
332Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
333Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
334Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
335Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
336Flexible Memristive Memory Array on Plastic Substrates
337Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
338Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
339Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
340Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
341Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
342Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
343Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
344Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
345Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
346Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
347Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
348Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
349Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
350Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
351Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
352Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
353Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
354Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
355Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
356The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
357Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
358The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
359High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
360Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
361Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
362Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
363Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
364A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
365Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
366Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
367Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
368HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
369Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
370Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
371High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
372Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
373Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
374Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
375Energy-enhanced atomic layer deposition for more process and precursor versatility
376'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
377Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
378Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
379Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
380Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
381Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
382Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
383Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
384Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
385Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
386Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
387Trilayer Tunnel Selectors for Memristor Memory Cells
388Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
389Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
390Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
391Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
392In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
393Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
394Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
395Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
396Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
397Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
398Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
399Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
400The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
401A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
402Modal properties of a strip-loaded horizontal slot waveguide
403Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
404Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
405Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
406Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
407Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
408Tuning size and coverage of Pd nanoparticles using atomic layer deposition
409Anti-stiction coating for mechanically tunable photonic crystal devices
410A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
411Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
412From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
413Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
414Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
415Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
416Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
417Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
418Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
419Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
420Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
421Experimental verification of electro-refractive phase modulation in graphene
422Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
423Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
424Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
425Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
426Atomic Layer Deposition of the Conductive Delafossite PtCoO2
427Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
428Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
429Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
430A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
431Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
432Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
433Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
434Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
435Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
436Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
437HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
438Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
439In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
440Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
441The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
442High-efficiency embedded transmission grating
443Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
444Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
445Low temperature temporal and spatial atomic layer deposition of TiO2 films
446Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
447Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
448Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
449Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
450Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
451Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
452Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
453Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
454Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
455Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
456SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
457Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
458Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
459Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
4603D structure evolution using metastable atomic layer deposition based on planar silver templates
461Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
462The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
463Atomic layer deposition of YMnO3 thin films
464Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
465Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
466Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
467High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
468Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
469Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
470N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
471Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
472Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
473Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
474Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
475High-efficiency embedded transmission grating
476Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
477Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
478Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
479Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
480Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
481Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
482DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
483Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
484Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
485Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
486Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
487Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
488Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
489Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
490Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
491Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
492Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
493Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
494Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
495Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
496Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
497Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
498Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
499Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
500Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
501Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
502Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
503An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
504Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
505Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
506Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
507Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
508Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
509On the equilibrium concentration of boron-oxygen defects in crystalline silicon
510Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
511Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
512Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
513Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
514Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
515Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
516A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
517Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
518Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
519Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
520Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
521Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
522HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
523Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
524Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
525Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
526Plasma-enhanced atomic layer deposition of BaTiO3
527Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
528Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
529Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
530Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
531Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
532Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
533Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
534Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
535Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
536Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
537Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
538Optical and Electrical Properties of AlxTi1-xO Films
539A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
540Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
541Mechanical properties of thin-film Parylene-metal-Parylene devices
542Radical Enhanced Atomic Layer Deposition of Metals and Oxides
543Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
544Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
545Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
546Innovative remote plasma source for atomic layer deposition for GaN devices
547Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
548Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
549Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
550Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
551Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
552Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
553Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
554ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
555Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
556Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
557Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
558Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
559Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
560In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
561Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
562Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
563Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
564Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
565The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
566Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
567Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
568Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
569Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
570Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
571Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
572Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
573α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
574Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
575Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
576Topographically selective deposition
577Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
578Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
579Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
580Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
581Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
582Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
583Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
584Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
585Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
586Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
587Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
588Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
589ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
590Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
591Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
592Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
593Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
594On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
595Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
596Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
597Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
598Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
599Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
600Optical in situ monitoring of plasma-enhanced atomic layer deposition process
601Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
602Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
603Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
604PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
605Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
606Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
607Ferroelectricity in hafnia controlled via surface electrochemical state
608Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
609Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
610Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
611Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
612Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
613Top-down fabricated ZnO nanowire transistors for application in biosensors
614Band alignment of Al2O3 with (-201) β-Ga2O3
615Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
616Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
617Optical properties and bandgap evolution of ALD HfSiOx films
618Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
619Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
620Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
621Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
622Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
623Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
624Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
625The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
626Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
627Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
628Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
629Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
630The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
631'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
632Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
633Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
634Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
635Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
636Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
637Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
638Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
639Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
640Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
641A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
642Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
643Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
644Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
645Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
646Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
647Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
648Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
649Designing high performance precursors for atomic layer deposition of silicon oxide
650Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
651Advances in the fabrication of graphene transistors on flexible substrates
652The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
653An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
654IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
655Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
656An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
657Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
658Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
659Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
660Method of Fabrication for Encapsulated Polarizing Resonant Gratings
661Optical properties and bandgap evolution of ALD HfSiOx films
662Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
663Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
664Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
665Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
666Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
667Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
668Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
669Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
670Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
671Flexible, light trapping substrates for organic photovoltaics
672Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
673Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
674Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
675High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
676Nonvolatile Capacitive Crossbar Array for In-Memory Computing
677Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
678Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
679In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
680Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
681Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
682Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
683On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
684Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
685Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
686Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
687Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
688Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
689Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
690Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
691Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
692A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
693Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
694Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
695Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
696Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
697Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
698Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
699Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
700Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
701High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
702Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
703Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
704Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
705Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
706Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
707ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
708Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
709Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
710On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
711Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
712Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
713Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
714Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
715Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
716Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
717Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
718Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
719Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
720Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
721Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
722Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
723Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
724Sub-10-nm ferroelectric Gd-doped HfO2 layers
725Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
726Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
727Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
728Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
729Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
730Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
731Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
732Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
733Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
734Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
735Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
736Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
737Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
738The important role of water in growth of monolayer transition metal dichalcogenides
739Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
740Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
741Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
742Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
743Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
744Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
745Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
746Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
747On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
748Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
749Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
750Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
751Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
752A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
753Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
754Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
755Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
756Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
757A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
758Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
759Densification of Thin Aluminum Oxide Films by Thermal Treatments
760First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
761Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
762Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
763Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
764Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
765Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
766Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
767Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
768Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
769Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
770Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
771Comparative study of ALD SiO2 thin films for optical applications
772Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
773Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
774Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
775The effects of layering in ferroelectric Si-doped HfO2 thin films
776Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
777Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
778Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
779Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
780PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
781Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
782Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
783Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
784Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
785Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
786Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
787Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
788MANOS performance dependence on ALD Al2O3 oxidation source
789Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
790Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
791Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
792Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
793Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
794Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
795Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
796Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
797Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
798Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
799Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
800Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
801Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
802Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
803Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
804Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
805Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
806High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
807ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
808Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
809Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
810Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
811Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
812Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
813The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
814Characteristics of HfO2 thin films grown by plasma atomic layer deposition
815Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
816Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
817Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
818Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
819Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
820Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
821In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
822Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
823Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
824All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
825Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
826Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
827Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
828Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
829A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
830Radical Enhanced Atomic Layer Deposition of Metals and Oxides
831Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
832Plasma-enhanced atomic layer deposition of zinc phosphate
833Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
834Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
835Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
836Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
837Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
838TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
839Impact of interface materials on side permeation in indirect encapsulation of organic electronics
840In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
841Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
842Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
843Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
844Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
845Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
846Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
847Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
848Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
849Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
850Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
851Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
852The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
853Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
854Epitaxial 1D electron transport layers for high-performance perovskite solar cells
855Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
856Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
857Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
858Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
859A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
860Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
861Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
862Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
863Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
864Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
865Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
866Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
867Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
868Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
869Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
870Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
871Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
872In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
873Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
874Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
875Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
876Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
877Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
878Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
879Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
880Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
881Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
882Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
883Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
884Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
885Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
886The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
887Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
888Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
889Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
890Encapsulation method for atom probe tomography analysis of nanoparticles
891Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
892Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
893Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
894Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
895Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
896Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
897Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
898Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
899Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
900Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
901Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
902Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
903Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
904The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
905Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
906All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
907Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
908Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
909Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
910Damage evaluation in graphene underlying atomic layer deposition dielectrics
911Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
912Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
913Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
914Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
915Optical display film as flexible and light trapping substrate for organic photovoltaics
916AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
917Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
918The important role of water in growth of monolayer transition metal dichalcogenides
919Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
920Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
921Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
922Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
923Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
924Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
925Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
926Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
927Optimization of the Surface Structure on Black Silicon for Surface Passivation
928Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
929Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
930Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
931Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
932Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
933Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
934Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
935Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
936Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
937Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
938Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
939Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
940Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
941Energy-enhanced atomic layer deposition for more process and precursor versatility
942Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
943Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
944Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
945XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
946Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
947Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
948Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
949Atomic Layer Deposition of Gold Metal
950Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
951Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
952Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
953Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
954Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
955Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
956Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
957Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
958Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
959Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
960Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
961Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
962Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
963Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
964Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
965Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
966Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
967Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
968Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
969Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
970Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
971Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
972Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
973Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
974Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
975Composite materials and nanoporous thin layers made by atomic layer deposition
976Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
977Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
978Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
979Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
980Residual stress study of thin films deposited by atomic layer deposition
981Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
982Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
983Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
984Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
985AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
986Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
987Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
988Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
989Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
990Nonvolatile Capacitive Crossbar Array for In-Memory Computing
991Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
992Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
993The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
994Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
995Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
996Study on the resistive switching time of TiO2 thin films
997MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
998Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
999Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
1000Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1001Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1002Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
1003Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
1004Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
1005Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
1006Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
1007Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1008Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1009Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1010Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
1011Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1012The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1013Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
1014Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
1015Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
1016Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
1017Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
1018Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
10191D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
1020Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1021Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
1022Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1023Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
1024Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
1025Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1026Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
1027Trapped charge densities in Al2O3-based silicon surface passivation layers
1028Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1029Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
1030Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1031Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
1032Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1033Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1034Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
1035Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
1036Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1037Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1038High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1039Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
1040Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1041Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
1042Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
1043Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1044Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
1045Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1046Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
1047Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
1048Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1049Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1050Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1051Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1052Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
1053Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1054Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1055Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
1056Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
1057Growth of silica nanowires in vacuum
1058Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
1059Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
1060Very high frequency plasma reactant for atomic layer deposition
1061Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1062Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1063Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
1064PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
1065Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1066Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
1067Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
1068Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1069Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1070Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1071Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
1072Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
1073Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
1074Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1075Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1076In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1077Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
1078Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
1079Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1080Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1081Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
1082Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
1083Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1084Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
1085Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1086Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1087High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
1088Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1089High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
1090Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1091Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
1092Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1093Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1094Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1095Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
1096Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
1097Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1098Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1099Propagation Effects in Carbon Nanoelectronics
1100Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
1101Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1102Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
1103Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1104Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
1105Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
1106Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
1107Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
1108A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
1109Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1110TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1111Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
1112Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
1113Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
1114Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1115Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
1116Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1117Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
1118Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1119Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
1120Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
1121Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
1122Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1123Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1124Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
1125Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
1126Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1127Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
1128Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
1129Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1130Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1131Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
1132Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
1133Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1134Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
1135Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
1136Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1137Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
1138Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
1139Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1140Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
1141Energy-enhanced atomic layer deposition for more process and precursor versatility
1142Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
1143Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
1144Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
1145Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
1146Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
1147Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1148Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1149Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
1150ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1151Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
1152Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
1153Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1154Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1155Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
1156Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
1157Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
1158Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1159Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1160Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1161Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
1162Gate Insulator for High Mobility Oxide TFT
1163Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
1164Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
1165Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1166Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
1167Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1168Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
1169Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
1170Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
1171Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
1172Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1173Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
1174Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
1175Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
1176Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1177Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1178In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1179Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
1180Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1181Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1182Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1183Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
1184Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
1185Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1186Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1187Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1188Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1189Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
1190Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
1191Highly efficient and bending durable perovskite solar cells: toward a wearable power source
1192Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
1193Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
1194Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1195Passivation effects of atomic-layer-deposited aluminum oxide
1196Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
1197Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
1198Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
1199The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
1200Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1201Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1202The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1203TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
1204Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
1205Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
1206Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
1207New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
1208Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1209Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
1210Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
1211Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
1212Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
1213Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
1214Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
1215Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1216Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
1217Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
1218Surface and sensing properties of PE-ALD SnO2 thin film
1219Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
1220ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1221Optical properties and bandgap evolution of ALD HfSiOx films
1222Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1223Plasma enhanced atomic layer deposition of Ga2O3 thin films
1224Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1225The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
1226ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1227Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1228Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1229A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
1230TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1231Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1232Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
1233Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
1234Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
1235Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1236On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1237Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
1238Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
1239Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
1240Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
1241Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1242RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
1243Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1244Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1245Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1246Capacitance spectroscopy of gate-defined electronic lattices
1247Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1248On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1249Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1250Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1251Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1252Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
1253Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
1254Optical and Electrical Properties of TixSi1-xOy Films
1255Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
1256Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1257Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
1258Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1259Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1260Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
1261MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
1262Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
1263Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1264Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
1265Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
1266Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
1267Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
1268Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1269Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1270Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1271Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
1272Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
1273Breakdown and Protection of ALD Moisture Barrier Thin Films
1274Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
1275Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1276An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
1277The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges