O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
11A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
12Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
13Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
14Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
15Advances in the fabrication of graphene transistors on flexible substrates
16Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
17Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
18Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
19Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
20Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
21Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
22Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
23ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
24AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
25AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
26AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
27Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
28Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
29Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
30Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
31An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
32Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
33Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
34Anti-stiction coating for mechanically tunable photonic crystal devices
35Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
36Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
37Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
38Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
39Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
40Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
41Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
42Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
43Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
44Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
45Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
46Band alignment of Al2O3 with (-201) β-Ga2O3
47Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
48Breakdown and Protection of ALD Moisture Barrier Thin Films
49Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
50Capacitance spectroscopy of gate-defined electronic lattices
51Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
52Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
53Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
54Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
55Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
56Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
57Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
58Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
59Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
60Charge effects of ultrafine FET with nanodot type floating gate
61Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
62Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
63Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
64Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
65Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
66Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
67Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
68Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
69Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
70Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
71Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
72Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
73Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
74Damage evaluation in graphene underlying atomic layer deposition dielectrics
75DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
76Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
77Densification of Thin Aluminum Oxide Films by Thermal Treatments
78Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
79Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
80Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
81DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
82Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
83Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
84Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
85Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
86Dynamic tuning of plasmon resonance in the visible using graphene
87Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
88Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
89Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
90Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
91Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
92Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
93Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
94Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
95Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
96Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
97Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
98Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
99Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
100Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
101Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
102Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
103Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
104Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
105Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
106Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
107Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
108Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
109Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
110Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
111Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
112Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
113Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
114Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
115Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
116Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
117Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
118Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
119Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
120Energy-enhanced atomic layer deposition for more process and precursor versatility
121Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
122Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
123Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
124Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
125Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
126Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
127Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
128Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
129Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
130Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
131Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
132Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
133Experimental verification of electro-refractive phase modulation in graphene
134Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
135Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
136Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
137Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
138Fiber-matrix interface reinforcement using Atomic Layer Deposition
139Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
140Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
141Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
142Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
143Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
144First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
145Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
146Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
147Flexible, light trapping substrates for organic photovoltaics
148Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
149Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
150Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
151Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
152Hafnia and alumina on sulphur passivated germanium
153High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
154High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
155High-efficiency embedded transmission grating
156High-Reflective Coatings For Ground and Space Based Applications
157High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
158Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
159Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
160Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
161Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
162Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
163Impact of interface materials on side permeation in indirect encapsulation of organic electronics
164Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
165Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
166Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
167Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
168Improved understanding of recombination at the Si/Al2O3 interface
169Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
170Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
171Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
172Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
173Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
174In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
175In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
176In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
177Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
178Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
179Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
180Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
181Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
182Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
183Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
184Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
185Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
186Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
187Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
188Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
189Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
190Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
191Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
192Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
193Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
194Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
195Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
196Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
197Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
198Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
199Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
200Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
201Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
202Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
203Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
204Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
205Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
206Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
207Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
208Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
209Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
210Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
211Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
212Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
213Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
214Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
215Lithium-Iron (III) Fluoride Battery with Double Surface Protection
216Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
217Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
218Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
219Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
220Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
221Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
222Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
223Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
224MANOS performance dependence on ALD Al2O3 oxidation source
225Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
226Mechanical properties of thin-film Parylene-metal-Parylene devices
227Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
228Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
229Method of Fabrication for Encapsulated Polarizing Resonant Gratings
230Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
231Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
232Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
233Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
234Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
235Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
236Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
237MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
238Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
239N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
240Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
241Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
242Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
243Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
244Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
245Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
246Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
247Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
248On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
249On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
250On the equilibrium concentration of boron-oxygen defects in crystalline silicon
251On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
252On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
253Optical display film as flexible and light trapping substrate for organic photovoltaics
254Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
255Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
256Optimization of the Surface Structure on Black Silicon for Surface Passivation
257Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
258Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
259Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
260Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
261Passivation effects of atomic-layer-deposited aluminum oxide
262Patterned deposition by plasma enhanced spatial atomic layer deposition
263PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
264Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
265Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
266Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
267Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
268Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
269Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
270Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
271Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
272Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
273Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
274Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
275Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
276Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
277Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
278Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
279Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
280Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
281Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
282Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
283Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
284Propagation Effects in Carbon Nanoelectronics
285Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
286Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
287Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
288Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
289Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
290Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
291Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
292Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
293Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
294Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
295Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
296Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
297Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
298Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
299Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
300Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
301Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
302Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
303Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
304Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
305Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
306Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
307Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
308Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
309Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
310Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
311Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
312Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
313Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
314Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
315Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
316Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
317Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
318Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
319Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
320Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
321Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
322Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
323The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
324The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
325The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
326Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
327Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
328Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
329Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
330TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
331Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
332Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
333Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
334Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
335Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
336Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
337Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
338Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
339Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
340Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
341Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
342Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
343Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
344Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
345Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
346Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
347Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
348Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
349Very high frequency plasma reactant for atomic layer deposition
350Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
351Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
352Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
353Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
354Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
355Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
356Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
357Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
358Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
359Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
360Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
361Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
362Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
363Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
364Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
365Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
366Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
367Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
368Composite materials and nanoporous thin layers made by atomic layer deposition
369Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
370Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
371Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
372Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
373Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
374Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
375Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
376Optical and Electrical Properties of AlxTi1-xO Films
377Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
378Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
379Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
380Atomic Layer Deposition of Gold Metal
381Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
382Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
383Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
384Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
385Plasma-enhanced atomic layer deposition of BaTiO3
386High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
387Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
388Plasma-enhanced atomic layer deposition of BaTiO3
389Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
390Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
391Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
392Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
393Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
394Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
395Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
396Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
397A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
398Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
399Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
400Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
401Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
402Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
403Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
404Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
405Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
406Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
407Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
408Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
409Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
410Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
411Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
412Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
413Radical Enhanced Atomic Layer Deposition of Metals and Oxides
414Radical Enhanced Atomic Layer Deposition of Metals and Oxides
415Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
416Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
417Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
418Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
419Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
420Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
421Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
422Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
423Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
424Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
425Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
426Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
427Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
428Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
429Plasma enhanced atomic layer deposition of Fe2O3 thin films
430Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
431Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
432Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
433Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
434The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
435Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
436Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
437Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
438Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
439Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
440Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
441Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
442Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
443Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
444Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
445Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
446Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
447Plasma enhanced atomic layer deposition of Ga2O3 thin films
448Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
449Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
450Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
451Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
452RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
453Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
454Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
455α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
456Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
457Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
458Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
459Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
460Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
461Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
462Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
463Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
464Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
465Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
466Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
467A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
468An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
469Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
470Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
471Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
472Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
473Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
474AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
475Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
476Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
477Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
478Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
479Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
480Characteristics of HfO2 thin films grown by plasma atomic layer deposition
481Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
482Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
483Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
484Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
485Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
486Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
487Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
488Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
489Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
490Damage evaluation in graphene underlying atomic layer deposition dielectrics
491Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
492Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
493Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
494Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
495Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
496Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
497Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
498Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
499Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
500Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
501Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
502Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
503Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
504Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
505Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
506Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
507Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
508Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
509Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
510Hafnia and alumina on sulphur passivated germanium
511HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
512Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
513Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
514Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
515Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
516In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
517Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
518Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
519Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
520Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
521Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
522Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
523Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
524Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
525Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
526Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
527Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
528Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
529Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
530Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
531Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
532Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
533Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
534Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
535Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
536Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
537Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
538On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
539Optical properties and bandgap evolution of ALD HfSiOx films
540Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
541PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
542Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
543Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
544Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
545Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
546Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
547Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
548Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
549Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
550Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
551Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
552Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
553Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
554Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
555Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
556Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
557The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
558The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
559The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
560The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
561The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
562Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
563Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
564Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
565Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
566Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
567Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
568Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
569Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
570Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
571Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
572Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
573Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
574Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
575HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
576Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
577The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
578Annealing behavior of ferroelectric Si-doped HfO2 thin films
579Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
580Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
581Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
582Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
583Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
584Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
585Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
586Optical properties and bandgap evolution of ALD HfSiOx films
587Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
588TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
589The effects of layering in ferroelectric Si-doped HfO2 thin films
590Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
591Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
592Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
593Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
594Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
595New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
596Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
597Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
598All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
599Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
600Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
601Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
602Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
603High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
604High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
605Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
606Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
607On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
608Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
609Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
610High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
611Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
612Systematic efficiency study of line-doubled zone plates
613TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
614IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
615Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
616Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
617Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
618Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
619Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
620Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
621Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
622The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
623XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
624Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
625Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
626Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
627Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
628Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
629Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
630Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
631Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
632Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
633Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
634Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
635Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
636In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
637Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
638Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
639Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
640Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
641Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
642Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
643Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
644Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
645Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
646Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
647Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
648The important role of water in growth of monolayer transition metal dichalcogenides
649Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
650Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
651Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
652Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
653Radical Enhanced Atomic Layer Deposition of Metals and Oxides
654Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
655Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
656Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
657Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
658Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
659Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
660Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
661Radical Enhanced Atomic Layer Deposition of Metals and Oxides
662Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
663Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
664Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
665Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
666Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
667Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
668Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
669Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
670Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
671Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
672Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
673Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
674Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
675Encapsulation method for atom probe tomography analysis of nanoparticles
676Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
677Growth of silica nanowires in vacuum
678In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
679Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
680Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
681Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
682Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
683Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
684Remote Plasma ALD of Platinum and Platinum Oxide Films
685Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
686Room-Temperature Atomic Layer Deposition of Platinum
687Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
688Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
689Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
690Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
691Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
692Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
693Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
694Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
695The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
696Remote Plasma ALD of Platinum and Platinum Oxide Films
697Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
698Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
699Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
700Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
701Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
702Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
703High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
704Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
705In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
706Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
707Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
708Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
709Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
710Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
711Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
712(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
713ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
714Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
715Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
716Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
717Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
718Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
719Radical Enhanced Atomic Layer Deposition of Metals and Oxides
720Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
721Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
722Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
723Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
724Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
725'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7263D structure evolution using metastable atomic layer deposition based on planar silver templates
727A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
728A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
729Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
730Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
731Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
732An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
733Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
734Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
735Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
736Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
737Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
738Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
739Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
740Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
741Atomic layer deposition of metal-oxide thin films on cellulose fibers
742Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
743Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
744Breakdown and Protection of ALD Moisture Barrier Thin Films
745Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
746Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
747Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
748Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
749Comparative study of ALD SiO2 thin films for optical applications
750Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
751Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
752Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
753Designing high performance precursors for atomic layer deposition of silicon oxide
754Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
755Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
756Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
757Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
758Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
759Energy-enhanced atomic layer deposition for more process and precursor versatility
760Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
761Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
762Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
763Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
764Gate Insulator for High Mobility Oxide TFT
765Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
766High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
767High-Reflective Coatings For Ground and Space Based Applications
768Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
769Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
770Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
771Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
772Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
773Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
774Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
775Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
776Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
777Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
778Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
779Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
780Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
781Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
782Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
783Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
784Modal properties of a strip-loaded horizontal slot waveguide
785Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
786Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
787Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
788Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
789Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
790On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
791On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
792Optical properties and bandgap evolution of ALD HfSiOx films
793PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
794Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
795Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
796Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
797Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
798Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
799Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
800Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
801Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
802Radical Enhanced Atomic Layer Deposition of Metals and Oxides
803Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
804Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
805Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
806Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
807Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
808Single-Cell Photonic Nanocavity Probes
809Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
810Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
811Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
812Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
813Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
814Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
815Symmetrical Al2O3-based passivation layers for p- and n-type silicon
816Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
817Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
818Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
819Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
820Trapped charge densities in Al2O3-based silicon surface passivation layers
821Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
822Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
823A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
824Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
825Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
826Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
827Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
828Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
829Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
830Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
831Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
832In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
833Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
834Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
835Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
836Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
837SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
838Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
839Surface and sensing properties of PE-ALD SnO2 thin film
840Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
841Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
842Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
843Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
844Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
845Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
846Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
847Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
848Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
849Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
850Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
851Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
852Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
853Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
854Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
855Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
856Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
857Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
858Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
859Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
860Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
861Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
862Radical Enhanced Atomic Layer Deposition of Metals and Oxides
863Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
864Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
865Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
866Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
867Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
868Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
869Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
870Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
871Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
872Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
873Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
874Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
875Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
876Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
877Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
878Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
879Topographically selective deposition
880Trilayer Tunnel Selectors for Memristor Memory Cells
881Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
882Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
883A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
884Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
885An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
886Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
887Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
888Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
889Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
890Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
891Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
892Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
893Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
894Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
895Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
896Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
897Biofilm prevention on cochlear implants
898Bipolar resistive switching in amorphous titanium oxide thin film
899Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
900Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
901Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
902Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
903Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
904Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
905Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
906Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
907Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
908Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
909Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
910Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
911Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
912Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
913Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
914Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
915Energy-enhanced atomic layer deposition for more process and precursor versatility
916Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
917Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
918Epitaxial 1D electron transport layers for high-performance perovskite solar cells
919Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
920Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
921Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
922Flexible Memristive Memory Array on Plastic Substrates
923Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
924Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
925Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
926Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
927Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
928Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
929Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
930High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
931High-efficiency embedded transmission grating
932Highly efficient and bending durable perovskite solar cells: toward a wearable power source
933Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
934Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
935Impact of interface materials on side permeation in indirect encapsulation of organic electronics
936Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
937Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
938In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
939In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
940In-gap states in titanium dioxide and oxynitride atomic layer deposited films
941Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
942Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
943Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
944Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
945Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
946Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
947Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
948Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
949Lithium-Iron (III) Fluoride Battery with Double Surface Protection
950Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
951Low temperature temporal and spatial atomic layer deposition of TiO2 films
952Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
953Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
954Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
955MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
956Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
957On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
958Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
959Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
960Oxygen migration in TiO2-based higher-k gate stacks
961Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
962Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
963Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
964Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
965Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
966Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
967Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
968Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
969Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
970Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
971Plasma-enhanced atomic layer deposition of BaTiO3
972Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
973Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
974Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
975Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
976Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
977Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
978Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
979Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
980Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
981Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
982Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
983Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
984Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
985Study on the resistive switching time of TiO2 thin films
986Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
987Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
988Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
989Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
990The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
991The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
992The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
993The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
994The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
995Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
996Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
997TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
998Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
999Transient characterization of the electroforming process in TiO2 based resistive switching devices
1000Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1001Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
1002X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1003Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
1004Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1005Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1006Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
1007Optical and Electrical Properties of TixSi1-xOy Films
1008Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
1009Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
1010Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1011Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
1012Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1013Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
1014Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1015Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1016Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
1017Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
1018Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1019In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
1020Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1021Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1022Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1023The important role of water in growth of monolayer transition metal dichalcogenides
1024Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
1025Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
1026Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1027Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
1028Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1029Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1030Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1031Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1032Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1033Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1034Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1035Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1036Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1037Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1038Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1039A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1040Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1041All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1042Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1043Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1044Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
1045Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1046Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1047Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1048Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1049Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1050Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1051Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1052Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1053Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1054Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1055From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1056Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1057Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1058Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1059Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1060Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1061Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1062Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1063Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1064Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1065Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1066Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1067Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1068Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1069Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1070Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1071Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1072Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1073Spectroscopy and control of near-surface defects in conductive thin film ZnO
1074Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1075Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1076The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1077The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1078The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1079The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1080The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1081Top-down fabricated ZnO nanowire transistors for application in biosensors
1082Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1083Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1084Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1085ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1086ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1087Plasma-enhanced atomic layer deposition of zinc phosphate
1088Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1089Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1090Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1091Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1092Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1093Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1094Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1095Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1096Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1097Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1098Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1099Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1100Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1101Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1102High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1103Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1104Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1105Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1106Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1107Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1108Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1109Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1110Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1111Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1112Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1113PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1114PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1115PEALD ZrO2 Films Deposition on TiN and Si Substrates
1116Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1117Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1118Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1119Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1120Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1121Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1122Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1123Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1124Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1125Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1126The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1127The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1128Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1129Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1130XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1131ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1132ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1133ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1134Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1135Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1136Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1137Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation