O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
2Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
3Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
4High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
5Optical and Electrical Properties of AlxTi1-xO Films
6Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
7Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
8Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
9Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
10Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
11Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
12Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
13Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
14Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
15Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
16Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
17Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
18Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
19Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
20Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
21Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
22Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
23Study on the resistive switching time of TiO2 thin films
24Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
25Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
26Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
27Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
28Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
29Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
30Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
31Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
32Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
33Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
34Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
35Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
36Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
37Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
38Improved understanding of recombination at the Si/Al2O3 interface
39Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
40Hafnia and alumina on sulphur passivated germanium
41Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
42Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
43Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
44Radical Enhanced Atomic Layer Deposition of Metals and Oxides
45Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
46Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
47Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
48In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
49Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
50Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
51Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
52Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
53MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
54Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
55Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
56Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
57High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
58Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
59Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
60Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
61Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
62Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
63Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
64Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
65Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
66Systematic efficiency study of line-doubled zone plates
67Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
68Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
69Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
70Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
71Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
72AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
73Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
74Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
75Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
76Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
77Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
78Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
79Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
80Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
81Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
82Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
83Breakdown and Protection of ALD Moisture Barrier Thin Films
84Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
85Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
86Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
87Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
88Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
89Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
90Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
91Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
92Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
93Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
94Breakdown and Protection of ALD Moisture Barrier Thin Films
95Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
96Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
97Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
98Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
99Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
100Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
101Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
102Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
103High-Reflective Coatings For Ground and Space Based Applications
104Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
105(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
106Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
107Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
108Epitaxial 1D electron transport layers for high-performance perovskite solar cells
109Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
110Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
111Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
112Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
113Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
114Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
115Remote Plasma ALD of Platinum and Platinum Oxide Films
116Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
117Radical Enhanced Atomic Layer Deposition of Metals and Oxides
118Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
119Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
120Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
121Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
122In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
123Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
124Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
125Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
126Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
127Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
128Propagation Effects in Carbon Nanoelectronics
129Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
130All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
131An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
132Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
133Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
134Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
135Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
136Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
137Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
138Growth of silica nanowires in vacuum
139Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
140Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
141Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
142Atomic layer deposition of metal-oxide thin films on cellulose fibers
143The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
144Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
145Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
146Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
147Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
148Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
149Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
150Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
151Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
152Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
153Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
154Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
155Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
156Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
157Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
158Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
159Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
160Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
161Residual stress study of thin films deposited by atomic layer deposition
162Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
163Optical in situ monitoring of plasma-enhanced atomic layer deposition process
164Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
165Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
166Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
167Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
168Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
169Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
170Trapped charge densities in Al2O3-based silicon surface passivation layers
171Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
172SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
173Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
174On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
175Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
176PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
177Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
178Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
179Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
180Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
181Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
182Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
183Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
184Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
185Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
186Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
187Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
188Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
189High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
190Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
191ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
192Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
193Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
194Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
195Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
196Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
197Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
198Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
199Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
200Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
201Biofilm prevention on cochlear implants
202Transient characterization of the electroforming process in TiO2 based resistive switching devices
203Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
204Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
205Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
206Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
207Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
208Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
209Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
210Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
211Method of Fabrication for Encapsulated Polarizing Resonant Gratings
212Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
213On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
214PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
215Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
216Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
217Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
218Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
219Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
220Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
221Charge effects of ultrafine FET with nanodot type floating gate
222N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
223Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
224Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
225Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
226Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
227Sub-10-nm ferroelectric Gd-doped HfO2 layers
228Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
229Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
230Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
231Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
232Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
233Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
234Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
235Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
236Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
237Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
238Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
239Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
240Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
241Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
242Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
243Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
244In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
245Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
246Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
247Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
248Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
249Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
250Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
251Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
252Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
253Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
254Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
255Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
256Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
257Oxygen migration in TiO2-based higher-k gate stacks
258Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
259Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
260Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
261Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
262Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
263Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
264Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
265Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
266'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
267Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
268Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
269A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
270Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
271Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
272Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
273An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
274Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
275Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
276The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
277Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
278Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
279Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
280The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
281Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
282Mechanical properties of thin-film Parylene-metal-Parylene devices
283Sub-7-nm textured ZrO2 with giant ferroelectricity
284Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
285High-Reflective Coatings For Ground and Space Based Applications
286Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
287Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
288Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
289Dynamic tuning of plasmon resonance in the visible using graphene
290A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
291Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
292On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
293Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
294IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
295Residual stress study of thin films deposited by atomic layer deposition
296Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
297Characteristics of HfO2 thin films grown by plasma atomic layer deposition
298High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
299Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
300Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
301Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
302Optical properties and bandgap evolution of ALD HfSiOx films
303ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
304Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
305The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
306Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
307Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
308Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
309Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
310Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
311Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
312Plasma enhanced atomic layer deposition of Fe2O3 thin films
313An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
314Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
315Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
316HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
317Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
318Innovative remote plasma source for atomic layer deposition for GaN devices
319Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
320Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
321High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
322Plasma-enhanced atomic layer deposition of BaTiO3
323Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
324Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
325Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
326Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
327Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
328Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
329Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
330Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
331Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
332Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
333Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
334Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
335Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
336Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
337Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
338Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
339Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
340Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
341Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
342In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
343Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
344DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
345Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
346Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
347Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
348Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
349Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
350In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
351Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
352Annealing behavior of ferroelectric Si-doped HfO2 thin films
353Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
354PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
355Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
356Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
357Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
358Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
359Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
360Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
361Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
362Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
363Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
364Energy-enhanced atomic layer deposition for more process and precursor versatility
365Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
366Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
367Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
368Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
369Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
370Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
371Radical Enhanced Atomic Layer Deposition of Metals and Oxides
372Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
373Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
374Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
375ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
376Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
377Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
378Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
379Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
380Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
381A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
382Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
383Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
384Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
385Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
386Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
387Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
388Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
389Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
390Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
391Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
392Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
393Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
394Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
395Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
396Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
397Lithium-Iron (III) Fluoride Battery with Double Surface Protection
398Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
399Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
400Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
401Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
402Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
403Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
404The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
405Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
406In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
407Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
408Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
409Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
410Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
411Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
412Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
413Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
414Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
415Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
416ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
417Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
418Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
419Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
420Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
421Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
422Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
423Nonvolatile Capacitive Crossbar Array for In-Memory Computing
424Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
425Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
426Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
427Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
428Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
429Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
430Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
431Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
432Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
433Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
434Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
435Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
436Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
437Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
438Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
439A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
440Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
441Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
442Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
443Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
444Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
445The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
446Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
447AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
448Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
449Very high frequency plasma reactant for atomic layer deposition
450Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
451Fiber-matrix interface reinforcement using Atomic Layer Deposition
452In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
453Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
454Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
455Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
456The important role of water in growth of monolayer transition metal dichalcogenides
457Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
458Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
459Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
460Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
461Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
462Passivation effects of atomic-layer-deposited aluminum oxide
463Tuning size and coverage of Pd nanoparticles using atomic layer deposition
464Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
465Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
466Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
467Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
468The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
469Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
470Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
471Ferroelectricity in hafnia controlled via surface electrochemical state
472Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
473Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
474Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
475Patterned deposition by plasma enhanced spatial atomic layer deposition
476Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
477Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
478A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
479Remote Plasma ALD of Platinum and Platinum Oxide Films
480Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
481Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
482The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
483Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
484Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
485Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
486Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
487Low temperature temporal and spatial atomic layer deposition of TiO2 films
488Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
489TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
490Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
491Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
492Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
493Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
494Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
495Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
496Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
497Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
498Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
499The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
500Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
501A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
502Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
503Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
504Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
505The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
506Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
507Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
508Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
509Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
510Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
511Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
512Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
513Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
514Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
515Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
516Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
517Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
518Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
519Single-Cell Photonic Nanocavity Probes
520Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
521Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
522Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
523Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
524Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
525Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
526Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
527Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
528Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
529Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
530Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
531Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
532Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
533A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
534Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
535Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
536Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
537Atomic layer deposition of YMnO3 thin films
538Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
539Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
540Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
541Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
542Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
543Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
544Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
545Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
546Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
547Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
548Flexible, light trapping substrates for organic photovoltaics
549Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
550Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
551Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
552Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
553Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
554Bipolar resistive switching in amorphous titanium oxide thin film
555Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
556Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
557Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
558A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
559Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
560Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
561Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
562Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
563Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
564Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
565Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
566Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
567In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
568Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
569Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
570Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
571Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
572Radical Enhanced Atomic Layer Deposition of Metals and Oxides
573Densification of Thin Aluminum Oxide Films by Thermal Treatments
574Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
575Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
576Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
577High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
578Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
579Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
580Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
581Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
582A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
583Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
584Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
585Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
586Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
587Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
588Optical display film as flexible and light trapping substrate for organic photovoltaics
589Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
590Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
591Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
592Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
593Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
594An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
5953D structure evolution using metastable atomic layer deposition based on planar silver templates
596Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
597Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
598Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
599Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
600In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
601Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
602In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
603Plasma-enhanced atomic layer deposition of BaTiO3
604Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
605Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
606Radical Enhanced Atomic Layer Deposition of Metals and Oxides
607Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
608Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
609Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
610Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
611Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
612Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
613Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
614Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
615Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
616Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
617Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
618Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
619Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
620Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
621Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
622Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
623Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
624Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
625Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
626Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
627Comparative study of ALD SiO2 thin films for optical applications
628Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
629Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
630Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
631Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
632Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
633Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
634Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
635Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
636Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
637Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
638Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
639Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
640Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
641Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
642Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
643Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
644Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
645Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
646Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
647Plasma enhanced atomic layer deposition of Ga2O3 thin films
648Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
649Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
650In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
651Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
652Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
653Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
654Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
655Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
656Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
657Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
658Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
659Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
660Gate Insulator for High Mobility Oxide TFT
661Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
662Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
663Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
664Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
665Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
666Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
667HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
668Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
669The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
670Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
671Energy-enhanced atomic layer deposition for more process and precursor versatility
672Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
673Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
674Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
675Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
676Plasma-enhanced atomic layer deposition of zinc phosphate
677Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
678Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
679Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
680Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
681Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
682Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
683Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
684Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
685Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
686Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
687Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
688Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
689Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
690Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
691Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
692Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
693MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
694Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
695Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
696Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
697Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
698Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
699Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
700Atomic Layer Deposition of the Conductive Delafossite PtCoO2
701Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
702Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
703Band alignment of Al2O3 with (-201) β-Ga2O3
704Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
705Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
706Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
707Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
708Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
709Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
710Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
711Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
712Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
713Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
714Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
715First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
716Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
717Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
718Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
719Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
720Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
721HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
722Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
723Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
724Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
725Optical and Electrical Properties of TixSi1-xOy Films
726Impact of interface materials on side permeation in indirect encapsulation of organic electronics
727Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
728Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
729Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
730Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
731Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
732Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
733A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
734Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
735Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
736Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
737Damage evaluation in graphene underlying atomic layer deposition dielectrics
738Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
739Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
740Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
741Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
742Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
743The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
744Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
745Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
746Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
747Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
748Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
749HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
750Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
751Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
752TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
753Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
754Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
755Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
756Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
757Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
758Top-down fabricated ZnO nanowire transistors for application in biosensors
759Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
760Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
761Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
762Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
763Impact of interface materials on side permeation in indirect encapsulation of organic electronics
764Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
765Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
766The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
767Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
768Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
769Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
770Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
771Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
772Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
773Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
774Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
775Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
776TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
777Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
778Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
779Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
780Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
781Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
782Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
783Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
784Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
785Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
786Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
787Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
788Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
789Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
790Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
791Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
792Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
793Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
794The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
795Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
796Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
797Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
798Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
799Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
800The important role of water in growth of monolayer transition metal dichalcogenides
801Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
802Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
803Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
804Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
805Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
806Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
807Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
808Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
809Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
810Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
811Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
812Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
813Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
814Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
815Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
816High-efficiency embedded transmission grating
817Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
818Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
819Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
820Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
821Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
822Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
823Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
824Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
825Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
826Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
827Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
828Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
829Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
830Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
831α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
832Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
833A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
834Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
835ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
836Designing high performance precursors for atomic layer deposition of silicon oxide
837Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
838Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
839Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
840Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
841Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
842Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
843High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
844Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
845Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
846The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
847Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
848Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
849Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
850Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
851Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
852Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
853Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
854Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
855Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
856Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
857Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
858Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
859Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
860Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
861Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
862Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
863Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
864Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
865Optical properties and bandgap evolution of ALD HfSiOx films
866Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
867Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
868Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
869Trilayer Tunnel Selectors for Memristor Memory Cells
870Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
871Surface and sensing properties of PE-ALD SnO2 thin film
872Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
873Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
874Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
875Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
876Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
877The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
878Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
879Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
880Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
881Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
882Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
883New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
884Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
885Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
886Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
887Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
888Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
889DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
890Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
891Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
892Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
893Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
894Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
895Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
896Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
897Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
898Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
899Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
900Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
901Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
902Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
903Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
904Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
905Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
906Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
907Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
908Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
909Experimental verification of electro-refractive phase modulation in graphene
910Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
911Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
912Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
913Topographically selective deposition
914Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
915Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
9161D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
917In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
918Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
919Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
920Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
921Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
922Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
923Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
924Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
925Radical Enhanced Atomic Layer Deposition of Metals and Oxides
926Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
927Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
928Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
929Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
930Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
931Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
932Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
933Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
934Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
935Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
936The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
937Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
938High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
939Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
940Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
941Advances in the fabrication of graphene transistors on flexible substrates
942Optical properties and bandgap evolution of ALD HfSiOx films
943Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
944Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
945Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
946Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
947Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
948Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
949Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
950Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
951Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
952Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
953Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
954Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
955Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
956Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
957High-efficiency embedded transmission grating
958Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
959Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
960AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
961Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
962Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
963Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
964Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
965Capacitance spectroscopy of gate-defined electronic lattices
966Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
967Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
968Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
969Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
970The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
971Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
972Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
973Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
974Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
975XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
976Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
977Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
978Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
979Room-Temperature Atomic Layer Deposition of Platinum
980Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
981Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
982On the equilibrium concentration of boron-oxygen defects in crystalline silicon
983Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
984Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
985Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
986Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
987Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
988Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
989Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
990Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
991Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
992Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
993In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
994Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
995Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
996Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
997Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
998A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
999Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1000Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1001Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
1002Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1003The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
1004Composite materials and nanoporous thin layers made by atomic layer deposition
1005Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
1006High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
1007Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
1008Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
1009Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1010Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
1011Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
1012Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
1013Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
1014Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
1015Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
1016Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
1017Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1018Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
1019Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
1020Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
1021Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
1022In-gap states in titanium dioxide and oxynitride atomic layer deposited films
1023Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
1024PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1025Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
1026Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
1027Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
1028Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1029Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
1030Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1031Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1032Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1033Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
1034Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
1035Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
1036Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1037Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
1038Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1039Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
1040Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
1041Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
1042Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
1043Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1044Hafnia and alumina on sulphur passivated germanium
1045Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
1046Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1047Plasma-enhanced atomic layer deposition of BaTiO3
1048Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
1049Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1050Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1051Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
1052The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
1053Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1054Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
1055Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1056Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1057XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1058Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
1059Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1060The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1061Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
1062Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
1063Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
1064Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1065Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1066Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1067Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1068Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1069Encapsulation method for atom probe tomography analysis of nanoparticles
1070In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1071Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
1072Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
1073Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1074Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1075Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
1076Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
1077Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1078Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
1079Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1080Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
1081A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
1082MANOS performance dependence on ALD Al2O3 oxidation source
1083Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1084Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
1085Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
1086Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
1087Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1088Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1089Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
1090Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1091From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1092Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
1093Energy-enhanced atomic layer deposition for more process and precursor versatility
1094Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1095Flexible Memristive Memory Array on Plastic Substrates
1096Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1097Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
1098Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
1099Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1100Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1101PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
1102Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1103A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1104Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
1105Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
1106Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
1107Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
1108Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
1109Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
1110Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1111Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1112Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
1113'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1114Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
1115On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1116Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
1117Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1118Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1119Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1120Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
1121Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1122Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
1123Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
1124Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1125Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1126Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1127Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1128The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1129Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1130ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1131Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
1132Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1133Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1134Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1135Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
1136Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1137Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
1138On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1139Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
1140AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
1141The effects of layering in ferroelectric Si-doped HfO2 thin films
1142Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1143Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
1144The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1145Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
1146High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
1147Optimization of the Surface Structure on Black Silicon for Surface Passivation
1148Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
1149Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1150Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1151Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1152Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
1153Anti-stiction coating for mechanically tunable photonic crystal devices
1154Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
1155Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
1156Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1157Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
1158Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
1159Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
1160Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
1161Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
1162Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
1163Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
1164Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1165Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1166Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1167Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
1168Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
1169Highly efficient and bending durable perovskite solar cells: toward a wearable power source
1170Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
1171Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1172Spectroscopy and control of near-surface defects in conductive thin film ZnO
1173Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
1174Atomic Layer Deposition of Gold Metal
1175Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
1176Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
1177ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1178Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1179Symmetrical Al2O3-based passivation layers for p- and n-type silicon
1180Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
1181X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1182Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1183ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1184Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1185Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
1186Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
1187Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
1188Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
1189Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1190Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
1191Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
1192Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
1193Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1194Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
1195Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1196High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
1197Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
1198Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1199Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1200Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
1201Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
1202Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
1203Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1204Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1205Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1206Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1207Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1208Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
1209On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
1210Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1211Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
1212On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1213The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
1214TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1215Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1216Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1217On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
1218Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1219Damage evaluation in graphene underlying atomic layer deposition dielectrics
1220Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1221Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
1222Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
1223Nonvolatile Capacitive Crossbar Array for In-Memory Computing
1224Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1225Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
1226Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
1227Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
1228Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
1229High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
1230PEALD ZrO2 Films Deposition on TiN and Si Substrates
1231Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
1232Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
1233Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
1234Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
1235Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
1236Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
1237Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
1238Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1239All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1240Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1241Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
1242Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
1243RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
1244Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
1245Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1246Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
1247Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
1248Modal properties of a strip-loaded horizontal slot waveguide
1249Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1250On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
1251Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
1252Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1253Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
1254Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
1255Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1256Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
1257Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
1258Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
1259A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
1260Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1261Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1262Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
1263Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
1264Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
1265Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1266Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
126746-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
1268Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
1269Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1270A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
1271Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
1272Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1273Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
1274Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
1275Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
1276Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1277Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks