O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12Advances in the fabrication of graphene transistors on flexible substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30Anti-stiction coating for mechanically tunable photonic crystal devices
31Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40Breakdown and Protection of ALD Moisture Barrier Thin Films
41Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42Capacitance spectroscopy of gate-defined electronic lattices
43Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52Charge effects of ultrafine FET with nanodot type floating gate
53Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
60Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
61Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
62Damage evaluation in graphene underlying atomic layer deposition dielectrics
63DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
64Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
65Demonstration of flexible thin film transistors with GaN channels
66Densification of Thin Aluminum Oxide Films by Thermal Treatments
67Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
68Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
69Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
70DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
71Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
72Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
73Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
74Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
75Dynamic tuning of plasmon resonance in the visible using graphene
76Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
77Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
78Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
79Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
80Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
81Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
82Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
83Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
84Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
85Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
86Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
87Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
88Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
89Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
90Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
91Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
92Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
93Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
94Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
95Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
96Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
97Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
98Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
99Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
100Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
101Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
102Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
103Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
104Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
105Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
106Energy-enhanced atomic layer deposition for more process and precursor versatility
107Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
108Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
109Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
110Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
111Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
112Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
113Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
114Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
115Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
116Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
117Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
118Experimental verification of electro-refractive phase modulation in graphene
119Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
120Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
121Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
122Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
123Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
124Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
125Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
126Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
127Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
128Flexible, light trapping substrates for organic photovoltaics
129Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
130Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
131Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
132Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
133Hafnia and alumina on sulphur passivated germanium
134High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
135High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
136High-efficiency embedded transmission grating
137High-Reflective Coatings For Ground and Space Based Applications
138Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
139Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
140Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
141Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
142Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
143Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
144Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
145Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
146Improved understanding of recombination at the Si/Al2O3 interface
147Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
148Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
149Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
150Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
151Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
152In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
153In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
154In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
155Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
156Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
157Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
158Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
159Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
160Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
161Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
162Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
163Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
164Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
165Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
166Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
167Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
168Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
169Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
170Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
171Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
172Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
173Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
174Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
175Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
176Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
177Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
178Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
179Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
180Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
181Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
182Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
183Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
184Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
185Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
186Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
187Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
188Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
189Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
190Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
191Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
192MANOS performance dependence on ALD Al2O3 oxidation source
193Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
194Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
195Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
196Method of Fabrication for Encapsulated Polarizing Resonant Gratings
197Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
198Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
199Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
200Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
201Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
202Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
203Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
204N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
205Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
206Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
207Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
208Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
209Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
210Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
211On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
212On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
213On the equilibrium concentration of boron-oxygen defects in crystalline silicon
214On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
215Optical display film as flexible and light trapping substrate for organic photovoltaics
216Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
217Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
218Optimization of the Surface Structure on Black Silicon for Surface Passivation
219Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
220Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
221Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
222Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
223Passivation effects of atomic-layer-deposited aluminum oxide
224Patterned deposition by plasma enhanced spatial atomic layer deposition
225PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
226Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
227Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
228Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
229Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
230Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
231Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
232Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
233Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
234Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
235Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
236Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
237Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
238Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
239Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
240Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
241Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
242Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
243Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
244Propagation Effects in Carbon Nanoelectronics
245Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
246Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
247Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
248Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
249Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
250Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
251Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
252Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
253Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
254Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
255Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
256Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
257Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
258Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
259Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
260Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
261Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
262Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
263Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
264Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
265Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
266Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
267Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
268Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
269Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
270Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
271Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
272Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
273Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
274Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
275Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
276Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
277The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
278The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
279The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
280Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
281Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
282Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
283Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
284TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
285Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
286Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
287Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
288Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
289Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
290Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
291Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
292Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
293Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
294Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
295Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
296Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
297Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
298Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
299Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
300Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
301Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
302Very high frequency plasma reactant for atomic layer deposition
303Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
304Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
305Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
306Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
307Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
308Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
309Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
310Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
311Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
312Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
313Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
314Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
315Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
316Composite materials and nanoporous thin layers made by atomic layer deposition
317Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
318Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
319Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
320Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
321Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
322Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
323Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
324Optical and Electrical Properties of AlxTi1-xO Films
325Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
326Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
327Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
328Atomic Layer Deposition of Gold Metal
329Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
330Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
331Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
332Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
333High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
334Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
335Plasma-enhanced atomic layer deposition of BaTiO3
336Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
337Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
338Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
339A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
340Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
341Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
342Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
343Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
344Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
345Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
346Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
347Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
348Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
349Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
350Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
351Radical Enhanced Atomic Layer Deposition of Metals and Oxides
352Radical Enhanced Atomic Layer Deposition of Metals and Oxides
353Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
354Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
355Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
356Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
357Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
358Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
359Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
360Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
361Plasma enhanced atomic layer deposition of Fe2O3 thin films
362Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
363Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
364The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
365Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
366Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
367Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
368Electrical characteristics of β-Ga2O3 thin films grown by PEALD
369Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
370Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
371Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
372Plasma enhanced atomic layer deposition of Ga2O3 thin films
373Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
374Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
375RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
376Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
377Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
378Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
379Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
380Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
381Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
382Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
383Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
384Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
385Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
386Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
387A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
388An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
389Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
390Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
391Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
392Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
393Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
394AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
395Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
396Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
397Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
398Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
399Characteristics of HfO2 thin films grown by plasma atomic layer deposition
400Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
401Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
402Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
403Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
404Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
405Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
406Damage evaluation in graphene underlying atomic layer deposition dielectrics
407Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
408Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
409Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
410Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
411Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
412Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
413Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
414Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
415Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
416Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
417Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
418Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
419Hafnia and alumina on sulphur passivated germanium
420HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
421Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
422Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
423Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
424Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
425In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
426Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
427Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
428Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
429Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
430Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
431Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
432Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
433Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
434Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
435Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
436Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
437Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
438Optical properties and bandgap evolution of ALD HfSiOx films
439Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
440Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
441Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
442Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
443Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
444Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
445Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
446Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
447Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
448Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
449Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
450Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
451Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
452Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
453The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
454The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
455The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
456Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
457Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
458Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
459Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
460Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
461Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
462Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
463Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
464Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
465HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
466Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
467Annealing behavior of ferroelectric Si-doped HfO2 thin films
468Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
469Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
470Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
471Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
472Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
473Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
474Optical properties and bandgap evolution of ALD HfSiOx films
475TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
476The effects of layering in ferroelectric Si-doped HfO2 thin films
477Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
478Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
479Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
480Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
481Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
482High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
483High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
484Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
485Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
486On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
487Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
488High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
489Systematic efficiency study of line-doubled zone plates
490TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
491IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
492Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
493Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
494Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
495Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
496Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
497Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
498Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
499Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
500Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
501Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
502Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
503Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
504In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
505Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
506Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
507Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
508Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
509Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
510Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
511Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
512Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
513The important role of water in growth of monolayer transition metal dichalcogenides
514Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
515Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
516Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
517Radical Enhanced Atomic Layer Deposition of Metals and Oxides
518Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
519Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
520Radical Enhanced Atomic Layer Deposition of Metals and Oxides
521Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
522Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
523Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
524Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
525Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
526Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
527Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
528Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
529Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
530Encapsulation method for atom probe tomography analysis of nanoparticles
531Growth of silica nanowires in vacuum
532In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
533Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
534Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
535Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
536Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
537Remote Plasma ALD of Platinum and Platinum Oxide Films
538Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
539Room-Temperature Atomic Layer Deposition of Platinum
540Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
541Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
542Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
543Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
544Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
545Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
546Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
547Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
548The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
549Remote Plasma ALD of Platinum and Platinum Oxide Films
550Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
551Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
552Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
553Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
554Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
555Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
556Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
557In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
558Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
559Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
560Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
561Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
562Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
563(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
564ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
565Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
566Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
567Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
568Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
569Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
570Radical Enhanced Atomic Layer Deposition of Metals and Oxides
571Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
572Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
573Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
574'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
575A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
576Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
577Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
578Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
579Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
580Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
581Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
582Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
583Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
584Atomic layer deposition of metal-oxide thin films on cellulose fibers
585Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
586Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
587Breakdown and Protection of ALD Moisture Barrier Thin Films
588Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
589Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
590Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
591Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
592Comparative study of ALD SiO2 thin films for optical applications
593Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
594Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
595Designing high performance precursors for atomic layer deposition of silicon oxide
596Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
597Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
598Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
599Energy-enhanced atomic layer deposition for more process and precursor versatility
600Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
601Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
602Gate Insulator for High Mobility Oxide TFT
603Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
604High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
605High-Reflective Coatings For Ground and Space Based Applications
606Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
607Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
608Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
609Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
610Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
611Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
612Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
613Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
614Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
615Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
616Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
617Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
618Modal properties of a strip-loaded horizontal slot waveguide
619Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
620Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
621On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
622On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
623Optical properties and bandgap evolution of ALD HfSiOx films
624PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
625Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
626Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
627Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
628Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
629Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
630Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
631Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
632Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
633Radical Enhanced Atomic Layer Deposition of Metals and Oxides
634Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
635Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
636Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
637Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
638Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
639Single-Cell Photonic Nanocavity Probes
640Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
641Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
642Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
643Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
644Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
645Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
646Symmetrical Al2O3-based passivation layers for p- and n-type silicon
647Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
648Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
649Trapped charge densities in Al2O3-based silicon surface passivation layers
650Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
651Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
652A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
653Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
654Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
655Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
656Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
657Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
658Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
659Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
660Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
661Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
662SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
663Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
664Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
665Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
666Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
667Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
668Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
669Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
670Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
671Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
672Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
673Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
674Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
675Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
676Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
677Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
678Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
679Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
680Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
681Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
682Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
683Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
684Radical Enhanced Atomic Layer Deposition of Metals and Oxides
685Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
686Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
687Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
688Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
689Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
690Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
691Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
692Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
693Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
694Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
695Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
696Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
697Trilayer Tunnel Selectors for Memristor Memory Cells
698Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
699A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
700Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
701An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
702Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
703Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
704Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
705Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
706Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
707Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
708Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
709Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
710Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
711Biofilm prevention on cochlear implants
712Bipolar resistive switching in amorphous titanium oxide thin film
713Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
714Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
715Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
716Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
717Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
718Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
719Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
720Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
721Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
722Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
723Energy-enhanced atomic layer deposition for more process and precursor versatility
724Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
725Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
726Epitaxial 1D electron transport layers for high-performance perovskite solar cells
727Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
728Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
729Flexible Memristive Memory Array on Plastic Substrates
730Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
731Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
732Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
733Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
734High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
735High-efficiency embedded transmission grating
736Highly efficient and bending durable perovskite solar cells: toward a wearable power source
737Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
738Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
739Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
740In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
741In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
742In-gap states in titanium dioxide and oxynitride atomic layer deposited films
743Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
744Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
745Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
746Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
747Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
748Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
749Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
750Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
751Low temperature temporal and spatial atomic layer deposition of TiO2 films
752Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
753Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
754Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
755On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
756Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
757Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
758Oxygen migration in TiO2-based higher-k gate stacks
759Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
760Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
761Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
762Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
763Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
764Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
765Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
766Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
767Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
768Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
769Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
770Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
771Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
772Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
773Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
774Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
775Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
776Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
777Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
778Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
779Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
780The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
781The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
782The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
783Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
784Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
785TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
786Transient characterization of the electroforming process in TiO2 based resistive switching devices
787Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
788Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
789X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
790Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
791Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
792Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
793Optical and Electrical Properties of TixSi1-xOy Films
794Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
795Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
796Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
797Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
798Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
799Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
800Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
801Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
802Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
803Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
804The important role of water in growth of monolayer transition metal dichalcogenides
805Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
806Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
807Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
808Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
809Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
810Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
811Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
812Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
813Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
814Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
815Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
816Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
817Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
818Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
819Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
820Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
821Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
822Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
823Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
824Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
825Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
826Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
827Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
828Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
829Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
830Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
831Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
832Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
833Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
834Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
835Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
836Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
837Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
838Radical Enhanced Atomic Layer Deposition of Metals and Oxides
839Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
840Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
841Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
842Spectroscopy and control of near-surface defects in conductive thin film ZnO
843Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
844Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
845The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
846The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
847The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
848The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
849Top-down fabricated ZnO nanowire transistors for application in biosensors
850Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
851Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
852Plasma-enhanced atomic layer deposition of zinc phosphate
853Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
854Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
855Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
856Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
857Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
858Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
859Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
860Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
861Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
862Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
863Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
864Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
865High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
866Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
867Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
868Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
869Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
870Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
871Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
872Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
873PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
874PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
875PEALD ZrO2 Films Deposition on TiN and Si Substrates
876Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
877Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
878Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
879Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
880Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
881Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
882The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
883The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
884Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
885Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
886ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
887ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
888ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
889Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
890Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
891Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
892Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation


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