O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
11Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
12Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
13Advances in the fabrication of graphene transistors on flexible substrates
14Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
15Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
16Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
17Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
18Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
19Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
20Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
21ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
22AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
23AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
24AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
25Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
26Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
27Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
28An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
29Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
30Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
31Anti-stiction coating for mechanically tunable photonic crystal devices
32Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
33Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
34Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
35Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
36Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
37Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
38Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
39Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
40Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
41Band alignment of Al2O3 with (-201) β-Ga2O3
42Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
43Breakdown and Protection of ALD Moisture Barrier Thin Films
44Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
45Capacitance spectroscopy of gate-defined electronic lattices
46Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
47Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
48Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
49Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
50Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
51Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
52Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
53Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
54Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
55Charge effects of ultrafine FET with nanodot type floating gate
56Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
57Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
58Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
59Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
60Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
61Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
62Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
63Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
64Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
65Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
66Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
67Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
68Damage evaluation in graphene underlying atomic layer deposition dielectrics
69DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
70Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
71Densification of Thin Aluminum Oxide Films by Thermal Treatments
72Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
73Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
74Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
75DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
76Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
77Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
78Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
79Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
80Dynamic tuning of plasmon resonance in the visible using graphene
81Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
82Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
83Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
84Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
85Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
86Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
87Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
88Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
89Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
90Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
91Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
92Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
93Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
94Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
95Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
96Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
97Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
98Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
99Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
100Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
101Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
102Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
103Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
104Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
105Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
106Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
107Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
108Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
109Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
110Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
111Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
112Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
113Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
114Energy-enhanced atomic layer deposition for more process and precursor versatility
115Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
116Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
117Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
118Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
119Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
120Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
121Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
122Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
123Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
124Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
125Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
126Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
127Experimental verification of electro-refractive phase modulation in graphene
128Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
129Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
130Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
131Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
132Fiber-matrix interface reinforcement using Atomic Layer Deposition
133Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
134Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
135Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
136Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
137Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
138First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
139Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
140Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
141Flexible, light trapping substrates for organic photovoltaics
142Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
143Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
144Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
145Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
146Hafnia and alumina on sulphur passivated germanium
147High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
148High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
149High-efficiency embedded transmission grating
150High-Reflective Coatings For Ground and Space Based Applications
151High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
152Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
153Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
154Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
155Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
156Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
157Impact of interface materials on side permeation in indirect encapsulation of organic electronics
158Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
159Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
160Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
161Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
162Improved understanding of recombination at the Si/Al2O3 interface
163Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
164Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
165Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
166Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
167Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
168In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
169In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
170In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
171Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
172Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
173Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
174Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
175Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
176Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
177Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
178Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
179Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
180Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
181Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
182Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
183Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
184Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
185Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
186Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
187Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
188Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
189Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
190Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
191Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
192Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
193Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
194Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
195Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
196Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
197Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
198Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
199Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
200Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
201Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
202Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
203Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
204Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
205Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
206Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
207Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
208Lithium-Iron (III) Fluoride Battery with Double Surface Protection
209Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
210Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
211Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
212Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
213Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
214Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
215Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
216Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
217MANOS performance dependence on ALD Al2O3 oxidation source
218Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
219Mechanical properties of thin-film Parylene-metal-Parylene devices
220Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
221Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
222Method of Fabrication for Encapsulated Polarizing Resonant Gratings
223Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
224Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
225Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
226Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
227Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
228Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
229Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
230MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
231Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
232N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
233Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
234Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
235Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
236Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
237Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
238Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
239Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
240On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
241On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
242On the equilibrium concentration of boron-oxygen defects in crystalline silicon
243On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
244On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
245Optical display film as flexible and light trapping substrate for organic photovoltaics
246Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
247Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
248Optimization of the Surface Structure on Black Silicon for Surface Passivation
249Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
250Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
251Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
252Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
253Passivation effects of atomic-layer-deposited aluminum oxide
254Patterned deposition by plasma enhanced spatial atomic layer deposition
255PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
256Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
257Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
258Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
259Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
260Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
261Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
262Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
263Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
264Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
265Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
266Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
267Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
268Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
269Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
270Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
271Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
272Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
273Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
274Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
275Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
276Propagation Effects in Carbon Nanoelectronics
277Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
278Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
279Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
280Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
281Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
282Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
283Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
284Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
285Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
286Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
287Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
288Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
289Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
290Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
291Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
292Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
293Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
294Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
295Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
296Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
297Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
298Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
299Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
300Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
301Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
302Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
303Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
304Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
305Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
306Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
307Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
308Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
309Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
310Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
311Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
312The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
313The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
314The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
315Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
316Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
317Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
318Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
319TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
320Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
321Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
322Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
323Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
324Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
325Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
326Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
327Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
328Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
329Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
330Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
331Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
332Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
333Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
334Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
335Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
336Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
337Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
338Very high frequency plasma reactant for atomic layer deposition
339Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
340Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
341Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
342Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
343Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
344Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
345Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
346Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
347Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
348Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
349Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
350Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
351Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
352Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
353Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
354Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
355Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
356Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
357Composite materials and nanoporous thin layers made by atomic layer deposition
358Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
359Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
360Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
361Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
362Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
363Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
364Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
365Optical and Electrical Properties of AlxTi1-xO Films
366Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
367Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
368Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
369Atomic Layer Deposition of Gold Metal
370Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
371Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
372Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
373Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
374Plasma-enhanced atomic layer deposition of BaTiO3
375High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
376Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
377Plasma-enhanced atomic layer deposition of BaTiO3
378Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
379Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
380Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
381Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
382Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
383Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
384A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
385Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
386Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
387Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
388Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
389Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
390Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
391Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
392Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
393Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
394Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
395Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
396Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
397Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
398Radical Enhanced Atomic Layer Deposition of Metals and Oxides
399Radical Enhanced Atomic Layer Deposition of Metals and Oxides
400Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
401Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
402Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
403Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
404Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
405Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
406Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
407Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
408Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
409Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
410Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
411Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
412Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
413Plasma enhanced atomic layer deposition of Fe2O3 thin films
414Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
415Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
416Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
417The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
418Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
419Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
420Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
421Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
422Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
423Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
424Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
425Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
426Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
427Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
428Plasma enhanced atomic layer deposition of Ga2O3 thin films
429Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
430Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
431RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
432Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
433Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
434Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
435Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
436Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
437Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
438Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
439Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
440Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
441Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
442Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
443Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
444Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
445A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
446An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
447Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
448Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
449Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
450Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
451Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
452AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
453Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
454Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
455Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
456Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
457Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
458Characteristics of HfO2 thin films grown by plasma atomic layer deposition
459Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
460Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
461Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
462Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
463Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
464Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
465Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
466Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
467Damage evaluation in graphene underlying atomic layer deposition dielectrics
468Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
469Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
470Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
471Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
472Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
473Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
474Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
475Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
476Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
477Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
478Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
479Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
480Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
481Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
482Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
483Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
484Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
485Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
486Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
487Hafnia and alumina on sulphur passivated germanium
488HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
489Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
490Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
491Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
492Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
493In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
494Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
495Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
496Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
497Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
498Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
499Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
500Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
501Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
502Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
503Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
504Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
505Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
506Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
507Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
508Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
509Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
510Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
511Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
512Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
513On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
514Optical properties and bandgap evolution of ALD HfSiOx films
515Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
516PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
517Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
518Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
519Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
520Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
521Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
522Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
523Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
524Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
525Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
526Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
527Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
528Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
529Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
530Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
531The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
532The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
533The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
534The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
535The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
536Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
537Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
538Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
539Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
540Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
541Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
542Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
543Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
544Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
545Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
546Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
547Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
548Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
549HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
550Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
551The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
552Annealing behavior of ferroelectric Si-doped HfO2 thin films
553Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
554Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
555Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
556Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
557Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
558Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
559Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
560Optical properties and bandgap evolution of ALD HfSiOx films
561TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
562The effects of layering in ferroelectric Si-doped HfO2 thin films
563Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
564Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
565Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
566Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
567New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
568Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
569Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
570All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
571Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
572Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
573Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
574Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
575High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
576High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
577Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
578Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
579On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
580Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
581Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
582High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
583Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
584Systematic efficiency study of line-doubled zone plates
585TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
586IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
587Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
588Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
589Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
590Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
591Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
592Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
593Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
594The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
595XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
596Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
597Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
598Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
599Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
600Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
601Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
602Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
603Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
604In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
605Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
606Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
607Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
608Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
609Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
610Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
611Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
612Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
613The important role of water in growth of monolayer transition metal dichalcogenides
614Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
615Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
616Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
617Radical Enhanced Atomic Layer Deposition of Metals and Oxides
618Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
619Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
620Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
621Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
622Radical Enhanced Atomic Layer Deposition of Metals and Oxides
623Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
624Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
625Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
626Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
627Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
628Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
629Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
630Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
631Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
632Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
633Encapsulation method for atom probe tomography analysis of nanoparticles
634Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
635Growth of silica nanowires in vacuum
636In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
637Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
638Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
639Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
640Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
641Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
642Remote Plasma ALD of Platinum and Platinum Oxide Films
643Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
644Room-Temperature Atomic Layer Deposition of Platinum
645Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
646Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
647Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
648Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
649Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
650Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
651Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
652Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
653The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
654Remote Plasma ALD of Platinum and Platinum Oxide Films
655Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
656Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
657Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
658Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
659Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
660Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
661High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
662Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
663In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
664Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
665Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
666Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
667Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
668Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
669(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
670ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
671Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
672Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
673Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
674Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
675Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
676Radical Enhanced Atomic Layer Deposition of Metals and Oxides
677Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
678Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
679Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
680Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
681'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
682A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
683A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
684Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
685Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
686Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
687Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
688Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
689Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
690Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
691Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
692Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
693Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
694Atomic layer deposition of metal-oxide thin films on cellulose fibers
695Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
696Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
697Breakdown and Protection of ALD Moisture Barrier Thin Films
698Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
699Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
700Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
701Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
702Comparative study of ALD SiO2 thin films for optical applications
703Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
704Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
705Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
706Designing high performance precursors for atomic layer deposition of silicon oxide
707Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
708Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
709Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
710Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
711Energy-enhanced atomic layer deposition for more process and precursor versatility
712Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
713Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
714Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
715Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
716Gate Insulator for High Mobility Oxide TFT
717Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
718High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
719High-Reflective Coatings For Ground and Space Based Applications
720Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
721Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
722Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
723Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
724Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
725Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
726Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
727Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
728Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
729Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
730Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
731Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
732Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
733Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
734Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
735Modal properties of a strip-loaded horizontal slot waveguide
736Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
737Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
738Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
739Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
740Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
741On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
742On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
743Optical properties and bandgap evolution of ALD HfSiOx films
744PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
745Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
746Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
747Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
748Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
749Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
750Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
751Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
752Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
753Radical Enhanced Atomic Layer Deposition of Metals and Oxides
754Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
755Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
756Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
757Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
758Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
759Single-Cell Photonic Nanocavity Probes
760Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
761Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
762Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
763Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
764Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
765Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
766Symmetrical Al2O3-based passivation layers for p- and n-type silicon
767Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
768Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
769Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
770Trapped charge densities in Al2O3-based silicon surface passivation layers
771Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
772Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
773A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
774Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
775Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
776Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
777Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
778Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
779Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
780Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
781In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
782Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
783Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
784Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
785Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
786SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
787Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
788Surface and sensing properties of PE-ALD SnO2 thin film
789Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
790Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
791Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
792Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
793Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
794Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
795Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
796Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
797Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
798Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
799Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
800Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
801Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
802Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
803Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
804Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
805Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
806Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
807Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
808Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
809Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
810Radical Enhanced Atomic Layer Deposition of Metals and Oxides
811Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
812Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
813Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
814Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
815Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
816Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
817Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
818Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
819Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
820Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
821Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
822Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
823Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
824Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
825Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
826Topographically selective deposition
827Trilayer Tunnel Selectors for Memristor Memory Cells
828Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
829Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
830A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
831Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
832An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
833Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
834Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
835Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
836Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
837Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
838Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
839Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
840Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
841Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
842Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
843Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
844Biofilm prevention on cochlear implants
845Bipolar resistive switching in amorphous titanium oxide thin film
846Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
847Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
848Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
849Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
850Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
851Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
852Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
853Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
854Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
855Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
856Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
857Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
858Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
859Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
860Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
861Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
862Energy-enhanced atomic layer deposition for more process and precursor versatility
863Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
864Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
865Epitaxial 1D electron transport layers for high-performance perovskite solar cells
866Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
867Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
868Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
869Flexible Memristive Memory Array on Plastic Substrates
870Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
871Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
872Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
873Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
874Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
875Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
876Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
877High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
878High-efficiency embedded transmission grating
879Highly efficient and bending durable perovskite solar cells: toward a wearable power source
880Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
881Impact of interface materials on side permeation in indirect encapsulation of organic electronics
882Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
883Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
884In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
885In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
886In-gap states in titanium dioxide and oxynitride atomic layer deposited films
887Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
888Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
889Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
890Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
891Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
892Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
893Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
894Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
895Lithium-Iron (III) Fluoride Battery with Double Surface Protection
896Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
897Low temperature temporal and spatial atomic layer deposition of TiO2 films
898Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
899Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
900Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
901MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
902Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
903On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
904Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
905Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
906Oxygen migration in TiO2-based higher-k gate stacks
907Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
908Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
909Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
910Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
911Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
912Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
913Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
914Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
915Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
916Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
917Plasma-enhanced atomic layer deposition of BaTiO3
918Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
919Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
920Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
921Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
922Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
923Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
924Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
925Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
926Study on the resistive switching time of TiO2 thin films
927Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
928Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
929Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
930Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
931The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
932The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
933The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
934The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
935The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
936Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
937Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
938TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
939Transient characterization of the electroforming process in TiO2 based resistive switching devices
940Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
941Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
942X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
943Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
944Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
945Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
946Optical and Electrical Properties of TixSi1-xOy Films
947Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
948Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
949Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
950Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
951Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
952Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
953Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
954Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
955Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
956Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
957In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
958Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
959Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
960The important role of water in growth of monolayer transition metal dichalcogenides
961Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
962Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
963Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
964Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
965Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
966Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
967Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
968Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
969Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
970Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
971Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
972Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
973Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
974Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
975Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
976All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
977Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
978Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
979Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
980Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
981Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
982Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
983Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
984Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
985Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
986Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
987Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
988Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
989Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
990Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
991Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
992Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
993Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
994Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
995Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
996Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
997Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
998Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
999Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1000Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1001Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1002Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1003Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1004Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1005Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1006Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1007Spectroscopy and control of near-surface defects in conductive thin film ZnO
1008Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1009Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1010The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1011The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1012The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1013The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1014The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1015Top-down fabricated ZnO nanowire transistors for application in biosensors
1016Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1017Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1018Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1019ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1020Plasma-enhanced atomic layer deposition of zinc phosphate
1021Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1022Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1023Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1024Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1025Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1026Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1027Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1028Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1029Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1030Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1031Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1032Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1033Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1034Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1035High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1036Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1037Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1038Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1039Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1040Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1041Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1042Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1043Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1044Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1045PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1046PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1047PEALD ZrO2 Films Deposition on TiN and Si Substrates
1048Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1049Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1050Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1051Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1052Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1053Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1054Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1055Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1056The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1057The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1058Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1059Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1060XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1061ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1062ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1063ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1064Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1065Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1066Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1067Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation