O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
2TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
3Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
4Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
5Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
6Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
7Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
8Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
9Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
10Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
11Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
12Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
13The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
14'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
15Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
16Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
17Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
18Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
19Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
20Very high frequency plasma reactant for atomic layer deposition
21Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
22Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
23Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
24Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
25Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
26Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
27Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
28Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
29Radical Enhanced Atomic Layer Deposition of Metals and Oxides
30Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
31Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
32Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
33Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
34High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
35Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
36Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
37Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
38Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
39Sub-7-nm textured ZrO2 with giant ferroelectricity
40Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
41Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
42Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
43Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
44Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
45Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
46On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
47Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
48Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
49Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
50Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
51Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
52HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
53Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
54Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
55Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
56Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
57Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
58Hafnia and alumina on sulphur passivated germanium
59Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
60Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
61Energy-enhanced atomic layer deposition for more process and precursor versatility
62Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
63Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
64Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
65Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
66Top-down fabricated ZnO nanowire transistors for application in biosensors
67Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
68Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
69MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
70Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
71Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
72Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
73Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
74Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
75Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
76Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
77Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
78Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
79Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
80The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
81Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
82Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
83Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
84Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
85Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
86Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
87Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
88High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
89Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
90High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
91Impact of interface materials on side permeation in indirect encapsulation of organic electronics
92Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
93Designing high performance precursors for atomic layer deposition of silicon oxide
94Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
95Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
96Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
97The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
98Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
99Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
100Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
101Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
102Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
103Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
104Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
105Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
106Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
107Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
108Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
109Radical Enhanced Atomic Layer Deposition of Metals and Oxides
110Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
111Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
112New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
113Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
114Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
115MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
116Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
117Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
118Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
119Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
120The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
121Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
122Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
123Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
124Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
125Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
126Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
127Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
128Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
129Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
130Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
131Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
132A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
133Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
134Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
135Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
136Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
137Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
138In-gap states in titanium dioxide and oxynitride atomic layer deposited films
139High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
140Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
141Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
142Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
143Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
144Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
145Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
146On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
147Improved understanding of recombination at the Si/Al2O3 interface
148Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
149Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
150Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
151Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
152Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
153Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
154In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
155Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
156Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
157Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
158Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
159Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
160Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
161Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
162ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
163Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
164Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
165HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
166Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
167TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
168Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
169Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
170Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
171Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
172Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
173Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
174Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
175Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
176Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
177Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
178The important role of water in growth of monolayer transition metal dichalcogenides
179Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
180Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
181Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
182RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
183Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
184Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
185DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
186High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
187Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
188Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
189Hafnia and alumina on sulphur passivated germanium
190(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
191Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
192Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
193Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
194Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
195Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
196Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
197Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
198Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
199Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
200Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
201A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
202Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
203Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
204Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
205Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
206In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
207Transient characterization of the electroforming process in TiO2 based resistive switching devices
208Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
209Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
210Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
211Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
212PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
213Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
214Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
215Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
216Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
217Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
218Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
219Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
220Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
221Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
222Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
223Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
224Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
225Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
226Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
227Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
228Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
229Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
230Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
231Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
232Highly efficient and bending durable perovskite solar cells: toward a wearable power source
233Gate Insulator for High Mobility Oxide TFT
234Propagation Effects in Carbon Nanoelectronics
235Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
236On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
237Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
238Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
239All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
240Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
241Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
242Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
243Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
244XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
245Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
246Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
247Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
248Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
249Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
250Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
251The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
252Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
253Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
254Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
255Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
256Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
257Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
258Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
259Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
260Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
261Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
262Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
263Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
264Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
265Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
266The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
267Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
268Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
269In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
270The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
271Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
272Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
273Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
274Lithium-Iron (III) Fluoride Battery with Double Surface Protection
275Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
276Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
277Epitaxial 1D electron transport layers for high-performance perovskite solar cells
278Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
279Surface and sensing properties of PE-ALD SnO2 thin film
280A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
281Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
282Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
283Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
284Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
285Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
286Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
287Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
288Plasma-enhanced atomic layer deposition of BaTiO3
289Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
290Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
291Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
292Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
293Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
294Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
295Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
296A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
297AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
298Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
299Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
300Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
301Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
302High-efficiency embedded transmission grating
303Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
304Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
305Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
306Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
307Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
308Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
309Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
310Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
311Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
312Nonvolatile Capacitive Crossbar Array for In-Memory Computing
313Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
314Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
315'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
316Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
317Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
318Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
319Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
320Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
321Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
322Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
323Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
324Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
325Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
326An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
327Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
328An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
329Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
330A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
331Radical Enhanced Atomic Layer Deposition of Metals and Oxides
332Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
333Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
334Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
335Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
336Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
337Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
338Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
339Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
340Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
341Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
342Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
343Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
344PEALD ZrO2 Films Deposition on TiN and Si Substrates
345Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
346Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
347Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
348In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
349Nonvolatile Capacitive Crossbar Array for In-Memory Computing
350Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
351A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
352Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
353The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
354Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
355Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
356Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
357Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
358Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
359Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
360Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
361Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
362Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
363On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
364Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
365Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
366Band alignment of Al2O3 with (-201) β-Ga2O3
367The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
368Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
369Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
370Spectroscopy and control of near-surface defects in conductive thin film ZnO
371Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
372Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
373Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
374Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
375Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
376Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
377Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
378Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
379Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
380Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
381Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
382Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
383Passivation effects of atomic-layer-deposited aluminum oxide
384Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
385Optical properties and bandgap evolution of ALD HfSiOx films
386Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
387Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
388Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
389Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
390Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
391Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
392Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
393Bipolar resistive switching in amorphous titanium oxide thin film
394Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
395Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
396Patterned deposition by plasma enhanced spatial atomic layer deposition
397Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
398Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
399Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
400TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
401Breakdown and Protection of ALD Moisture Barrier Thin Films
402Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
403Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
404Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
405Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
406Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
407Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
408Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
409Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
410Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
411Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
412Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
413Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
414Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
415Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
416A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
417Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
418Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
419PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
420Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
421A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
422Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
423Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
424Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
425Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
426Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
427Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
428In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
429Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
430A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
431Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
432Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
433Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
434Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
435Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
436The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
437All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
438Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
439Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
440Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
441AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
442Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
443HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
444Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
445Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
446Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
447Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
448Dynamic tuning of plasmon resonance in the visible using graphene
449Oxygen migration in TiO2-based higher-k gate stacks
450Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
451Study on the resistive switching time of TiO2 thin films
452Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
453Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
454Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
455A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
456Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
457Plasma-enhanced atomic layer deposition of zinc phosphate
458Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
459Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
460Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
461Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
462Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
463Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
464Lithium-Iron (III) Fluoride Battery with Double Surface Protection
465Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
466Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
467Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
468Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
469PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
470Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
471Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
472Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
473Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
474Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
475Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
476Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
477Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
478Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
479ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
480Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
481Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
482Biofilm prevention on cochlear implants
483Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
484A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
485Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
486Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
487Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
488Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
489Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
490Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
491Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
492Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
493The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
494Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
495Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
496Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
497Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
498ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
499Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
500Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
501Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
502Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
503Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
504Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
505Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
506Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
507Breakdown and Protection of ALD Moisture Barrier Thin Films
508Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
509Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
510Topographically selective deposition
511Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
512XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
513Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
514Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
515Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
516Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
517Atomic Layer Deposition of Gold Metal
518Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
519Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
520The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
521Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
522Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
523Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
524Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
525Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
526Advances in the fabrication of graphene transistors on flexible substrates
527Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
528Impact of interface materials on side permeation in indirect encapsulation of organic electronics
529Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
530Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
531Encapsulation method for atom probe tomography analysis of nanoparticles
532Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
533Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
534Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
535Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
536Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
537Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
538Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
539The important role of water in growth of monolayer transition metal dichalcogenides
540The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
541Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
542Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
543Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
544Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
545Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
546Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
547Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
548Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
549Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
550The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
551Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
552Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
553Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
554Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
555Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
556In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
557Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
558Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
559Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
560Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
561Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
562Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
563Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
564N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
565Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
566An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
567Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
568Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
569Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
570Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
571Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
572Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
573SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
574Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
575Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
576Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
577High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
578Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
579Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
580AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
581Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
582Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
583Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
584Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
585Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
586Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
587Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
588Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
589Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
590Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
591Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
592Plasma-enhanced atomic layer deposition of BaTiO3
593Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
594Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
595Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
596Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
597Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
598IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
599Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
600Radical Enhanced Atomic Layer Deposition of Metals and Oxides
601Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
602Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
603Radical Enhanced Atomic Layer Deposition of Metals and Oxides
604Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
605The effects of layering in ferroelectric Si-doped HfO2 thin films
606Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
607Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
608Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
609Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
610Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
611Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
612The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
613Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
614Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
615Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
616Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
617Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
618Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
619Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
620The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
621Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
622Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
623Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
624Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
625Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
626Remote Plasma ALD of Platinum and Platinum Oxide Films
627Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
628Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
629Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
630Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
631Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
632Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
633Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
634Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
635Capacitance spectroscopy of gate-defined electronic lattices
636Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
637The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
638Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
639Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
640Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
641Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
642In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
643Symmetrical Al2O3-based passivation layers for p- and n-type silicon
644Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
645Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
646Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
647Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
648Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
649Annealing behavior of ferroelectric Si-doped HfO2 thin films
650Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
651Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
652Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
653Plasma enhanced atomic layer deposition of Fe2O3 thin films
654Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
655Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
656Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
657Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
658Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
659Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
660Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
661Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
662Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
663Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
664Residual stress study of thin films deposited by atomic layer deposition
665Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
666An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
667Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
668Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
669Damage evaluation in graphene underlying atomic layer deposition dielectrics
670Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
671Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
672Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
673Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
674Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
675Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
676Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
677Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
678Sub-10-nm ferroelectric Gd-doped HfO2 layers
679Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
680Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
681Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
682Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
683Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
684Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
685Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
686ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
687Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
688Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
689Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
690Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
691Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
692Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
693Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
694α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
695Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
696Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
697Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
698Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
699Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
700ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
701Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
702Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
703Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
704Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
705Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
706Radical Enhanced Atomic Layer Deposition of Metals and Oxides
707In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
708Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
709Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
710Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
711Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
712Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
713Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
714Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
715In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
716Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
717Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
718Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
719Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
720Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
721Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
722Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
723Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
724Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
725Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
726Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
727Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
728Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
729Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
730Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
731Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
732Method of Fabrication for Encapsulated Polarizing Resonant Gratings
733Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
734The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
735Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
736Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
737Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
738Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
739Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
740Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
741Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
742Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
743Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
744On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
745Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
746Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
747Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
748Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
749Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
750Trilayer Tunnel Selectors for Memristor Memory Cells
751Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
752Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
753Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
754Optical display film as flexible and light trapping substrate for organic photovoltaics
755AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
756Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
757Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
758Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
759Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
760Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
761Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
762Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
763Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
764Charge effects of ultrafine FET with nanodot type floating gate
765Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
766Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
767Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
768Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
769Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
770Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
771Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
772Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
773Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
774Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
775Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
776Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
777Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
778Optical in situ monitoring of plasma-enhanced atomic layer deposition process
779Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
780Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
781Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
782Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
783Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
784Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
785Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
786Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
787Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
788Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
789Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
790Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
791Trapped charge densities in Al2O3-based silicon surface passivation layers
792Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
793Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
794Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
795Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
796Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
797Atomic Layer Deposition of the Conductive Delafossite PtCoO2
798Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
799Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
800Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
801Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
802Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
803Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
804Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
805Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
806MANOS performance dependence on ALD Al2O3 oxidation source
807Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
808A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
809Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
810Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
811Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
812Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
813Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
814Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
815Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
816Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
817Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
818Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
819Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
820Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
821Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
822Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
823Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
824Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
825Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
826Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
827A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
828Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
829Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
830Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
831The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
832Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
833Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
834Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
835Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
836Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
837Radical Enhanced Atomic Layer Deposition of Metals and Oxides
838Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
839Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
840Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
841Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
842Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
843Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
844Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
845Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
846Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
847Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
848High-Reflective Coatings For Ground and Space Based Applications
849Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
850Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
851Anti-stiction coating for mechanically tunable photonic crystal devices
852Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
853Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
854High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
855Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
856Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
857Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
858Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
859Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
860Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
861Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
862Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
863Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
864Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
865Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
866Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
867Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
868Atomic layer deposition of YMnO3 thin films
869ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
870Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
871Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
872Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
873Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
874Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
875Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
876Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
877Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
878Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
879Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
880Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
881Energy-enhanced atomic layer deposition for more process and precursor versatility
882Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
883Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
884Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
885The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
886Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
887Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
888Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
889High-efficiency embedded transmission grating
890Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
891Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
892Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
893Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
894Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
895Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
896Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
897Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
898Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
899Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
900Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
901Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
902Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
903Optical and Electrical Properties of TixSi1-xOy Films
904Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
905Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
906Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
907Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
908Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
909Single-Cell Photonic Nanocavity Probes
910Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
911Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
912Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
913Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
914Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
915Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
916Flexible, light trapping substrates for organic photovoltaics
917Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
918First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
919Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
920Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
921Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
922Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
923Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
924Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
925Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
926Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
927Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
928Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
929Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
930Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
931High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
932Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
933Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
934Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
935Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
936Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
937Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
938Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
939Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
940Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
941Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
942Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
943Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
944Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
945Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
946Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
947The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
948Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
949Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
950Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
951Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
952Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
953Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
9543D structure evolution using metastable atomic layer deposition based on planar silver templates
955Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
956Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
957Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
958Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
959PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
960Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
961Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
962Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
963High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
964Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
965Systematic efficiency study of line-doubled zone plates
966Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
967Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
968Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
969High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
970Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
971Residual stress study of thin films deposited by atomic layer deposition
972Energy-enhanced atomic layer deposition for more process and precursor versatility
973Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
974Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
975In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
976Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
977Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
978Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
979Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
980Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
981Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
982Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
983Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
984Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
985Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
986Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
987Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
988Innovative remote plasma source for atomic layer deposition for GaN devices
989Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
990Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
991Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
992Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
993Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
994Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
995Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
996Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
997Experimental verification of electro-refractive phase modulation in graphene
998Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
999Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1000Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
1001Modal properties of a strip-loaded horizontal slot waveguide
1002Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
1003Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
100446-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
1005Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1006Remote Plasma ALD of Platinum and Platinum Oxide Films
1007Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
1008Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
1009Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1010Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1011Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
1012Optical and Electrical Properties of AlxTi1-xO Films
1013On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1014Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
1015Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
1016Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1017Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1018Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
1019Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
1020Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
1021TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1022Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1023Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
1024Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
1025Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
1026Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1027Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
1028Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
1029Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
1030Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
1031Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1032Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
1033A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1034Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1035Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
1036Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
1037Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1038Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1039Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
1040Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
1041Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
1042Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1043Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
1044ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1045Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1046Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
1047Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
1048Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1049Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1050Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
1051Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1052Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1053Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1054Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
1055Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
1056Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
1057Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
1058Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
1059Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
1060Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
1061Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
1062Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1063Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1064Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
1065High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
1066Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1067Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1068Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
1069Optical properties and bandgap evolution of ALD HfSiOx films
1070Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1071Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1072Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
1073Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
1074Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1075Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
1076Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
1077Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1078Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
10791D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
1080Comparative study of ALD SiO2 thin films for optical applications
1081Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
1082Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
1083Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1084Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
1085Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1086Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
1087On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1088Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1089Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
1090Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
1091Room-Temperature Atomic Layer Deposition of Platinum
1092A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
1093Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
1094Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1095Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
1096Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
1097Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1098Plasma enhanced atomic layer deposition of Ga2O3 thin films
1099Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
1100X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1101Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1102Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1103Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
1104Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1105Flexible Memristive Memory Array on Plastic Substrates
1106Optimization of the Surface Structure on Black Silicon for Surface Passivation
1107Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
1108Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
1109Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1110Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
1111Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
1112Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
1113Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
1114Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
1115Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1116Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1117Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1118Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1119Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1120Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
1121Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1122Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
1123Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1124Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1125Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
1126Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
1127Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
1128Growth of silica nanowires in vacuum
1129Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
1130Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
1131Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
1132Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
1133Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1134Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
1135Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
1136Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1137Low temperature temporal and spatial atomic layer deposition of TiO2 films
1138On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1139Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
1140Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1141Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1142Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1143Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1144Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1145Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
1146Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
1147On the equilibrium concentration of boron-oxygen defects in crystalline silicon
1148Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
1149Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
1150Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1151Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1152Characteristics of HfO2 thin films grown by plasma atomic layer deposition
1153Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1154Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
1155Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
1156Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
1157In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1158Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
1159High-Reflective Coatings For Ground and Space Based Applications
1160Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
1161Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1162In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
1163Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
1164Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
1165Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1166The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1167Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
1168Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1169Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1170Atomic layer deposition of metal-oxide thin films on cellulose fibers
1171Fiber-matrix interface reinforcement using Atomic Layer Deposition
1172Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
1173Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
1174Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
1175Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1176Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1177Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1178Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1179Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1180High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
1181Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
1182Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
1183DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
1184Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1185Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1186Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
1187Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1188Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
1189Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
1190Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1191Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1192Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
1193Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1194Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
1195Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
1196Plasma-enhanced atomic layer deposition of BaTiO3
1197Optical properties and bandgap evolution of ALD HfSiOx films
1198Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1199Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
1200Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1201Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
1202Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
1203PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
1204Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
1205Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
1206Mechanical properties of thin-film Parylene-metal-Parylene devices
1207Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
1208Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1209Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
1210Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
1211Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
1212Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
1213Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1214Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
1215Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
1216Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
1217Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
1218Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1219Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1220Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1221Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1222Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1223Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1224A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1225In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
1226Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
1227Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
1228Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
1229The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
1230Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1231Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
1232Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
1233Tuning size and coverage of Pd nanoparticles using atomic layer deposition
1234Damage evaluation in graphene underlying atomic layer deposition dielectrics
1235Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1236From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1237Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1238Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
1239Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1240Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1241Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
1242Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1243Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
1244The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1245Densification of Thin Aluminum Oxide Films by Thermal Treatments
1246Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
1247On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
1248Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1249Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1250In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
1251Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1252Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
1253Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1254HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
1255Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1256Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1257Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
1258Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1259Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1260Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1261Composite materials and nanoporous thin layers made by atomic layer deposition
1262Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
1263Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1264Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1265Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1266Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate