Oxygen, O2, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12Advances in the fabrication of graphene transistors on flexible substrates
13Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30Anti-stiction coating for mechanically tunable photonic crystal devices
31Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38Band alignment of Al2O3 with (-201) β-Ga2O3
39Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40Breakdown and Protection of ALD Moisture Barrier Thin Films
41Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42Capacitance spectroscopy of gate-defined electronic lattices
43Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52Charge effects of ultrafine FET with nanodot type floating gate
53Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
60Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
61Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
62Damage evaluation in graphene underlying atomic layer deposition dielectrics
63DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
64Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
65Demonstration of flexible thin film transistors with GaN channels
66Densification of Thin Aluminum Oxide Films by Thermal Treatments
67Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
68Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
69Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
70DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
71Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
72Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
73Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
74Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
75Dynamic tuning of plasmon resonance in the visible using graphene
76Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
77Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
78Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
79Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
80Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
81Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
82Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
83Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
84Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
85Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
86Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
87Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
88Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
89Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
90Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
91Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
92Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
93Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
94Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
95Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
96Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
97Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
98Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
99Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
100Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
101Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
102Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
103Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
104Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
105Energy-enhanced atomic layer deposition for more process and precursor versatility
106Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
107Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
108Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
109Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
110Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
111Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
112Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
113Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
114Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
115Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
116Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
117Experimental verification of electro-refractive phase modulation in graphene
118Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
119Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
120Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
121Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
122Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
123Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
124Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
125Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
126Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
127Flexible, light trapping substrates for organic photovoltaics
128Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
129Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
130Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
131Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
132Hafnia and alumina on sulphur passivated germanium
133High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
134High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
135High-efficiency embedded transmission grating
136High-Reflective Coatings For Ground and Space Based Applications
137Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
138Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
139Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
140Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
141Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
142Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
143Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
144Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
145Improved understanding of recombination at the Si/Al2O3 interface
146Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
147Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
148Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
149Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
150Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
151In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
152In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
153In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
154Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
155Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
156Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
157Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
158Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
159Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
160Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
161Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
162Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
163Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
164Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
165Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
166Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
167Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
168Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
169Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
170Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
171Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
172Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
173Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
174Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
175Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
176Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
177Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
178Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
179Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
180Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
181Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
182Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
183Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
184Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
185Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
186Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
187Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
188Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
189Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
190Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
191MANOS performance dependence on ALD Al2O3 oxidation source
192Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
193Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
194Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
195Method of Fabrication for Encapsulated Polarizing Resonant Gratings
196Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
197Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
198Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
199Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
200Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
201Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
202Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
203N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
204Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
205Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
206Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
207Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
208Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
209Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
210On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
211On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
212On the equilibrium concentration of boron-oxygen defects in crystalline silicon
213On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
214Optical display film as flexible and light trapping substrate for organic photovoltaics
215Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
216Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
217Optimization of the Surface Structure on Black Silicon for Surface Passivation
218Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
219Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
220Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
221Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
222Passivation effects of atomic-layer-deposited aluminum oxide
223Patterned deposition by plasma enhanced spatial atomic layer deposition
224PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
225Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
226Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
227Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
228Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
229Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
230Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
231Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
232Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
233Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
234Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
235Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
236Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
237Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
238Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
239Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
240Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
241Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
242Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
243Propagation Effects in Carbon Nanoelectronics
244Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
245Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
246Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
247Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
248Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
249Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
250Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
251Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
252Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
253Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
254Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
255Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
256Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
257Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
258Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
259Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
260Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
261Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
262Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
263Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
264Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
265Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
266Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
267Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
268Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
269Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
270Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
271Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
272Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
273Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
274Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
275Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
276The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
277The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
278The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
279Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
280Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
281Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
282Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
283TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
284Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
285Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
286Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
287Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
288Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
289Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
290Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
291Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
292Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
293Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
294Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
295Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
296Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
297Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
298Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
299Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
300Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
301Very high frequency plasma reactant for atomic layer deposition
302Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
303Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
304Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
305Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
306Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
307Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
308Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
309Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
310Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
311Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
312Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
313Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
314Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
315Composite materials and nanoporous thin layers made by atomic layer deposition
316Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
317Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
318Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
319Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
320Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
321Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
322Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
323Optical and Electrical Properties of AlxTi1-xO Films
324Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
325Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
326Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
327Atomic Layer Deposition of Gold Metal
328Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
329Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
330Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
331Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
332High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
333Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
334Plasma-enhanced atomic layer deposition of BaTiO3
335Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
336Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
337Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
338A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
339Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
340Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
341Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
342Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
343Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
344Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
345Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
346Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
347Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
348Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
349Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
350Radical Enhanced Atomic Layer Deposition of Metals and Oxides
351Radical Enhanced Atomic Layer Deposition of Metals and Oxides
352Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
353Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
354Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
355Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
356Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
357Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
358Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
359Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
360Plasma enhanced atomic layer deposition of Fe2O3 thin films
361Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
362Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
363The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
364Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
365Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
366Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
367Electrical characteristics of β-Ga2O3 thin films grown by PEALD
368Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
369Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
370Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
371Plasma enhanced atomic layer deposition of Ga2O3 thin films
372Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
373Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
374RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
375Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
376Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
377Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
378Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
379Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
380Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
381Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
382Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
383Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
384Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
385Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
386A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
387An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
388Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
389Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
390Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
391Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
392Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
393AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
394Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
395Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
396Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
397Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
398Characteristics of HfO2 thin films grown by plasma atomic layer deposition
399Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
400Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
401Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
402Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
403Damage evaluation in graphene underlying atomic layer deposition dielectrics
404Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
405Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
406Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
407Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
408Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
409Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
410Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
411Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
412Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
413Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
414Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
415Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
416Hafnia and alumina on sulphur passivated germanium
417HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
418Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
419Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
420Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
421Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
422In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
423Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
424Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
425Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
426Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
427Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
428Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
429Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
430Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
431Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
432Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
433Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
434Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
435Optical properties and bandgap evolution of ALD HfSiOx films
436Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
437Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
438Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
439Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
440Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
441Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
442Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
443Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
444Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
445Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
446Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
447Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
448Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
449The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
450The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
451The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
452Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
453Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
454Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
455Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
456Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
457Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
458Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
459Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
460Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
461HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
462Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
463Annealing behavior of ferroelectric Si-doped HfO2 thin films
464Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
465Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
466Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
467Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
468Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
469Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
470Optical properties and bandgap evolution of ALD HfSiOx films
471TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
472The effects of layering in ferroelectric Si-doped HfO2 thin films
473Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
474Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
475Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
476Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
477Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
478High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
479High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
480Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
481Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
482On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
483High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
484Systematic efficiency study of line-doubled zone plates
485TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
486IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
487Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
488Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
489Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
490Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
491Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
492Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
493Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
494Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
495Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
496Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
497Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
498Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
499In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
500Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
501Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
502Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
503Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
504Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
505Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
506Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
507Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
508The important role of water in growth of monolayer transition metal dichalcogenides
509Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
510Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
511Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
512Radical Enhanced Atomic Layer Deposition of Metals and Oxides
513Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
514Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
515Radical Enhanced Atomic Layer Deposition of Metals and Oxides
516Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
517Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
518Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
519Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
520Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
521Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
522Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
523Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
524Encapsulation method for atom probe tomography analysis of nanoparticles
525Growth of silica nanowires in vacuum
526In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
527Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
528Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
529Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
530Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
531Remote Plasma ALD of Platinum and Platinum Oxide Films
532Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
533Room-Temperature Atomic Layer Deposition of Platinum
534Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
535Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
536Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
537Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
538Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
539Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
540Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
541Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
542The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
543Remote Plasma ALD of Platinum and Platinum Oxide Films
544Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
545Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
546Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
547Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
548Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
549Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
550Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
551In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
552Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
553Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
554Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
555Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
556Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
557(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
558ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
559Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
560Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
561Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
562Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
563Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
564Radical Enhanced Atomic Layer Deposition of Metals and Oxides
565Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
566Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
567Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
568'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
569A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
570Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
571Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
572Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
573Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
574Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
575Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
576Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
577Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
578Atomic layer deposition of metal-oxide thin films on cellulose fibers
579Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
580Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
581Breakdown and Protection of ALD Moisture Barrier Thin Films
582Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
583Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
584Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
585Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
586Comparative study of ALD SiO2 thin films for optical applications
587Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
588Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
589Designing high performance precursors for atomic layer deposition of silicon oxide
590Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
591Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
592Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
593Energy-enhanced atomic layer deposition for more process and precursor versatility
594Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
595Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
596Gate Insulator for High Mobility Oxide TFT
597Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
598High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
599High-Reflective Coatings For Ground and Space Based Applications
600Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
601Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
602Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
603Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
604Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
605Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
606Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
607Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
608Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
609Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
610Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
611Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
612Modal properties of a strip-loaded horizontal slot waveguide
613Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
614Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
615On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
616On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
617Optical properties and bandgap evolution of ALD HfSiOx films
618PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
619Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
620Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
621Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
622Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
623Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
624Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
625Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
626Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
627Radical Enhanced Atomic Layer Deposition of Metals and Oxides
628Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
629Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
630Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
631Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
632Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
633Single-Cell Photonic Nanocavity Probes
634Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
635Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
636Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
637Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
638Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
639Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
640Symmetrical Al2O3-based passivation layers for p- and n-type silicon
641Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
642Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
643Trapped charge densities in Al2O3-based silicon surface passivation layers
644Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
645Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
646A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
647Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
648Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
649Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
650Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
651Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
652Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
653Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
654Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
655Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
656SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
657Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
658Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
659Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
660Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
661Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
662Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
663Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
664Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
665Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
666Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
667Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
668Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
669Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
670Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
671Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
672Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
673Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
674Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
675Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
676Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
677Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
678Radical Enhanced Atomic Layer Deposition of Metals and Oxides
679Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
680Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
681Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
682Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
683Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
684Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
685Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
686Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
687Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
688Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
689Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
690Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
691Trilayer Tunnel Selectors for Memristor Memory Cells
692Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
693A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
694Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
695An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
696Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
697Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
698Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
699Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
700Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
701Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
702Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
703Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
704Biofilm prevention on cochlear implants
705Bipolar resistive switching in amorphous titanium oxide thin film
706Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
707Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
708Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
709Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
710Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
711Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
712Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
713Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
714Energy-enhanced atomic layer deposition for more process and precursor versatility
715Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
716Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
717Epitaxial 1D electron transport layers for high-performance perovskite solar cells
718Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
719Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
720Flexible Memristive Memory Array on Plastic Substrates
721Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
722Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
723Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
724Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
725High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
726High-efficiency embedded transmission grating
727Highly efficient and bending durable perovskite solar cells: toward a wearable power source
728Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
729Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
730Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
731In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
732In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
733In-gap states in titanium dioxide and oxynitride atomic layer deposited films
734Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
735Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
736Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
737Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
738Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
739Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
740Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
741Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
742Low temperature temporal and spatial atomic layer deposition of TiO2 films
743Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
744Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
745Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
746On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
747Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
748Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
749Oxygen migration in TiO2-based higher-k gate stacks
750Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
751Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
752Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
753Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
754Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
755Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
756Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
757Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
758Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
759Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
760Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
761Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
762Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
763Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
764Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
765Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
766Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
767Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
768Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
769Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
770Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
771The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
772The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
773The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
774Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
775Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
776TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
777Transient characterization of the electroforming process in TiO2 based resistive switching devices
778Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
779Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
780X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
781Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
782Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
783Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
784Optical and Electrical Properties of TixSi1-xOy Films
785Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
786Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
787Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
788Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
789Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
790Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
791Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
792Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
793Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
794Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
795The important role of water in growth of monolayer transition metal dichalcogenides
796Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
797Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
798Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
799Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
800Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
801Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
802Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
803Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
804Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
805Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
806Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
807Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
808Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
809Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
810Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
811Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
812Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
813Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
814Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
815Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
816Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
817Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
818Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
819Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
820Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
821Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
822Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
823Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
824Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
825Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
826Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
827Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
828Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
829Radical Enhanced Atomic Layer Deposition of Metals and Oxides
830Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
831Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
832Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
833Spectroscopy and control of near-surface defects in conductive thin film ZnO
834Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
835Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
836The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
837The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
838The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
839The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
840Top-down fabricated ZnO nanowire transistors for application in biosensors
841Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
842Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
843Plasma-enhanced atomic layer deposition of zinc phosphate
844Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
845Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
846Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
847Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
848Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
849Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
850Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
851Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
852Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
853Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
854High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
855Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
856Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
857Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
858Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
859Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
860Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
861Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
862PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
863PEALD ZrO2 Films Deposition on TiN and Si Substrates
864Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
865Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
866Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
867Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
868Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
869Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
870The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
871Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
872Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
873ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
874ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
875Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
876Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
877Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
878Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation


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