O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
2Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
3Annealing behavior of ferroelectric Si-doped HfO2 thin films
4Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
5Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
6Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
7Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
8Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
9Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
10Gate Insulator for High Mobility Oxide TFT
11Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
12Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
13Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
14Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
15Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
16Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
17Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
18Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
19Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
20Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
21(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
22Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
23Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
24Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
25Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
26Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
27Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
28Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
29Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
30Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
31Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
32Radical Enhanced Atomic Layer Deposition of Metals and Oxides
33Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
34Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
35Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
36An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
37Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
38Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
39Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
40Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
41Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
42Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
43Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
44Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
45Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
46Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
47Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
48Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
49Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
50Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
51High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
52Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
53Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
54High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
55The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
56Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
57Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
58A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
59Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
60Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
61Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
62Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
63Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
64Spectroscopy and control of near-surface defects in conductive thin film ZnO
65Hafnia and alumina on sulphur passivated germanium
66Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
67Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
68Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
69Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
70Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
71Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
72Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
73Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
74Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
75Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
76Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
77Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
78Advances in the fabrication of graphene transistors on flexible substrates
79Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
80Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
81Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
82Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
83Lithium-Iron (III) Fluoride Battery with Double Surface Protection
84Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
85Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
86Oxygen migration in TiO2-based higher-k gate stacks
87Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
88Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
89Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
90Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
91Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
92Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
93Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
94Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
95Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
96Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
97Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
98Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
99Radical Enhanced Atomic Layer Deposition of Metals and Oxides
100Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
101Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
102Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
103X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
104Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
105Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
106Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
107Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
108Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
109Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
110Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
111Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
112Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
113Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
114Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
115High-Reflective Coatings For Ground and Space Based Applications
116Tuning size and coverage of Pd nanoparticles using atomic layer deposition
117Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
118Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
119Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
120Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
121Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
122Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
123Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
124Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
125Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
126Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
127Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
128Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
129Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
130Highly efficient and bending durable perovskite solar cells: toward a wearable power source
131Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
132AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
133Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
134Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
135Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
136Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
137Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
138Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
139Dynamic tuning of plasmon resonance in the visible using graphene
140Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
141On the equilibrium concentration of boron-oxygen defects in crystalline silicon
142Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
143Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
144Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
145Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
146Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
147Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
148Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
149Top-down fabricated ZnO nanowire transistors for application in biosensors
150Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
151Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
152Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
153AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
154Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
155Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
156Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
157Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
158N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
159Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
160Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
161Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
162Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
163Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
164Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
165The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
166In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
167Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
168Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
169Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
170Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
171Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
172Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
173Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
174Plasma-enhanced atomic layer deposition of BaTiO3
175Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
176Transient characterization of the electroforming process in TiO2 based resistive switching devices
177Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
178Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
179Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
180Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
181Energy-enhanced atomic layer deposition for more process and precursor versatility
182Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
183Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
184Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
185Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
186Bipolar resistive switching in amorphous titanium oxide thin film
187Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
188Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
189Lithium-Iron (III) Fluoride Battery with Double Surface Protection
190Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
191Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
192Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
193TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
194The effects of layering in ferroelectric Si-doped HfO2 thin films
195Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
196Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
197Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
198Study on the resistive switching time of TiO2 thin films
199Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
200Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
201Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
202Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
203PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
204Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
205Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
206Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
207All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
208Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
209Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
210Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
211Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
212PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
213Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
214Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
215Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
216Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
217Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
218A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
219Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
220Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
221Anti-stiction coating for mechanically tunable photonic crystal devices
222Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
223The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
224Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
225Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
226Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
227Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
228Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
229Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
230Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
231Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
232Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
233Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
234Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
235A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
236High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
237Trilayer Tunnel Selectors for Memristor Memory Cells
238Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
239Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
240Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
241Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
242Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
243Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
244Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
245Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
246Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
247Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
248Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
249PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
250Surface and sensing properties of PE-ALD SnO2 thin film
251Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
252Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
253Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
254Densification of Thin Aluminum Oxide Films by Thermal Treatments
255Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
256Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
257Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
258Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
259Symmetrical Al2O3-based passivation layers for p- and n-type silicon
260Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
261Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
262Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
263Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
264Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
265Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
266Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
267PEALD ZrO2 Films Deposition on TiN and Si Substrates
268DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
269Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
270Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
271Remote Plasma ALD of Platinum and Platinum Oxide Films
272Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
273A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
274Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
275Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
276Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
277Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
278Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
279Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
280Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
281Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
282Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
283Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
284Optical properties and bandgap evolution of ALD HfSiOx films
285Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
286Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
287Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
288Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
2891D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
290Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
291Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
292'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
293ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
294Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
295Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
296Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
297Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
298Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
299Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
300Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
301Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
302Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
303Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
304Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
305Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
306Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
307Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
308Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
309A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
310Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
311Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
312On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
313Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
314Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
315Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
316ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
317Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
318Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
319Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
320Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
321Sub-7-nm textured ZrO2 with giant ferroelectricity
322Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
323Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
324Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
325Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
326Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
327Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
328Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
329Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
330Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
331Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
332From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
333Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
334Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
335Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
336Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
337High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
338Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
339α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
340Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
341Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
342Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
343Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
344Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
345Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
346XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
347Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
348Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
349Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
350Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
351Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
352Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
353The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
354Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
355Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
356Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
357Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
358Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
359Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
360Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
361Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
362Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
363Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
364Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
365The important role of water in growth of monolayer transition metal dichalcogenides
366Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
367First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
368Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
369Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
370The important role of water in growth of monolayer transition metal dichalcogenides
371Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
372Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
373Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
374Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
375Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
376Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
377Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
378Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
379Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
380Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
381Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
382Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
383Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
384Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
385Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
386Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
387Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
388Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
389Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
390Experimental verification of electro-refractive phase modulation in graphene
391Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
392HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
393Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
394Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
395Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
396Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
397Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
398Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
399Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
400In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
401Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
402The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
403Comparative study of ALD SiO2 thin films for optical applications
404Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
405A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
406Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
407Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
408Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
409Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
410Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
411Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
412Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
413Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
414Designing high performance precursors for atomic layer deposition of silicon oxide
415Capacitance spectroscopy of gate-defined electronic lattices
416Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
417Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
418Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
419Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
420Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
421Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
422ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
423Optical properties and bandgap evolution of ALD HfSiOx films
424In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
425High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
426Very high frequency plasma reactant for atomic layer deposition
427Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
428Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
429An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
430Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
431The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
432Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
433Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
434Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
435Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
436All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
437Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
438Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
439The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
440Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
441Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
442HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
443Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
444Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
445Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
446Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
447Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
448Optimization of the Surface Structure on Black Silicon for Surface Passivation
449Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
450Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
451RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
452Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
453Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
454Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
455Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
456Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
457Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
458Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
459Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
460The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
461Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
462Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
463Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
464Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
465Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
466Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
467An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
468A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
469Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
470Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
471Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
472Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
473Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
474Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
475Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
476Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
477Lithium-Iron (III) Fluoride Battery with Double Surface Protection
478Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
479Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
480Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
481Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
482Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
483AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
484Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
485High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
486Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
487Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
488Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
489Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
490Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
491Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
492Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
493The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
494Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
495Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
496Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
497Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
498Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
499Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
500Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
501Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
502Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
503Room-Temperature Atomic Layer Deposition of Platinum
504Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
505Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
506Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
507Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
508Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
509Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
510Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
511Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
512Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
513Fiber-matrix interface reinforcement using Atomic Layer Deposition
514Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
515Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
516Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
517Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
518Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
519Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
520A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
521Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
522Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
523Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
524A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
525Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
526Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
527Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
528Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
529Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
530In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
531Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
532Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
533Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
534Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
535Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
536Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
537Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
538Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
539Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
540Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
541Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
542Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
543Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
544Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
545Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
546Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
547A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
548Innovative remote plasma source for atomic layer deposition for GaN devices
549Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
550In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
551Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
552Impact of interface materials on side permeation in indirect encapsulation of organic electronics
553Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
554Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
555Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
556Biofilm prevention on cochlear implants
557Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
558Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
559Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
560Plasma-enhanced atomic layer deposition of zinc phosphate
561Trapped charge densities in Al2O3-based silicon surface passivation layers
562Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
563Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
564Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
565MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
566Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
567On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
568Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
569Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
570Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
571Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
572Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
573Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
574Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
575In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
576Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
577Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
578Energy-enhanced atomic layer deposition for more process and precursor versatility
579Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
580Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
581Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
582Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
583Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
584Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
585Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
586Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
587Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
588Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
589Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
590Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
591Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
592Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
593Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
594Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
595Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
596High-Reflective Coatings For Ground and Space Based Applications
597Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
598Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
599On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
600Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
601Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
602Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
603Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
604Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
605A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
606Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
607Radical Enhanced Atomic Layer Deposition of Metals and Oxides
608Plasma enhanced atomic layer deposition of Ga2O3 thin films
609Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
610Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
611Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
612Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
613Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
614DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
615Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
616Optical in situ monitoring of plasma-enhanced atomic layer deposition process
617Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
618Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
619Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
620Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
621Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
622Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
623Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
624Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
625Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
626Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
627SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
628Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
629Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
630Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
631Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
632Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
633Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
634Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
635Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
636Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
637Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
638Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
63946-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
640Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
641Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
642Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
643Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
644Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
645Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
646Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
647Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
648Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
649Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
650Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
651Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
652Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
653AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
654Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
655Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
656Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
657Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
658Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
659Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
660Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
661Plasma-enhanced atomic layer deposition of BaTiO3
662Hafnia and alumina on sulphur passivated germanium
663Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
664Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
665Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
666Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
667Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
668Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
669Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
670In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
671Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
672Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
673Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
674Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
675Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
676Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
677In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
678A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
679Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
680Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
681Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
682Growth of silica nanowires in vacuum
683Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
684Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
685Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
686Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
687Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
688ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
689Characteristics of HfO2 thin films grown by plasma atomic layer deposition
690Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
691Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
692Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
693Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
694Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
695Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
696Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
697The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
698Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
699Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
700ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
701Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
702Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
703Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
704Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
705Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
706On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
707Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
708Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
709Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
710Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
711Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
712Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
713The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
714Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
715Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
716Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
717Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
718Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
719The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
720In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
721Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
722Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
723Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
724Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
725Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
726Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
727Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
728Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
729Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
730Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
731Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
732Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
733Breakdown and Protection of ALD Moisture Barrier Thin Films
734Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
735Passivation effects of atomic-layer-deposited aluminum oxide
736Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
737Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
738Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
739The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
740Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
741Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
742High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
743Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
744HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
745Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
746Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
747Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
748Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
749Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
750Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
751Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
752Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
753Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
754Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
755Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
756Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
757Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
758Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
759Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
760Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
761Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
762Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
763Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
764Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
765Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
766Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
767Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
768Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
769Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
770Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
771Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
772Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
773Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
774Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
775Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
776'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
777Radical Enhanced Atomic Layer Deposition of Metals and Oxides
778In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
779Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
780Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
781Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
782Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
783Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
784Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
785Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
786Remote Plasma ALD of Platinum and Platinum Oxide Films
787Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
788Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
789Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
7903D structure evolution using metastable atomic layer deposition based on planar silver templates
791Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
792Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
793Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
794MANOS performance dependence on ALD Al2O3 oxidation source
795Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
796Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
797XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
798Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
799In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
800Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
801On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
802Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
803Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
804Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
805Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
806Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
807Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
808Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
809Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
810Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
811Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
812Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
813Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
814The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
815Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
816Patterned deposition by plasma enhanced spatial atomic layer deposition
817Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
818Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
819Atomic Layer Deposition of Gold Metal
820Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
821Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
822Atomic layer deposition of YMnO3 thin films
823Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
824Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
825Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
826Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
827Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
828Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
829Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
830Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
831Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
832Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
833Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
834Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
835Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
836Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
837Optical display film as flexible and light trapping substrate for organic photovoltaics
838Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
839Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
840Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
841Propagation Effects in Carbon Nanoelectronics
842Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
843Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
844Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
845Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
846Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
847Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
848Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
849Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
850Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
851Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
852Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
853Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
854Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
855Mechanical properties of thin-film Parylene-metal-Parylene devices
856Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
857In-gap states in titanium dioxide and oxynitride atomic layer deposited films
858Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
859Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
860Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
861Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
862Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
863Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
864Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
865Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
866Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
867Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
868Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
869Damage evaluation in graphene underlying atomic layer deposition dielectrics
870Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
871In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
872An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
873Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
874Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
875Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
876Single-Cell Photonic Nanocavity Probes
877Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
878The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
879A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
880Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
881Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
882Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
883Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
884Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
885On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
886Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
887Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
888Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
889Systematic efficiency study of line-doubled zone plates
890Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
891Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
892Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
893Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
894The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
895Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
896Radical Enhanced Atomic Layer Deposition of Metals and Oxides
897IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
898Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
899Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
900Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
901The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
902Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
903Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
904Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
905Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
906Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
907Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
908Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
909Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
910Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
911Energy-enhanced atomic layer deposition for more process and precursor versatility
912Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
913Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
914Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
915Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
916ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
917Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
918Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
919Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
920Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
921Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
922New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
923Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
924Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
925Low temperature temporal and spatial atomic layer deposition of TiO2 films
926Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
927Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
928Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
929Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
930Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
931Flexible Memristive Memory Array on Plastic Substrates
932Radical Enhanced Atomic Layer Deposition of Metals and Oxides
933Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
934Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
935Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
936Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
937Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
938Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
939Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
940Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
941Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
942The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
943Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
944Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
945The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
946Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
947Optical and Electrical Properties of TixSi1-xOy Films
948Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
949Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
950Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
951Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
952Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
953Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
954High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
955Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
956Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
957Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
958Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
959Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
960Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
961Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
962Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
963Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
964Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
965Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
966Impact of interface materials on side permeation in indirect encapsulation of organic electronics
967Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
968Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
969Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
970Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
971Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
972PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
973Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
974Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
975Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
976Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
977Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
978Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
979Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
980Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
981Optical and Electrical Properties of AlxTi1-xO Films
982Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
983Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
984Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
985Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
986On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
987Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
988Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
989Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
990Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
991Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
992Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
993PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
994Composite materials and nanoporous thin layers made by atomic layer deposition
995Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
996The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
997Epitaxial 1D electron transport layers for high-performance perovskite solar cells
998Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
999Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1000Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
1001Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
1002Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1003Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
1004Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1005Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1006Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
1007Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1008Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
1009Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
1010Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
1011Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1012The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
1013Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
1014Encapsulation method for atom probe tomography analysis of nanoparticles
1015Breakdown and Protection of ALD Moisture Barrier Thin Films
1016Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1017Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
1018Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
1019Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1020Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
1021Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
1022Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
1023Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
1024Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1025Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1026Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1027Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1028Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
1029Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1030Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1031Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
1032HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
1033The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1034Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
1035Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
1036Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1037TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
1038Plasma-enhanced atomic layer deposition of BaTiO3
1039Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1040On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
1041Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1042Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1043High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
1044Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1045Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
1046Topographically selective deposition
1047Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
1048Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
1049Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
1050Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
1051Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1052Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
1053Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
1054Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1055Optical properties and bandgap evolution of ALD HfSiOx films
1056A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
1057Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
1058Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1059High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
1060Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
1061Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
1062A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1063Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1064Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
1065Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
1066Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
1067Modal properties of a strip-loaded horizontal slot waveguide
1068Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1069Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
1070Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
1071Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
1072Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
1073Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
1074Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1075Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
1076Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
1077Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
1078Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1079Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
1080Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
1081Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
1082Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
1083Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
1084The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
1085Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1086Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1087In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1088Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1089Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
1090Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1091Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1092Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
1093The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1094Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
1095Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1096Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1097Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
1098Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1099Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
1100Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
1101High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
1102Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1103Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
1104Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1105Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
1106Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
1107Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
1108Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1109Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
1110Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
1111Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
1112Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
1113Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1114Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
1115Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1116Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
1117Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1118Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
1119Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
1120Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
1121Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
1122Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1123Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
1124Improved understanding of recombination at the Si/Al2O3 interface
1125Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
1126Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
1127Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1128Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
1129Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
1130Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
1131Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
1132Damage evaluation in graphene underlying atomic layer deposition dielectrics
1133Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1134Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
1135Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1136Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1137Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1138On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1139Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1140Charge effects of ultrafine FET with nanodot type floating gate
1141Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1142Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1143Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
1144Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1145Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1146Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1147Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1148Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1149Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1150ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
1151Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
1152Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
1153Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
1154Atomic layer deposition of metal-oxide thin films on cellulose fibers
1155Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1156Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
1157Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1158Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
1159Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1160Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
1161Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
1162Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
1163Band alignment of Al2O3 with (-201) β-Ga2O3
1164Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
1165Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
1166Plasma enhanced atomic layer deposition of Fe2O3 thin films
1167Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
1168Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1169Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1170High-efficiency embedded transmission grating
1171Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1172TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1173Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
1174Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
1175Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
1176Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1177In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
1178Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
1179MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
1180Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
1181Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
1182Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
1183Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1184Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
1185A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
1186Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
1187Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
1188Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1189Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
1190Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
1191Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
1192Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
1193Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
1194High-efficiency embedded transmission grating
1195Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1196Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
1197Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1198Flexible, light trapping substrates for organic photovoltaics
1199Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1200Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1201Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
1202Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
1203Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
1204Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1205Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1206Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
1207Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
1208Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1209TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1210Method of Fabrication for Encapsulated Polarizing Resonant Gratings
1211Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
1212Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
1213Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1214Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
1215Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
1216Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1217Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
1218Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1219Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
1220Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
1221Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition