Oxygen, O₂, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5	46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6	A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12	Advances in the fabrication of graphene transistors on flexible substrates
13	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
14	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
15	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
16	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
17	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
18	ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
19	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
20	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
21	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
22	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
23	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
24	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
25	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
26	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
27	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
28	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
29	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
30	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
31	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
32	Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
33	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
34	Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
35	Band alignment of Al2O3 with (-201) β-Ga2O3
36	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
37	Breakdown and Protection of ALD Moisture Barrier Thin Films
38	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
39	Capacitance spectroscopy of gate-defined electronic lattices
40	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
41	Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
42	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
43	Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
44	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
45	Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
46	Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
47	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
48	Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
49	Charge effects of ultrafine FET with nanodot type floating gate
50	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
51	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
52	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
53	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
54	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
55	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
56	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
57	Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
58	Damage evaluation in graphene underlying atomic layer deposition dielectrics
59	DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
60	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
61	Demonstration of flexible thin film transistors with GaN channels
62	Densification of Thin Aluminum Oxide Films by Thermal Treatments
63	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
64	Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
65	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
66	DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
67	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
68	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
69	Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
70	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
71	Dynamic tuning of plasmon resonance in the visible using graphene
72	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
73	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
74	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
75	Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
76	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
77	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
78	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
79	Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
80	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
81	Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
82	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
83	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
84	Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
85	Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
86	Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
87	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
88	Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
89	Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
90	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
91	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
92	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
93	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
94	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
95	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
96	Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
97	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
98	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
99	Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
100	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
101	Energy-enhanced atomic layer deposition for more process and precursor versatility
102	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
103	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
104	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
105	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
106	Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
107	Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
108	Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
109	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
110	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
111	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
112	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
113	Experimental verification of electro-refractive phase modulation in graphene
114	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
115	Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
116	Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
117	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
118	Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
119	Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
120	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
121	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
122	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
123	Flexible, light trapping substrates for organic photovoltaics
124	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
125	Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
126	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
127	Hafnia and alumina on sulphur passivated germanium
128	High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
129	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
130	High-efficiency embedded transmission grating
131	High-Reflective Coatings For Ground and Space Based Applications
132	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
133	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
134	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
135	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
136	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
137	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
138	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
139	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
140	Improved understanding of recombination at the Si/Al2O3 interface
141	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
142	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
143	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
144	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
145	Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
146	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
147	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
148	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
149	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
150	Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
151	Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
152	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
153	Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
154	Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
155	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
156	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
157	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
158	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
159	Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
160	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
161	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
162	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
163	Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
164	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
165	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
166	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
167	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
168	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
169	Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
170	Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
171	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
172	Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
173	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
174	Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
175	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
176	Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
177	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
178	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
179	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
180	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
181	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
182	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
183	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
184	Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
185	MANOS performance dependence on ALD Al2O3 oxidation source
186	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
187	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
188	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
189	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
190	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
191	Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
192	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
193	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
194	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
195	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
196	Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
197	N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
198	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
199	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
200	Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
201	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
202	Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
203	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
204	On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
205	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
206	On the equilibrium concentration of boron-oxygen defects in crystalline silicon
207	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
208	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
209	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
210	Optimization of the Surface Structure on Black Silicon for Surface Passivation
211	Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
212	Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
213	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
214	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
215	Passivation effects of atomic-layer-deposited aluminum oxide
216	Patterned deposition by plasma enhanced spatial atomic layer deposition
217	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
218	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
219	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
220	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
221	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
222	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
223	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
224	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
225	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
226	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
227	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
228	Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
229	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
230	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
231	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
232	Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
233	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
234	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
235	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
236	Propagation Effects in Carbon Nanoelectronics
237	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
238	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
239	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
240	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
241	Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
242	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
243	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
244	Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
245	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
246	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
247	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
248	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
249	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
250	Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
251	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
252	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
253	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
254	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
255	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
256	Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
257	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
258	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
259	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
260	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
261	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
262	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
263	Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
264	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
265	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
266	Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
267	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
268	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
269	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
270	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
271	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
272	Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
273	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
274	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
275	Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
276	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
277	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
278	Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
279	Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
280	Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
281	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
282	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
283	Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
284	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
285	Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
286	Very high frequency plasma reactant for atomic layer deposition
287	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
288	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
289	Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
290	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
291	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
292	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
293	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
294	Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
295	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
296	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
297	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
298	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
299	Composite materials and nanoporous thin layers made by atomic layer deposition
300	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
301	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
302	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
303	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
304	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
305	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
306	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
307	Optical and Electrical Properties of AlxTi1-xO Films
308	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
309	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
310	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
311	Atomic Layer Deposition of Gold Metal
312	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
313	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
314	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
315	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
316	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
317	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
318	Plasma-enhanced atomic layer deposition of BaTiO3
319	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
320	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
321	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
322	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
323	Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
324	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
325	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
326	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
327	Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
328	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
329	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
330	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
331	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
332	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
333	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
334	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
335	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
336	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
337	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
338	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
339	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
340	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
341	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
342	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
343	Plasma enhanced atomic layer deposition of Fe2O3 thin films
344	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
345	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
346	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
347	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
348	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
349	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
350	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
351	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
352	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
353	Plasma enhanced atomic layer deposition of Ga2O3 thin films
354	Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
355	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
356	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
357	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
358	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
359	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
360	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
361	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
362	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
363	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
364	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
365	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
366	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
367	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
368	A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
369	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
370	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
371	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
372	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
373	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
374	Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
375	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
376	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
377	Damage evaluation in graphene underlying atomic layer deposition dielectrics
378	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
379	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
380	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
381	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
382	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
383	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
384	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
385	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
386	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
387	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
388	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
389	Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
390	Hafnia and alumina on sulphur passivated germanium
391	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
392	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
393	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
394	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
395	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
396	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
397	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
398	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
399	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
400	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
401	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
402	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
403	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
404	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
405	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
406	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
407	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
408	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
409	Optical properties and bandgap evolution of ALD HfSiOx films
410	Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
411	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
412	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
413	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
414	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
415	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
416	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
417	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
418	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
419	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
420	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
421	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
422	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
423	The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
424	Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
425	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
426	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
427	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
428	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
429	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
430	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
431	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
432	Annealing behavior of ferroelectric Si-doped HfO2 thin films
433	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
434	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
435	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
436	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
437	Optical properties and bandgap evolution of ALD HfSiOx films
438	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
439	The effects of layering in ferroelectric Si-doped HfO2 thin films
440	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
441	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
442	Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
443	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
444	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
445	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
446	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
447	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
448	High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
449	Systematic efficiency study of line-doubled zone plates
450	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
451	IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
452	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
453	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
454	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
455	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
456	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
457	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
458	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
459	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
460	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
461	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
462	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
463	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
464	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
465	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
466	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
467	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
468	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
469	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
470	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
471	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
472	The important role of water in growth of monolayer transition metal dichalcogenides
473	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
474	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
475	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
476	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
477	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
478	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
479	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
480	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
481	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
482	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
483	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
484	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
485	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
486	Encapsulation method for atom probe tomography analysis of nanoparticles
487	Growth of silica nanowires in vacuum
488	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
489	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
490	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
491	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
492	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
493	Remote Plasma ALD of Platinum and Platinum Oxide Films
494	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
495	Room-Temperature Atomic Layer Deposition of Platinum
496	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
497	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
498	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
499	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
500	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
501	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
502	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
503	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
504	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
505	Remote Plasma ALD of Platinum and Platinum Oxide Films
506	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
507	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
508	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
509	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
510	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
511	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
512	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
513	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
514	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
515	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
516	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
517	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
518	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
519	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
520	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
521	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
522	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
523	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
524	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
525	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
526	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
527	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
528	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
529	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
530	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
531	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
532	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
533	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
534	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
535	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
536	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
537	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
538	Breakdown and Protection of ALD Moisture Barrier Thin Films
539	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
540	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
541	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
542	Comparative study of ALD SiO2 thin films for optical applications
543	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
544	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
545	Designing high performance precursors for atomic layer deposition of silicon oxide
546	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
547	Energy-enhanced atomic layer deposition for more process and precursor versatility
548	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
549	Gate Insulator for High Mobility Oxide TFT
550	Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
551	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
552	High-Reflective Coatings For Ground and Space Based Applications
553	Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
554	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
555	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
556	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
557	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
558	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
559	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
560	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
561	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
562	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
563	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
564	Modal properties of a strip-loaded horizontal slot waveguide
565	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
566	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
567	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
568	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
569	Optical properties and bandgap evolution of ALD HfSiOx films
570	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
571	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
572	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
573	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
574	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
575	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
576	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
577	Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
578	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
579	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
580	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
581	Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
582	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
583	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
584	Single-Cell Photonic Nanocavity Probes
585	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
586	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
587	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
588	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
589	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
590	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
591	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
592	Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
593	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
594	Trapped charge densities in Al2O3-based silicon surface passivation layers
595	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
596	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
597	A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
598	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
599	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
600	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
601	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
602	Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
603	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
604	Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
605	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
606	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
607	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
608	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
609	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
610	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
611	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
612	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
613	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
614	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
615	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
616	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
617	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
618	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
619	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
620	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
621	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
622	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
623	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
624	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
625	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
626	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
627	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
628	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
629	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
630	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
631	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
632	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
633	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
634	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
635	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
636	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
637	Trilayer Tunnel Selectors for Memristor Memory Cells
638	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
639	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
640	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
641	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
642	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
643	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
644	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
645	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
646	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
647	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
648	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
649	Biofilm prevention on cochlear implants
650	Bipolar resistive switching in amorphous titanium oxide thin film
651	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
652	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
653	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
654	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
655	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
656	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
657	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
658	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
659	Energy-enhanced atomic layer deposition for more process and precursor versatility
660	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
661	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
662	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
663	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
664	Flexible Memristive Memory Array on Plastic Substrates
665	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
666	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
667	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
668	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
669	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
670	High-efficiency embedded transmission grating
671	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
672	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
673	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
674	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
675	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
676	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
677	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
678	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
679	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
680	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
681	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
682	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
683	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
684	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
685	Low temperature temporal and spatial atomic layer deposition of TiO2 films
686	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
687	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
688	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
689	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
690	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
691	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
692	Oxygen migration in TiO2-based higher-k gate stacks
693	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
694	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
695	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
696	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
697	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
698	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
699	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
700	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
701	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
702	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
703	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
704	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
705	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
706	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
707	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
708	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
709	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
710	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
711	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
712	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
713	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
714	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
715	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
716	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
717	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
718	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
719	Transient characterization of the electroforming process in TiO2 based resistive switching devices
720	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
721	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
722	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
723	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
724	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
725	Optical and Electrical Properties of TixSi1-xOy Films
726	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
727	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
728	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
729	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
730	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
731	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
732	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
733	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
734	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
735	The important role of water in growth of monolayer transition metal dichalcogenides
736	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
737	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
738	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
739	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
740	Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
741	Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
742	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
743	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
744	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
745	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
746	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
747	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
748	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
749	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
750	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
751	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
752	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
753	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
754	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
755	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
756	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
757	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
758	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
759	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
760	Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
761	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
762	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
763	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
764	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
765	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
766	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
767	Spectroscopy and control of near-surface defects in conductive thin film ZnO
768	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
769	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
770	The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
771	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
772	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
773	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
774	Top-down fabricated ZnO nanowire transistors for application in biosensors
775	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
776	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
777	Plasma-enhanced atomic layer deposition of zinc phosphate
778	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
779	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
780	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
781	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
782	Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
783	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
784	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
785	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
786	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
787	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
788	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
789	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
790	Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
791	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
792	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
793	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
794	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
795	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
796	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
797	PEALD ZrO2 Films Deposition on TiN and Si Substrates
798	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
799	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
800	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
801	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
802	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
803	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
804	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
805	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
806	Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
807	ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
808	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
809	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
810	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
811	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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