O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
2Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
3Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
4A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
5Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
6On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
7Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
8Hafnia and alumina on sulphur passivated germanium
9Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
10Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
11Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
12A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
13The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
14The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
15Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
16Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
17Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
18Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
19Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
20Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
21Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
22Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
23Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
24Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
25Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
26A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
27Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
28Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
29Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
30(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
31Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
32Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
33Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
34Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
35Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
36Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
37Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
38Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
39Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
40The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
41Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
42Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
43Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
44Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
45Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
46Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
47Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
48N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
49AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
50Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
51Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
52Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
53Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
54Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
55Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
56Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
57Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
58Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
59Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
60HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
61ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
62Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
63Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
64Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
65Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
66Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
67Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
68Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
69Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
70Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
71Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
72Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
73Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
74Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
75Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
76Plasma-enhanced atomic layer deposition of BaTiO3
77TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
78Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
79Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
80Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
81Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
82Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
83Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
84The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
85Mechanical properties of thin-film Parylene-metal-Parylene devices
86Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
87Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
88Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
89The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
90Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
91Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
92Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
93Lithium-Iron (III) Fluoride Battery with Double Surface Protection
94Flexible Memristive Memory Array on Plastic Substrates
95Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
96Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
97Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
98Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
99Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
100Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
101Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
102Oxygen migration in TiO2-based higher-k gate stacks
103Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
104High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
105Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
106Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
107Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
108Energy-enhanced atomic layer deposition for more process and precursor versatility
109Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
110Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
111Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
112Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
113Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
114Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
115Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
116Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
117Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
118Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
119Low temperature temporal and spatial atomic layer deposition of TiO2 films
120Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
121Tuning size and coverage of Pd nanoparticles using atomic layer deposition
122Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
123Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
124Capacitance spectroscopy of gate-defined electronic lattices
125A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
126Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
127Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
128Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
129Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
130Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
131Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
132Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
133Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
134Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
135Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
136AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
137Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
138Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
139Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
140Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
141Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
142DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
143In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
144Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
145Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
146Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
147Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
148Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
149Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
150Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
151PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
152Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
153Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
154Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
155Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
156Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
157Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
158Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
159Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
160Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
161Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
162Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
163Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
164Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
165Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
166Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
167Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
168High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
169Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
170Designing high performance precursors for atomic layer deposition of silicon oxide
171Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
172Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
173Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
174Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
175Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
176Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
177Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
178Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
179On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
180Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
181XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
182Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
183Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
184PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
185Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
186Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
187Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
188Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
189Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
190Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
191Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
192Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
193Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
194Improved understanding of recombination at the Si/Al2O3 interface
195Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
196Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
197From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
198PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
199Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
200Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
201Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
202Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
203Encapsulation method for atom probe tomography analysis of nanoparticles
204Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
205Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
206Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
207Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
208Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
209Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
210Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
211Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
212Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
213Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
214An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
215Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
216Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
217Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
218Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
219Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
220Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
221Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
222Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
223Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
224The effects of layering in ferroelectric Si-doped HfO2 thin films
225Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
226Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
227Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
228Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
229Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
230Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
231Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
232In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
233Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
234Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
235Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
236Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
237Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
238Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
239RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
240Optical display film as flexible and light trapping substrate for organic photovoltaics
241Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
242Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
243Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
244Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
245Atomic layer deposition of YMnO3 thin films
246The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
247Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
248On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
249Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
250Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
251Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
252Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
253Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
254Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
255Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
256Densification of Thin Aluminum Oxide Films by Thermal Treatments
257Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
258Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
259Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
260Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
261Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
262Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
263Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
264Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
265Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
266In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
267Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
268Annealing behavior of ferroelectric Si-doped HfO2 thin films
269Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
270Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
271Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
272Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
273Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
274Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
275Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
276Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
277Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
278Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
279Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
280In-gap states in titanium dioxide and oxynitride atomic layer deposited films
281Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
282Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
283Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
284Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
285Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
286Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
287Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
288PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
289Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
290Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
291Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
292Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
293Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
294Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
295Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
296Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
297Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
298Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
299AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
300Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
301Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
302Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
303Radical Enhanced Atomic Layer Deposition of Metals and Oxides
304Flexible, light trapping substrates for organic photovoltaics
305Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
306Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
307Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
308Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
309Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
310Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
311Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
312Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
313Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
314Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
315Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
316Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
317Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
318Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
319Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
320Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
321High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
322Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
323The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
324Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
325Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
326Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
327Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
328Lithium-Iron (III) Fluoride Battery with Double Surface Protection
329TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
330Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
331Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
332Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
333An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
334Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
335Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
336Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
337Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
338Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
339Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
340Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
341ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
342Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
343Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
344Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
345Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
346The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
347Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
348Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
349PEALD ZrO2 Films Deposition on TiN and Si Substrates
350Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
351Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
352Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
353Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
354MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
355Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
356Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
357Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
358Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
359Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
360The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
361Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
362Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
363Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
364Breakdown and Protection of ALD Moisture Barrier Thin Films
365Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
366Symmetrical Al2O3-based passivation layers for p- and n-type silicon
367Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
368Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
369Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
370Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
371Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
372Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
373Atomic Layer Deposition of Gold Metal
374Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
375Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
376Impact of interface materials on side permeation in indirect encapsulation of organic electronics
377Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
378The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
379Plasma enhanced atomic layer deposition of Fe2O3 thin films
380A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
381Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
382Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
383Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
384Trapped charge densities in Al2O3-based silicon surface passivation layers
385Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
386Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
387Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
388Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
389Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
390Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
391Remote Plasma ALD of Platinum and Platinum Oxide Films
392In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
393Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
394Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
395Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
396Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
397Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
398A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
399Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
400Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
401Optical in situ monitoring of plasma-enhanced atomic layer deposition process
402Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
403Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
404Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
405Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
406Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
407Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
408Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
409Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
410Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
411Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
412Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
413Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
414Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
415Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
416Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
417Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
418Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
419Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
420Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
421Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
422Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
423Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
424Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
425Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
426Remote Plasma ALD of Platinum and Platinum Oxide Films
427Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
428Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
429Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
430Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
431Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
432Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
433Characteristics of HfO2 thin films grown by plasma atomic layer deposition
434Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
435Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
436Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
437Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
438Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
439Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
440Optimization of the Surface Structure on Black Silicon for Surface Passivation
441On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
442Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
443Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
444Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
445Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
446Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
447Modal properties of a strip-loaded horizontal slot waveguide
448Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
449Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
450Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
451Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
452Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
453The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
454Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
455Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
456Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
457The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
458Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
459Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
460Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
461Fiber-matrix interface reinforcement using Atomic Layer Deposition
462Nonvolatile Capacitive Crossbar Array for In-Memory Computing
463Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
464Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
465Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
466Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
467Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
468Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
469Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
470Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
471Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
472Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
473Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
474Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
475Anti-stiction coating for mechanically tunable photonic crystal devices
476Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
477Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
478The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
479Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
480Sub-7-nm textured ZrO2 with giant ferroelectricity
481Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
482Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
483Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
484MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
485Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
486Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
487Gate Insulator for High Mobility Oxide TFT
488Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
489Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
490Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
491Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
492Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
493Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
494Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
495Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
496Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
497High-efficiency embedded transmission grating
498The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
499Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
500Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
501Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
502Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
503Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
504Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
505Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
506Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
507Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
508Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
509Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
510Plasma-enhanced atomic layer deposition of zinc phosphate
511Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
512Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
513Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
514Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
515Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
516Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
517Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
518New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
519Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
520Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
521Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
522Radical Enhanced Atomic Layer Deposition of Metals and Oxides
523The important role of water in growth of monolayer transition metal dichalcogenides
524Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
525IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
526Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
527Radical Enhanced Atomic Layer Deposition of Metals and Oxides
528Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
529Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
530Radical Enhanced Atomic Layer Deposition of Metals and Oxides
531Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
532Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
533Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
534Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
535Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
536Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
537The important role of water in growth of monolayer transition metal dichalcogenides
538Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
539Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
540Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
541Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
542Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
543Bipolar resistive switching in amorphous titanium oxide thin film
544Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
5453D structure evolution using metastable atomic layer deposition based on planar silver templates
546Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
547Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
548Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
549Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
550Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
551Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
552Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
553Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
554Method of Fabrication for Encapsulated Polarizing Resonant Gratings
555Ferroelectricity in hafnia controlled via surface electrochemical state
556Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
557Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
558Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
559Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
560Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
561Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
562Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
563Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
564Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
565X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
566Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
567Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
568Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
569Innovative remote plasma source for atomic layer deposition for GaN devices
570Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
571Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
572Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
573Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
574Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
575In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
576Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
577'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
578Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
579Optical and Electrical Properties of TixSi1-xOy Films
580Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
581Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
582Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
583Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
584Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
585Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
586Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
587Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
588Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
589Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
590Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
591Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
592Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
593On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
594Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
595Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
596Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
597Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
598Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
599Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
600Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
601AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
602Biofilm prevention on cochlear implants
603Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
604Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
605The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
606Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
607Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
608Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
609Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
610Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
611Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
612Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
613Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
614Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
615The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
616Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
617Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
618Energy-enhanced atomic layer deposition for more process and precursor versatility
619Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
620Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
621Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
622Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
623Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
624Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
625Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
626An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
627The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
628XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
629'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
630Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
631Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
632Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
633Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
634Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
635Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
636ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
637Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
638Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
639Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
640Optical and Electrical Properties of AlxTi1-xO Films
641Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
642Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
643Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
644Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
645Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
646Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
647Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
648Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
649Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
650Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
651Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
652Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
653Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
654Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
655High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
656Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
657Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
658Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
659Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
660Optical properties and bandgap evolution of ALD HfSiOx films
661High-Reflective Coatings For Ground and Space Based Applications
662Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
663Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
664Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
665ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
666Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
667Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
668Highly efficient and bending durable perovskite solar cells: toward a wearable power source
669Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
670Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
671Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
672Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
673HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
674A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
675Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
676Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
677Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
678Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
679Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
680Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
681High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
682Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
683Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
684Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
685Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
686Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
687Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
688Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
689Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
690Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
691Very high frequency plasma reactant for atomic layer deposition
692Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
693Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
694Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
695Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
696Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
697Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
698Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
699Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
700Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
701Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
702Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
703Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
704The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
705Radical Enhanced Atomic Layer Deposition of Metals and Oxides
706Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
707Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
708Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
709Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
710Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
711Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
712Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
713Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
714Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
715Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
716Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
717Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
718Composite materials and nanoporous thin layers made by atomic layer deposition
719Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
720Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
721Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
722Systematic efficiency study of line-doubled zone plates
723Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
724Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
725Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
726Radical Enhanced Atomic Layer Deposition of Metals and Oxides
727Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
7281D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
729Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
730Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
731Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
732Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
733High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
734Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
735Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
736Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
737Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
738Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
739Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
740Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
741Optical properties and bandgap evolution of ALD HfSiOx films
742Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
743Experimental verification of electro-refractive phase modulation in graphene
744Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
745Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
746Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
747Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
748Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
749Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
750Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
751Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
752Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
753Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
754Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
755Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
756Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
757Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
758Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
759Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
760Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
761High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
762Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
763The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
764Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
765Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
766Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
767Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
768High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
769Study on the resistive switching time of TiO2 thin films
770Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
771Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
772Damage evaluation in graphene underlying atomic layer deposition dielectrics
773Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
774Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
775Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
776Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
777Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
778Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
779Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
780Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
781Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
782Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
783Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
784Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
785Patterned deposition by plasma enhanced spatial atomic layer deposition
786Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
787Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
788Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
789Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
790Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
791Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
792Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
793Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
794Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
795Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
796Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
797Comparative study of ALD SiO2 thin films for optical applications
798Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
799Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
800Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
801Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
802Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
803A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
804Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
805Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
806Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
807Topographically selective deposition
808Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
809Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
810Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
811Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
812First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
813Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
814Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
815Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
816Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
817Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
818PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
819Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
820Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
821Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
822The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
823Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
824Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
825In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
826Sub-10-nm ferroelectric Gd-doped HfO2 layers
827Residual stress study of thin films deposited by atomic layer deposition
828Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
829Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
830Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
831Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
832Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
833Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
834Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
835Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
836Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
837Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
838Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
839Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
840Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
841Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
842In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
843Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
844Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
845Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
846Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
847Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
848HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
849High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
850Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
851Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
852Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
853Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
854Breakdown and Protection of ALD Moisture Barrier Thin Films
855A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
856Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
857Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
858Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
859Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
860Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
861Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
862Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
863Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
864Nonvolatile Capacitive Crossbar Array for In-Memory Computing
865Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
866Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
867Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
868Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
869Transient characterization of the electroforming process in TiO2 based resistive switching devices
870Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
871High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
872Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
873Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
874Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
875Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
876Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
877Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
878A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
879Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
880ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
881Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
882Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
883Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
884Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
885Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
886Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
887Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
888Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
889Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
890On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
891Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
892Lithium-Iron (III) Fluoride Battery with Double Surface Protection
893Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
894Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
895Residual stress study of thin films deposited by atomic layer deposition
896Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
897Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
898Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
899Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
900Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
901Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
902Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
903Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
904Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
905Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
906Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
907Plasma enhanced atomic layer deposition of Ga2O3 thin films
908Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
909Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
910Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
911Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
912Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
913Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
914Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
915Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
916Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
917Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
918Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
919Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
920Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
921Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
922Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
923Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
924Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
925Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
926Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
927In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
928A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
929Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
930Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
931Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
932On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
933Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
934Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
935Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
936Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
937Passivation effects of atomic-layer-deposited aluminum oxide
938Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
939Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
940Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
941Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
942Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
943Room-Temperature Atomic Layer Deposition of Platinum
944Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
945Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
946Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
947Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
948Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
949Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
950Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
951Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
952Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
953Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
954ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
955Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
956Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
957Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
958Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
959Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
960Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
961Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
962Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
963High-Reflective Coatings For Ground and Space Based Applications
964Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
965Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
966Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
967Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
968In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
969Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
970Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
971Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
972Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
973Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
974A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
975Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
976Hafnia and alumina on sulphur passivated germanium
977Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
978Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
979Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
980Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
981Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
982Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
983An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
984Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
985Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
986Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
987TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
988On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
989Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
990Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
991Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
992Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
993Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
994Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
995Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
996Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
997Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
998Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
999Energy-enhanced atomic layer deposition for more process and precursor versatility
1000Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
1001The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
1002All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1003HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
1004Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1005Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
1006Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
1007Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
1008Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
1009Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
1010Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
1011Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
1012Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
1013Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
1014Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
1015Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
1016A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
1017Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
1018Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1019Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1020Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1021Dynamic tuning of plasmon resonance in the visible using graphene
1022Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
1023Surface and sensing properties of PE-ALD SnO2 thin film
1024Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
1025Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1026Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
1027Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1028Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1029Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
1030Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1031Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
1032Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
1033Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
1034Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
1035Advances in the fabrication of graphene transistors on flexible substrates
1036Band alignment of Al2O3 with (-201) β-Ga2O3
1037Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1038Charge effects of ultrafine FET with nanodot type floating gate
1039Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
1040Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
1041Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
1042Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
1043Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1044Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1045ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1046Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1047Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1048Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1049Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
1050Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1051The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1052Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
1053Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
1054Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1055Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
1056Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1057Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1058Trilayer Tunnel Selectors for Memristor Memory Cells
1059Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
1060Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
1061SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
1062Epitaxial 1D electron transport layers for high-performance perovskite solar cells
1063Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
1064Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1065Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1066Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1067Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1068Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
1069Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
1070Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1071Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
1072Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
1073Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
1074Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
1075Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
1076A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1077Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
1078Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1079Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
1080Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1081Plasma-enhanced atomic layer deposition of BaTiO3
1082Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1083Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
1084Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
1085Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1086Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1087Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
1088Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
1089Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
1090Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
1091Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1092Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
1093Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
1094Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
1095Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1096Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1097Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
1098Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
1099Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
1100Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
1101Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
1102Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
1103Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
1104Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
1105Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
1106Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
1107Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1108Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1109Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
1110Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1111Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
1112Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1113All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1114ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1115Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
1116The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1117Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1118Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1119Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
1120Optical properties and bandgap evolution of ALD HfSiOx films
1121Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1122High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
1123Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
1124DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
1125Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
1126Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1127Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
1128Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1129Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
1130Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1131Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
1132Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1133Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
1134Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1135Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1136Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1137Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
1138Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
1139Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1140Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1141Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
1142Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
1143Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
1144Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1145Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1146Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
1147In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1148Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1149Single-Cell Photonic Nanocavity Probes
1150Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
1151Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
1152A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
1153Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1154Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
1155Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
1156Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
1157Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
1158Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1159Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
1160Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1161Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
1162Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
1163Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
1164Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
1165Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
1166MANOS performance dependence on ALD Al2O3 oxidation source
1167Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1168Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
1169Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
1170Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
1171The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
1172Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
1173Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
1174Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
1175Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1176Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
1177High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
1178Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1179Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
1180Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
1181Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
1182Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1183Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
1184Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
1185Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
1186Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
1187TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1188In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1189Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
1190Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
1191Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
119246-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
1193Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
1194Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
1195Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
1196Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1197Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1198Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
1199Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
1200Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1201Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
1202Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
1203Atomic layer deposition of metal-oxide thin films on cellulose fibers
1204Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1205Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
1206Spectroscopy and control of near-surface defects in conductive thin film ZnO
1207Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
1208On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1209Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1210Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1211Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1212Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
1213A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
1214Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1215Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
1216Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
1217Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
1218Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1219Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
1220In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
1221Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
1222Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1223Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1224Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
1225Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1226Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1227Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1228Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
1229Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1230In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1231Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
1232Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
1233Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
1234Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1235Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
1236Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1237α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
1238Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1239In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
1240Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1241Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
1242Growth of silica nanowires in vacuum
1243Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
1244Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1245Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
1246Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1247Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
1248Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1249Top-down fabricated ZnO nanowire transistors for application in biosensors
1250Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1251Propagation Effects in Carbon Nanoelectronics
1252Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
1253Damage evaluation in graphene underlying atomic layer deposition dielectrics
1254Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1255Plasma-enhanced atomic layer deposition of BaTiO3
1256Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1257Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1258Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1259High-efficiency embedded transmission grating
1260Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
1261Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
1262Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1263Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1264Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
1265Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
1266Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
1267Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1268Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
1269Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
1270Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1271Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1272Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
1273Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
1274Atomic Layer Deposition of the Conductive Delafossite PtCoO2
1275On the equilibrium concentration of boron-oxygen defects in crystalline silicon
1276Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
1277Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene