O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
11Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
12Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
13Advances in the fabrication of graphene transistors on flexible substrates
14Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
15Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
16Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
17Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
18Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
19Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
20Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
21ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
22AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
23AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
24AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
25Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
26Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
27Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
28An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
29Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
30Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
31Anti-stiction coating for mechanically tunable photonic crystal devices
32Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
33Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
34Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
35Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
36Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
37Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
38Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
39Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
40Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
41Band alignment of Al2O3 with (-201) β-Ga2O3
42Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
43Breakdown and Protection of ALD Moisture Barrier Thin Films
44Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
45Capacitance spectroscopy of gate-defined electronic lattices
46Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
47Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
48Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
49Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
50Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
51Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
52Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
53Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
54Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
55Charge effects of ultrafine FET with nanodot type floating gate
56Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
57Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
58Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
59Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
60Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
61Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
62Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
63Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
64Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
65Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
66Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
67Damage evaluation in graphene underlying atomic layer deposition dielectrics
68DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
69Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
70Densification of Thin Aluminum Oxide Films by Thermal Treatments
71Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
72Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
73Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
74DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
75Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
76Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
77Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
78Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
79Dynamic tuning of plasmon resonance in the visible using graphene
80Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
81Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
82Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
83Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
84Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
85Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
86Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
87Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
88Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
89Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
90Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
91Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
92Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
93Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
94Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
95Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
96Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
97Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
98Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
99Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
100Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
101Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
102Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
103Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
104Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
105Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
106Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
107Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
108Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
109Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
110Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
111Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
112Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
113Energy-enhanced atomic layer deposition for more process and precursor versatility
114Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
115Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
116Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
117Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
118Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
119Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
120Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
121Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
122Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
123Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
124Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
125Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
126Experimental verification of electro-refractive phase modulation in graphene
127Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
128Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
129Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
130Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
131Fiber-matrix interface reinforcement using Atomic Layer Deposition
132Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
133Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
134Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
135Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
136First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
137Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
138Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
139Flexible, light trapping substrates for organic photovoltaics
140Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
141Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
142Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
143Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
144Hafnia and alumina on sulphur passivated germanium
145High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
146High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
147High-efficiency embedded transmission grating
148High-Reflective Coatings For Ground and Space Based Applications
149High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
150Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
151Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
152Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
153Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
154Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
155Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
156Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
157Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
158Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
159Improved understanding of recombination at the Si/Al2O3 interface
160Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
161Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
162Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
163Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
164Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
165In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
166In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
167In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
168Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
169Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
170Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
171Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
172Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
173Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
174Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
175Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
176Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
177Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
178Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
179Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
180Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
181Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
182Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
183Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
184Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
185Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
186Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
187Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
188Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
189Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
190Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
191Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
192Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
193Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
194Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
195Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
196Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
197Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
198Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
199Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
200Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
201Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
202Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
203Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
204Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
205Lithium-Iron (III) Fluoride Battery with Double Surface Protection
206Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
207Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
208Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
209Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
210Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
211Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
212Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
213Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
214MANOS performance dependence on ALD Al2O3 oxidation source
215Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
216Mechanical properties of thin-film Parylene-metal-Parylene devices
217Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
218Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
219Method of Fabrication for Encapsulated Polarizing Resonant Gratings
220Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
221Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
222Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
223Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
224Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
225Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
226Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
227MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
228Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
229N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
230Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
231Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
232Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
233Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
234Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
235Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
236Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
237On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
238On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
239On the equilibrium concentration of boron-oxygen defects in crystalline silicon
240On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
241Optical display film as flexible and light trapping substrate for organic photovoltaics
242Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
243Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
244Optimization of the Surface Structure on Black Silicon for Surface Passivation
245Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
246Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
247Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
248Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
249Passivation effects of atomic-layer-deposited aluminum oxide
250Patterned deposition by plasma enhanced spatial atomic layer deposition
251PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
252Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
253Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
254Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
255Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
256Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
257Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
258Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
259Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
260Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
261Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
262Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
263Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
264Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
265Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
266Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
267Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
268Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
269Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
270Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
271Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
272Propagation Effects in Carbon Nanoelectronics
273Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
274Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
275Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
276Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
277Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
278Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
279Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
280Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
281Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
282Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
283Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
284Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
285Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
286Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
287Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
288Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
289Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
290Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
291Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
292Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
293Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
294Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
295Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
296Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
297Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
298Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
299Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
300Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
301Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
302Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
303Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
304Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
305Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
306Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
307Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
308The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
309The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
310The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
311Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
312Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
313Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
314Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
315TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
316Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
317Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
318Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
319Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
320Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
321Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
322Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
323Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
324Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
325Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
326Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
327Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
328Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
329Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
330Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
331Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
332Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
333Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
334Very high frequency plasma reactant for atomic layer deposition
335Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
336Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
337Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
338Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
339Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
340Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
341Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
342Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
343Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
344Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
345Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
346Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
347Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
348Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
349Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
350Composite materials and nanoporous thin layers made by atomic layer deposition
351Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
352Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
353Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
354Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
355Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
356Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
357Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
358Optical and Electrical Properties of AlxTi1-xO Films
359Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
360Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
361Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
362Atomic Layer Deposition of Gold Metal
363Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
364Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
365Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
366Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
367High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
368Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
369Plasma-enhanced atomic layer deposition of BaTiO3
370Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
371Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
372Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
373Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
374Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
375Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
376A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
377Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
378Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
379Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
380Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
381Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
382Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
383Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
384Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
385Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
386Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
387Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
388Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
389Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
390Radical Enhanced Atomic Layer Deposition of Metals and Oxides
391Radical Enhanced Atomic Layer Deposition of Metals and Oxides
392Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
393Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
394Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
395Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
396Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
397Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
398Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
399Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
400Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
401Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
402Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
403Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
404Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
405Plasma enhanced atomic layer deposition of Fe2O3 thin films
406Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
407Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
408Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
409The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
410Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
411Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
412Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
413Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
414Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
415Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
416Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
417Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
418Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
419Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
420Plasma enhanced atomic layer deposition of Ga2O3 thin films
421Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
422Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
423RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
424Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
425Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
426Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
427Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
428Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
429Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
430Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
431Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
432Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
433Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
434Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
435Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
436Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
437A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
438An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
439Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
440Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
441Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
442Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
443Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
444AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
445Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
446Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
447Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
448Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
449Characteristics of HfO2 thin films grown by plasma atomic layer deposition
450Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
451Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
452Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
453Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
454Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
455Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
456Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
457Damage evaluation in graphene underlying atomic layer deposition dielectrics
458Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
459Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
460Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
461Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
462Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
463Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
464Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
465Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
466Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
467Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
468Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
469Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
470Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
471Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
472Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
473Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
474Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
475Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
476Hafnia and alumina on sulphur passivated germanium
477HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
478Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
479Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
480Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
481Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
482In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
483Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
484Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
485Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
486Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
487Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
488Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
489Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
490Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
491Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
492Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
493Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
494Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
495Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
496Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
497Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
498Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
499Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
500Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
501Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
502Optical properties and bandgap evolution of ALD HfSiOx films
503Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
504PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
505Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
506Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
507Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
508Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
509Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
510Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
511Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
512Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
513Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
514Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
515Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
516Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
517Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
518Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
519The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
520The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
521The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
522The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
523The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
524Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
525Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
526Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
527Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
528Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
529Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
530Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
531Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
532Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
533Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
534Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
535Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
536Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
537HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
538Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
539The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
540Annealing behavior of ferroelectric Si-doped HfO2 thin films
541Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
542Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
543Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
544Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
545Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
546Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
547Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
548Optical properties and bandgap evolution of ALD HfSiOx films
549TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
550The effects of layering in ferroelectric Si-doped HfO2 thin films
551Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
552Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
553Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
554New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
555Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
556Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
557Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
558Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
559Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
560Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
561High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
562High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
563Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
564Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
565On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
566Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
567Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
568High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
569Systematic efficiency study of line-doubled zone plates
570TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
571IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
572Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
573Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
574Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
575Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
576Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
577Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
578Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
579The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
580Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
581Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
582Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
583Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
584Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
585Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
586Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
587Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
588In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
589Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
590Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
591Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
592Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
593Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
594Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
595Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
596Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
597The important role of water in growth of monolayer transition metal dichalcogenides
598Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
599Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
600Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
601Radical Enhanced Atomic Layer Deposition of Metals and Oxides
602Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
603Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
604Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
605Radical Enhanced Atomic Layer Deposition of Metals and Oxides
606Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
607Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
608Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
609Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
610Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
611Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
612Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
613Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
614Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
615Encapsulation method for atom probe tomography analysis of nanoparticles
616Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
617Growth of silica nanowires in vacuum
618In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
619Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
620Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
621Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
622Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
623Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
624Remote Plasma ALD of Platinum and Platinum Oxide Films
625Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
626Room-Temperature Atomic Layer Deposition of Platinum
627Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
628Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
629Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
630Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
631Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
632Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
633Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
634Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
635The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
636Remote Plasma ALD of Platinum and Platinum Oxide Films
637Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
638Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
639Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
640Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
641Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
642Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
643High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
644Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
645In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
646Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
647Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
648Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
649Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
650Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
651(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
652ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
653Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
654Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
655Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
656Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
657Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
658Radical Enhanced Atomic Layer Deposition of Metals and Oxides
659Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
660Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
661Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
662Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
663'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
664A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
665A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
666Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
667Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
668Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
669Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
670Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
671Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
672Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
673Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
674Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
675Atomic layer deposition of metal-oxide thin films on cellulose fibers
676Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
677Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
678Breakdown and Protection of ALD Moisture Barrier Thin Films
679Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
680Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
681Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
682Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
683Comparative study of ALD SiO2 thin films for optical applications
684Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
685Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
686Designing high performance precursors for atomic layer deposition of silicon oxide
687Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
688Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
689Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
690Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
691Energy-enhanced atomic layer deposition for more process and precursor versatility
692Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
693Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
694Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
695Gate Insulator for High Mobility Oxide TFT
696Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
697High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
698High-Reflective Coatings For Ground and Space Based Applications
699Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
700Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
701Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
702Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
703Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
704Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
705Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
706Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
707Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
708Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
709Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
710Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
711Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
712Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
713Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
714Modal properties of a strip-loaded horizontal slot waveguide
715Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
716Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
717Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
718Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
719Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
720On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
721On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
722Optical properties and bandgap evolution of ALD HfSiOx films
723PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
724Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
725Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
726Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
727Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
728Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
729Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
730Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
731Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
732Radical Enhanced Atomic Layer Deposition of Metals and Oxides
733Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
734Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
735Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
736Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
737Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
738Single-Cell Photonic Nanocavity Probes
739Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
740Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
741Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
742Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
743Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
744Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
745Symmetrical Al2O3-based passivation layers for p- and n-type silicon
746Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
747Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
748Trapped charge densities in Al2O3-based silicon surface passivation layers
749Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
750Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
751A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
752Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
753Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
754Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
755Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
756Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
757Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
758Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
759In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
760Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
761Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
762Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
763Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
764SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
765Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
766Surface and sensing properties of PE-ALD SnO2 thin film
767Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
768Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
769Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
770Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
771Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
772Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
773Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
774Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
775Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
776Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
777Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
778Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
779Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
780Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
781Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
782Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
783Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
784Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
785Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
786Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
787Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
788Radical Enhanced Atomic Layer Deposition of Metals and Oxides
789Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
790Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
791Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
792Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
793Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
794Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
795Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
796Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
797Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
798Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
799Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
800Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
801Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
802Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
803Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
804Trilayer Tunnel Selectors for Memristor Memory Cells
805Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
806Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
807A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
808Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
809An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
810Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
811Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
812Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
813Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
814Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
815Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
816Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
817Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
818Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
819Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
820Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
821Biofilm prevention on cochlear implants
822Bipolar resistive switching in amorphous titanium oxide thin film
823Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
824Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
825Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
826Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
827Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
828Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
829Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
830Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
831Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
832Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
833Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
834Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
835Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
836Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
837Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
838Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
839Energy-enhanced atomic layer deposition for more process and precursor versatility
840Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
841Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
842Epitaxial 1D electron transport layers for high-performance perovskite solar cells
843Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
844Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
845Flexible Memristive Memory Array on Plastic Substrates
846Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
847Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
848Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
849Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
850Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
851Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
852Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
853High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
854High-efficiency embedded transmission grating
855Highly efficient and bending durable perovskite solar cells: toward a wearable power source
856Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
857Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
858Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
859In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
860In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
861In-gap states in titanium dioxide and oxynitride atomic layer deposited films
862Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
863Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
864Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
865Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
866Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
867Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
868Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
869Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
870Lithium-Iron (III) Fluoride Battery with Double Surface Protection
871Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
872Low temperature temporal and spatial atomic layer deposition of TiO2 films
873Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
874Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
875Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
876MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
877Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
878On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
879Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
880Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
881Oxygen migration in TiO2-based higher-k gate stacks
882Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
883Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
884Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
885Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
886Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
887Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
888Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
889Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
890Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
891Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
892Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
893Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
894Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
895Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
896Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
897Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
898Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
899Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
900Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
901Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
902Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
903Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
904The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
905The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
906The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
907The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
908Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
909Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
910TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
911Transient characterization of the electroforming process in TiO2 based resistive switching devices
912Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
913Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
914X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
915Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
916Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
917Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
918Optical and Electrical Properties of TixSi1-xOy Films
919Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
920Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
921Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
922Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
923Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
924Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
925Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
926Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
927Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
928Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
929In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
930Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
931Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
932The important role of water in growth of monolayer transition metal dichalcogenides
933Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
934Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
935Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
936Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
937Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
938Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
939Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
940Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
941Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
942Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
943Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
944Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
945Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
946Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
947Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
948Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
949Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
950Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
951Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
952Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
953Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
954Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
955Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
956Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
957Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
958Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
959Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
960Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
961Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
962Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
963Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
964Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
965Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
966Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
967Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
968Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
969Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
970Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
971Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
972Radical Enhanced Atomic Layer Deposition of Metals and Oxides
973Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
974Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
975Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
976Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
977Spectroscopy and control of near-surface defects in conductive thin film ZnO
978Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
979Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
980The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
981The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
982The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
983The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
984The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
985Top-down fabricated ZnO nanowire transistors for application in biosensors
986Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
987Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
988Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
989ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
990Plasma-enhanced atomic layer deposition of zinc phosphate
991Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
992Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
993Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
994Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
995Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
996Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
997Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
998Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
999Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1000Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1001Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1002Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1003Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1004High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1005Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1006Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1007Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1008Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1009Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1010Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1011Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1012Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1013Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1014PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1015PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1016PEALD ZrO2 Films Deposition on TiN and Si Substrates
1017Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1018Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1019Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1020Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1021Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1022Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1023Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1024Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1025The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1026The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1027Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1028Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1029ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1030ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1031ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1032Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1033Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1034Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1035Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

Mark Sowa

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