O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
2Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
3Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
4Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
5Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
6Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
7Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
8Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
9Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
10Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
11Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
12Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
13Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
14Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
15Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
16HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
17Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
18Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
19A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
20Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
21Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
22Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
23Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
24Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
25Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
26Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
27New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
28Damage evaluation in graphene underlying atomic layer deposition dielectrics
29Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
30Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
31Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
32Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
33A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
34Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
35Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
36Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
37Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
38Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
39Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
40Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
41Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
42Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
43Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
44Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
45Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
46Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
47The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
48Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
49Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
50Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
511D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
52Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
53Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
54HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
55Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
56Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
57Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
58Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
59Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
60Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
61Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
62Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
63Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
64Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
65Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
66Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
67Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
68The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
69Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
70Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
71Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
72Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
73Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
74Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
75In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
76Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
77Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
78Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
79Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
80Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
81Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
82Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
83Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
84Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
85Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
86Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
87Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
88Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
89Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
90Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
91Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
92Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
93Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
94Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
95Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
96Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
97Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
98Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
99Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
100Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
101Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
102Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
103Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
104Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
105Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
106Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
107Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
108Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
109Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
110Optimization of the Surface Structure on Black Silicon for Surface Passivation
111Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
112Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
113Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
114Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
115Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
116Charge effects of ultrafine FET with nanodot type floating gate
117Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
118Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
119In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
120Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
121Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
122In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
123Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
124Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
125Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
126Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
127Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
128Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
129Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
130Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
131Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
132Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
133ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
134Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
135Study on the resistive switching time of TiO2 thin films
136Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
137Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
138Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
139In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
140Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
141Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
142Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
143Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
144Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
145Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
146Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
147Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
148Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
149Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
150Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
151The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
152Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
153Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
154Plasma-enhanced atomic layer deposition of BaTiO3
155Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
156Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
157Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
158Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
159Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
160Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
161Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
162Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
163Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
164Symmetrical Al2O3-based passivation layers for p- and n-type silicon
165Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
166TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
167Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
168Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
169Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
170High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
171Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
172Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
173Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
174An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
175Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
176Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
177Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
178High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
179Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
180Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
181Oxygen migration in TiO2-based higher-k gate stacks
182Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
183Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
184Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
185Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
186Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
187Low temperature temporal and spatial atomic layer deposition of TiO2 films
188Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
189Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
190Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
191Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
192Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
193Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
194Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
195Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
196Trilayer Tunnel Selectors for Memristor Memory Cells
197Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
198Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
199Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
200Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
201The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
202Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
203Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
204Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
205Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
206Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
207Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
208Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
209Residual stress study of thin films deposited by atomic layer deposition
210Propagation Effects in Carbon Nanoelectronics
211Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
212The effects of layering in ferroelectric Si-doped HfO2 thin films
213Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
214Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
215Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
216Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
217Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
218Atomic Layer Deposition of Gold Metal
219Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
220Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
221Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
222Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
223Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
224Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
225Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
226Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
227Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
228Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
229Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
230Advances in the fabrication of graphene transistors on flexible substrates
231Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
232Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
233Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
234Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
235Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
236Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
237Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
238High-Reflective Coatings For Ground and Space Based Applications
239Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
240Energy-enhanced atomic layer deposition for more process and precursor versatility
241Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
242Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
243Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
244Optical properties and bandgap evolution of ALD HfSiOx films
245Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
246Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
247Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
248Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
249Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
250Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
251Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
252Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
253Optical properties and bandgap evolution of ALD HfSiOx films
254Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
255Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
256Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
257Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
258Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
259ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
260Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
261High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
262Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
263Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
264Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
265Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
266Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
267Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
268Optical and Electrical Properties of AlxTi1-xO Films
269Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
270Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
271Radical Enhanced Atomic Layer Deposition of Metals and Oxides
272Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
273Fiber-matrix interface reinforcement using Atomic Layer Deposition
274Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
275Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
276Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
277Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
278Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
279Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
280Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
281Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
282Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
283Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
284Breakdown and Protection of ALD Moisture Barrier Thin Films
285Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
286Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
287Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
288Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
289Band alignment of Al2O3 with (-201) β-Ga2O3
290In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
291Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
292Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
293Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
294Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
295Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
296Nonvolatile Capacitive Crossbar Array for In-Memory Computing
297Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
298Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
299Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
300Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
301Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
302Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
303Impact of interface materials on side permeation in indirect encapsulation of organic electronics
304Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
305Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
306Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
307In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
308Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
309Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
310Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
311Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
312Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
313Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
314Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
315Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
316On the equilibrium concentration of boron-oxygen defects in crystalline silicon
317TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
318Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
319Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
320Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
321Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
322Radical Enhanced Atomic Layer Deposition of Metals and Oxides
323Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
324Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
325In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
326Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
327A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
328Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
329Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
330Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
331Sub-10-nm ferroelectric Gd-doped HfO2 layers
332PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
333Surface and sensing properties of PE-ALD SnO2 thin film
334Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
335Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
336Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
337Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
338High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
339Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
340In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
341Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
342A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
343Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
344Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
345Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
346The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
347Plasma enhanced atomic layer deposition of Fe2O3 thin films
348Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
349Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
350Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
351Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
352Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
353Plasma-enhanced atomic layer deposition of zinc phosphate
354Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
355The important role of water in growth of monolayer transition metal dichalcogenides
356Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
357Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
358Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
359Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
360ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
361Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
362Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
363Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
364Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
365Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
366Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
367Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
368Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
369Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
370Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
371Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
372In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
373Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
374Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
375Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
376Radical Enhanced Atomic Layer Deposition of Metals and Oxides
377Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
378Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
379Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
380Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
381Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
382Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
383Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
384Densification of Thin Aluminum Oxide Films by Thermal Treatments
385Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
386Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
387Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
388Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
389A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
390Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
391Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
392Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
393Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
394XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
395Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
396A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
397Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
398Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
399Atomic Layer Deposition of the Conductive Delafossite PtCoO2
400Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
401Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
402Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
403Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
404Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
405Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
406Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
407Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
408Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
409Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
410Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
411Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
412Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
413(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
414Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
415Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
416Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
417Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
418Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
419DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
420Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
421Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
422Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
423Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
424Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
425Optical display film as flexible and light trapping substrate for organic photovoltaics
426Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
427Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
428Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
429Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
430Ferroelectricity in hafnia controlled via surface electrochemical state
431The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
432Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
433Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
434Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
435Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
436Anti-stiction coating for mechanically tunable photonic crystal devices
437Plasma-enhanced atomic layer deposition of BaTiO3
438Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
439Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
440Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
441Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
442Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
443Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
444Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
445Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
446Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
447The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
448Biofilm prevention on cochlear implants
449Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
450Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
451In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
452Optical properties and bandgap evolution of ALD HfSiOx films
453Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
454Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
455Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
456Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
457Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
458Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
459Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
460Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
461Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
462Innovative remote plasma source for atomic layer deposition for GaN devices
463Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
464Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
465Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
466Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
467The important role of water in growth of monolayer transition metal dichalcogenides
468Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
469Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
470Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
471Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
472Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
473Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
474Hafnia and alumina on sulphur passivated germanium
475Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
476Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
477Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
478Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
479Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
480Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
481Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
482Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
483Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
484TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
485Energy-enhanced atomic layer deposition for more process and precursor versatility
486Atomic layer deposition of metal-oxide thin films on cellulose fibers
487Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
488Energy-enhanced atomic layer deposition for more process and precursor versatility
4893D structure evolution using metastable atomic layer deposition based on planar silver templates
490Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
491Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
492Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
493Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
494Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
495Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
496Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
497Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
498Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
499Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
500On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
501Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
502Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
503Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
504Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
505PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
506Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
507Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
508Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
509Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
510Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
511Epitaxial 1D electron transport layers for high-performance perovskite solar cells
512Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
513Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
514Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
515Remote Plasma ALD of Platinum and Platinum Oxide Films
516Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
517On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
518Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
519Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
520Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
521Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
522Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
523Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
524Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
525Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
526Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
527Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
528Patterned deposition by plasma enhanced spatial atomic layer deposition
529Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
530Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
531Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
532Bipolar resistive switching in amorphous titanium oxide thin film
533Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
534Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
535Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
536Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
537Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
538Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
539A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
540Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
541Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
542Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
543Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
544Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
545Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
546The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
547Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
548Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
549Transient characterization of the electroforming process in TiO2 based resistive switching devices
550Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
551Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
552Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
553Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
554Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
555Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
556Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
557Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
558Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
559Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
560Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
561Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
562Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
563On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
564Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
565Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
566Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
567Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
568Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
569Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
570Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
571Flexible, light trapping substrates for organic photovoltaics
572Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
573Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
574Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
575Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
576Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
577Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
578Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
579HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
580Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
581Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
582Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
583Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
584Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
585Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
586Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
587ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
588Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
589Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
590Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
591Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
592Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
593Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
594Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
595Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
596Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
597Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
598Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
599Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
600Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
601Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
602Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
603Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
604Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
605Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
606Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
607The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
608Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
609Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
610Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
611Composite materials and nanoporous thin layers made by atomic layer deposition
612Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
613Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
614Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
615Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
616Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
617Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
618Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
619Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
620Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
621Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
622Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
623Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
624Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
625Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
626Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
627Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
628Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
629Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
630Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
631Gate Insulator for High Mobility Oxide TFT
632ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
633Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
634Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
635In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
636Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
637Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
638Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
639Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
640Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
641Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
642Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
643Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
644Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
645Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
646Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
647Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
648Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
649Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
650Radical Enhanced Atomic Layer Deposition of Metals and Oxides
651Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
652Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
653Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
654Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
655Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
656Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
657Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
658Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
659An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
660Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
661Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
662A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
663Topographically selective deposition
664α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
665Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
666Single-Cell Photonic Nanocavity Probes
667Experimental verification of electro-refractive phase modulation in graphene
668Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
669Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
670Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
671Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
672Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
673A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
674Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
675Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
676AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
677Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
678Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
679Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
680Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
681Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
682Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
683Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
684Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
685Plasma enhanced atomic layer deposition of Ga2O3 thin films
686Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
687Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
688Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
689Optical and Electrical Properties of TixSi1-xOy Films
690Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
691Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
692Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
693Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
694Remote Plasma ALD of Platinum and Platinum Oxide Films
695MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
696Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
697Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
698Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
699Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
700Radical Enhanced Atomic Layer Deposition of Metals and Oxides
701Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
702Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
703Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
704Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
705Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
706Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
707Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
708On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
709Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
710Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
711Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
712Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
713Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
714Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
715Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
716Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
717Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
718Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
719Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
720Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
721High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
722Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
723Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
724Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
725Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
726Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
727First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
728Passivation effects of atomic-layer-deposited aluminum oxide
729Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
730Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
731Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
732Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
733IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
734Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
735Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
736Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
737Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
738Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
739Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
740Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
741Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
742Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
743Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
744Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
745A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
746An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
747Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
748Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
749Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
750Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
751Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
752Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
753Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
754N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
755Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
756Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
757Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
758Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
759Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
760Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
761Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
762Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
763The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
764Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
765Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
766Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
767Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
768On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
769In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
770Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
771Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
772Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
773DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
774Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
775ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
776Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
777Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
778Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
779Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
780Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
781HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
782The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
783Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
784Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
785Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
786Breakdown and Protection of ALD Moisture Barrier Thin Films
787Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
788Highly efficient and bending durable perovskite solar cells: toward a wearable power source
789Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
790On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
791Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
792Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
793Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
794Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
795Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
796Characteristics of HfO2 thin films grown by plasma atomic layer deposition
797Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
798Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
799A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
800Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
801Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
802Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
803Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
804Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
805Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
806Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
807Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
808Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
809ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
810Annealing behavior of ferroelectric Si-doped HfO2 thin films
811Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
812Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
813Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
814Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
815Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
816Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
817Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
818Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
819Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
820Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
821Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
822Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
823Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
824Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
825Nonvolatile Capacitive Crossbar Array for In-Memory Computing
826Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
827Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
828Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
829Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
830Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
831Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
832Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
833Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
834Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
835Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
836Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
837Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
838Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
839Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
840High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
841Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
842Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
843Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
844Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
845Systematic efficiency study of line-doubled zone plates
846Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
847Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
848Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
849Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
850Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
851Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
852Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
853Radical Enhanced Atomic Layer Deposition of Metals and Oxides
854Lithium-Iron (III) Fluoride Battery with Double Surface Protection
855Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
856Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
857Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
858Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
859Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
860'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
861Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
862All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
863Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
864Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
865Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
866Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
867Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
868Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
869Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
870Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
871The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
872Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
873Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
874Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
875High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
876Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
877The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
878Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
879Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
880Capacitance spectroscopy of gate-defined electronic lattices
881Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
882Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
883Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
884Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
885Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
886Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
887Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
888Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
889Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
890Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
891Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
892AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
893High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
894Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
895High-Reflective Coatings For Ground and Space Based Applications
896Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
897Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
898Trapped charge densities in Al2O3-based silicon surface passivation layers
899Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
900Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
901Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
902Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
903Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
904Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
905Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
906Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
907Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
908Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
909Very high frequency plasma reactant for atomic layer deposition
910Room-Temperature Atomic Layer Deposition of Platinum
911Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
912Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
913Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
914Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
915The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
916Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
917XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
918Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
919Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
920Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
921Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
922Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
923Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
924The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
925Flexible Memristive Memory Array on Plastic Substrates
926Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
927Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
928Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
929Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
930The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
931High-efficiency embedded transmission grating
932Residual stress study of thin films deposited by atomic layer deposition
933A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
934On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
935Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
936Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
937Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
938Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
939Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
940Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
941Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
942Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
943Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
944MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
945Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
946Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
947Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
948Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
949Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
950TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
951Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
952Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
953Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
954Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
955Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
956Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
957The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
958Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
959Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
960Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
961Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
962Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
963Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
964Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
965Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
966Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
967AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
968Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
969RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
970Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
971Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
972Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
973Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
974Comparative study of ALD SiO2 thin films for optical applications
975Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
976Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
977On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
978Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
979High-efficiency embedded transmission grating
980Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
981Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
982Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
983Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
984Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
985Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
986Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
987Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
988Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
989Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
990Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
991Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
992Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
993Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
994PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
995Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
996Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
997Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
998Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
999Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1000Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1001Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
1002Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
1003Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
1004Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1005Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
1006The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1007Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1008Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
1009High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
1010Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
1011Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
1012Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1013Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
1014Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
1015Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1016Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
1017Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
1018Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1019The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1020Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
1021Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
1022Damage evaluation in graphene underlying atomic layer deposition dielectrics
1023Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
1024Growth of silica nanowires in vacuum
1025Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
1026Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
1027Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1028Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1029Encapsulation method for atom probe tomography analysis of nanoparticles
1030Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
1031Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
1032Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
1033Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
1034Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1035Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1036A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1037Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
1038Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1039Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
1040Method of Fabrication for Encapsulated Polarizing Resonant Gratings
1041Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
1042A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
1043Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1044Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1045Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
1046Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
1047Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1048Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1049A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
1050Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
1051Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
1052SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
1053Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1054Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
1055Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
1056Top-down fabricated ZnO nanowire transistors for application in biosensors
1057Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
1058Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
1059Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1060Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
1061All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1062Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1063Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1064Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1065Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1066Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1067Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
1068The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1069Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1070Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
1071Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
107246-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
1073In-gap states in titanium dioxide and oxynitride atomic layer deposited films
1074Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1075Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
1076Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
1077Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
1078Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1079Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
1080In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1081Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1082Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
1083Tuning size and coverage of Pd nanoparticles using atomic layer deposition
1084Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
1085Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
1086Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1087Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
1088Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
1089Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1090Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
1091Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1092Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1093Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
1094Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
1095Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1096Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
1097Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1098Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
1099Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1100Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
1101The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
1102Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
1103PEALD ZrO2 Films Deposition on TiN and Si Substrates
1104Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1105Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1106Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1107Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
1108Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1109Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1110Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1111Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1112Modal properties of a strip-loaded horizontal slot waveguide
1113Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1114Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
1115Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1116Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1117Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1118Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
1119Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1120Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
1121Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1122Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1123Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
1124Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1125PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1126X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1127Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
1128Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1129Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1130Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
1131Designing high performance precursors for atomic layer deposition of silicon oxide
1132Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
1133Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1134Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1135AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
1136Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
1137Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1138Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1139Mechanical properties of thin-film Parylene-metal-Parylene devices
1140Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
1141Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
1142Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
1143Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1144Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
1145Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
1146On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1147Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
1148Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1149Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
1150Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1151Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
1152Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
1153Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1154Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1155Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1156Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
1157'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1158Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
1159Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
1160Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
1161High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
1162Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1163Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
1164Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1165Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1166Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1167Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
1168Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1169Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1170Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
1171Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1172Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1173Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1174Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
1175Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1176Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1177Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1178Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
1179Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
1180Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
1181Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1182Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
1183Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
1184Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1185Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
1186Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
1187Dynamic tuning of plasmon resonance in the visible using graphene
1188Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
1189Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1190Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
1191Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1192In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
1193Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
1194Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
1195Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
1196Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
1197Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1198Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
1199Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1200High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
1201Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1202Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1203Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
1204A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
1205Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
1206Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1207Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
1208Optical in situ monitoring of plasma-enhanced atomic layer deposition process
1209Sub-7-nm textured ZrO2 with giant ferroelectricity
1210Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
1211Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
1212Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1213Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1214An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
1215Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
1216Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
1217Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
1218Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1219The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1220Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1221Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1222Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
1223Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
1224Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1225Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1226Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1227Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1228Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
1229Spectroscopy and control of near-surface defects in conductive thin film ZnO
1230Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
1231Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
1232Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1233Hafnia and alumina on sulphur passivated germanium
1234Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1235Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1236Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
1237Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1238Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
1239Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
1240High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1241Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
1242Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
1243Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1244Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1245Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
1246The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
1247Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
1248Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
1249Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1250PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
1251Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
1252Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
1253Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
1254Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1255ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
1256Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1257Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1258Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
1259Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1260Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1261Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
1262Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
1263Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1264Atomic layer deposition of YMnO3 thin films
1265Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1266Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
1267From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1268Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
1269Improved understanding of recombination at the Si/Al2O3 interface
1270Plasma-enhanced atomic layer deposition of BaTiO3
1271Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
1272Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
1273Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
1274Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
1275Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
1276MANOS performance dependence on ALD Al2O3 oxidation source
1277Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge