O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
2Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
3Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
4Capacitance spectroscopy of gate-defined electronic lattices
5Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
6Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
7Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
8Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
9Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
10Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
11Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
12Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
13Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
14Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
15Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
16High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
17Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
18Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
19Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
20Patterned deposition by plasma enhanced spatial atomic layer deposition
21Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
22Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
23Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
24Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
25Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
26Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
27Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
28ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
29Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
30Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
31Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
32Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
33Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
34Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
35Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
36Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
37Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
38Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
39Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
40A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
41Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
42Propagation Effects in Carbon Nanoelectronics
43Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
44Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
45Radical Enhanced Atomic Layer Deposition of Metals and Oxides
46Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
47Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
48Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
49Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
50Densification of Thin Aluminum Oxide Films by Thermal Treatments
51Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
52Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
53Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
54Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
55Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
56Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
57HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
58The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
59Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
60Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
61Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
62Atomic Layer Deposition of the Conductive Delafossite PtCoO2
63Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
64Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
65Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
66Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
67Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
68Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
69Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
70Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
71The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
72Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
73Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
74Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
75Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
76Innovative remote plasma source for atomic layer deposition for GaN devices
77Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
78Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
79Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
80Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
81'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
82Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
83Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
84Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
85The effects of layering in ferroelectric Si-doped HfO2 thin films
86Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
87Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
88Spectroscopy and control of near-surface defects in conductive thin film ZnO
89Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
90The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
91On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
92Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
93Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
94Annealing behavior of ferroelectric Si-doped HfO2 thin films
95Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
96Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
97Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
98Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
99Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
100Surface and sensing properties of PE-ALD SnO2 thin film
101On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
102Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
103Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
104Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
105Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
106Energy-enhanced atomic layer deposition for more process and precursor versatility
107Method of Fabrication for Encapsulated Polarizing Resonant Gratings
108High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
109Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
110Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
111Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
112Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
113Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
114Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
115Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
116Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
117Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
118Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
119Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
120Optical properties and bandgap evolution of ALD HfSiOx films
121TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
122Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
123Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
124Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
125Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
126Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
127Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
128Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
129A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
130Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
131Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
132Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
133Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
134TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
135Fiber-matrix interface reinforcement using Atomic Layer Deposition
136A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
137Radical Enhanced Atomic Layer Deposition of Metals and Oxides
138In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
139Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
140Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
141Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
142In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
143On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
144Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
145Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
146Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
147Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
148Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
149Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
150Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
151Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
152Dynamic tuning of plasmon resonance in the visible using graphene
153Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
154Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
155Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
156Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
157Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
158Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
159Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
160Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
161Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
162Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
163Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
164Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
165A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
166Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
167Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
168Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
169Flexible, light trapping substrates for organic photovoltaics
170Optical in situ monitoring of plasma-enhanced atomic layer deposition process
171On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
172Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
173Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
174Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
175Lithium-Iron (III) Fluoride Battery with Double Surface Protection
176Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
177First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
178Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
179Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
180Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
181Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
182AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
183Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
184Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
185Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
186Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
187Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
188Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
189Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
190Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
191The important role of water in growth of monolayer transition metal dichalcogenides
192Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
193Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
194Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
195Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
196Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
197PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
198Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
199Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
200Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
201Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
202Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
203Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
204Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
205Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
206An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
207Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
208Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
209Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
210Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
211Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
212Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
213Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
214Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
215Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
216Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
217The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
218Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
219Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
2201D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
221Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
222Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
223Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
224Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
225Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
226α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
227Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
228Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
229Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
230Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
231'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
232Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
233Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
234Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
235The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
236Radical Enhanced Atomic Layer Deposition of Metals and Oxides
237Topographically selective deposition
238Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
239Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
240Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
241On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
242Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
243Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
244Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
245Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
246DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
247Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
248Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
249Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
250Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
251Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
252Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
253Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
254Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
255The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
256Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
257Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
258Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
259MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
260Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
261Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
262Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
263Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
264Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
265A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
266Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
267Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
2683D structure evolution using metastable atomic layer deposition based on planar silver templates
269Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
270Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
271Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
272Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
273Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
274Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
275Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
276Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
277Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
278Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
279Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
280Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
281Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
282Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
283Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
284Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
285Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
286Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
287Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
288Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
289Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
290Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
291HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
292Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
293Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
294Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
295The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
296Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
297Sub-7-nm textured ZrO2 with giant ferroelectricity
298Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
299Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
300Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
301Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
302Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
303Hafnia and alumina on sulphur passivated germanium
304Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
305Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
306Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
307Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
308Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
309Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
310Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
311Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
312TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
313A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
314Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
315Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
316Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
317An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
318Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
319Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
320The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
321Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
322Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
323Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
324Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
325Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
326Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
327Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
328Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
329Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
330Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
331The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
332Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
333The important role of water in growth of monolayer transition metal dichalcogenides
334Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
335Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
336Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
337Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
338Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
339(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
340Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
341ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
342Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
343A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
344Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
345Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
346Composite materials and nanoporous thin layers made by atomic layer deposition
347Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
348Nonvolatile Capacitive Crossbar Array for In-Memory Computing
349Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
350Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
351Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
352Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
353Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
354Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
355Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
356Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
357Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
358Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
359Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
360Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
361AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
362Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
363Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
364Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
365Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
366Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
367Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
368Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
369Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
370Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
371Residual stress study of thin films deposited by atomic layer deposition
372Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
373Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
374Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
375Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
376Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
377Damage evaluation in graphene underlying atomic layer deposition dielectrics
378Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
379Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
380A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
381Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
382Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
383ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
384In-gap states in titanium dioxide and oxynitride atomic layer deposited films
385Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
386Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
387High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
388Energy-enhanced atomic layer deposition for more process and precursor versatility
389Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
390Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
391Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
392Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
393Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
394Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
395Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
396Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
397Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
398High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
399Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
400Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
401From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
402Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
403Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
404Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
405Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
406Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
407Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
408Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
409Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
410Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
411Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
412Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
413Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
414Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
415HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
416Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
417Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
418Radical Enhanced Atomic Layer Deposition of Metals and Oxides
419Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
420Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
421Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
422Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
423Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
424Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
425Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
426Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
427Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
428In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
429On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
430Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
431Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
432Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
433Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
434Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
435Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
436Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
437Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
438Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
439Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
440Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
441Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
442Optical properties and bandgap evolution of ALD HfSiOx films
443Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
444Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
445Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
446Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
447Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
448Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
449Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
450Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
451Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
452Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
453Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
454Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
455Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
456Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
457Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
458Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
459Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
460Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
461Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
462Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
463Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
464Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
465Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
466Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
467Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
468Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
469Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
470Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
471Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
472Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
473Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
474Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
475Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
476Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
477Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
478Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
479Symmetrical Al2O3-based passivation layers for p- and n-type silicon
480Optical properties and bandgap evolution of ALD HfSiOx films
481High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
482Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
483Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
484Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
485Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
486Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
487Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
488Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
489The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
490Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
491Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
492Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
493Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
494Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
495Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
496Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
497Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
498Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
499On the equilibrium concentration of boron-oxygen defects in crystalline silicon
500Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
501Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
502Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
503Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
504Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
505Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
506Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
507Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
508Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
509Bipolar resistive switching in amorphous titanium oxide thin film
510Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
511Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
512Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
513Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
514Optical and Electrical Properties of TixSi1-xOy Films
515Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
516Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
517Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
518Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
519Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
520Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
521Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
522Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
523Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
524Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
525Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
526Damage evaluation in graphene underlying atomic layer deposition dielectrics
527Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
528DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
529Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
530Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
531Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
532All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
533Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
534Modal properties of a strip-loaded horizontal slot waveguide
535Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
536Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
537Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
538Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
539Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
540Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
541Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
542In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
543Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
544Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
545Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
546Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
547Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
548Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
549Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
550Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
551Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
552Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
553Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
554Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
555Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
556Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
557Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
558Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
559Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
560Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
561Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
562Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
563Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
564Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
565Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
566Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
567Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
568Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
569Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
570The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
571The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
572Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
573Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
574Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
575Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
576Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
577In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
578Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
579Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
580Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
581Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
582Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
583Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
584Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
585Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
586Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
587Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
588Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
589Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
590Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
591X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
592Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
593Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
594Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
595TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
596Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
597Breakdown and Protection of ALD Moisture Barrier Thin Films
598Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
599Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
600Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
601Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
602Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
603Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
604Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
605Optimization of the Surface Structure on Black Silicon for Surface Passivation
606Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
607Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
608Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
609Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
610Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
611Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
612Systematic efficiency study of line-doubled zone plates
613Growth of silica nanowires in vacuum
614Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
615Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
616Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
617Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
618Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
619Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
620Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
621Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
622Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
623Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
624Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
625Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
626Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
627Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
628Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
629Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
630Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
631Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
632Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
633Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
634Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
635Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
636Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
637Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
638Breakdown and Protection of ALD Moisture Barrier Thin Films
639Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
640Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
641Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
642Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
643Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
644Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
645PEALD ZrO2 Films Deposition on TiN and Si Substrates
646Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
647Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
648Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
649Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
650Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
651Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
652Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
653Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
654Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
655A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
656Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
657Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
658Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
659Transient characterization of the electroforming process in TiO2 based resistive switching devices
660Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
661Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
662Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
663Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
664Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
665Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
666Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
667Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
668Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
669Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
670Designing high performance precursors for atomic layer deposition of silicon oxide
671The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
672High-Reflective Coatings For Ground and Space Based Applications
673Radical Enhanced Atomic Layer Deposition of Metals and Oxides
674Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
675Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
676Epitaxial 1D electron transport layers for high-performance perovskite solar cells
677Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
678Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
679Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
680Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
681Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
682Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
683Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
684Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
685Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
686Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
687Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
688High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
689Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
690In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
691Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
692Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
693Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
694Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
695Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
696N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
697Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
698Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
699Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
700Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
701Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
702MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
703Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
704Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
705Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
706Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
707Remote Plasma ALD of Platinum and Platinum Oxide Films
708Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
709Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
710Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
711Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
712Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
713Optical display film as flexible and light trapping substrate for organic photovoltaics
714Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
715Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
716Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
717Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
718Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
719Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
720Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
721Biofilm prevention on cochlear implants
722Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
723Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
724Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
725Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
726Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
727Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
728Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
729Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
730Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
731High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
732Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
733Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
734Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
735An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
736Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
737Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
738Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
739Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
740Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
741Lithium-Iron (III) Fluoride Battery with Double Surface Protection
742Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
743Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
744Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
745Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
746All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
747Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
748Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
749Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
750Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
751Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
752Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
753Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
754PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
755In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
756Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
757Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
758Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
759A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
760Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
761The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
762High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
763The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
764Plasma-enhanced atomic layer deposition of BaTiO3
765Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
766Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
767Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
768Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
769Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
770Low temperature temporal and spatial atomic layer deposition of TiO2 films
771Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
772Experimental verification of electro-refractive phase modulation in graphene
773Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
774On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
775Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
776Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
777Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
778Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
779Plasma-enhanced atomic layer deposition of zinc phosphate
780RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
781Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
782Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
783Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
784Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
785Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
786Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
787Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
788Charge effects of ultrafine FET with nanodot type floating gate
789Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
790Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
791Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
792Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
793High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
794Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
795Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
796Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
797Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
798The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
799Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
800Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
801Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
802Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
803Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
804ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
805A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
806Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
807Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
808Encapsulation method for atom probe tomography analysis of nanoparticles
809PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
810Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
811Optical and Electrical Properties of AlxTi1-xO Films
812Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
813Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
814Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
815XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
816Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
817A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
818Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
819Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
820Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
821Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
822Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
823Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
824Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
825Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
826Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
827Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
828Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
829Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
830Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
831Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
832Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
833Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
834Characteristics of HfO2 thin films grown by plasma atomic layer deposition
835Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
836Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
837Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
838Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
839Remote Plasma ALD of Platinum and Platinum Oxide Films
84046-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
841Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
842Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
843High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
844Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
845Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
846Trapped charge densities in Al2O3-based silicon surface passivation layers
847Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
848Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
849Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
850Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
851Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
852Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
853Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
854Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
855Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
856Tuning size and coverage of Pd nanoparticles using atomic layer deposition
857The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
858Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
859Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
860Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
861Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
862Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
863Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
864Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
865Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
866Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
867Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
868Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
869ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
870Radical Enhanced Atomic Layer Deposition of Metals and Oxides
871Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
872Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
873Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
874Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
875Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
876Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
877Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
878Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
879Atomic layer deposition of YMnO3 thin films
880Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
881Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
882Impact of interface materials on side permeation in indirect encapsulation of organic electronics
883Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
884Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
885Sub-10-nm ferroelectric Gd-doped HfO2 layers
886Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
887Study on the resistive switching time of TiO2 thin films
888Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
889Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
890Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
891Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
892Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
893Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
894Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
895Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
896Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
897Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
898New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
899Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
900Plasma enhanced atomic layer deposition of Fe2O3 thin films
901Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
902Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
903Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
904Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
905Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
906Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
907Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
908MANOS performance dependence on ALD Al2O3 oxidation source
909Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
910Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
911Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
912Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
913Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
914Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
915Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
916Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
917Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
918Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
919Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
920Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
921Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
922Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
923Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
924Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
925Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
926Hafnia and alumina on sulphur passivated germanium
927Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
928Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
929Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
930Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
931Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
932SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
933Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
934Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
935Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
936Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
937Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
938Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
939Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
940Residual stress study of thin films deposited by atomic layer deposition
941Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
942Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
943Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
944Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
945Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
946Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
947Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
948Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
949Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
950Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
951Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
952Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
953Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
954Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
955Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
956Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
957Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
958Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
959Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
960Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
961Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
962Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
963Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
964AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
965AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
966Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
967Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
968Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
969Impact of interface materials on side permeation in indirect encapsulation of organic electronics
970Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
971Flexible Memristive Memory Array on Plastic Substrates
972Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
973Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
974Plasma enhanced atomic layer deposition of Ga2O3 thin films
975Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
976Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
977Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
978ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
979Atomic Layer Deposition of Gold Metal
980Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
981Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
982Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
983Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
984Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
985High-efficiency embedded transmission grating
986Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
987Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
988Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
989PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
990Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
991Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
992Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
993Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
994On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
995Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
996Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
997In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
998Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
999Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
1000Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
1001Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
1002Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
1003Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1004Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
1005The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1006Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
1007Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
1008Anti-stiction coating for mechanically tunable photonic crystal devices
1009Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
1010In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
1011Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
1012Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
1013Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
1014Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
1015Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1016Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
1017Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
1018Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
1019Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
1020An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
1021A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1022Single-Cell Photonic Nanocavity Probes
1023Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1024Room-Temperature Atomic Layer Deposition of Platinum
1025Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1026Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
1027Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1028Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
1029Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
1030Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
1031Gate Insulator for High Mobility Oxide TFT
1032Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
1033Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
1034A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
1035Oxygen migration in TiO2-based higher-k gate stacks
1036Highly efficient and bending durable perovskite solar cells: toward a wearable power source
1037Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1038A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
1039Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1040Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
1041Mechanical properties of thin-film Parylene-metal-Parylene devices
1042Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1043Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
1044Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
1045Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
1046Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
1047Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
1048Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1049Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
1050Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1051Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1052Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
1053High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
1054Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1055Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1056Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
1057Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
1058Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
1059Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
1060Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1061Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
1062Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
1063Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
1064Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
1065Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
1066Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1067Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1068Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1069ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1070Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1071Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1072Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1073Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1074Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
1075Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
1076Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
1077Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
1078Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
1079Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1080Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1081Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
1082Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1083Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
1084Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1085Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
1086Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1087Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1088Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
1089In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
1090Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1091Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1092Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1093Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
1094Top-down fabricated ZnO nanowire transistors for application in biosensors
1095Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
1096Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1097Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1098Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
1099IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
1100Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1101Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1102Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
1103Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
1104Plasma-enhanced atomic layer deposition of BaTiO3
1105Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1106Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1107Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1108Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1109PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1110The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1111A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
1112Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
1113Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
1114Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1115Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1116Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
1117Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
1118Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1119Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
1120Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
1121Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
1122Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
1123High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
1124Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
1125Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
1126XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1127Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
1128Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
1129Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
1130Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
1131Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
1132Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
1133Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
1134Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
1135Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1136Comparative study of ALD SiO2 thin films for optical applications
1137Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
1138Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1139Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
1140Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1141Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
1142Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
1143Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
1144Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1145Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1146Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1147Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
1148Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1149Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
1150Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1151Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
1152Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1153Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1154Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1155Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
1156Energy-enhanced atomic layer deposition for more process and precursor versatility
1157Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1158In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
1159Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1160Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1161Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
1162ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1163Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
1164Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
1165Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
1166Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1167Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
1168Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1169Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
1170Band alignment of Al2O3 with (-201) β-Ga2O3
1171Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
1172Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1173Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1174Advances in the fabrication of graphene transistors on flexible substrates
1175Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
1176Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
1177Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
1178The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1179Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1180Trilayer Tunnel Selectors for Memristor Memory Cells
1181The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1182Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
1183Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1184Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
1185Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
1186Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
1187Nonvolatile Capacitive Crossbar Array for In-Memory Computing
1188Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
1189Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1190Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1191Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1192The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
1193Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
1194High-efficiency embedded transmission grating
1195Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1196Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1197Atomic layer deposition of metal-oxide thin films on cellulose fibers
1198Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
1199Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
1200Ferroelectricity in hafnia controlled via surface electrochemical state
1201Very high frequency plasma reactant for atomic layer deposition
1202Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
1203Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
1204Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1205Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
1206Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1207In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
1208Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
1209Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
1210Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
1211Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
1212Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1213Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1214Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
1215Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1216Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1217Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
1218Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
1219Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
1220Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1221Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1222On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
1223Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
1224High-Reflective Coatings For Ground and Space Based Applications
1225Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1226Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1227Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
1228Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
1229Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
1230Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
1231Improved understanding of recombination at the Si/Al2O3 interface
1232Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1233Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
1234Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
1235Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
1236Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
1237Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1238Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
1239Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
1240Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1241Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
1242Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
1243Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
1244Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1245HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
1246Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
1247Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1248Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
1249Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1250Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
1251Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1252Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
1253Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1254Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
1255Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
1256Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1257Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
1258Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1259Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
1260Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1261Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
1262Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1263Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
1264Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1265Plasma-enhanced atomic layer deposition of BaTiO3
1266Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
1267In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
1268Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
1269Passivation effects of atomic-layer-deposited aluminum oxide
1270The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
1271Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
1272Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
1273The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
1274Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
1275Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1276Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
1277In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors