O₂, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 958 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5	46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6	A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12	Advances in the fabrication of graphene transistors on flexible substrates
13	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20	ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30	Anti-stiction coating for mechanically tunable photonic crystal devices
31	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35	Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37	Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38	Band alignment of Al2O3 with (-201) β-Ga2O3
39	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40	Breakdown and Protection of ALD Moisture Barrier Thin Films
41	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42	Capacitance spectroscopy of gate-defined electronic lattices
43	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44	Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46	Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48	Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49	Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51	Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52	Charge effects of ultrafine FET with nanodot type floating gate
53	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
60	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
61	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
62	Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
63	Damage evaluation in graphene underlying atomic layer deposition dielectrics
64	DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
65	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
66	Demonstration of flexible thin film transistors with GaN channels
67	Densification of Thin Aluminum Oxide Films by Thermal Treatments
68	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69	Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71	DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74	Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76	Dynamic tuning of plasmon resonance in the visible using graphene
77	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
81	Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
82	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
83	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
84	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
85	Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
86	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
87	Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
88	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
89	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
90	Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
91	Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
92	Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
93	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
94	Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
95	Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
96	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
97	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
99	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
100	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
101	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
102	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
103	Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
104	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
105	Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
106	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
107	Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
108	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
109	Energy-enhanced atomic layer deposition for more process and precursor versatility
110	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
111	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
112	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
113	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
114	Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
115	Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
116	Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
117	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
118	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
119	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
120	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
121	Experimental verification of electro-refractive phase modulation in graphene
122	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
123	Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
124	Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
125	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
126	Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
127	Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
128	Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
129	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
130	First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
131	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
132	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
133	Flexible, light trapping substrates for organic photovoltaics
134	Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
135	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
136	Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
137	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
138	Hafnia and alumina on sulphur passivated germanium
139	High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
140	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
141	High-efficiency embedded transmission grating
142	High-Reflective Coatings For Ground and Space Based Applications
143	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
144	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
145	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
146	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
147	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
148	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
149	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
150	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
151	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
152	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
153	Improved understanding of recombination at the Si/Al2O3 interface
154	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
155	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
156	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
157	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
158	Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
159	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
160	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
161	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
162	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
163	Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
164	Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
165	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
166	Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
167	Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
168	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
169	Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
170	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
171	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
172	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
173	Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
174	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
175	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
176	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
177	Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
178	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
179	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
180	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
181	Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
182	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
183	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
184	Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
185	Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
186	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
187	Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
188	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
189	Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
190	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
191	Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
192	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
193	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
194	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
195	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
196	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
197	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
198	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
199	Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
200	MANOS performance dependence on ALD Al2O3 oxidation source
201	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
202	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
203	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
204	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
205	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
206	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
207	Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
208	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
209	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
210	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
211	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
212	Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
213	N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
214	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
215	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
216	Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
217	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
218	Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
219	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
220	On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
221	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
222	On the equilibrium concentration of boron-oxygen defects in crystalline silicon
223	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
224	Optical display film as flexible and light trapping substrate for organic photovoltaics
225	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
226	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
227	Optimization of the Surface Structure on Black Silicon for Surface Passivation
228	Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
229	Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
230	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
231	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
232	Passivation effects of atomic-layer-deposited aluminum oxide
233	Patterned deposition by plasma enhanced spatial atomic layer deposition
234	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
235	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
236	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
237	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
238	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
239	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
240	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
241	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
242	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
243	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
244	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
245	Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
246	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
247	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
248	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
249	Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
250	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
251	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
252	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
253	Propagation Effects in Carbon Nanoelectronics
254	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
255	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
256	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
257	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
258	Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
259	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
260	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
261	Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
262	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
263	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
264	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
265	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
266	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
267	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
268	Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
269	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
270	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
271	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
272	Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
273	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
274	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
275	Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
276	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
277	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
278	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
279	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
280	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
281	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
282	Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
283	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
284	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
285	Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
286	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
287	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
288	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
289	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
290	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
291	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
292	Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
293	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
294	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
295	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
296	Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
297	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
298	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
299	Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
300	Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
301	Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
302	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
303	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
304	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
305	Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
306	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
307	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
308	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
309	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
310	Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
311	Very high frequency plasma reactant for atomic layer deposition
312	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
313	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
314	Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
315	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
316	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
317	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
318	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
319	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
320	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
321	Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
322	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
323	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
324	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
325	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
326	Composite materials and nanoporous thin layers made by atomic layer deposition
327	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
328	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
329	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
330	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
331	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
332	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
333	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
334	Optical and Electrical Properties of AlxTi1-xO Films
335	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
336	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
337	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
338	Atomic Layer Deposition of Gold Metal
339	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
340	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
341	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
342	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
343	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
344	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
345	Plasma-enhanced atomic layer deposition of BaTiO3
346	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
347	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
348	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
349	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
350	Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
351	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
352	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
353	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
354	Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
355	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
356	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
357	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
358	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
359	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
360	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
361	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
362	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
363	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
364	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
365	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
366	Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
367	Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
368	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
369	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
370	Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
371	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
372	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
373	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
374	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
375	Plasma enhanced atomic layer deposition of Fe2O3 thin films
376	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
377	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
378	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
379	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
380	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
381	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
382	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
383	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
384	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
385	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
386	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
387	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
388	Plasma enhanced atomic layer deposition of Ga2O3 thin films
389	Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
390	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
391	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
392	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
393	Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
394	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
395	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
396	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
397	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
398	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
399	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
400	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
401	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
402	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
403	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
404	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
405	A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
406	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
407	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
408	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
409	Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
410	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
411	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
412	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
413	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
414	Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
415	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
416	Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
417	Characteristics of HfO2 thin films grown by plasma atomic layer deposition
418	Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
419	Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
420	Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
421	Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
422	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
423	Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
424	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
425	Damage evaluation in graphene underlying atomic layer deposition dielectrics
426	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
427	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
428	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
429	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
430	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
431	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
432	Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
433	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
434	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
435	Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
436	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
437	Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
438	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
439	Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
440	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
441	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
442	Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
443	Hafnia and alumina on sulphur passivated germanium
444	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
445	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
446	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
447	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
448	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
449	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
450	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
451	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
452	Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
453	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
454	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
455	Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
456	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
457	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
458	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
459	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
460	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
461	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
462	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
463	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
464	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
465	Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
466	Optical properties and bandgap evolution of ALD HfSiOx films
467	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
468	Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
469	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
470	Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
471	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
472	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
473	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
474	Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
475	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
476	Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
477	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
478	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
479	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
480	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
481	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
482	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
483	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
484	The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
485	Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
486	Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
487	Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
488	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
489	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
490	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
491	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
492	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
493	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
494	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
495	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
496	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
497	Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
498	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
499	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
500	Annealing behavior of ferroelectric Si-doped HfO2 thin films
501	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
502	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
503	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
504	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
505	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
506	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
507	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
508	Optical properties and bandgap evolution of ALD HfSiOx films
509	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
510	The effects of layering in ferroelectric Si-doped HfO2 thin films
511	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
512	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
513	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
514	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
515	Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
516	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
517	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
518	Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
519	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
520	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
521	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
522	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
523	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
524	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
525	Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
526	High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
527	Systematic efficiency study of line-doubled zone plates
528	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
529	IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
530	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
531	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
532	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
533	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
534	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
535	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
536	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
537	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
538	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
539	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
540	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
541	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
542	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
543	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
544	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
545	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
546	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
547	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
548	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
549	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
550	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
551	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
552	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
553	The important role of water in growth of monolayer transition metal dichalcogenides
554	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
555	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
556	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
557	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
558	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
559	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
560	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
561	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
562	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
563	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
564	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
565	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
566	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
567	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
568	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
569	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
570	Encapsulation method for atom probe tomography analysis of nanoparticles
571	Growth of silica nanowires in vacuum
572	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
573	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
574	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
575	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
576	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
577	Remote Plasma ALD of Platinum and Platinum Oxide Films
578	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
579	Room-Temperature Atomic Layer Deposition of Platinum
580	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
581	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
582	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
583	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
584	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
585	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
586	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
587	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
588	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
589	Remote Plasma ALD of Platinum and Platinum Oxide Films
590	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
591	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
592	Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
593	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
594	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
595	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
596	High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
597	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
598	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
599	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
600	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
601	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
602	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
603	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
604	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
605	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
606	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
607	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
608	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
609	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
610	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
611	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
612	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
613	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
614	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
615	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
616	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
617	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
618	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
619	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
620	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
621	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
622	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
623	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
624	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
625	Atomic layer deposition of metal-oxide thin films on cellulose fibers
626	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
627	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
628	Breakdown and Protection of ALD Moisture Barrier Thin Films
629	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
630	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
631	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
632	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
633	Comparative study of ALD SiO2 thin films for optical applications
634	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
635	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
636	Designing high performance precursors for atomic layer deposition of silicon oxide
637	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
638	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
639	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
640	Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
641	Energy-enhanced atomic layer deposition for more process and precursor versatility
642	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
643	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
644	Gate Insulator for High Mobility Oxide TFT
645	Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
646	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
647	High-Reflective Coatings For Ground and Space Based Applications
648	Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
649	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
650	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
651	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
652	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
653	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
654	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
655	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
656	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
657	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
658	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
659	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
660	Modal properties of a strip-loaded horizontal slot waveguide
661	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
662	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
663	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
664	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
665	Optical properties and bandgap evolution of ALD HfSiOx films
666	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
667	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
668	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
669	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
670	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
671	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
672	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
673	Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
674	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
675	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
676	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
677	Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
678	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
679	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
680	Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
681	Single-Cell Photonic Nanocavity Probes
682	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
683	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
684	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
685	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
686	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
687	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
688	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
689	Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
690	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
691	Trapped charge densities in Al2O3-based silicon surface passivation layers
692	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
693	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
694	A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
695	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
696	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
697	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
698	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
699	Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
700	Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
701	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
702	In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
703	Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
704	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
705	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
706	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
707	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
708	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
709	Surface and sensing properties of PE-ALD SnO2 thin film
710	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
711	Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
712	Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
713	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
714	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
715	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
716	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
717	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
718	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
719	Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
720	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
721	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
722	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
723	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
724	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
725	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
726	Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
727	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
728	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
729	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
730	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
731	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
732	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
733	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
734	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
735	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
736	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
737	Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
738	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
739	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
740	Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
741	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
742	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
743	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
744	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
745	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
746	Trilayer Tunnel Selectors for Memristor Memory Cells
747	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
748	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
749	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
750	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
751	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
752	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
753	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
754	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
755	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
756	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
757	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
758	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
759	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
760	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
761	Biofilm prevention on cochlear implants
762	Bipolar resistive switching in amorphous titanium oxide thin film
763	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
764	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
765	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
766	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
767	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
768	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
769	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
770	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
771	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
772	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
773	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
774	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
775	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
776	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
777	Energy-enhanced atomic layer deposition for more process and precursor versatility
778	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
779	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
780	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
781	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
782	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
783	Flexible Memristive Memory Array on Plastic Substrates
784	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
785	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
786	Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
787	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
788	Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
789	Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
790	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
791	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
792	High-efficiency embedded transmission grating
793	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
794	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
795	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
796	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
797	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
798	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
799	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
800	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
801	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
802	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
803	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
804	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
805	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
806	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
807	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
808	Low temperature temporal and spatial atomic layer deposition of TiO2 films
809	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
810	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
811	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
812	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
813	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
814	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
815	Oxygen migration in TiO2-based higher-k gate stacks
816	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
817	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
818	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
819	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
820	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
821	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
822	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
823	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
824	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
825	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
826	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
827	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
828	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
829	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
830	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
831	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
832	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
833	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
834	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
835	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
836	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
837	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
838	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
839	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
840	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
841	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
842	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
843	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
844	Transient characterization of the electroforming process in TiO2 based resistive switching devices
845	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
846	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
847	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
848	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
849	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
850	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
851	Optical and Electrical Properties of TixSi1-xOy Films
852	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
853	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
854	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
855	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
856	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
857	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
858	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
859	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
860	In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
861	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
862	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
863	The important role of water in growth of monolayer transition metal dichalcogenides
864	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
865	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
866	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
867	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
868	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
869	Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
870	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
871	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
872	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
873	Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
874	Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
875	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
876	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
877	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
878	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
879	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
880	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
881	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
882	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
883	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
884	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
885	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
886	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
887	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
888	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
889	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
890	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
891	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
892	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
893	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
894	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
895	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
896	Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
897	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
898	Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
899	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
900	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
901	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
902	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
903	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
904	Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
905	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
906	Spectroscopy and control of near-surface defects in conductive thin film ZnO
907	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
908	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
909	The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
910	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
911	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
912	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
913	Top-down fabricated ZnO nanowire transistors for application in biosensors
914	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
915	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
916	Plasma-enhanced atomic layer deposition of zinc phosphate
917	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
918	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
919	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
920	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
921	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
922	Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
923	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
924	Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
925	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
926	Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
927	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
928	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
929	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
930	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
931	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
932	Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
933	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
934	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
935	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
936	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
937	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
938	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
939	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
940	PEALD ZrO2 Films Deposition on TiN and Si Substrates
941	Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
942	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
943	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
944	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
945	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
946	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
947	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
948	The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
949	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
950	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
951	Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
952	ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
953	ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
954	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
955	Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
956	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
957	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
958	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

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