O₂, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 945 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2	Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
4	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
5	46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6	A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8	A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
10	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
11	Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
12	Advances in the fabrication of graphene transistors on flexible substrates
13	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
14	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
15	Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
16	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
17	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
18	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
19	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
20	ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
21	AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
22	AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
23	AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
24	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
25	Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
26	Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
27	An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
28	Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
29	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
30	Anti-stiction coating for mechanically tunable photonic crystal devices
31	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
32	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33	Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
34	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
35	Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
36	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
37	Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
38	Band alignment of Al2O3 with (-201) β-Ga2O3
39	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
40	Breakdown and Protection of ALD Moisture Barrier Thin Films
41	Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
42	Capacitance spectroscopy of gate-defined electronic lattices
43	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
44	Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
45	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
46	Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
47	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
48	Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
49	Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
50	Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
51	Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
52	Charge effects of ultrafine FET with nanodot type floating gate
53	Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
54	Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
55	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
56	Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
57	Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
58	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
59	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
60	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
61	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
62	Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
63	Damage evaluation in graphene underlying atomic layer deposition dielectrics
64	DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
65	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
66	Demonstration of flexible thin film transistors with GaN channels
67	Densification of Thin Aluminum Oxide Films by Thermal Treatments
68	Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
69	Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
70	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
71	DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
72	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
73	Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
74	Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
75	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
76	Dynamic tuning of plasmon resonance in the visible using graphene
77	Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
78	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
79	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
80	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
81	Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
82	Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
83	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
84	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
85	Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
86	Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
87	Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
88	Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
89	Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
90	Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
91	Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
92	Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
93	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
94	Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
95	Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
96	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
97	Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
98	Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
99	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
100	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
101	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
102	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
103	Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
104	Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
105	Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
106	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
107	Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
108	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
109	Energy-enhanced atomic layer deposition for more process and precursor versatility
110	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
111	Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
112	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
113	Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
114	Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
115	Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
116	Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
117	Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
118	Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
119	Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
120	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
121	Experimental verification of electro-refractive phase modulation in graphene
122	Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
123	Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
124	Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
125	Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
126	Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
127	Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
128	Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
129	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
130	First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
131	Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
132	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
133	Flexible, light trapping substrates for organic photovoltaics
134	Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
135	Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
136	Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
137	Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
138	Hafnia and alumina on sulphur passivated germanium
139	High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
140	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
141	High-efficiency embedded transmission grating
142	High-Reflective Coatings For Ground and Space Based Applications
143	High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
144	Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
145	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
146	Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
147	Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
148	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
149	Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
150	Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
151	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
152	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
153	Improved understanding of recombination at the Si/Al2O3 interface
154	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
155	Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
156	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
157	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
158	Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
159	In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
160	In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
161	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
162	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
163	Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
164	Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
165	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
166	Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
167	Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
168	Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
169	Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
170	Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
171	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
172	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
173	Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
174	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
175	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
176	Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
177	Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
178	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
179	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
180	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
181	Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
182	Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
183	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
184	Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
185	Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
186	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
187	Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
188	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
189	Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
190	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
191	Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
192	Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
193	Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
194	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
195	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
196	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
197	Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
198	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
199	Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
200	MANOS performance dependence on ALD Al2O3 oxidation source
201	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
202	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
203	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
204	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
205	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
206	Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
207	Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
208	Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
209	Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
210	Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
211	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
212	Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
213	N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
214	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
215	Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
216	Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
217	Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
218	Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
219	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
220	On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
221	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
222	On the equilibrium concentration of boron-oxygen defects in crystalline silicon
223	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
224	Optical display film as flexible and light trapping substrate for organic photovoltaics
225	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
226	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
227	Optimization of the Surface Structure on Black Silicon for Surface Passivation
228	Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
229	Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
230	Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
231	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
232	Passivation effects of atomic-layer-deposited aluminum oxide
233	Patterned deposition by plasma enhanced spatial atomic layer deposition
234	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
235	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
236	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
237	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
238	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
239	Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
240	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
241	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
242	Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
243	Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
244	Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
245	Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
246	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
247	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
248	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
249	Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
250	Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
251	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
252	Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
253	Propagation Effects in Carbon Nanoelectronics
254	Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
255	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
256	Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
257	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
258	Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
259	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
260	Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
261	Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
262	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
263	Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
264	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
265	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
266	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
267	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
268	Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
269	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
270	Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
271	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
272	Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
273	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
274	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
275	Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
276	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
277	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
278	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
279	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
280	Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
281	Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
282	Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
283	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
284	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
285	Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
286	The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
287	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
288	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
289	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
290	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
291	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
292	Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
293	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
294	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
295	Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
296	Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
297	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
298	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
299	Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
300	Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
301	Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
302	Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
303	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
304	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
305	Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
306	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
307	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
308	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
309	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
310	Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
311	Very high frequency plasma reactant for atomic layer deposition
312	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
313	Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
314	Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
315	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
316	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
317	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
318	Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
319	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
320	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
321	Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
322	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
323	Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
324	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
325	Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
326	Composite materials and nanoporous thin layers made by atomic layer deposition
327	Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
328	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
329	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
330	Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
331	Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
332	Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
333	Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
334	Optical and Electrical Properties of AlxTi1-xO Films
335	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
336	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
337	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
338	Atomic Layer Deposition of Gold Metal
339	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
340	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
341	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
342	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
343	High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
344	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
345	Plasma-enhanced atomic layer deposition of BaTiO3
346	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
347	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
348	Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
349	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
350	Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
351	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
352	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
353	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
354	Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
355	Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
356	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
357	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
358	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
359	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
360	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
361	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
362	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
363	Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
364	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
365	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
366	Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
367	Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
368	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
369	Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
370	Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
371	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
372	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
373	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
374	Plasma enhanced atomic layer deposition of Fe2O3 thin films
375	Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
376	Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
377	The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
378	Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
379	Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
380	Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
381	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
382	Electrical characteristics of β-Ga2O3 thin films grown by PEALD
383	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
384	Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
385	Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
386	Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
387	Plasma enhanced atomic layer deposition of Ga2O3 thin films
388	Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
389	Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
390	RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
391	Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
392	Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
393	Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
394	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
395	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
396	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
397	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
398	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
399	Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
400	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
401	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
402	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
403	Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
404	A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
405	An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
406	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
407	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
408	Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
409	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
410	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
411	AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
412	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
413	Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
414	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
415	Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
416	Characteristics of HfO2 thin films grown by plasma atomic layer deposition
417	Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
418	Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
419	Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
420	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
421	Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
422	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
423	Damage evaluation in graphene underlying atomic layer deposition dielectrics
424	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
425	Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
426	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
427	Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
428	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
429	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
430	Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
431	Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
432	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
433	Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
434	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
435	Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
436	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
437	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
438	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
439	Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
440	Hafnia and alumina on sulphur passivated germanium
441	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
442	Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
443	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
444	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
445	Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
446	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
447	Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
448	Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
449	Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
450	Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
451	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
452	Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
453	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
454	Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
455	Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
456	Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
457	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
458	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
459	Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
460	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
461	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
462	Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
463	Optical properties and bandgap evolution of ALD HfSiOx films
464	Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
465	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
466	Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
467	Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
468	Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
469	Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
470	Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
471	Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
472	Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
473	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
474	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
475	Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
476	Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
477	Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
478	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
479	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
480	The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
481	Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
482	Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
483	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
484	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
485	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
486	Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
487	Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
488	Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
489	Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
490	Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
491	Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
492	HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
493	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
494	Annealing behavior of ferroelectric Si-doped HfO2 thin films
495	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
496	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
497	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
498	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
499	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
500	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
501	Optical properties and bandgap evolution of ALD HfSiOx films
502	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
503	The effects of layering in ferroelectric Si-doped HfO2 thin films
504	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
505	Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
506	Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
507	Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
508	Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
509	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
510	Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
511	High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
512	High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
513	Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
514	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
515	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
516	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
517	Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
518	High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
519	Systematic efficiency study of line-doubled zone plates
520	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
521	IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
522	Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
523	Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
524	Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
525	Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
526	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
527	Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
528	Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
529	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
530	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
531	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
532	Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
533	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
534	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
535	Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
536	In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
537	Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
538	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
539	Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
540	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
541	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
542	Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
543	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
544	Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
545	The important role of water in growth of monolayer transition metal dichalcogenides
546	Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
547	Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
548	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
549	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
550	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
551	Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
552	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
553	Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
554	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
555	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
556	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
557	Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
558	Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
559	Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
560	Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
561	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
562	Encapsulation method for atom probe tomography analysis of nanoparticles
563	Growth of silica nanowires in vacuum
564	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
565	Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
566	Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
567	Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
568	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
569	Remote Plasma ALD of Platinum and Platinum Oxide Films
570	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
571	Room-Temperature Atomic Layer Deposition of Platinum
572	Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
573	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
574	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
575	Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
576	Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
577	Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
578	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
579	Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
580	The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
581	Remote Plasma ALD of Platinum and Platinum Oxide Films
582	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
583	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
584	Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
585	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
586	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
587	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
588	High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
589	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
590	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
591	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
592	Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
593	Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
594	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
595	Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
596	(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
597	ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
598	Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
599	Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
600	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
601	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
602	Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
603	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
604	Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
605	Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
606	Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
607	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
608	A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
609	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
610	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
611	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
612	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
613	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
614	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
615	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
616	Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
617	Atomic layer deposition of metal-oxide thin films on cellulose fibers
618	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
619	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
620	Breakdown and Protection of ALD Moisture Barrier Thin Films
621	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
622	Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
623	Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
624	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
625	Comparative study of ALD SiO2 thin films for optical applications
626	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
627	Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
628	Designing high performance precursors for atomic layer deposition of silicon oxide
629	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
630	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
631	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
632	Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
633	Energy-enhanced atomic layer deposition for more process and precursor versatility
634	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
635	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
636	Gate Insulator for High Mobility Oxide TFT
637	Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
638	High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
639	High-Reflective Coatings For Ground and Space Based Applications
640	Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
641	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
642	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
643	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
644	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
645	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
646	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
647	Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
648	Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
649	Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
650	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
651	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
652	Modal properties of a strip-loaded horizontal slot waveguide
653	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
654	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
655	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
656	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
657	Optical properties and bandgap evolution of ALD HfSiOx films
658	PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
659	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
660	Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
661	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
662	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
663	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
664	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
665	Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
666	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
667	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
668	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
669	Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
670	Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
671	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
672	Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
673	Single-Cell Photonic Nanocavity Probes
674	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
675	Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
676	Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
677	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
678	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
679	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
680	Symmetrical Al2O3-based passivation layers for p- and n-type silicon
681	Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
682	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
683	Trapped charge densities in Al2O3-based silicon surface passivation layers
684	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
685	Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
686	A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
687	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
688	Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
689	Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
690	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
691	Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
692	Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
693	Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
694	In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
695	Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
696	Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
697	Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
698	Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
699	SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
700	Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
701	Surface and sensing properties of PE-ALD SnO2 thin film
702	Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
703	Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
704	Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
705	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
706	Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
707	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
708	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
709	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
710	Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
711	Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
712	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
713	Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
714	Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
715	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
716	Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
717	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
718	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
719	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
720	Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
721	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
722	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
723	Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
724	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
725	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
726	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
727	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
728	Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
729	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
730	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
731	Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
732	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
733	Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
734	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
735	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
736	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
737	Trilayer Tunnel Selectors for Memristor Memory Cells
738	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
739	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
740	A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
741	Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
742	An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
743	Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
744	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
745	Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
746	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
747	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
748	Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
749	Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
750	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
751	Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
752	Biofilm prevention on cochlear implants
753	Bipolar resistive switching in amorphous titanium oxide thin film
754	Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
755	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
756	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
757	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
758	Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
759	Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
760	Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
761	Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
762	Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
763	Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
764	Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
765	Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
766	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
767	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
768	Energy-enhanced atomic layer deposition for more process and precursor versatility
769	Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
770	Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
771	Epitaxial 1D electron transport layers for high-performance perovskite solar cells
772	Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
773	Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
774	Flexible Memristive Memory Array on Plastic Substrates
775	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
776	Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
777	Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
778	Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
779	Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
780	High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
781	High-efficiency embedded transmission grating
782	Highly efficient and bending durable perovskite solar cells: toward a wearable power source
783	Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
784	Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
785	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
786	In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
787	In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
788	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
789	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
790	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
791	Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
792	Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
793	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
794	Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
795	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
796	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
797	Low temperature temporal and spatial atomic layer deposition of TiO2 films
798	Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
799	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
800	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
801	On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
802	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
803	Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
804	Oxygen migration in TiO2-based higher-k gate stacks
805	Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
806	Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
807	Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
808	Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
809	Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
810	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
811	Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
812	Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
813	Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
814	Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
815	Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
816	Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
817	Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
818	Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
819	Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
820	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
821	Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
822	Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
823	Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
824	Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
825	Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
826	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
827	The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
828	The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
829	Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
830	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
831	TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
832	Transient characterization of the electroforming process in TiO2 based resistive switching devices
833	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
834	Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
835	X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
836	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
837	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
838	Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
839	Optical and Electrical Properties of TixSi1-xOy Films
840	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
841	Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
842	Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
843	Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
844	Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
845	Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
846	Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
847	Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
848	In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
849	Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
850	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
851	The important role of water in growth of monolayer transition metal dichalcogenides
852	Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
853	Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
854	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
855	Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
856	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
857	Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
858	Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
859	Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
860	Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
861	Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
862	Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
863	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
864	Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
865	Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
866	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
867	Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
868	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
869	Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
870	Characteristics of ZnO Thin Films by Means of Plasma Enhanced Atomic Layer Deposition
871	Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
872	Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
873	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
874	Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
875	Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
876	Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
877	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
878	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
879	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
880	Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
881	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
882	Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
883	Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
884	Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
885	Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
886	Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
887	Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
888	Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
889	Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
890	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
891	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
892	Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
893	Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
894	Spectroscopy and control of near-surface defects in conductive thin film ZnO
895	Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
896	Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
897	The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
898	The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
899	The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
900	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
901	Top-down fabricated ZnO nanowire transistors for application in biosensors
902	Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
903	Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
904	Plasma-enhanced atomic layer deposition of zinc phosphate
905	Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
906	Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
907	Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
908	Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
909	Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
910	Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
911	Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
912	Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
913	Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
914	Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
915	Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
916	Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
917	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
918	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
919	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
920	Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
921	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
922	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
923	Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
924	Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
925	Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
926	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
927	PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
928	PEALD ZrO2 Films Deposition on TiN and Si Substrates
929	Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
930	Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
931	Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
932	Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
933	Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
934	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
935	The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
936	The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
937	Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
938	Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
939	ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
940	ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
941	ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
942	Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
943	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
944	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
945	Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation

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