O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
2Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
3Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
4Optical display film as flexible and light trapping substrate for organic photovoltaics
5Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
6Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
7In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
8Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
9Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
10Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
11Nonvolatile Capacitive Crossbar Array for In-Memory Computing
12Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
13Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
14Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
15Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
16Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
17Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
18Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
19Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
20Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
21Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
22Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
23Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
24Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
25Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
26Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
27Transient characterization of the electroforming process in TiO2 based resistive switching devices
28Plasma-enhanced atomic layer deposition of zinc phosphate
29Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
30Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
31Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
32Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
33Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
34Nonvolatile Capacitive Crossbar Array for In-Memory Computing
35Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
36Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
37Surface and sensing properties of PE-ALD SnO2 thin film
38Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
39HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
40MANOS performance dependence on ALD Al2O3 oxidation source
41Oxygen migration in TiO2-based higher-k gate stacks
42Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
43Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
44High-Reflective Coatings For Ground and Space Based Applications
45Lithium-Iron (III) Fluoride Battery with Double Surface Protection
46Anti-stiction coating for mechanically tunable photonic crystal devices
47Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
48Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
49Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
50Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
51Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
52Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
53Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
54HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
55High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
56Atomic Layer Deposition of Gold Metal
57Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
58Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
59The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
60The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
61Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
623D structure evolution using metastable atomic layer deposition based on planar silver templates
63Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
64Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
65Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
66Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
67Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
68Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
69Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
70Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
71Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
72Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
73Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
74Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
75Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
76Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
77Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
78Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
79Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
80Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
81Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
82On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
83Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
84Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
85Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
86Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
87Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
88Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
89Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
90Designing high performance precursors for atomic layer deposition of silicon oxide
91Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
92Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
93Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
94Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
95Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
96A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
97Advances in the fabrication of graphene transistors on flexible substrates
98Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
99Damage evaluation in graphene underlying atomic layer deposition dielectrics
100Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
101Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
102Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
103Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
104Plasma-enhanced atomic layer deposition of BaTiO3
105Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
106Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
107Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
108Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
109Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
110Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
111Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
112Method of Fabrication for Encapsulated Polarizing Resonant Gratings
113Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
114Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
115Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
116Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
117Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
118Symmetrical Al2O3-based passivation layers for p- and n-type silicon
119Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
120Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
121Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
122Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
123Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
124Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
125Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
126Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
127Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
128Residual stress study of thin films deposited by atomic layer deposition
129The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
130Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
131Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
132Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
133HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
134Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
135Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
136Radical Enhanced Atomic Layer Deposition of Metals and Oxides
137Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
138Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
139Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
140Remote Plasma ALD of Platinum and Platinum Oxide Films
141Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
142Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
143The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
144Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
145Impact of interface materials on side permeation in indirect encapsulation of organic electronics
146Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
147Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
148Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
149The effects of layering in ferroelectric Si-doped HfO2 thin films
150The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
151Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
152Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
153Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
154Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
155In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
156Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
157Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
158Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
159Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
160Optical properties and bandgap evolution of ALD HfSiOx films
161Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
162Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
163Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
164Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
165Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
166Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
167Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
168A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
169Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
170From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
171Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
172Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
173Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
174Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
175Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
176Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
177Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
178Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
179Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
180In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
181Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
182Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
183Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
184Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
185Room-Temperature Atomic Layer Deposition of Platinum
186Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
187Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
188Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
189Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
190Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
191Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
192Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
193Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
194Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
195Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
196Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
197Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
198Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
199Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
200Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
201Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
202Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
203Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
204Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
205Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
206Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
207Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
208Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
209Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
210Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
211Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
212Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
213Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
214Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
215Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
216Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
217Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
218Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
219Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
220Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
221Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
222Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
223Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
224Annealing behavior of ferroelectric Si-doped HfO2 thin films
225Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
226Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
227Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
228Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
229Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
230Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
231Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
232Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
233Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
234XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
235High-efficiency embedded transmission grating
236Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
237Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
238Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
239Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
240ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
241Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
242Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
243Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
244Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
245Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
246Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
247In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
248Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
249Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
250Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
251Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
252Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
253α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
254Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
255Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
256A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
257MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
258Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
259Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
260DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
261Flexible, light trapping substrates for organic photovoltaics
262Plasma-enhanced atomic layer deposition of BaTiO3
263Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
264Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
265Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
266Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
267An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
268High-efficiency embedded transmission grating
269Energy-enhanced atomic layer deposition for more process and precursor versatility
270Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
271Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
272Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
273Topographically selective deposition
274Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
275Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
276Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
277Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
278Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
279Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
280Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
281Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
282Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
283Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
284Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
285Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
286Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
287Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
288Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
289Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
290Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
291Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
292In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
293Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
294Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
295Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
296Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
297Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
298Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
299Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
300Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
301Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
302Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
303Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
304Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
305Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
306Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
307Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
308Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
309Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
310Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
311Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
312High-Reflective Coatings For Ground and Space Based Applications
313A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
314Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
315Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
316Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
317Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
318Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
319Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
320Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
321Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
322Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
323Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
324Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
325Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
326Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
327Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
328Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
329Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
330Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
331Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
332Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
333Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
334Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
335Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
336Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
337Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
338Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
339Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
340Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
341Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
342Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
343The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
344Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
345Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
346Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
347Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
348Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
349Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
350Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
351Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
352Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
353Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
354Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
355Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
356Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
357Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
358Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
359Impact of interface materials on side permeation in indirect encapsulation of organic electronics
360Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
361Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
362Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
363Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
364Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
365Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
366Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
367Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
368Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
369Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
370DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
371Capacitance spectroscopy of gate-defined electronic lattices
372Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
373Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
374Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
375Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
376Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
377Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
378Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
379Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
380Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
381Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
382Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
383Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
384Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
385Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
386Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
387Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
388Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
389Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
390Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
391Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
392Optical and Electrical Properties of TixSi1-xOy Films
393Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
394Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
395Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
396Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
397Sub-10-nm ferroelectric Gd-doped HfO2 layers
398Radical Enhanced Atomic Layer Deposition of Metals and Oxides
399Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
400Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
401Charge effects of ultrafine FET with nanodot type floating gate
40246-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
403Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
404Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
405Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
406Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
407Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
408Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
409Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
410Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
411Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
412Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
413Optimization of the Surface Structure on Black Silicon for Surface Passivation
414Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
415Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
416Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
417Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
418Study on the resistive switching time of TiO2 thin films
419Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
420A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
421Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
422Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
423Very high frequency plasma reactant for atomic layer deposition
424Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
425Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
426Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
427Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
428Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
429Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
430Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
431Passivation effects of atomic-layer-deposited aluminum oxide
432Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
433On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
434Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
435Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
436Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
437Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
438The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
439Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
440In-gap states in titanium dioxide and oxynitride atomic layer deposited films
441Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
442Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
443Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
444Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
445Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
446Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
447Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
448Radical Enhanced Atomic Layer Deposition of Metals and Oxides
449Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
450Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
451Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
452Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
453Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
454Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
455Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
456Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
457Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
458Epitaxial 1D electron transport layers for high-performance perovskite solar cells
459Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
460Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
461Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
462Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
463Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
464Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
465Band alignment of Al2O3 with (-201) β-Ga2O3
466All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
467Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
468HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
469Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
470Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
471Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
472Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
473Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
474Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
475Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
476Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
477Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
478Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
479Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
480Optical properties and bandgap evolution of ALD HfSiOx films
481Mechanical properties of thin-film Parylene-metal-Parylene devices
482Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
483Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
484Top-down fabricated ZnO nanowire transistors for application in biosensors
485Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
486The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
487Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
488Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
489Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
490Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
491Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
492High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
493Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
494Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
495Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
496The important role of water in growth of monolayer transition metal dichalcogenides
497Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
498Improved understanding of recombination at the Si/Al2O3 interface
499Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
500XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
501TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
502Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
503Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
504Bipolar resistive switching in amorphous titanium oxide thin film
505In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
506Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
507Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
508(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
509Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
510Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
511Single-Cell Photonic Nanocavity Probes
512Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
513Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
514Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
515Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
516Innovative remote plasma source for atomic layer deposition for GaN devices
517Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
518Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
519Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
520Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
521Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
522On the equilibrium concentration of boron-oxygen defects in crystalline silicon
523Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
524Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
525Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
526Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
527Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
528Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
529Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
530Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
531The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
532High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
533Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
534Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
535Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
536Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
537A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
538Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
539Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
540Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
541Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
542Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
543In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
544Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
545Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
546Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
547Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
548Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
549Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
550Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
551In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
552Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
553Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
554Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
555Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
556Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
557Energy-enhanced atomic layer deposition for more process and precursor versatility
558Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
559Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
560Optical properties and bandgap evolution of ALD HfSiOx films
561Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
562Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
563Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
564Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
565Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
566A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
567Atomic layer deposition of YMnO3 thin films
568A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
569Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
570Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
571All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
572Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
573Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
574Gate Insulator for High Mobility Oxide TFT
575Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
576Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
577Radical Enhanced Atomic Layer Deposition of Metals and Oxides
578Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
579Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
580Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
581Experimental verification of electro-refractive phase modulation in graphene
582Lithium-Iron (III) Fluoride Battery with Double Surface Protection
583Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
584Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
585Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
586Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
587Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
588Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
589Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
590Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
591Energy-enhanced atomic layer deposition for more process and precursor versatility
592Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
593Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
594Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
595Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
596Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
597The important role of water in growth of monolayer transition metal dichalcogenides
598Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
599PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
600Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
601Sub-7-nm textured ZrO2 with giant ferroelectricity
602Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
603Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
604Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
605Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
606On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
607Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
608Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
609Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
610Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
611The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
612Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
613Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
614Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
615Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
616Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
617Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
618Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
619Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
620Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
621Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
622Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
623Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
624Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
625Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
626Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
627Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
628Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
629PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
630Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
631Systematic efficiency study of line-doubled zone plates
632Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
633Hafnia and alumina on sulphur passivated germanium
634Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
635Radical Enhanced Atomic Layer Deposition of Metals and Oxides
636Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
637Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
638Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
639First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
640Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
641Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
642Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
643Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
644Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
645Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
646AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
647Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
648Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
649Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
650Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
651Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
652Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
653Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
654Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
655Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
656In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
657Low temperature temporal and spatial atomic layer deposition of TiO2 films
658Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
659Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
660Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
661Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
662Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
663Composite materials and nanoporous thin layers made by atomic layer deposition
664PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
665Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
666Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
667Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
668Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
669A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
670High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
671Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
672Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
673Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
674Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
675A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
676Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
677Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
678Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
679Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
680Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
681Optical in situ monitoring of plasma-enhanced atomic layer deposition process
682Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
683Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
684In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
685Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
686Characteristics of HfO2 thin films grown by plasma atomic layer deposition
687Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
688ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
689Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
690Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
691Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
692Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
693Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
694Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
695Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
696Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
697Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
698High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
699The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
700Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
701Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
702Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
703ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
704Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
705Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
706Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
707Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
708Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
709Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
710A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
711Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
712Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
713Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
714Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
715TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
716Comparative study of ALD SiO2 thin films for optical applications
717Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
718Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
719Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
720Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
721Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
722Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
723Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
724Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
725Radical Enhanced Atomic Layer Deposition of Metals and Oxides
726MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
727Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
728Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
729Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
730Growth of silica nanowires in vacuum
731Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
732Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
733Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
734Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
735Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
736Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
737The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
738Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
739Atomic layer deposition of metal-oxide thin films on cellulose fibers
740Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
741Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
742Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
743Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
744N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
745Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
746Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
747Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
748Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
749Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
750Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
751Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
752Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
753Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
754Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
755AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
756The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
757Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
758Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
759Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
760Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
761Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
762Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
763Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
764Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
765TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
766Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
767Plasma enhanced atomic layer deposition of Ga2O3 thin films
768Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
769Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
770Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
771Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
772Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
773An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
774Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
775Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
776Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
777Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
778Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
779Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
780Damage evaluation in graphene underlying atomic layer deposition dielectrics
781Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
782The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
783Atomic Layer Deposition of the Conductive Delafossite PtCoO2
784Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
785Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
786Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
787Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
788The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
789Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
790Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
791Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
792Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
793Patterned deposition by plasma enhanced spatial atomic layer deposition
794Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
795Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
796Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
797Encapsulation method for atom probe tomography analysis of nanoparticles
798Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
799Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
800Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
801Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
802Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
803Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
804Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
805Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
806Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
807Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
808ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
809Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
810Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
811Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
812Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
813Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
814Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
815The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
816Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
817Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
818Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
819Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
820Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
821Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
822Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
823Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
824Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
825Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
826Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
827Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
828Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
829Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
830Flexible Memristive Memory Array on Plastic Substrates
831Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
832Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
833Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
834Residual stress study of thin films deposited by atomic layer deposition
835Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
836Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
837Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
838Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
839Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
840Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
841Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
842Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
843Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
844Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
845Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
846Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
847Trilayer Tunnel Selectors for Memristor Memory Cells
848Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
849Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
850Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
851Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
852Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
853Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
854Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
855Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
856In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
857PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
858Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
859Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
860Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
861Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
862Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
863Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
864Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
865Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
866Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
867On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
868Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
869Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
870Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
871Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
872Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
873Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
874Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
875Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
876Spectroscopy and control of near-surface defects in conductive thin film ZnO
877Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
878Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
879Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
880Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
881Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
882Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
883Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
884Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
885Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
886Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
887A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
888Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
889Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
890Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
891Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
892Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
893Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
894Propagation Effects in Carbon Nanoelectronics
895Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
896Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
897Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
898Breakdown and Protection of ALD Moisture Barrier Thin Films
899Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
900Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
901Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
902Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
903Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
904Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
905Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
906Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
907Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
908Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
909Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
910Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
911Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
912PEALD ZrO2 Films Deposition on TiN and Si Substrates
913Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
914Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
915Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
916Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
917Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
918The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
919Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
920Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
921'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
922Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
923A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
924Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
925On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
926Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
927Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
928Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
929Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
930Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
931Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
932AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
933Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
934Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
935Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
936ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
937Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
938A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
939Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
940Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
941High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
942Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
943Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
944Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
945Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
946In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
947Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
948X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
949Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
950Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
951Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
952In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
953Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
954Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
955Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
956Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
957Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
958Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
959The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
960Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
961Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
962Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
963Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
964Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
965Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
966Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
967Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
968Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
969Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
970Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
971Plasma enhanced atomic layer deposition of Fe2O3 thin films
972Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
973Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
974Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
975Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
976Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
977Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
978On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
979Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
980Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
981Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
982Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
983Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
984Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
985Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
986Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
987Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
988Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
989Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
990Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
991Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
992Breakdown and Protection of ALD Moisture Barrier Thin Films
993Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
994Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
995Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
996Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
997Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
998Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
999Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1000Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
1001Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1002Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
1003Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1004Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1005Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
1006Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1007Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1008Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1009An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
1010Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1011Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
1012Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1013Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
1014Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1015Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
1016Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
1017Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
1018Dynamic tuning of plasmon resonance in the visible using graphene
1019Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1020Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
1021Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
1022Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
1023Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1024Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1025Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
1026Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1027Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
1028Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
1029Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
1030Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
1031Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1032Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
1033Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1034Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
1035Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1036Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
1037ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
1038Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1039High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
1040Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
1041Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1042Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1043Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
1044TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1045Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1046Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1047Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
1048A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1049Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1050Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1051Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
1052Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1053Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
1054Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1055Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
1056Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1057Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
1058Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
1059Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
1060High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
1061Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1062Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
1063Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1064Highly efficient and bending durable perovskite solar cells: toward a wearable power source
1065Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
1066Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1067Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
1068Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1069AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
1070Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1071Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
1072Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1073Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1074Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
1075Hafnia and alumina on sulphur passivated germanium
1076Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
1077Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
1078Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
1079IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
1080Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1081Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1082Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1083Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
1084Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
1085Ferroelectricity in hafnia controlled via surface electrochemical state
1086Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1087Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
1088Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1089Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1090The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
1091The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
1092Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
1093Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
1094Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1095Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
1096Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
1097Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
1098Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
1099Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
1100Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1101Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1102Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
1103Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
1104Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
1105PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1106Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
1107Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1108Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
1109Modal properties of a strip-loaded horizontal slot waveguide
1110Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1111On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
1112Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1113Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
1114Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
1115In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1116Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
1117Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1118Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1119Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
1120Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
1121Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
1122Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
1123Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1124Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1125Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
1126Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1127'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
1128Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
1129Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1130Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
1131On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
1132Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
1133Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1134Fiber-matrix interface reinforcement using Atomic Layer Deposition
1135ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1136Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
1137Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
1138Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1139Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
1140Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
1141Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
1142Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
1143Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1144Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1145Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
1146SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
1147Optical and Electrical Properties of AlxTi1-xO Films
1148Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1149Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
1150An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
1151Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
1152Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1153Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1154Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
1155Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
1156Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
1157Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
1158The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
1159Trapped charge densities in Al2O3-based silicon surface passivation layers
1160Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
1161Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1162Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
1163Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
1164Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
1165Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
1166Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1167Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
1168Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
1169Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
1170Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
1171Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1172Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1173Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
1174Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1175Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
1176Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1177Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1178Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
1179Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
1180High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
1181Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1182Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
1183Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1184Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
1185Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
1186Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1187Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1188Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1189Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
1190Biofilm prevention on cochlear implants
1191Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1192Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1193Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
1194Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1195High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1196Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
1197The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1198On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
1199Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
1200Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1201Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
1202Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
1203Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
1204The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1205Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
1206Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1207Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
1208Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1209Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1210Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
1211Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
1212Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1213Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1214Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1215Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1216Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
1217Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1218Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1219Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
1220Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
1221Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
1222New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
1223Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
1224Plasma-enhanced atomic layer deposition of BaTiO3
1225Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
1226Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1227ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1228Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
1229Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
1230Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
1231Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
1232Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1233Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
1234Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
1235Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
1236Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
1237Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
1238The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1239Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1240Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1241A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1242Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
1243RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
1244Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
12451D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
1246High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
1247Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1248Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
1249Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1250Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
1251Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1252Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
1253Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
1254Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
1255Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
1256Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
1257Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
1258Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1259Remote Plasma ALD of Platinum and Platinum Oxide Films
1260Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
1261Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1262Densification of Thin Aluminum Oxide Films by Thermal Treatments
1263Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1264High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
1265Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1266Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1267Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1268Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
1269Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
1270Tuning size and coverage of Pd nanoparticles using atomic layer deposition
1271Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
1272Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
1273Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1274Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
1275Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
1276Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
1277Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes