O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1279 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
2Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
3Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
4Residual stress study of thin films deposited by atomic layer deposition
5TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
6Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
7Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
8Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
9Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
10Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
11Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
12Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
13Lithium-Iron (III) Fluoride Battery with Double Surface Protection
14Passivation effects of atomic-layer-deposited aluminum oxide
15Improved understanding of recombination at the Si/Al2O3 interface
16Optical and Electrical Properties of TixSi1-xOy Films
17Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
18Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
19In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
20Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
21Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
22Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
23In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
24Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
25Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
26The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
27Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
28Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
29Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
30Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
31Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
32Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
33Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
34Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
35Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
36Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
37Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
38Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
39Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
40Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
41Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
42Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
43Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
44Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
45Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
46On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
47Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
48Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
49Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
50Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
51Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
52Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
53Annealing behavior of ferroelectric Si-doped HfO2 thin films
54Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
55Method of Fabrication for Encapsulated Polarizing Resonant Gratings
56Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
57Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
58Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
59Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
60Impact of interface materials on side permeation in indirect encapsulation of organic electronics
61Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
62Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
63Radical Enhanced Atomic Layer Deposition of Metals and Oxides
64Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
65Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
66Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
67Remote Plasma ALD of Platinum and Platinum Oxide Films
68Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
69A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
70Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
71Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
72Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
73Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
74The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
75Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
76Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
77Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
78The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
79Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
80TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
81Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
82Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
83Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
84RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
8546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
86Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
87Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
88Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
89Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
90Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
91Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
92DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
93Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
94Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
95Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
96Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
97Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
98Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
99Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
100Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
101IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
102In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
103Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
104Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
105Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
106Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
107Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
108Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
109Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
110High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
111Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
112Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
113Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
114Band alignment of Al2O3 with (-201) β-Ga2O3
115XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
116A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
117Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
118Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
119HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
120Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
121Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
122Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
123A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
124Radical Enhanced Atomic Layer Deposition of Metals and Oxides
125Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
126Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
127Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
128Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
129The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
130Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
131Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
132Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
133Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
134Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
135Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
136Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
137Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
138Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
139Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
140Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
141Tuning size and coverage of Pd nanoparticles using atomic layer deposition
142Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
143Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
144Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
145'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
146Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
147Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
148Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
149Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
150Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
151Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
152Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
153Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
154Bipolar resistive switching in amorphous titanium oxide thin film
155Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
156Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
157Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
158Residual stress study of thin films deposited by atomic layer deposition
159A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
160Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
161Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
162Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
163A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
164Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
165Radical Enhanced Atomic Layer Deposition of Metals and Oxides
166Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
167Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
168High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
169Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
170Plasma-enhanced atomic layer deposition of BaTiO3
171Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
172Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
173Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
174Hafnia and alumina on sulphur passivated germanium
175Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
176Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
177Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
178Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
179Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
180Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
181'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
182Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
183Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
184Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
185Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
186Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
187Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
188Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
189Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
190Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
191Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
192Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
193Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
194Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
195ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
196Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
197PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
198Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
199Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
200PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
201Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
202Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
203Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
204The important role of water in growth of monolayer transition metal dichalcogenides
205Mechanical properties of thin-film Parylene-metal-Parylene devices
206Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
207Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
208Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
209Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
210Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
211In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
212Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
213A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
214Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
215Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
216Plasma enhanced atomic layer deposition of Fe2O3 thin films
217Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
218An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
219Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
220Modal properties of a strip-loaded horizontal slot waveguide
221Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
222Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
223Radical Enhanced Atomic Layer Deposition of Metals and Oxides
224Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
225Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
226Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
227In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
228Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
229In-gap states in titanium dioxide and oxynitride atomic layer deposited films
230Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
231Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
232Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
233High-efficiency embedded transmission grating
234Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
235Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
236Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
237Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
238Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
239Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
240Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
241Radical Enhanced Atomic Layer Deposition of Metals and Oxides
242Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
243Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
244Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
245Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
246Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
247All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
248Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
249High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
250Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
251Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
252Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
253Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
254Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
255Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
256Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
257Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
258Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
259On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
260Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
261Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
262Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
263Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
264Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
265Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
266Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
267Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
268Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
269Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
270Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
271Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
272The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
273Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
274Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
275On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
276Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
277Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
278Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
279Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
280Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
281Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
282Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
283Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
284Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
285Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
286Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
287Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
288Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
289Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
290Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
291Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
292Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
293Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
294Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
295Sub-10-nm ferroelectric Gd-doped HfO2 layers
296On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
297Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
298High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
299Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
300TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
301Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
302Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
303Damage evaluation in graphene underlying atomic layer deposition dielectrics
304Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
305Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
306Characteristics of HfO2 thin films grown by plasma atomic layer deposition
307Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
308Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
309Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
310Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
311Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
312Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
313Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
314High-Reflective Coatings For Ground and Space Based Applications
315Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
316High-efficiency embedded transmission grating
317X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
318Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
319Comparative study of ALD SiO2 thin films for optical applications
320Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
321Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
322Optical properties and bandgap evolution of ALD HfSiOx films
323Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
324Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
325Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
326Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
327Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
328Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
329Breakdown and Protection of ALD Moisture Barrier Thin Films
330Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
331Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
332Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
333Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
334Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
335Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
336Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
337Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
338Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
339Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
340Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
341Atomic Layer Deposition of Gold Metal
342Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
343Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
344Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
345Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
346Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
347Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
348Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
349Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
350Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
351Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
352Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
353Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
354PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
355Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
356Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
357Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
358Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
359Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
360Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
361Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
362Damage evaluation in graphene underlying atomic layer deposition dielectrics
363Nonvolatile Capacitive Crossbar Array for In-Memory Computing
364Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
365Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
366High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
367Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
368Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
3691D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
370Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
371Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
372Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
373Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
374Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
375Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
376Densification of Thin Aluminum Oxide Films by Thermal Treatments
377Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
378In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
379The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
380Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
381Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
382Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
383Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
384Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
385Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
386Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
387Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
388Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
389Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
390Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
391Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
392Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
393Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
394Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
395In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
396Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
397Remote Plasma ALD of Platinum and Platinum Oxide Films
398Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
399Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
400Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
401Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
402Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
403Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
404Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
405The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
406All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
407Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
408Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
409On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
410Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
411Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
412Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
413Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
414Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
415Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
416Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
417Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
418Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
419Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
420Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
421Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
422Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
423Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
424Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
425Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
426Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
427Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
428Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
429Hafnia and alumina on sulphur passivated germanium
430MANOS performance dependence on ALD Al2O3 oxidation source
431Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
432In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
433Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
434Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
435Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
436Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
437Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
438Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
439Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
440Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
441A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
442Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
443Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
444Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
445Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
446Energy-enhanced atomic layer deposition for more process and precursor versatility
447Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
448Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
449Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
450Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
451Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
452Optical properties and bandgap evolution of ALD HfSiOx films
453Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
454Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
455Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
456Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
457Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
458Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
459Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
460Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
461Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
462Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
463Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
464In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
465Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
466Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
467The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
468Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
469Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
470Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
471Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
472Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
473Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
474Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
475Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
476Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
477Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
478Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
479Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
480Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
481Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
482Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
483Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
484Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
485Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
486Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
487Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
488Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
489Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
490Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
491In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
492Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
493Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
494Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
495Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
496Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
497Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
498Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
499Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
500Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
501Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
502Optical and Electrical Properties of AlxTi1-xO Films
503Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
504Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
505PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
506Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
507Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
508Breakdown and Protection of ALD Moisture Barrier Thin Films
509Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
510Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
511Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
512Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
513Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
514Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
515Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
516Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
517Optimization of the Surface Structure on Black Silicon for Surface Passivation
518PEALD ZrO2 Films Deposition on TiN and Si Substrates
519Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
520Flexible Memristive Memory Array on Plastic Substrates
521Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
522Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
523HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
524Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
525Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
526Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
527Spectroscopy and control of near-surface defects in conductive thin film ZnO
528Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
529Topographically selective deposition
530Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
531Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
532Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
533Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
534Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
535A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
5363D structure evolution using metastable atomic layer deposition based on planar silver templates
537Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
538Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
539Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
540Nonvolatile Capacitive Crossbar Array for In-Memory Computing
541Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
542Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
543Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
544Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
545Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
546On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
547Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
548Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
549Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
550The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
551Energy-enhanced atomic layer deposition for more process and precursor versatility
552The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
553Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
554Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
555Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
556Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
557Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
558Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
559Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
560Plasma-enhanced atomic layer deposition of BaTiO3
561Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
562Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
563Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
564Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
565Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
566Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
567Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
568Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
569Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
570Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
571Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
572Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
573Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
574Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
575Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
576Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
577Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
578Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
579Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
580Growth of silica nanowires in vacuum
581Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
582Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
583In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
584Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
585Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
586Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
587Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
588Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
589Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
590Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
591Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
592Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
593Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
594Charge effects of ultrafine FET with nanodot type floating gate
595Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
596Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
597Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
598Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
599Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
600Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
601Trapped charge densities in Al2O3-based silicon surface passivation layers
602Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
603The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
604Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
605Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
606Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
607Lithium-Iron (III) Fluoride Battery with Double Surface Protection
608Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
609Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
610Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
611In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
612Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
613Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
614Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
615A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
616TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
617Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
618Lithium-Iron (III) Fluoride Battery with Double Surface Protection
619Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
620Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
621Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
622Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
623HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
624Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
625Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
626Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
627Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
628Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
629Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
630Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
631Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
632Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
633Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
634High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
635Highly efficient and bending durable perovskite solar cells: toward a wearable power source
636Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
637Innovative remote plasma source for atomic layer deposition for GaN devices
638Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
639Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
640Propagation Effects in Carbon Nanoelectronics
641Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
642Symmetrical Al2O3-based passivation layers for p- and n-type silicon
643Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
644Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
645Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
646Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
647Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
648Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
649High-Reflective Coatings For Ground and Space Based Applications
650Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
651Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
652Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
653Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
654Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
655Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
656Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
657Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
658Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
659Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
660Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
661Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
662High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
663ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
664Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
665Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
666Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
667Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
668Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
669Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
670α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
671Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
672Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
673Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
674Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
675Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
676Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
677Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
678The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
679Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
680Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
681Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
682Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
683Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
684Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
685Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
686Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
687Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
688Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
689A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
690Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
691Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
692Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
693Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
694Biofilm prevention on cochlear implants
695A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
696Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
697Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
698Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
699Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
700The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
701Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
702Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
703Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
704Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
705Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
706Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
707Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
708Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
709Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
710Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
711Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
712Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
713Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
714Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
715Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
716Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
717Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
718Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
719Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
720Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
721Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
722Single-Cell Photonic Nanocavity Probes
723Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
724Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
725Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
726Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
727Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
728Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
729Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
730Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
731Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
732Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
733Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
734Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
735Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
736Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
737Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
738Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
739AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
740Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
741Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
742Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
743Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
744Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
745Trilayer Tunnel Selectors for Memristor Memory Cells
746Fiber-matrix interface reinforcement using Atomic Layer Deposition
747Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
748Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
749Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
750Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
751Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
752Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
753Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
754Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
755Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
756Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
757Surface and sensing properties of PE-ALD SnO2 thin film
758Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
759Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
760Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
761Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
762Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
763Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
764Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
765Plasma enhanced atomic layer deposition of Ga2O3 thin films
766Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
767Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
768Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
769Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
770Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
771Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
772Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
773Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
774Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
775Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
776Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
777Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
778Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
779Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
780Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
781Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
782Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
783Impact of interface materials on side permeation in indirect encapsulation of organic electronics
784Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
785Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
786Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
787Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
788Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
789Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
790Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
791Low temperature temporal and spatial atomic layer deposition of TiO2 films
792Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
793Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
794Optical display film as flexible and light trapping substrate for organic photovoltaics
795Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
796Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
797Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
798Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
799Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
800Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
801Top-down fabricated ZnO nanowire transistors for application in biosensors
802Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
803Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
804Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
805Radical Enhanced Atomic Layer Deposition of Metals and Oxides
806Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
807Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
808Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
809Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
810The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
811Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
812Room-Temperature Atomic Layer Deposition of Platinum
813Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
814Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
815Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
816Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
817Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
818Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
819Optical properties and bandgap evolution of ALD HfSiOx films
820Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
821Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
822Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
823Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
824Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
825Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
826Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
827Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
828Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
829Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
830Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
831Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
832Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
833High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
834Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
835Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
836Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
837Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
838Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
839Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
840Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
841Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
842Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
843Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
844High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
845Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
846Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
847Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
848Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
849Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
850Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
851Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
852Optical in situ monitoring of plasma-enhanced atomic layer deposition process
853Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
854Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
855Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
856Atomic Layer Deposition of the Conductive Delafossite PtCoO2
857Radical Enhanced Atomic Layer Deposition of Metals and Oxides
858Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
859Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
860Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
861Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
862Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
863Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
864Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
865Atomic layer deposition of metal-oxide thin films on cellulose fibers
866Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
867Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
868Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
869Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
870Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
871High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
872Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
873Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
874Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
875Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
876Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
877Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
878The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
879Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
880Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
881Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
882Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
883Experimental verification of electro-refractive phase modulation in graphene
884Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
885ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
886Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
887Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
888Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
889Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
890Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
891Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
892Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
893Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
894Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
895Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
896Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
897Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
898Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
899Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
900Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
901Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
902Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
903Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
904Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
905Patterned deposition by plasma enhanced spatial atomic layer deposition
906The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
907Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
908Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
909Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
910Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
911Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
912Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
913Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
914Systematic efficiency study of line-doubled zone plates
915Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
916AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
917Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
918Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
919Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
920The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
921Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
922Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
923Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
924Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
925Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
926Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
927Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
928Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
929Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
930Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
931The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
932Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
933Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
934Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
935Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
936Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
937Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
938Plasma-enhanced atomic layer deposition of BaTiO3
939High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
940Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
941Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
942Composite materials and nanoporous thin layers made by atomic layer deposition
943An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
944Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
945Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
946Epitaxial 1D electron transport layers for high-performance perovskite solar cells
947On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
948An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
949Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
950Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
951Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
952On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
953Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
954Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
955SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
956Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
957Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
958Dynamic tuning of plasmon resonance in the visible using graphene
959Ferroelectricity in hafnia controlled via surface electrochemical state
960Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
961Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
962Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
963Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
964Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
965Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
966Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
967Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
968Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
969A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
970Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
971Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
972Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
973Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
974Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
975Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
976Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
977Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
978Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
979Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
980DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
981Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
982On the equilibrium concentration of boron-oxygen defects in crystalline silicon
983Encapsulation method for atom probe tomography analysis of nanoparticles
984Very high frequency plasma reactant for atomic layer deposition
985Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
986Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
987HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
988Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
989Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
990Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
991Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
992Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
993Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
994Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
995Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
996Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
997Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
998Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
999Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
1000Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
1001Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1002(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
1003Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1004Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1005Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
1006Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
1007Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1008Anti-stiction coating for mechanically tunable photonic crystal devices
1009MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
1010Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1011Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
1012Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
1013Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
1014Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1015Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
1016Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
1017Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
1018Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
1019Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
1020Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
1021Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
1022Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1023Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1024Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
1025Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
1026Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1027Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1028Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
1029Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
1030Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
1031Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
1032Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1033Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
1034Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
1035Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
1036Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
1037An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
1038Designing high performance precursors for atomic layer deposition of silicon oxide
1039Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1040Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1041Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1042Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
1043Transient characterization of the electroforming process in TiO2 based resistive switching devices
1044Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
1045Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
1046Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1047Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1048Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
1049Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1050Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
1051Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1052Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1053Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1054The effects of layering in ferroelectric Si-doped HfO2 thin films
1055Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
1056Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1057Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
1058Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
1059Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
1060Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
1061Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1062Advances in the fabrication of graphene transistors on flexible substrates
1063Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
1064Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1065Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
1066Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1067Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1068Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1069Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
1070Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
1071Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
1072In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
1073Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1074Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
1075Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1076Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1077Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
1078Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
1079Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1080Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
1081Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
1082Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
1083Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
1084PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
1085Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
1086Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
1087The important role of water in growth of monolayer transition metal dichalcogenides
1088Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
1089ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
1090Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
1091Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1092AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
1093Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
1094Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1095Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1096The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1097Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
1098Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
1099Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
1100Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
1101Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1102Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1103Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1104Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1105Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
1106The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
1107Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
1108Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
1109The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
1110Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
1111Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1112Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
1113Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1114Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
1115Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
1116Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
1117Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
1118Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
1119Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
1120Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1121Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1122Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1123Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
1124First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
1125Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1126Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
1127N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
1128Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
1129Flexible, light trapping substrates for organic photovoltaics
1130Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1131Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1132Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
1133Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1134The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
1135Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
1136Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1137Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
1138Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
1139Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1140Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
1141Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
1142Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
1143Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
1144Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1145Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
1146Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
1147ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1148Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1149Sub-7-nm textured ZrO2 with giant ferroelectricity
1150Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1151Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
1152Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
1153Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1154Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
1155Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
1156Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
1157High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
1158Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
1159Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
1160Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1161Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1162Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
1163Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1164Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1165In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1166Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
1167Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
1168Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1169Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
1170Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1171Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1172Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
1173Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1174Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1175Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
1176Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
1177Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
1178Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1179Atomic layer deposition of YMnO3 thin films
1180Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1181Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
1182Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1183Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
1184Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1185Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
1186Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
1187Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
1188Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1189Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
1190Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
1191Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1192Energy-enhanced atomic layer deposition for more process and precursor versatility
1193XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1194Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
1195Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
1196Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
1197Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
1198Plasma-enhanced atomic layer deposition of zinc phosphate
1199Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
1200Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1201Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
1202Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
1203Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
1204Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1205Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1206On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1207Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1208Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
1209Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1210Gate Insulator for High Mobility Oxide TFT
1211Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1212Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
1213Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1214Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
1215Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1216Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1217Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
1218Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
1219MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
1220Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1221Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1222Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1223Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
1224Study on the resistive switching time of TiO2 thin films
1225Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1226Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
1227Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1228ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1229A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
1230Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1231Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1232A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
1233Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
1234Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
1235A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1236New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
1237ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1238Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
1239From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1240Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
1241Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1242Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1243Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1244AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
1245Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1246Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1247Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
1248Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1249Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1250Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1251Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
1252Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
1253Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
1254Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
1255Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
1256Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1257Capacitance spectroscopy of gate-defined electronic lattices
1258Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
1259The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1260Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1261The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1262Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
1263Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1264Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1265Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
1266Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
1267Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
1268Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
1269Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
1270Oxygen migration in TiO2-based higher-k gate stacks
1271Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
1272Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1273A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
1274Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1275ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
1276Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
1277Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3