O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
2Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
3Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
4Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
5Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
6Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
7Atomic layer deposition of YMnO3 thin films
8Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
9Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
10Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
11Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
12Top-down fabricated ZnO nanowire transistors for application in biosensors
13Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
14Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
15Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
16Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
17Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
18Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
19Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
20Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
21Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
22Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
23Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
24Plasma-enhanced atomic layer deposition of zinc phosphate
25Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
26Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
27Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
28Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
29Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
30Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
31In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
32Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
33Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
34Flexible, light trapping substrates for organic photovoltaics
35Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
36Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
37Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
38Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
39A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
40Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
41Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
42Experimental verification of electro-refractive phase modulation in graphene
43The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
44Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
45Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
46Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
47Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
48The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
49A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
50Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
51Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
52Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
53Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
54Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
55Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
56PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
57Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
58Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
59Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
60Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
61Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
62The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
63Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
64Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
65Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
66Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
67Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
68Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
69Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
70Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
71Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
72Radical Enhanced Atomic Layer Deposition of Metals and Oxides
73Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
74Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
75Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
76Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
77Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
78Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
79Gate Insulator for High Mobility Oxide TFT
80Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
81Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
82Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
83Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
84Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
85Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
86Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
87Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
88Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
89High-Reflective Coatings For Ground and Space Based Applications
90Fiber-matrix interface reinforcement using Atomic Layer Deposition
91Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
92Study on the resistive switching time of TiO2 thin films
93Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
94Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
95Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
96A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
97Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
98Symmetrical Al2O3-based passivation layers for p- and n-type silicon
99Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
100Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
101Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
102Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
103Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
104Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
105Sub-10-nm ferroelectric Gd-doped HfO2 layers
106Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
107Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
108Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
109Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
110Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
111Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
112Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
113Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
114Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
115Remote Plasma ALD of Platinum and Platinum Oxide Films
116Plasma-enhanced atomic layer deposition of BaTiO3
117Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
118Comparative study of ALD SiO2 thin films for optical applications
119Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
120In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
121Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
122Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
123Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
124Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
12546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
126Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
127Plasma-enhanced atomic layer deposition of BaTiO3
128Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
129Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
130Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
131Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
132Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
133Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
134Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
135Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
136Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
137Designing high performance precursors for atomic layer deposition of silicon oxide
138Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
139Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
140Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
141Breakdown and Protection of ALD Moisture Barrier Thin Films
142Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
143Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
144Trapped charge densities in Al2O3-based silicon surface passivation layers
145Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
146The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
147ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
148Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
149Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
150Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
151Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
152HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
153The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
154Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
155TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
156Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
157Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
158ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
159High-Reflective Coatings For Ground and Space Based Applications
160Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
161Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
162Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
163In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
164Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
165The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
166Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
167Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
168Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
169Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
170Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
171Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
172Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
173PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
174A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
175The effects of layering in ferroelectric Si-doped HfO2 thin films
176Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
177Low temperature temporal and spatial atomic layer deposition of TiO2 films
178Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
179Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
180Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
181Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
182Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
183Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
184Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
185Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
186Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
187Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
188'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
189Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
190Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
191Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
192Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
193Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
194Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
195The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
196Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
197Highly efficient and bending durable perovskite solar cells: toward a wearable power source
198The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
199Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
200Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
201Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
202Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
203Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
204Anti-stiction coating for mechanically tunable photonic crystal devices
205Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
206MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
207Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
208Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
209Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
210Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
211Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
212Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
213Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
214Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
215Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
216Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
217Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
218Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
219On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
220Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
221Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
222Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
223Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
224Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
225Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
226Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
227Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
228Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
229Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
230Surface and sensing properties of PE-ALD SnO2 thin film
231Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
232Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
233Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
234Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
235Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
236Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
237Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
238Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
239Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
240High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
241Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
242Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
243Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
244Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
245Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
246Spectroscopy and control of near-surface defects in conductive thin film ZnO
247Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
248Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
249Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
250High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
251A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
252Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
253Biofilm prevention on cochlear implants
254Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
255Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
256Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
257Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
258Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
259Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
260Optical properties and bandgap evolution of ALD HfSiOx films
261Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
262Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
263Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
264Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
265High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
266Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
267Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
268Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
269Propagation Effects in Carbon Nanoelectronics
270Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
271Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
272Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
273Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
274Innovative remote plasma source for atomic layer deposition for GaN devices
275Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
276Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
277Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
278Optical display film as flexible and light trapping substrate for organic photovoltaics
279Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
280Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
281Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
282Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
283Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
284Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
285Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
286Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
287Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
288Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
289Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
290Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
291Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
292Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
293Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
294Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
295Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
296Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
297Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
298Optical and Electrical Properties of AlxTi1-xO Films
299Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
300Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
301Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
302Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
303TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
304Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
305High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
306Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
307Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
308The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
309Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
310Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
311Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
312Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
313Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
314Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
315Epitaxial 1D electron transport layers for high-performance perovskite solar cells
316Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
317Method of Fabrication for Encapsulated Polarizing Resonant Gratings
318Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
319PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
320Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
321All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
322Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
323Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
324Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
325Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
326Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
327Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
328Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
329HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
330Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
331Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
332Breakdown and Protection of ALD Moisture Barrier Thin Films
333Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
334Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
335ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
336Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
337Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
338Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
339Hafnia and alumina on sulphur passivated germanium
340Annealing behavior of ferroelectric Si-doped HfO2 thin films
341Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
342Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
343Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
344Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
345Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
346Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
347Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
348Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
349Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
350In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
351Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
352Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
353Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
354Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
355Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
356Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
357Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
358Characteristics of HfO2 thin films grown by plasma atomic layer deposition
359Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
360Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
361Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
362Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
363Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
364Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
3651D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
366Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
367Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
368Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
369Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
370Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
371Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
372Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
373Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
374Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
375Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
376Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
377Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
378Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
379Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
380Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
381Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
382Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
383Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
384Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
385Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
386Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
387Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
388Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
389Sub-7-nm textured ZrO2 with giant ferroelectricity
390TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
391Systematic efficiency study of line-doubled zone plates
392Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
393Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
394In-gap states in titanium dioxide and oxynitride atomic layer deposited films
395Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
396Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
397The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
398Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
399Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
400Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
401Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
402Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
403MANOS performance dependence on ALD Al2O3 oxidation source
404Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
405Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
406Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
407Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
408Topographically selective deposition
409On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
410Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
411Passivation effects of atomic-layer-deposited aluminum oxide
412Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
413Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
414Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
415Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
416Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
417Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
418Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
419Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
420Optical and Electrical Properties of TixSi1-xOy Films
421A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
422Improved understanding of recombination at the Si/Al2O3 interface
423Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
424Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
425Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
426Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
427Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
428Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
429Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
430Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
431Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
432High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
433Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
434Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
435Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
436The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
437An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
438Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
439Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
440ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
441Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
442Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
443High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
444Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
445Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
446Dynamic tuning of plasmon resonance in the visible using graphene
447Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
448Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
449Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
450Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
451Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
452Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
453Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
454Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
455Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
456Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
457Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
458Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
459Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
460Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
461Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
462Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
463Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
464Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
465Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
466Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
467Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
468A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
469Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
470Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
471Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
472Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
473Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
474Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
475Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
476Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
477Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
478Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
479Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
480Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
481Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
482ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
483Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
484Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
485Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
486Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
487Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
488Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
489Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
490Growth of silica nanowires in vacuum
491Densification of Thin Aluminum Oxide Films by Thermal Treatments
492Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
493Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
494Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
495Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
496Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
497Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
498Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
499In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
500Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
501Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
502Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
503Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
504Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
505Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
506Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
507The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
508Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
509Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
510Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
511Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
512Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
513Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
514Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
515Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
516Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
517Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
518Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
519Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
520Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
521Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
522Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
523Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
524AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
525Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
526Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
527Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
528Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
529Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
530A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
531Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
532Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
533Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
534Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
535Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
536Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
537Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
538In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
539Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
540Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
541Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
542Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
543Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
544Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
545Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
546Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
547Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
548Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
549Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
550Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
551Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
552Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
553Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
554Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
555Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
556Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
557All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
558Atomic Layer Deposition of Gold Metal
559Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
560Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
561Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
562Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
563Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
564Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
565On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
566Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
567Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
568Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
569Radical Enhanced Atomic Layer Deposition of Metals and Oxides
570Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
571Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
572Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
573Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
574Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
575'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
576Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
577Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
578Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
579Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
580Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
581Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
582Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
583Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
584Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
585Residual stress study of thin films deposited by atomic layer deposition
586PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
587Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
588Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
589Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
590Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
591Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
592Optical properties and bandgap evolution of ALD HfSiOx films
593Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
594Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
595Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
596The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
597Radical Enhanced Atomic Layer Deposition of Metals and Oxides
598Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
599Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
600Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
601Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
602Band alignment of Al2O3 with (-201) β-Ga2O3
603Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
604Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
605Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
606Composite materials and nanoporous thin layers made by atomic layer deposition
607Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
608Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
609Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
610Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
611Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
612Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
613Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
614Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
615Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
616Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
617Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
618Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
619New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
620Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
621Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
622Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
623Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
624Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
625Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
626Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
627Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
628Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
629Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
630Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
631Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
632Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
633Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
634Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
635Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
636Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
637Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
638Remote Plasma ALD of Platinum and Platinum Oxide Films
639Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
640Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
641Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
642PEALD ZrO2 Films Deposition on TiN and Si Substrates
643Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
644Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
645Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
646On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
647The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
648Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
649ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
650Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
651In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
652Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
653Transient characterization of the electroforming process in TiO2 based resistive switching devices
654Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
655Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
656Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
657Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
658Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
659ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
660Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
661Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
662Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
663Lithium-Iron (III) Fluoride Battery with Double Surface Protection
664Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
665Mechanical properties of thin-film Parylene-metal-Parylene devices
666Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
667Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
668Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
669Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
670Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
671(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
672Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
673Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
674Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
675Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
676Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
677Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
678Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
679Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
680Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
681Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
682Patterned deposition by plasma enhanced spatial atomic layer deposition
683Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
684First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
685Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
686Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
687Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
688Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
689Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
690MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
691Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
692Advances in the fabrication of graphene transistors on flexible substrates
693Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
694Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
695Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
696Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
697Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
698Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
699Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
700Radical Enhanced Atomic Layer Deposition of Metals and Oxides
701Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
702Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
703HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
704Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
705Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
706Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
707Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
708Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
709Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
710Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
711Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
712Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
713Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
714Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
715Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
716Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
717The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
718Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
719Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
720Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
721Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
722Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
723Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
724Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
725Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
726Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
727Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
728Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
729Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
730Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
731The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
732Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
733Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
734Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
735XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
736Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
737Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
738Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
739Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
740Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
741The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
742Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
743Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
744Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
745Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
746Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
747Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
748Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
749Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
750A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
751Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
752Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
753Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
754Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
755In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
756Radical Enhanced Atomic Layer Deposition of Metals and Oxides
757Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
758Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
759Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
760Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
761Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
762Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
763Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
764Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
765Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
766Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
767Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
768Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
769Plasma enhanced atomic layer deposition of Ga2O3 thin films
770Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
771Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
772Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
773Oxygen migration in TiO2-based higher-k gate stacks
774Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
775Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
776The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
777Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
778Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
779Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
780Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
781Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
782Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
783Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
784Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
785Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
786PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
787Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
788Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
789Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
790Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
791Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
792Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
793Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
794Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
795Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
796Lithium-Iron (III) Fluoride Battery with Double Surface Protection
797Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
798Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
799Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
800Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
801Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
802On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
803Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
804Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
805Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
806Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
807Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
808Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
809Single-Cell Photonic Nanocavity Probes
810Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
811Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
812Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
813Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
814Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
815Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
816Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
817Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
818Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
819Radical Enhanced Atomic Layer Deposition of Metals and Oxides
820XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
821Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
822Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
823Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
824Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
825Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
826Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
827Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
828Energy-enhanced atomic layer deposition for more process and precursor versatility
829Nonvolatile Capacitive Crossbar Array for In-Memory Computing
830Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
831Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
832Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
833The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
834Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
835Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
836Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
837Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
838Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
839Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
840Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
841The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
842Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
843Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
844TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
845Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
846Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
847Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
848Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
849Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
850Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
851Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
852Room-Temperature Atomic Layer Deposition of Platinum
853Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
854DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
855Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
856Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
857A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
858A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
859Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
860Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
861Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
862Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
863Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
864Optical in situ monitoring of plasma-enhanced atomic layer deposition process
865Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
866Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
867Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
868Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
869Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
870Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
871Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
872Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
873Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
874Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
875Plasma enhanced atomic layer deposition of Fe2O3 thin films
876Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
877Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
878High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
879Optimization of the Surface Structure on Black Silicon for Surface Passivation
880Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
881Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
882Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
883A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
884Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
885Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
886Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
887Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
888Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
889Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
890Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
891Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
892Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
893Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
894Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
895Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
896On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
897Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
898Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
899Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
900Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
901In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
902Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
903Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
904Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
905Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
906Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
907Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
908Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
909Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
910HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
911Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
912Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
913A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
914High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
915Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
916Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
917Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
918Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
919Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
920Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
921Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
922Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
923Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
924Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
925Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
926Flexible Memristive Memory Array on Plastic Substrates
927Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
928Atomic layer deposition of metal-oxide thin films on cellulose fibers
929Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
930Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
9313D structure evolution using metastable atomic layer deposition based on planar silver templates
932Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
933AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
934Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
935Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
936Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
937Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
938Energy-enhanced atomic layer deposition for more process and precursor versatility
939Capacitance spectroscopy of gate-defined electronic lattices
940Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
941Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
942Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
943Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
944Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
945Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
946Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
947Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
948Lithium-Iron (III) Fluoride Battery with Double Surface Protection
949Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
950Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
951Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
952Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
953Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
954Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
955Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
956Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
957Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
958Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
959Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
960Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
961Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
962Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
963Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
964Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
965Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
966Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
967Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
968Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
969X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
970Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
971Damage evaluation in graphene underlying atomic layer deposition dielectrics
972Trilayer Tunnel Selectors for Memristor Memory Cells
973Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
974The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
975Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
976Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
977Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
978Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
979Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
980Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
981Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
982Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
983Energy-enhanced atomic layer deposition for more process and precursor versatility
984An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
985Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
986Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
987High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
988Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
989Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
990In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
991Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
992Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
993Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
994Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
995Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
996Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
997Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
998Bipolar resistive switching in amorphous titanium oxide thin film
999Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
1000Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1001Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
1002SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
1003Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
1004Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
1005Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1006Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1007Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
1008Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
1009Ferroelectricity in hafnia controlled via surface electrochemical state
1010Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
1011Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1012High-efficiency embedded transmission grating
1013Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
1014Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
1015Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
1016Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
1017Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1018Modal properties of a strip-loaded horizontal slot waveguide
1019Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1020Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1021Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
1022Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
1023Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1024Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
1025Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
1026Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1027Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1028Damage evaluation in graphene underlying atomic layer deposition dielectrics
1029Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1030Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
1031Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
1032Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
1033Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1034Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
1035High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
1036Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1037Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
1038Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1039The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
1040Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
1041Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1042Encapsulation method for atom probe tomography analysis of nanoparticles
1043The important role of water in growth of monolayer transition metal dichalcogenides
1044From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1045Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1046Residual stress study of thin films deposited by atomic layer deposition
1047Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
1048Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
1049Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1050Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
1051On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1052Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
1053Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
1054Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
1055Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1056Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
1057Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1058Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1059In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
1060Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1061Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1062Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1063Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
1064N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
1065Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1066Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1067Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
1068Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
1069Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
1070Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
1071Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1072Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1073Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1074Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
1075Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
1076Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1077Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
1078Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1079Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1080Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1081Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1082AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
1083Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
1084Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
1085Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
1086In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1087Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
1088Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
1089Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
1090Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1091Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
1092Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
1093Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1094Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
1095Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
1096Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
1097Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
1098Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
1099In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1100High-efficiency embedded transmission grating
1101Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1102Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
1103Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
1104Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1105Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1106Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
1107Charge effects of ultrafine FET with nanodot type floating gate
1108Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1109Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
1110Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1111Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1112Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1113Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
1114Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
1115Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1116Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
1117A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
1118Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
1119Plasma-enhanced atomic layer deposition of BaTiO3
1120Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
1121Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1122Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
1123Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
1124Optical properties and bandgap evolution of ALD HfSiOx films
1125Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
1126Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1127An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
1128Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
1129Hafnia and alumina on sulphur passivated germanium
1130Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
1131Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1132Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
1133Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1134Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1135Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
1136α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
1137Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1138Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
1139Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1140Tuning size and coverage of Pd nanoparticles using atomic layer deposition
1141RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
1142Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1143Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
1144Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
1145Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
1146Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
1147Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1148Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
1149Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1150Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1151Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
1152Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
1153AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
1154Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
1155Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
1156IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
1157Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
1158Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
1159Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1160Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1161Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
1162Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
1163Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
1164Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
1165Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
1166Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
1167Very high frequency plasma reactant for atomic layer deposition
1168Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1169ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
1170Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
1171Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
1172Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1173Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
1174Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1175Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
1176Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
1177Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1178The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1179Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
1180On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
1181Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
1182Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
1183Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
1184Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1185Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
1186On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
1187Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1188Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
1189Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
1190Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
1191Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1192Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
1193Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
1194Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
1195Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
1196Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1197Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
1198Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
1199Nonvolatile Capacitive Crossbar Array for In-Memory Computing
1200The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1201Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
1202Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
1203Impact of interface materials on side permeation in indirect encapsulation of organic electronics
1204Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
1205A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
1206Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1207Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1208Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
1209Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
1210Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
1211In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
1212Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
1213Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
1214Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1215Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
1216Atomic Layer Deposition of the Conductive Delafossite PtCoO2
1217High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
1218DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
1219Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
1220Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
1221Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
1222Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
1223The important role of water in growth of monolayer transition metal dichalcogenides
1224Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1225Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
1226Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
1227Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1228An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
1229Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
1230Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
1231Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
1232Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
1233Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
1234Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1235Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
1236Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
1237High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
1238Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1239On the equilibrium concentration of boron-oxygen defects in crystalline silicon
1240Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
1241Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
1242Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
1243Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
1244Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
1245Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1246Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1247Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
1248Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1249Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1250Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
1251Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1252Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1253Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1254Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1255Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
1256Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
1257Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
1258Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
1259Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
1260Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1261Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1262Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
1263Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1264Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1265Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
1266Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1267Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
1268Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1269Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
1270Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
1271Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
1272Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
1273Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1274Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1275Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
1276A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
1277Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure