O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
41D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
546-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
6A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
10A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
11A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
12Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
13Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
14Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
15Advances in the fabrication of graphene transistors on flexible substrates
16Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
17Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
18Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
19Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
20Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
21Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
22Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
23ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
24AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
25AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
26AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
27Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
28Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
29Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
30Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
31An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
32Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
33Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
34Anti-stiction coating for mechanically tunable photonic crystal devices
35Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
36Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
37Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
38Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
39Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
40Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
41Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
42Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
43Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
44Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
45Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
46Band alignment of Al2O3 with (-201) β-Ga2O3
47Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
48Breakdown and Protection of ALD Moisture Barrier Thin Films
49Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
50Capacitance spectroscopy of gate-defined electronic lattices
51Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
52Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
53Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
54Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
55Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
56Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
57Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
58Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
59Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
60Charge effects of ultrafine FET with nanodot type floating gate
61Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
62Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
63Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
64Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
65Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
66Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
67Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
68Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
69Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
70Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
71Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
72Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
73Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
74Damage evaluation in graphene underlying atomic layer deposition dielectrics
75DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
76Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
77Densification of Thin Aluminum Oxide Films by Thermal Treatments
78Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
79Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
80Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
81DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
82Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
83Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
84Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
85Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
86Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
87Dynamic tuning of plasmon resonance in the visible using graphene
88Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
89Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
90Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
91Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
92Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
93Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
94Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
95Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
96Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
97Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
98Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
99Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
100Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
101Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
102Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
103Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
104Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
105Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
106Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
107Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
108Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
109Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
110Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
111Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
112Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
113Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
114Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
115Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
116Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
117Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
118Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
119Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
120Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
121Energy-enhanced atomic layer deposition for more process and precursor versatility
122Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
123Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
124Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
125Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
126Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
127Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
128Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
129Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
130Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
131Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
132Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
133Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
134Experimental verification of electro-refractive phase modulation in graphene
135Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
136Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
137Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
138Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
139Fiber-matrix interface reinforcement using Atomic Layer Deposition
140Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
141Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
142Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
143Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
144Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
145First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
146Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
147Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
148Flexible, light trapping substrates for organic photovoltaics
149Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
150Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
151Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
152Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
153Hafnia and alumina on sulphur passivated germanium
154High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
155High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
156High-efficiency embedded transmission grating
157High-Reflective Coatings For Ground and Space Based Applications
158High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
159Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
160Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
161Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
162Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
163Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
164Impact of interface materials on side permeation in indirect encapsulation of organic electronics
165Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
166Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
167Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
168Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
169Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
170Improved understanding of recombination at the Si/Al2O3 interface
171Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
172Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
173Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
174Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
175Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
176In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
177In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
178In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
179In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
180Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
181Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
182Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
183Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
184Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
185Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
186Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
187Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
188Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
189Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
190Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
191Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
192Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
193Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
194Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
195Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
196Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
197Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
198Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
199Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
200Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
201Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
202Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
203Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
204Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
205Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
206Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
207Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
208Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
209Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
210Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
211Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
212Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
213Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
214Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
215Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
216Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
217Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
218Lithium-Iron (III) Fluoride Battery with Double Surface Protection
219Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
220Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
221Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
222Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
223Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
224Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
225Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
226Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
227MANOS performance dependence on ALD Al2O3 oxidation source
228Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
229Mechanical properties of thin-film Parylene-metal-Parylene devices
230Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
231Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
232Method of Fabrication for Encapsulated Polarizing Resonant Gratings
233Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
234Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
235Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
236Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
237Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
238Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
239Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
240MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
241Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
242N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
243Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
244Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
245Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
246Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
247Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
248Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
249Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
250Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
251On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
252On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
253On the equilibrium concentration of boron-oxygen defects in crystalline silicon
254On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
255On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
256Optical display film as flexible and light trapping substrate for organic photovoltaics
257Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
258Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
259Optimization of the Surface Structure on Black Silicon for Surface Passivation
260Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
261Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
262Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
263Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
264Passivation effects of atomic-layer-deposited aluminum oxide
265Patterned deposition by plasma enhanced spatial atomic layer deposition
266PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
267Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
268Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
269Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
270Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
271Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
272Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
273Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
274Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
275Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
276Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
277Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
278Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
279Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
280Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
281Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
282Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
283Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
284Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
285Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
286Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
287Propagation Effects in Carbon Nanoelectronics
288Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
289Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
290Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
291Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
292Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
293Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
294Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
295Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
296Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
297Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
298Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
299Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
300Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
301Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
302Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
303Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
304Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
305Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
306Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
307Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
308Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
309Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
310Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
311Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
312Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
313Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
314Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
315Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
316Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
317Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
318Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
319Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
320Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
321Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
322Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
323Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
324Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
325Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
326The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
327The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
328The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
329Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
330Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
331Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
332Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
333TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
334Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
335Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
336Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
337Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
338Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
339Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
340Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
341Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
342Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
343Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
344Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
345Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
346Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
347Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
348Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
349Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
350Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
351Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
352Very high frequency plasma reactant for atomic layer deposition
353Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
354Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
355Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
356Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
357Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
358Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
359Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
360Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
361Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
362Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
363Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
364Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
365Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
366Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
367Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
368Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
369Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
370Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
371Composite materials and nanoporous thin layers made by atomic layer deposition
372Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
373Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
374Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
375Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
376Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
377Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
378Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
379Optical and Electrical Properties of AlxTi1-xO Films
380Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
381Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
382Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
383Atomic Layer Deposition of Gold Metal
384Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
385Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
386Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
387Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
388Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
389Plasma-enhanced atomic layer deposition of BaTiO3
390High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
391Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
392Plasma-enhanced atomic layer deposition of BaTiO3
393Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
394Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
395Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
396Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
397Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
398Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
399Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
400Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
401Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
402A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
403Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
404Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
405Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
406Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
407Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
408Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
409Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
410Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
411Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
412Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
413Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
414Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
415Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
416Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
417Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
418Radical Enhanced Atomic Layer Deposition of Metals and Oxides
419Radical Enhanced Atomic Layer Deposition of Metals and Oxides
420Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
421Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
422Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
423Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
424Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
425Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
426Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
427Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
428Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
429Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
430Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
431Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
432Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
433Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
434Plasma enhanced atomic layer deposition of Fe2O3 thin films
435Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
436Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
437Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
438Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
439The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
440Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
441Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
442Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
443Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
444Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
445Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
446Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
447Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
448Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
449Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
450Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
451Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
452Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
453Plasma enhanced atomic layer deposition of Ga2O3 thin films
454Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
455Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
456Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
457Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
458RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
459Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
460Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
461α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
462Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
463Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
464Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
465Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
466Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
467Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
468Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
469Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
470Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
471Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
472Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
473A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
474An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
475Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
476Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
477Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
478Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
479Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
480AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
481Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
482Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
483Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
484Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
485Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
486Characteristics of HfO2 thin films grown by plasma atomic layer deposition
487Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
488Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
489Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
490Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
491Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
492Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
493Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
494Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
495Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
496Damage evaluation in graphene underlying atomic layer deposition dielectrics
497Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
498Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
499Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
500Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
501Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
502Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
503Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
504Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
505Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
506Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
507Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
508Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
509Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
510Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
511Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
512Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
513Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
514Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
515Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
516Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
517Hafnia and alumina on sulphur passivated germanium
518HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
519HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
520Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
521Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
522Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
523Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
524In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
525Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
526Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
527Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
528Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
529Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
530Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
531Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
532Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
533Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
534Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
535Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
536Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
537Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
538Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
539Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
540Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
541Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
542Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
543Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
544Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
545Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
546On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
547Optical properties and bandgap evolution of ALD HfSiOx films
548Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
549PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
550Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
551Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
552Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
553Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
554Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
555Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
556Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
557Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
558Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
559Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
560Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
561Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
562Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
563Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
564Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
565The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
566The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
567The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
568The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
569The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
570Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
571Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
572Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
573Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
574Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
575Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
576Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
577Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
578Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
579Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
580Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
581Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
582Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
583HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
584Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
585The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
586Annealing behavior of ferroelectric Si-doped HfO2 thin films
587Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
588Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
589Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
590Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
591Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
592Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
593Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
594Optical properties and bandgap evolution of ALD HfSiOx films
595Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
596TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
597The effects of layering in ferroelectric Si-doped HfO2 thin films
598Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
599Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
600Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
601Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
602Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
603New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
604Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
605Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
606All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
607Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
608Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
609Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
610Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
611High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
612High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
613Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
614Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
615On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
616Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
617Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
618High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
619Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
620Systematic efficiency study of line-doubled zone plates
621TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
622IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
623Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
624Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
625Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
626Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
627Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
628Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
629Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
630The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
631XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
632Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
633Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
634Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
635Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
636Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
637Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
638Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
639Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
640Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
641Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
642Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
643Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
644In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
645Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
646Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
647Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
648Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
649Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
650Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
651Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
652Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
653Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
654Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
655Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
656The important role of water in growth of monolayer transition metal dichalcogenides
657Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
658Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
659Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
660Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
661Radical Enhanced Atomic Layer Deposition of Metals and Oxides
662Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
663Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
664Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
665Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
666Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
667Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
668Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
669Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
670Radical Enhanced Atomic Layer Deposition of Metals and Oxides
671Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
672Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
673Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
674Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
675Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
676Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
677Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
678Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
679Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
680Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
681Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
682Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
683Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
684Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
685Encapsulation method for atom probe tomography analysis of nanoparticles
686Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
687Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
688Growth of silica nanowires in vacuum
689In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
690Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
691Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
692Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
693Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
694Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
695Remote Plasma ALD of Platinum and Platinum Oxide Films
696Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
697Room-Temperature Atomic Layer Deposition of Platinum
698Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
699Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
700Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
701Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
702Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
703Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
704Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
705Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
706The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
707Remote Plasma ALD of Platinum and Platinum Oxide Films
708Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
709Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
710Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
711Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
712Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
713Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
714High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
715Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
716In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
717Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
718Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
719Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
720Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
721Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
722Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
723(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
724ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
725Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
726Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
727Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
728Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
729Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
730Radical Enhanced Atomic Layer Deposition of Metals and Oxides
731Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
732Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
733Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
734Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
735Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
736Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
737'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7383D structure evolution using metastable atomic layer deposition based on planar silver templates
739A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
740A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
741Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
742Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
743Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
744An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
745Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
746Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
747Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
748Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
749Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
750Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
751Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
752Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
753Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
754Atomic layer deposition of metal-oxide thin films on cellulose fibers
755Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
756Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
757Breakdown and Protection of ALD Moisture Barrier Thin Films
758Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
759Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
760Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
761Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
762Comparative study of ALD SiO2 thin films for optical applications
763Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
764Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
765Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
766Designing high performance precursors for atomic layer deposition of silicon oxide
767Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
768Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
769Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
770Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
771Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
772Energy-enhanced atomic layer deposition for more process and precursor versatility
773Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
774Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
775Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
776Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
777Gate Insulator for High Mobility Oxide TFT
778Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
779HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
780High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
781High-Reflective Coatings For Ground and Space Based Applications
782Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
783Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
784Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
785Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
786Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
787Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
788Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
789Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
790Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
791Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
792Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
793Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
794Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
795Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
796Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
797Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
798Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
799Modal properties of a strip-loaded horizontal slot waveguide
800Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
801Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
802Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
803Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
804Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
805On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
806On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
807Optical properties and bandgap evolution of ALD HfSiOx films
808PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
809Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
810Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
811Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
812Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
813Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
814Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
815Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
816Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
817Radical Enhanced Atomic Layer Deposition of Metals and Oxides
818Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
819Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
820Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
821Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
822Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
823Single-Cell Photonic Nanocavity Probes
824Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
825Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
826Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
827Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
828Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
829Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
830Symmetrical Al2O3-based passivation layers for p- and n-type silicon
831Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
832Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
833Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
834Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
835Trapped charge densities in Al2O3-based silicon surface passivation layers
836Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
837Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
838Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
839A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
840Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
841Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
842Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
843Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
844Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
845Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
846Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
847Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
848Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
849Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
850In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
851Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
852Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
853Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
854Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
855Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
856SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
857Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
858Surface and sensing properties of PE-ALD SnO2 thin film
859Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
860Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
861Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
862Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
863Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
864Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
865Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
866Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
867Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
868Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
869Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
870Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
871Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
872Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
873Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
874Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
875Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
876Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
877Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
878Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
879Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
880Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
881Radical Enhanced Atomic Layer Deposition of Metals and Oxides
882Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
883Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
884Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
885Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
886Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
887Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
888Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
889Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
890Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
891Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
892Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
893Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
894Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
895Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
896Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
897Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
898Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
899Topographically selective deposition
900Trilayer Tunnel Selectors for Memristor Memory Cells
901Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
902Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
903A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
904Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
905An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
906Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
907Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
908Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
909Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
910Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
911Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
912Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
913Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
914Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
915Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
916Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
917Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
918Biofilm prevention on cochlear implants
919Bipolar resistive switching in amorphous titanium oxide thin film
920Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
921Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
922Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
923Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
924Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
925Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
926Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
927Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
928Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
929Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
930Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
931Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
932Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
933Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
934Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
935Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
936Energy-enhanced atomic layer deposition for more process and precursor versatility
937Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
938Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
939Epitaxial 1D electron transport layers for high-performance perovskite solar cells
940Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
941Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
942Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
943Flexible Memristive Memory Array on Plastic Substrates
944Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
945Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
946Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
947Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
948Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
949Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
950Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
951Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
952High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
953High-efficiency embedded transmission grating
954Highly efficient and bending durable perovskite solar cells: toward a wearable power source
955Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
956Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
957Impact of interface materials on side permeation in indirect encapsulation of organic electronics
958Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
959Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
960Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
961In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
962In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
963In-gap states in titanium dioxide and oxynitride atomic layer deposited films
964Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
965Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
966Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
967Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
968Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
969Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
970Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
971Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
972Lithium-Iron (III) Fluoride Battery with Double Surface Protection
973Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
974Low temperature temporal and spatial atomic layer deposition of TiO2 films
975Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
976Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
977Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
978MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
979Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
980On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
981Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
982Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
983Oxygen migration in TiO2-based higher-k gate stacks
984Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
985Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
986Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
987Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
988Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
989Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
990Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
991Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
992Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
993Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
994Plasma-enhanced atomic layer deposition of BaTiO3
995Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
996Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
997Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
998Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
999Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
1000Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
1001Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1002Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
1003Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1004Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
1005Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1006Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1007Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
1008Study on the resistive switching time of TiO2 thin films
1009Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
1010Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
1011Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
1012Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1013The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1014The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
1015The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
1016The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
1017The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1018Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1019Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1020TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1021Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1022Transient characterization of the electroforming process in TiO2 based resistive switching devices
1023Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1024Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
1025X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
1026Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
1027Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1028Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1029Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
1030Optical and Electrical Properties of TixSi1-xOy Films
1031Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
1032Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
1033Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1034Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
1035Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
1036Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
1037Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1038Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
1039Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
1040Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
1041Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
1042In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
1043Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1044Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
1045Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1046The important role of water in growth of monolayer transition metal dichalcogenides
1047Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
1048Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
1049Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1050Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
1051Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
1052Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1053Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1054Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1055Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
1056Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1057Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
1058Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
1059Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1060Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
1061Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1062A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
1063Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1064All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
1065Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1066Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1067Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
1068Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
1069Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
1070Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
1071Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1072Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1073Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
1074Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1075Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
1076Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1077Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
1078From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
1079Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1080Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
1081Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1082Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
1083Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1084Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1085Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1086Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
1087Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
1088Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
1089Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1090Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1091Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1092Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1093Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1094Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1095Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
1096Spectroscopy and control of near-surface defects in conductive thin film ZnO
1097Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
1098Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
1099The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1100The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
1101The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
1102The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1103The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
1104Top-down fabricated ZnO nanowire transistors for application in biosensors
1105Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1106Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
1107Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
1108ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
1109ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
1110Plasma-enhanced atomic layer deposition of zinc phosphate
1111Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1112Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1113Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1114Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1115Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
1116Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1117Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
1118Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1119Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
1120Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1121Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
1122Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1123Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1124Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1125High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
1126Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1127Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
1128Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1129Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1130In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
1131Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
1132Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1133Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1134Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1135Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1136Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
1137PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1138PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
1139PEALD ZrO2 Films Deposition on TiN and Si Substrates
1140Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
1141Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1142Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1143Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
1144Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1145Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1146Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
1147Sub-7-nm textured ZrO2 with giant ferroelectricity
1148Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1149Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
1150Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
1151The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
1152The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
1153Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
1154Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1155XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
1156ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
1157ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
1158ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1159Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1160Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
1161Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
1162Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1163In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics