O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

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NumberTitle
1Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
2ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
3Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
4Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
5Band alignment of Al2O3 with (-201) β-Ga2O3
6High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
7Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
8Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
9Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
10Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
11Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
12Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
13Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
14Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
15Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
16Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
17Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
18Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
19Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
20Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
21Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
22Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
23Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
24Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
25Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
26Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
27The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
28Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
29Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
30Spectroscopy and control of near-surface defects in conductive thin film ZnO
31Breakdown and Protection of ALD Moisture Barrier Thin Films
32Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
33Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
34Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
35Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
36Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
37Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
38Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
39Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
40Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
41SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
42Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
43Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
44Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
45Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
46Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
47Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
48Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
49Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
50Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
51Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
52Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
53Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
54Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
55Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
56Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
57Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
58Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
59X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
60Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
61Atomic Layer Deposition of the Conductive Delafossite PtCoO2
62Capacitance spectroscopy of gate-defined electronic lattices
63Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
64Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
65Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
66Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
67Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
68Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
69Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
70Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
71Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
72Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
73The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
74Room-Temperature Atomic Layer Deposition of Platinum
75Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
76Energy-enhanced atomic layer deposition for more process and precursor versatility
77Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
78Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
79Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
80Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
81Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
82Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
83Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
84Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
85Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
86Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
87Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
88The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
89Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
90A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
91Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
92Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
93Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
94Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
95Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
96Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
97Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
98Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
99Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
100Radical Enhanced Atomic Layer Deposition of Metals and Oxides
101Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
102Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
103Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
104Innovative remote plasma source for atomic layer deposition for GaN devices
105Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
106Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
107Densification of Thin Aluminum Oxide Films by Thermal Treatments
108Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
109Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
110Single-Cell Photonic Nanocavity Probes
111Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
112Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
113Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
114Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
115ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
116Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
117In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
118Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
119Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
120Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
121Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
122Trapped charge densities in Al2O3-based silicon surface passivation layers
123Optical properties and bandgap evolution of ALD HfSiOx films
124Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
125Passivation effects of atomic-layer-deposited aluminum oxide
126Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
127Radical Enhanced Atomic Layer Deposition of Metals and Oxides
128Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
129Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
130Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
131The important role of water in growth of monolayer transition metal dichalcogenides
132XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
133XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
134Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
135Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
136Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
137Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
138Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
139ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
140Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
141Radical Enhanced Atomic Layer Deposition of Metals and Oxides
142Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
143Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
144Optical in situ monitoring of plasma-enhanced atomic layer deposition process
145Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
146Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
147Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
148Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
149Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
150Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
151Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
152Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
153Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
154Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
155Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
156IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
157Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
158Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
159All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
160Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
161Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
162Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
163Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
164Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
165Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
166Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
167Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
168Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
169Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
170Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
171Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
172Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
173Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
174Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
175Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
176Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
177Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
178Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
179Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
180Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
181Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
182Propagation Effects in Carbon Nanoelectronics
183Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
184Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
185Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
186Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
187Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
188On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
189Plasma-enhanced atomic layer deposition of BaTiO3
190Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
191Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
192The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
193Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
194Plasma enhanced atomic layer deposition of Ga2O3 thin films
195Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
196Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
197Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
198Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
199Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
200Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
201Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
202Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
203Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
204Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
205Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
206Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
207Optical properties and bandgap evolution of ALD HfSiOx films
208High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
209(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
210RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
211Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
212In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
213On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
214Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
215Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
216Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
217Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
218Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
219Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
220Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
221Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
222Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
223Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
224Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
225Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
226Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
227Characteristics of HfO2 thin films grown by plasma atomic layer deposition
228Hafnia and alumina on sulphur passivated germanium
229Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
230Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
231Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
232Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
233Patterned deposition by plasma enhanced spatial atomic layer deposition
234Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
235Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
236Ferroelectricity in hafnia controlled via surface electrochemical state
237'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
238Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
239Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
240Modal properties of a strip-loaded horizontal slot waveguide
241Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
242Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
243In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
244Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
245Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
246Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
247Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
248Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
249Damage evaluation in graphene underlying atomic layer deposition dielectrics
250Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
251MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
252Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
253Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
254PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
255Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
256Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
257Impact of interface materials on side permeation in indirect encapsulation of organic electronics
258Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
259Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
260Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
261Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
262Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
263Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
264High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
265Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
266PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
267Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
268On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
269Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
270A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
271High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
272Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
273Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
274Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
275Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
276Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
277Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
278On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
279Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
280Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
281Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
282Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
283Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
284Lithium-Iron (III) Fluoride Battery with Double Surface Protection
285Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
286Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
287Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
288Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
289Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
290Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
291Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
292Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
293Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
294Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
295Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
296Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
297Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
298Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
299Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
300Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
301Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
302Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
303Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
304Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
305Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
306TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
307Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
308Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
309Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
310Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
311Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
312Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
313Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
314Improved understanding of recombination at the Si/Al2O3 interface
315ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
316Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
317Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
318Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
319Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
320Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
321Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
322Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
323Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
324PEALD ZrO2 Films Deposition on TiN and Si Substrates
325Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
326Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
327Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
328N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
329Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
330Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
331Sub-10-nm ferroelectric Gd-doped HfO2 layers
332A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
333Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
334Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
335Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
336HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
337Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
338Anti-stiction coating for mechanically tunable photonic crystal devices
339Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
340Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
341Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
342Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
343Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
344Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
345Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
346Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
347Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
348Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
349Atomic layer deposition of YMnO3 thin films
350Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
351High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
352Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
353Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
35446-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
355Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
356Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
357Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
358The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
359Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
360Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
361Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
362Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
363Nonvolatile Capacitive Crossbar Array for In-Memory Computing
364Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
365Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
366Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
367In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
368Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
369Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
370Radical Enhanced Atomic Layer Deposition of Metals and Oxides
371Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
372Bipolar resistive switching in amorphous titanium oxide thin film
373Highly efficient and bending durable perovskite solar cells: toward a wearable power source
374Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
375Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
376Gate Insulator for High Mobility Oxide TFT
377Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
378Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
379The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
380The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
381Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
382Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
383Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
384Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
385Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
386Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
387Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
388Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
389Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
390Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
391Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
392Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
393Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
394Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
395Comparative study of ALD SiO2 thin films for optical applications
396Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
397DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
398Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
399Designing high performance precursors for atomic layer deposition of silicon oxide
400Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
401Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
402Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
403Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
404Atomic Layer Deposition of Gold Metal
405Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
406High-efficiency embedded transmission grating
407Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
408Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
409Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
410Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
411Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
412Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
413Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
414Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
415Annealing behavior of ferroelectric Si-doped HfO2 thin films
416The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
417Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
418Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
419Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
420Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
421Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
422Optical properties and bandgap evolution of ALD HfSiOx films
423Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
424Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
425Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
426The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
427Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
428Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
429Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
430Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
431Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
432Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
433Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
434Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
435Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
436Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
437Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
438Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
439Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
440Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
441Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
442Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
443Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
444Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
445Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
446Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
447Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
448Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
449Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
450Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
451Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
452Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
453Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
454Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
455High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
456Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
457Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
458Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
459Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
460Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
461Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
462An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
463Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
464Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
465Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
466Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
467Charge effects of ultrafine FET with nanodot type floating gate
468Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
469Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
470Hafnia and alumina on sulphur passivated germanium
471Transient characterization of the electroforming process in TiO2 based resistive switching devices
472Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
473Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
474Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
475Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
476Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
477In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
478Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
479In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
480Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
481Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
482Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
483Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
484Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
485Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
486Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
487Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
488Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
489Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
490Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
491Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
492Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
493Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
494Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
495Systematic efficiency study of line-doubled zone plates
496Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
497Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
498Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
499A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
500Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
501Composite materials and nanoporous thin layers made by atomic layer deposition
502Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
503Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
504High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
505Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
506Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
507Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
508Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
509Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
510Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
511Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
512Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
513Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
514Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
515Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
516Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
517Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
518Tuning size and coverage of Pd nanoparticles using atomic layer deposition
519Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
520Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
521Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
522In-gap states in titanium dioxide and oxynitride atomic layer deposited films
523Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
524High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
525Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
526Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
527ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
528On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
529Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
530Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
531Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
532Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
533Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
534Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
535Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
536Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
537Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
538Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
539Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
540Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
541Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
542Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
543Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
544Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
545Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
546Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
547A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
548High-Reflective Coatings For Ground and Space Based Applications
549Surface and sensing properties of PE-ALD SnO2 thin film
550An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
551Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
552Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
553Topographically selective deposition
554Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
555Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
556Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
557In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
558Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
559Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
560Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
561Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
562Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
563Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
564Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
565Residual stress study of thin films deposited by atomic layer deposition
566Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
567Low temperature temporal and spatial atomic layer deposition of TiO2 films
568Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
569Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
570Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
571Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
572Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
573Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
574Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
575Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
576Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
577Lithium-Iron (III) Fluoride Battery with Double Surface Protection
578Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
579Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
580Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
581Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
582Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
583Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
584Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
585HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
586HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
587Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
588Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
589Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
590Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
591Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
592Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
593Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
594Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
595MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
596Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
597Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
598Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
599High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
600Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
601Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
602Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
603Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
604Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
605Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
606PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
607Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
608Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
609Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
610Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
611Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
612Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
613A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
614Impact of interface materials on side permeation in indirect encapsulation of organic electronics
615Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
616Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
617Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
618Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
619Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
620Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
621Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
622'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
623On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
624Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
625Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
626Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
627Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
628Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
629Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
630Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
631Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
632Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
633Energy-enhanced atomic layer deposition for more process and precursor versatility
634Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
635Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
636Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
637Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
638Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
639Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
640Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
641Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
642Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
643Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
644Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
645Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
646Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
647Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
648Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
649TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
650Energy-enhanced atomic layer deposition for more process and precursor versatility
651Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
652Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
653Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
654Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
655Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
656Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
657Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
658Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
659Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
660Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
661Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
662All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
663Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
664Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
665Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
666Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
667New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
668The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
669Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
670Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
671Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
672Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
673Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
674Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
675Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
676Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
677Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
678Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
679The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
680Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
681Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
682Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
683Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
684Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
685Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
686Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
687Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
688Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
689Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
690Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
691First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
692Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
693Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
694Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
695Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
696Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
697Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
698Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
699Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
700Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
701Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
702Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
703Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
704On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
705Dynamic tuning of plasmon resonance in the visible using graphene
706Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
707Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
708Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
709Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
710Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
711Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
712Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
713Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
714On the equilibrium concentration of boron-oxygen defects in crystalline silicon
715Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
716Trilayer Tunnel Selectors for Memristor Memory Cells
717Plasma enhanced atomic layer deposition of Fe2O3 thin films
718Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
719Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
720Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
721The effects of layering in ferroelectric Si-doped HfO2 thin films
722Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
723Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
724Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
725Lithium-Iron (III) Fluoride Battery with Double Surface Protection
726Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
727Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
728Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
729Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
730From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
731Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
732Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
733Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
734Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
735Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
736Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
737Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
738High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
739Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
740Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
741Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
742Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
743Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
744Radical Enhanced Atomic Layer Deposition of Metals and Oxides
745Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
746Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
747Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
748Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
749Fiber-matrix interface reinforcement using Atomic Layer Deposition
750Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
751Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
752Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
753Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
754Symmetrical Al2O3-based passivation layers for p- and n-type silicon
755Radical Enhanced Atomic Layer Deposition of Metals and Oxides
756Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
757Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
758Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
759Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
760Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
761Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
762Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
763Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
764AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
765Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
766Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
767Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
768The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
769Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
770Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
771MANOS performance dependence on ALD Al2O3 oxidation source
772Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
773Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
774Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
775Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
776ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
777Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
778Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
779Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
780Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
781Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
782Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
783Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
784Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
785Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
786Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
787Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
788Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
789On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
790Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
791Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
792Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
793Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
794Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
795Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
796Residual stress study of thin films deposited by atomic layer deposition
797On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
798Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
799Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
800Flexible, light trapping substrates for organic photovoltaics
801Experimental verification of electro-refractive phase modulation in graphene
802Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
803Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
804Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
805Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
806Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
807Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
808Optical display film as flexible and light trapping substrate for organic photovoltaics
809Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
810Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
811Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
812Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
813Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
814Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
815Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
816Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
817Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
818Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
819Optical and Electrical Properties of TixSi1-xOy Films
820Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
821Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
822In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
823Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
824Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
825Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
826Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
827Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
828Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
829Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
830Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
831Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
832The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
833Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
834Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
835A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
836Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
837Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
838Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
839Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
840Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
841The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
842Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
843Atomic layer deposition of metal-oxide thin films on cellulose fibers
844Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
845In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
846AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
847Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
848Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
849Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
850Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
851Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
852Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
853Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
854The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
855Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
856Radical Enhanced Atomic Layer Deposition of Metals and Oxides
857Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
858Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
859Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
860Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
861Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
862Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
863Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
864Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
865Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
866Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
867Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
868Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
869Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
870Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
871Breakdown and Protection of ALD Moisture Barrier Thin Films
872Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
873Optimization of the Surface Structure on Black Silicon for Surface Passivation
874A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
875Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
876Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
877Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
878Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
879Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
880Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
881Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
882In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
883Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
884Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
885Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
886Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
887Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
888Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
889Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
890Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
891Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
892Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
893Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
894Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
895Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
896Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
897Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
898Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
899The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
900Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
901The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
902Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
903Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
904Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
905In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
906Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
907Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
908Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
909Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
910Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
911Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
912An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
913Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
914Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
915Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
916Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
917Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
918Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
919The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
920Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
921Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
922Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
923Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
924Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
925Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
926Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
927Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
928High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
929Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
930Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
931Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
932A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
933Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
934Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
935Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
936An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
937Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
938Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
939Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
940Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
941Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
942The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
943High-efficiency embedded transmission grating
944A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
945Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
946Sub-7-nm textured ZrO2 with giant ferroelectricity
947Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
948HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
949Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
950Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
951Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
952Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
953Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
954Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
955Epitaxial 1D electron transport layers for high-performance perovskite solar cells
956Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
957A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
958Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
959Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
960Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
961Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
962Nonvolatile Capacitive Crossbar Array for In-Memory Computing
963Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
964Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
965Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
966Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
967Flexible Memristive Memory Array on Plastic Substrates
968Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
969Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
970Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
971Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
972Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
973Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
974Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
975Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
976Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
977Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
978Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
979Remote Plasma ALD of Platinum and Platinum Oxide Films
980Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
981α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
982Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
983Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
984PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
985Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
986Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
987ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
988Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
989Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
990Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
991The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
992Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
993Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
994Optical and Electrical Properties of AlxTi1-xO Films
995Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
996Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
997Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
998The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
999Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
1000Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
1001Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
1002Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1003Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1004Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
1005Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
1006Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
1007In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
1008Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
1009Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
1010Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
1011Advances in the fabrication of graphene transistors on flexible substrates
1012Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1013DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
1014Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1015Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1016Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1017Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
1018Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1019Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
1020Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
1021A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
1022Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
1023Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
1024Damage evaluation in graphene underlying atomic layer deposition dielectrics
1025Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
1026Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
1027Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
1028Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
1029Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
1030Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
1031A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
1032Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
1033Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
1034Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
1035Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
1036Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
1037Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
1038Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1039Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
1040Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
1041Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1042Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
1043Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
1044Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
1045Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
1046Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
1047Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
1048In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1049Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1050Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
1051Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
1052Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
1053Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
1054Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
1055Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
10563D structure evolution using metastable atomic layer deposition based on planar silver templates
1057Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1058Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
1059Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
1060Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
1061Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
1062Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
1063Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
1064Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1065Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
1066Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
1067Top-down fabricated ZnO nanowire transistors for application in biosensors
1068Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
1069Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
1070Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
1071Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
1072Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1073Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1074Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
1075Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
1076Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
1077In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
1078Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
1079Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
1080The important role of water in growth of monolayer transition metal dichalcogenides
1081Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1082Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
1083Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
1084Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
1085TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1086Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
1087Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1088Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1089Growth of silica nanowires in vacuum
1090Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1091Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
1092High-Reflective Coatings For Ground and Space Based Applications
1093Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1094Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
1095Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1096Remote Plasma ALD of Platinum and Platinum Oxide Films
1097Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1098Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1099Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
1100Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
1101Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
1102Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1103Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1104Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1105Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
1106Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
1107Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
1108Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
1109Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
1110Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
1111Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1112Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
1113Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
1114Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
1115Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1116Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
1117Method of Fabrication for Encapsulated Polarizing Resonant Gratings
1118Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
1119Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
1120Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
1121Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
1122Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
1123Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
1124Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
1125Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
1126Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1127Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1128Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
1129Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
1130Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
1131Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
1132Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
1133Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
1134Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
1135Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
1136Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
1137Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
1138Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
1139Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
1140Very high frequency plasma reactant for atomic layer deposition
1141Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
1142Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
1143Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
1144Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
1145Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
1146The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
1147Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
11481D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
1149Biofilm prevention on cochlear implants
1150Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
1151The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1152Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
1153Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
1154A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
1155Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
1156Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
1157Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
1158Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
1159Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
1160Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
1161Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1162Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
1163Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
1164The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
1165Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
1166Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
1167Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1168Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
1169Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1170PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
1171Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
1172Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
1173Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
1174Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
1175Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
1176Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
1177Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
1178Oxygen migration in TiO2-based higher-k gate stacks
1179Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
1180Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
1181Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
1182Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
1183Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1184Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1185Study on the resistive switching time of TiO2 thin films
1186Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
1187Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
1188Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
1189Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
1190Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
1191Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
1192Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
1193Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
1194Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1195Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
1196High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
1197Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
1198Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
1199Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
1200Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1201Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
1202Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
1203Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
1204Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
1205Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1206Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
1207Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
1208Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
1209Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
1210Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
1211Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
1212Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
1213Plasma-enhanced atomic layer deposition of BaTiO3
1214Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
1215Plasma-enhanced atomic layer deposition of BaTiO3
1216Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1217Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
1218Mechanical properties of thin-film Parylene-metal-Parylene devices
1219Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
1220Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
1221Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
1222AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
1223Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
1224Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
1225Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
1226Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
1227Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
1228Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
1229Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
1230Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
1231Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
1232A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
1233Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1234Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1235Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
1236Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
1237Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
1238Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
1239Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
1240Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1241A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
1242Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
1243Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
1244Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1245Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
1246Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1247Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
1248Encapsulation method for atom probe tomography analysis of nanoparticles
1249Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1250Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
1251Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1252Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1253Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
1254Plasma-enhanced atomic layer deposition of zinc phosphate
1255Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1256Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
1257AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
1258Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
1259Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
1260Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
1261Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1262Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
1263Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
1264Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
1265Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
1266Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
1267Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
1268Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
1269Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
1270Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
1271Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1272TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
1273Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
1274Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1275Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
1276Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges