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Publication Information

Title: Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry

Type: Journal

Info: ECS J. Solid State Sci. Technol. 2013 volume 2, issue 1, N15-N22

Date: 2012-11-19

DOI: http://dx.doi.org/10.1149/2.024301jss

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range = 150-375C

0-0-0

123927-75-3

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Thickness

Ellipsometry

J.A. Woollam M-2000D

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

AccTec BV

Density

RBS, Rutherford Backscattering Spectrometry

AccTec BV

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Substrates

Si(100)

Keywords

Notes

659


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