About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Deposition Hardware in the Plasma Enhanced Atomic Layer Deposition Publication Database

Plasma enhanced atomic layer deposition derived from earlier thermal ALD research. Early PEALD work was performed primarily on homemade ALD systems further customized with a plasma source. In recent years, multiple vendors have begun offering commercial PEALD systems to researchers. Below is a list of hardware sets identified in the literature. Click on a hardware name to see a list of papers discussing work done on that system.