About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Precursors and Gases in the Plasma Enhanced Atomic Layer Deposition Publication Database

A wide variety of chemical precursors have been investigated for applicability to plasma enhanced atomic layer deposition. Some precursors have proven themselves to be extremely useful while others have failed to yield useful processes. The publications discussing deposition successes will be of critical importance to researchers looking to utilize PEALD films in their work. Deposition failures can be useful as well as they will steer you clear of processes that did not work or provide satisfactory film properties.

Below is a table which lists all the precursor chemicals and plasma gases which have been discussed in the publications included in the plasma-ald.com database so far. Click on the chemical name to get a list of publications that have used that precursor.

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-

123-54-6

-

7440-37-1

-

7782-39-0

-

1333-74-0

-

7440-59-7

-

7439-90-9

-

7440-01-9

-

Unknown

Ag

Al

As

As

7784-42-1

Au

B

Ba

Be

Bi

C

C

74-82-8

Ce

Co

Cr

Cu

Cu

0-0-0

Cu

0-0-0

Dy

Er

F

Fe

Ga

Gd

Gd

126970-21-6

Ge

Hf

Hf, Si

In

Ir

La

Li

Mg

Mn

Mo

N

N

7727-37-9

N

7664-41-7

Na

Nb

Ni

O

O

7732-18-5

O

7782-44-7

O

10028-15-6

P

Pd

Pt

Ru

S

Sb

Sc

Si

Si

0-0-0

Si

1590-87-0

Si

7803-62-5

Sn

Sr

Sr, Ta

Ta

Te

Ti

V

W

Y

Zn

Zr