Precursors and Gases in the Plasma Enhanced Atomic Layer Deposition Publication Database

A wide variety of chemical precursors have been investigated for applicability to plasma enhanced atomic layer deposition. Some precursors have proven themselves to be extremely useful while others have failed to yield useful processes. The publications discussing deposition successes will be of critical importance to researchers looking to utilize PEALD films in their work. Deposition failures can be useful as well as they will steer you clear of processes that did not work or provide satisfactory film properties.

Below is a table which lists all the precursor chemicals and plasma gases which have been discussed in the publications included in the plasma-ald.com database so far. Click on the chemical name to get a list of publications that have used that precursor.

-

-

123-54-6

-

7440-37-1

-

7782-39-0

-

7440-59-7

-

7439-90-9

-

7440-01-9

-

Unknown

Ag

Al

As

Au

B

Ba

Be

Bi

C

C

74-82-8

Ce

Co

Cr

Cu

Cu

0-0-0

Cu

0-0-0

Dy

Er

F

Fe

Ga

Gd

Ge

Hf

Hf, Si

In

Ir

La

Li

Mg

Mn

Mo

N

N

7727-37-9

N

7664-41-7

Nb

Ni

O

O

7732-18-5

O

7782-44-7

O

10028-15-6

P

Pd

Pt

Ru

S

Sb

Si

Si

0-0-0

Si

1590-87-0

Si

7803-62-5

Sn

Sr

Sr, Ta

Ta

Te

Ti

V

W

Y

Zn

Zr