Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

SF6, Sulfur Hexafluoride, CAS# 2551-62-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 4 record(s).

NumberTitle
1Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
2Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
3Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
4Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma