Inductively Coupled Plasma Sources for ALD and Surface Engineering
Plasma ALD, LLC designs and supplies compact 13.56 MHz inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition, thin-film etching, surface cleaning, surface modification, and laboratory plasma research.
Our ICP sources are designed for researchers and equipment manufacturers who need to integrate a high-density, low-pressure plasma source with an existing vacuum chamber, ALD reactor, or custom processing system.
Plasma ALD provides both the plasma-source hardware and the technical expertise needed to integrate it successfully. Support is available for source configuration, vacuum-system integration, RF matching, plasma operation, process development, and troubleshooting.
The source is particularly well suited to PEALD applications requiring remotely generated radicals and ions while maintaining flexibility in plasma power, gas chemistry, pressure, and source-to-substrate configuration.
ICP 300
$9999 base price for US customers - academic discounts available
ICP 300 Specifications
| Parameter | Information |
|---|---|
| Plasma Type | Inductively Coupled Plasma |
| Configuration | Remote cylindrical ICP |
| Primary Applications | Plasma Enhanced ALD, ALE, thin film etch, surface modificiation, surface cleaning, laboratory plasma processes |
| Vacuum Interfaces | ISO 100, 2.75" ConFlat, other |
| Gas Inlet Interface | KF16 bulkhead can be adapted to any standard plasma gas inlet fitting: VCR, compression, NPT, etc. |
| Typical Gases | Ar, He, Ne, Kr, O2, N2, H2O, CO2, CO, N2O, NH3, H2S, mixtures, ... |
| Plasma Tube Material | Quartz standard |
| Pressure Operating Range | 5 - 100mTorr |
| Integration | Existing ALD/vacuum systems |
| Manufacturer | Plasma ALD, LLC |
| Country | USA |
| Technical Support | Integration and process assistance available |
ICP 300 RF Requirements
| Parameter | Information |
|---|---|
| RF Equipment | Not included |
| RF Frequency | 13.56MHz |
| RF Power | Up to 300W |
| Matching Network Details | Automatic L-type designed for 300W, 13.56MHz operation |
| Matching Network Output Connector | HN-type male |
| Matching Network to Plasma Source Cable | RG393 with HN-type connectors no longer than 1 meter |
ICP 300 Additional Requirements
| Parameter | Information |
|---|---|
| Cooling Water for Pasma Coil | 1 lpm |
| Electric Power for Plasma Tube Cooling Fans | 120V AC, Single Phase, 50Hz/60Hz, 0.7A |
| RF Power | Up to 300W |
| Environmental | Indoor, controlled environment operation, 10-90% humidity, 5-40°C, pollution degree 2 |