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Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma

Type:
Journal
Info:
Applied Physics Letters 111, 113105 (2017)
Date:
2017-09-01
DOI:
http://dx.doi.org/10.1063/1.4998577

Author Information

Name Institution
Martijn F. J. VosEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
R. A. SynowickiJ.A. Woollam Co., Inc.
Erwin (W.M.M.) KesselsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology

Films

Plasma AlF

Hardware used: Oxford Instruments FlexAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
SF6, Sulfur Hexafluoride
CAS#: 2551-62-4
Deposition Temperature Range = 50-300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Uniformity
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Characteristic: Density
Analysis: Custom
Diagnostic: Custom

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Optical Properties
Analysis: VUV Spectroscopic Elllipsometry
Diagnostic: J.A. Woollam VUV-SE

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics UBS 4000-UV-VIS

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific KA1066 spectrometer

Substrates

Al2O3
GaP

Notes

1196