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Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 38 record(s).

NumberTitle
1Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
2Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
3Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
4Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
5Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
6Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
8Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
9Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
10Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
11Innovative remote plasma source for atomic layer deposition for GaN devices
12Room-Temperature Atomic Layer Deposition of Platinum
13Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
14Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
15Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
16Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
17Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
18Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
19Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
20Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
21Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
22Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
23Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
24Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
25Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
26Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
27Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
28'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
29Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
30Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
31Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
32Remote Plasma ALD of Platinum and Platinum Oxide Films
33Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
34Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
35Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
36Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
37Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
38Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy