Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 38 record(s).

Number	Title
1	Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
2	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
3	Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
4	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
5	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
6	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
7	Innovative remote plasma source for atomic layer deposition for GaN devices
8	Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
9	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
10	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
11	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
12	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
13	Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
14	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
15	Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
16	Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
17	Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
18	Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
19	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
20	Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
21	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
22	Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
23	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
24	Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
25	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
26	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
27	Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
28	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
29	Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
30	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
31	Room-Temperature Atomic Layer Deposition of Platinum
32	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
33	Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
34	Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
35	Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
36	Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
37	Remote Plasma ALD of Platinum and Platinum Oxide Films
38	Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions