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Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 38 record(s).

NumberTitle
1Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
2Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
3Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
4Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
5Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
6Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
7Innovative remote plasma source for atomic layer deposition for GaN devices
8Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
9Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
10Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
11Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
12Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
13Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
14Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
15Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
16Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
17Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
18Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
19Room-Temperature Atomic Layer Deposition of Platinum
20Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
21Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
22Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
23Remote Plasma ALD of Platinum and Platinum Oxide Films
24Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
25Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
26Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
27Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
28Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
29'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
30Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
31Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
32Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
33Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
34Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
35Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
36Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
37Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
38Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies