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Harm C. M. Knoops Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Harm C. M. Knoops returned 38 record(s).

NumberTitle
1Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
2Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
3Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
4Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
5Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
6Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
7Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
8Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
9'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
10Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
11Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
12Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
13Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
14Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
15Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
16Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
17Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
18Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
19Remote Plasma ALD of Platinum and Platinum Oxide Films
20Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
21Room-Temperature Atomic Layer Deposition of Platinum
22Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
23Innovative remote plasma source for atomic layer deposition for GaN devices
24Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
25Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
26Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
27Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
28Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
29Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
30Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
31Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
32Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
33Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
34Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
35Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
36Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
37Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
38Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer