Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
Info:
Journal of Vacuum Science & Technology A 36, 01B103 (2018)
Author Information
Films
Film/Plasma Properties
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: AFM, Atomic Force Microscopy
Substrates
Notes