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Erwin (W.M.M.) Kessels Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Erwin (W.M.M.) Kessels returned 135 record(s).

NumberTitle
1Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
2Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
3Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
4Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
5Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
6Comparative study of ALD SiO2 thin films for optical applications
7Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
8Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
9Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
10Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
11Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
12Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
13Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
14Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
15Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
16Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
17Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
18Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
19Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
20On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
21Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
22Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
23Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
24Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
25Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
26Anti-stiction coating for mechanically tunable photonic crystal devices
27Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
28Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
29Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
30Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
31Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
32Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
33Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
34Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
35Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
36Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
37Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
38Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
39Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
40Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
41Encapsulation method for atom probe tomography analysis of nanoparticles
42Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
43Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
44In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
45Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
46Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
47Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
48Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
49Innovative remote plasma source for atomic layer deposition for GaN devices
50In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
51Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
52Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
53Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
54Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
55Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
56Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
57Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
58Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
59Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
60Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
61Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
62Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
63Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
64Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
65Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
66Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
67Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
68Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
69Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
70Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
71Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
72Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
73Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
74Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
75Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
76Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
77Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
78Room-Temperature Atomic Layer Deposition of Platinum
79Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
80Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
81Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
82Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
83Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
84The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
85Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
86Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
87Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
88In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
89Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
90Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
91Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
92Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
93Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
94Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
95Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
96Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
97Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
98Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
99Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
100Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
101Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
102Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
103Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
104Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
105Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
106Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
107Remote Plasma ALD of Platinum and Platinum Oxide Films
108Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
109Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
110Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
111Energy-enhanced atomic layer deposition for more process and precursor versatility
112Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation
113Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
114'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
115Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
116Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
117Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
118Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
119Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
120Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
121Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
122Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
123Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
124Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
125Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
126Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
127Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
128Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
129Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
130Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
131Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
132Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
133Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
134Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
135Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas