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Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A103 (2016)
Date:
2015-08-25
DOI:
http://dx.doi.org/10.1116/1.4930161

Author Information

Name Institution
Martijn F. J. VosEindhoven University of Technology
Bart MaccoEindhoven University of Technology
Nick F. W. ThissenEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma MoOx

Hardware used: Custom
Bis(t-butylimido)bis(dimethylamino)molybdenum
CAS#: 923956-62-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 50-350C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific KA1066 spectrometer

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: Singletron

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: Singletron

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Diagnostic: Renishaw Invia Raman

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: PANalytical Xpert PRO MRD X-ray Diffractometer

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova 600i Nanolab

Substrates

Si(100)

Notes

387