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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Bis(t-butylimido)bis(dimethylamino)molybdenum, CAS# 923956-62-1

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 16 record(s).

NumberTitle
1Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
2Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
3Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
4Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
5Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
6Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
7Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
8Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
9Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
10Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
11Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
12Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
13Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
14Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
15Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
16Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma