Inductively coupled plasma sources from Plasma ALD, LLC.


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Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges

Type:
Journal
Info:
Sustainable Energy Fuels, 2017, 1, 30
Date:
2016-12-24

Author Information

Name Institution
Valerio ZardettoEindhoven University of Technology
B. L. WilliamsEindhoven University of Technology
Alberto PerrottaEindhoven University of Technology
Francesco Di GiacomoSolliance Solar Research
Marcel A. VerheijenEindhoven University of Technology
Ronn AndriessenSolliance Solar Research
Erwin (W.M.M.) KesselsEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology

Films

Plasma Al2O3


Thermal Al2O3


Thermal ZnO



CAS#: 7732-18-5

Plasma TiO2


Plasma MoOx


Plasma NiOx


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

MAPbI3, methylammonium lead iodide

Notes

982