Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

(MeCp)2Ni, Ni(C5H4CH3)2, Bis(methylcyclopentadienyl)nickel(II), 1,1'-Dimethylnickelocene, CAS# 1293-95-4

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s).

NumberTitle
1Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
2Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
3Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells