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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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DEZ, diethyl zinc, ZnEt2, CAS# 557-20-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 78 record(s).

NumberTitle
1Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
2ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
3Low-Power Double-Gate ZnO TFT Active Rectifier
4Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
5Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
6Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
7Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
8Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
9Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
10Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
11Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
12Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
13Plasma enhanced atomic layer deposition of zinc sulfide thin films
14Plasma-enhanced atomic layer deposition of zinc phosphate
15The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
16Spectroscopy and control of near-surface defects in conductive thin film ZnO
17Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
18Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
19P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
20Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
21Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
22Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
23The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
24Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
25Encapsulation method for atom probe tomography analysis of nanoparticles
26The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
27Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
28Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
29Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
30A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
31Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
32Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
33New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
34Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
35Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
36Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
37Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
38Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
39The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
40P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
41The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
42Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
43Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
44Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
45Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
46P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
47Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
48Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
49The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
50Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
51Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
52Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
53Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
54Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
55Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
56Top-down fabricated ZnO nanowire transistors for application in biosensors
57Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
58Fast Flexible Plastic Substrate ZnO Circuits
59Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
60Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
61Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
62ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
63Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
64Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
65Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
66Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
67P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
68Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
69Fast PEALD ZnO Thin-Film Transistor Circuits
70Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
71Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
72Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
73All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
74Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
75Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
76Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
77Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
78Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study