About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Plasma enhanced atomic layer deposition of zinc sulfide thin films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B111 (2017)
Date:
2016-10-27
DOI:
http://dx.doi.org/10.1116/1.4967724

Author Information

Name Institution
Jakob KuhsGhent University
Thomas DobbelaereGhent University
Zeger HensGhent University
Christophe DetavernierGhent University

Films

Plasma ZnS

Hardware used: Custom Remote Inductively Coupled Plasma
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature Range = 60-300C

Thermal ZnS

Hardware used: Custom Remote Inductively Coupled Plasma
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
Deposition Temperature Range = 60-300C

Film/Plasma Properties

Characteristic: Transmittance
Analysis: Optical Transmission
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Discover

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Discover

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension Edge

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics QE Pro

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Diagnostic: Hiden HPR-30

Substrates

SiO2
Quartz

Notes

895