About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Custom Remote Inductively Coupled Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Remote Inductively Coupled Plasma hardware returned 131 records.

NumberTitle
1Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
2Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
3Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
4Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
5Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
6Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
7Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition
8Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature
9Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
10Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
11The effect of plasma power on the properties of low-temperature silicon nitride deposited by RPALD for a gate spacer
12Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
13Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
14Plasma-Assisted Atomic Layer Deposition of Palladium
15Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
16In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
17Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
18The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
19Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
20Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
21Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
22Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
23Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
24Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
25Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
26The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
27Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
28Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
29High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
30Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
31Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
32Plasma enhanced atomic layer deposition of aluminum sulfide thin films
33Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
34Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
35Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy
36The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
37Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
38Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
39Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
40Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
41Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
42Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
43The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
44Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
45Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
46Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
47Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
48Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
49Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
50Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
51Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
52Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
53Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
54Experimental and theoretical determination of the role of ions in atomic layer annealing
55Plasma-Enhanced Atomic Layer Deposition of Iron Phosphate as a Positive Electrode for 3D Lithium-Ion Microbatteries
56Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
57Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
58Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
59Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
60Plasma-enhanced atomic layer deposition of zinc phosphate
61Tuning size and coverage of Pd nanoparticles using atomic layer deposition
62Texture of atomic layer deposited ruthenium
63Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
64Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
65Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
66Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
67Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
68Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
69Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
70Improvement of Vth Instability in Normally-Off GaN MIS-HEMTs Employing PEALD-SiNx as an Interfacial Layer
71Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
72Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
73Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
74A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
75Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
76Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
77High-Voltage and Low-Leakage-Current Gate Recessed Normally-Off GaN MIS-HEMTs With Dual Gate Insulator Employing PEALD-SiNx/RF-Sputtered-HfO2
78Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
79Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
80In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
81Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
82Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
83Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
84Room-Temperature Atomic Layer Deposition of Platinum
85Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
86Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
87Plasma enhanced atomic layer deposition of gallium sulfide thin films
88Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
89Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
90TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
91In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
92Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
93Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
94Si atomic layer epitaxy based on Si2H6 and remote He plasma bombardment
95Fundamental beam studies of radical enhanced atomic layer deposition of TiN
96The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
97Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
98Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
99The effects of plasma treatment on the thermal stability of HfO2 thin films
100Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
101Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
102On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
103Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
104Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
105Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
106The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
107Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
108Plasma enhanced atomic layer deposition of cobalt nitride with cobalt amidinate
109Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
110Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
111Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
112The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2
113Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
114Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
115Plasma-enhanced ALD system for SRF cavity
116Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
117Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
118Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
119Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
120Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
121Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
122Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
123Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
124Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
125Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
126Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
127Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
128Plasma enhanced atomic layer deposition of zinc sulfide thin films
129Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
130Characteristics of Nickel Thin Film and Formation of Nickel Silicide by Remote Plasma Atomic Layer Deposition using Ni(iPr-DAD)2
131Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method