Fundamental beam studies of radical enhanced atomic layer deposition of TiN
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 21, 96-105 (2003)
Date:
2002-09-30
Author Information
| Name | Institution |
|---|---|
| Frank Greer | University of California - Berkeley |
| D. Fraser | University of California - Berkeley |
| J. W. Coburn | University of California - Berkeley |
| David B. Graves | University of California - Berkeley |
Films
Plasma TiN
Hardware used: Custom Remote Inductively Coupled Plasma
CAS#: 7550-45-0
CAS#: 7782-39-0
CAS#: 7727-37-9
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Surface Reactions
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer
Substrates
| Silicon |
Notes
| 1226 |