TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 127 record(s).

Number	Title
1	Bipolar Resistive Switching Characteristics of HfO₂/TiO₂/HfO₂ Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
2	Controlling the composition of Ti_1-xAl_xN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
3	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
4	Plasma-enhanced atomic layer deposition for plasmonic TiN
5	Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
6	Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
7	ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
8	Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
9	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
10	Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
11	Fabrication of Highly Ordered and Well-Aligned PbTiO₃/TiN Core-Shell Nanotube Arrays
12	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
13	Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
14	In situ dry cleaning of Si wafer using OF₂/NH₃ remote plasma with low global warming potential
15	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
16	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
17	Plasma Enhanced Atomic Layer Deposition of Al₂O₃ and TiN
18	Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH₃ Plasma
19	Understanding and optimizing the floating body retention in FDSOI UTBOX
20	Fully CMOS BEOL compatible HfO₂ RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
21	Atomic layer deposition of Ru from CpRu(CO)₂Et using O₂ gas and O₂ plasma
22	Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
23	Mechanical characterization of hollow ceramic nanolattices
24	Controllable nitrogen doping in as deposited TiO₂ film and its effect on post deposition annealing
25	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
26	Thermal stability of antiferroelectric-like Al:HfO₂ thin films with TiN or Pt electrodes
27	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
28	Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
29	Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH₃
30	NiCO₂O₄@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
31	Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH₃-Ar-H₂ plasma treatment for capacitor electrodes
32	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
33	Silicon nanowire networks for multi-stage thermoelectric modules
34	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
35	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
36	TiCl₄ as a Precursor in the TiN Deposition by ALD and PEALD
37	Stuffing-enabled surface confinement of silanes used as sealing agents on CF₄ plasma-exposed 2.0 p-OSG films
38	Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
39	Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
40	Annealing behavior of ferroelectric Si-doped HfO₂ thin films
41	Damage free Ar ion plasma surface treatment on In_0.53Ga_0.47As-on-silicon metal-oxide-semiconductor device
42	Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH₃ on Particles Agitated in a Rotary Reactor
43	Microwave properties of superconducting atomic-layer deposited TiN films
44	Nonvolatile Capacitive Crossbar Array for In-Memory Computing
45	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
46	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
47	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
48	Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
49	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
50	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
51	DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
52	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
53	Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
54	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl₄ , SiH₄, and N₂/H₂/Ar Plasma
55	Atomic layer deposition of titanium nitride for quantum circuits
56	Nitride memristors
57	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
58	Plasma-enhanced atomic layer deposition of TiC_x films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
59	Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
60	Excellent resistive switching properties of atomic layer-deposited Al₂O₃/HfO₂/Al₂O₃ trilayer structures for non-volatile memory applications
61	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
62	Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
63	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
64	Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
65	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
66	Antioxidation properties of Ti_0.83Al_0.17N prepared using plasma-enhanced atomic layer deposition
67	Plasma-assisted atomic layer deposition of TiN/Al₂O₃ stacks for metal-oxide-semiconductor capacitor applications
68	A high-density carbon fiber neural recording array technology
69	Atomic layer deposition of titanium nitride from TDMAT precursor
70	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
71	Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO₂
72	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl₄ and N₂/H₂/Ar radicals
73	Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
74	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
75	Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
76	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
77	Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
78	Conformal Formation of (GeTe₂)_(1-x)(Sb₂Te₃)_x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
79	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
80	Tailoring angular selectivity in SiO₂ slanted columnar thin films using atomic layer deposition of titanium nitride
81	New materials for memristive switching
82	Non-destructive acoustic metrology and void detection in 3x50μm TSV
83	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
84	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
85	Sub-10-nm ferroelectric Gd-doped HfO₂ layers
86	Effect of cycling on ultra-thin HfZrO₄, ferroelectric synaptic weights
87	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
88	Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
89	Electron Transport Across Ultrathin Ferroelectric Hf_0.5Zr_0.5O₂ Films on Si
90	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
91	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
92	Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
93	Texture of atomic layer deposited ruthenium
94	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
95	The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
96	Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
97	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
98	Deposition of TiN and HfO₂ in a commercial 200 mm remote plasma atomic layer deposition reactor
99	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO₂/TiN stacks
100	ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
101	Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
102	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
103	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
104	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
105	Atomic Layer Deposition of TiN/Al₂O₃/TiN Nanolaminates for Capacitor Applications
106	Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
107	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
108	ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
109	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
110	Tribological properties of thin films made by atomic layer deposition sliding against silicon
111	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
112	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
113	Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
114	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
115	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
116	In_0.53Ga_0.47As FinFET and GAA-FET With Remote-Plasma Treatment
117	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
118	Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
119	Fully CMOS-compatible titanium nitride nanoantennas
120	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
121	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
122	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
123	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl₄/NH₃ System
124	Plasma Enhanced Atomic Layer Deposition on Powders
125	Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr_1-xHf_xO₂ Thin Film without Using Noble Metal Electrode
126	Film Uniformity in Atomic Layer Deposition
127	A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance

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TiN Plasma Enhanced Atomic Layer Deposition Film Publications