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Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors

Type:
Conference Proceedings
Info:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment Volume 831, 2016, Pages 2 - 6
Date:
2016-03-11
DOI:
http://dx.doi.org/10.1016/j.nima.2016.03.037

Author Information

Name Institution
J. HärkönenHelsinki Institute of Physics
Jennifer OttHelsinki Institute of Physics
Maarit MäkeläUniversity of Hamburg
T. ArsenovichHelsinki Institute of Physics
A. GäddaHelsinki Institute of Physics
T. PeltolaHelsinki Institute of Physics
E. TuovinenHelsinki Institute of Physics
P. LuukkaHelsinki Institute of Physics
E. TuominenHelsinki Institute of Physics
A. JunkesUniversity of Hamburg
Jaakko T. NiinistöUniversity of Helsinki
Mikko K. RitalaUniversity of Helsinki

Films

Plasma TiN

Hardware used: Beneq TFS-200
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature Range N/A

Thermal Al2O3

Hardware used: Beneq TFS-200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

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