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Al2O3 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Al2O3 films returned 489 record(s).

NumberTitle
1Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
2In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
3Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
4Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
5Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
6Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
746-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
8Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
9Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
10Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
11Lifetimes exceeding 1ms in 1-Ohm-cm boron-doped Cz-silicon
12Patterned deposition by plasma enhanced spatial atomic layer deposition
13On the equilibrium concentration of boron-oxygen defects in crystalline silicon
14Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
15A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
16Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
17Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
18The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
19Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
20Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
21Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
22Hafnia and alumina on sulphur passivated germanium
23Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
24AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
25Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
26Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
27Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
28Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
29Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
30TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
31Fiber-matrix interface reinforcement using Atomic Layer Deposition
32Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
33Graphene-based MMIC process development and RF passives design
34Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
35Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
36Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
37Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
38Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
39Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
40Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
41On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
42Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
43Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
44Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
45Improved understanding of recombination at the Si/Al2O3 interface
46Advances in the fabrication of graphene transistors on flexible substrates
47Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
48Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
49Mechanical properties of thin-film Parylene-metal-Parylene devices
50Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
51Graphene photodetectors with a bandwidth >76 GHz fabricated in a 6" wafer process line
52Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
53Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
54Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
55Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
56Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
57High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
58Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
59Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
60AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
61Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
62Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
63Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
64Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
65Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
66A wearable multiplexed silicon nonvolatile memory array using nanocrystal charge confinement
67Breakdown and Protection of ALD Moisture Barrier Thin Films
68Passivation of Al2O3/TiO2 on monocrystalline Si with relatively low reflectance
69Reliability and failure physics of GaN HEMT, MIS-HEMT and p-gate HEMTs for power switching applications: Parasitic effects and degradation due to deep level effects and time-dependent breakdown phenomena
70Nitride passivation of the interface between high-k dielectrics and SiGe
71Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
72High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
73Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
74Simultaneous Roll Transfer and Interconnection of Flexible Silicon NAND Flash Memory
75Capacitance spectroscopy of gate-defined electronic lattices
76ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
77Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
78Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
79Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
80Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
81Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
82DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
83Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process
84Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
85Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
86AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
87Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
88Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
89Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
90Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
91Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
92Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
93Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
94Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
95Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
96Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
97Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
98Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
99Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
100Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
101Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
102Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
103Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
104High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
105AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
106Gate Recessed Quasi-Normally OFF Al2O3/AlGaN/GaN MIS-HEMT With Low Threshold Voltage Hysteresis Using PEALD AlN Interfacial Passivation Layer
107Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
108Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
109Method of Fabrication for Encapsulated Polarizing Resonant Gratings
110Innovative remote plasma source for atomic layer deposition for GaN devices
111AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
112Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
113Device Performances Related to Gate Leakage Current in Al2O3/AlGaN/GaN MISHFETs
114Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
115Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
116Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
117Optical display film as flexible and light trapping substrate for organic photovoltaics
118Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
119A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
120Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
121PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
122Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
123Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
124Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
125Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
126Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
127Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
128Liquid-phase-deposited siloxane-based capping layers for silicon solar cells
129Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
130Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
131AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
132MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
133Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
134A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
135Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
136Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
137Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
138Performance of AlGaN/GaN MISHFET using dual-purpose thin Al2O3 layer for surface protection and gate insulator
139Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
140Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
141Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1421D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
143Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
144Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
145Gate Insulator for High Mobility Oxide TFT
146Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
147Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
148Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
149Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
150Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
151Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
152Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
153Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
154Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
155A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
156Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
157Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
158A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
159Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
160Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
161Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
162Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
163Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
164RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
165Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
166Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
167Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
168Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
169Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
170Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
171Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
172On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
173Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
174CMOS-compatible Replacement Metal Gate InGaAs-OI FinFET With ION= 156 μA/μm at VDD= 0.5 V and IOFF= 100 nA/μm
175Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
176Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
177Protective capping and surface passivation of III-V nanowires by atomic layer deposition
178Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
179Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
180Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
181Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
182Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
183Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
184Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
185Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
186Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
187Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
188Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
189Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
190Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
191Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
192Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
193Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
194Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
195Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
196Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
197Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
198Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
199A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
200Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
201Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
202Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
203Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
204Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
205Influence of Pre and Post-treatments on Plasma Enhanced ALD SiO2 and Al2O3 layers on GaN
206Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
207Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
208Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
209Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
210Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
211High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
212Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
213Improvement on the Passivation Effect of Al2O3 Layer Deposited by PA-ALD in Crystalline Silicon Solar Cells
214Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
215Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
216Device performance tuning of Ge gate-all-around tunneling field effect transistors by means of GeSn: Potential and challenges
217Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
218An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
219Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
220Detailed Atomistic Modeling of Si(110) Passivation by Atomic Layer Deposition of Al2O3
221'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
222Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
223A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
224Low-thermal budget flash light annealing for Al2O3 surface passivation
225Nonvolatile Capacitive Crossbar Array for In-Memory Computing
226Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
227Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
228Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
229Chemically-tunable ultrathin silsesquiazane interlayer for n-type and p-type organic transistors on flexible plastic
230Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
231Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
232Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
233A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
234Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
235Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
236Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
237In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
238Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
239Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
240Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
241Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
242Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
243DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
244Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
245Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
246Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
247Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
248Self-aligned ZnO thin-film transistors with 860 MHz fT and 2 GHz fmax for large-area applications
249Propagation Effects in Carbon Nanoelectronics
250Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
251Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
252Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
253Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
254Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
255Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
256Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
257Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
258Flexible Technologies for Self-Powered Wearable Health and Environmental Sensing
259Flexible, light trapping substrates for organic photovoltaics
260Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
261Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
262Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
263A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
264Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
265Optimization of the Surface Structure on Black Silicon for Surface Passivation
266SiNx passivated GaN HEMT by plasma enhanced atomic layer deposition
267Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
268Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
269Atomic layer deposition of metal-oxide thin films on cellulose fibers
270Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
271Single-Cell Photonic Nanocavity Probes
272Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
273Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
274Oxide TFT LC Oscillators on Glass and Plastic for Wireless Functions in Large-Area Flexible Electronic Systems
275Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
276Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
277Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
278Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
279The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
280Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
281Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
282Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
283Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
284Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
285Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
286Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
287High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
288Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
289Trapped charge densities in Al2O3-based silicon surface passivation layers
290Junction-less nanowire based photodetector: Role of nanowire width
291Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
292Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
293Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
294Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
295Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
296N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
297Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
298Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
299In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
300Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
301Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
302Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
303Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
304Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
305Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
306Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
307Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
308Densification of Thin Aluminum Oxide Films by Thermal Treatments
309Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
310Negative differential resistance in the I-V curves of Al2O3/AlGaN/GaN MIS structures
311Fluorinated polymer-grafted organic dielectrics for organic field-effect transistors with low-voltage and electrical stability
312Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
313Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
314Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
315Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
316Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
317Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
318Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
319Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
320Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
321Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
322Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
323Anti-stiction coating for mechanically tunable photonic crystal devices
324Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
325Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
326Electronic Conduction Mechanisms in Insulators
327Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
328Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
329Energy-enhanced atomic layer deposition for more process and precursor versatility
330In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
331Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
332Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
333Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
334Dynamic tuning of plasmon resonance in the visible using graphene
335Trapping and reliability issues in GaN-based MIS HEMTs with partially recessed gate
336Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
337First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
338Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
339Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
340Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
341Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
342Very high frequency plasma reactant for atomic layer deposition
343Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
344High-Reflective Coatings For Ground and Space Based Applications
345Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
346Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
347Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
348Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
349Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
350Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
351Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
352Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
353Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
354Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
355Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
356Plasma Enhanced Atomic Layer Deposition on Powders
357Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
358Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
359Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
360Fabrication and Characterization of an Extended-Gate AlGaN/GaN-Based Heterostructure Field-Effect Transistor-Type Biosensor for Detecting Immobilized Streptavidin-Biotin Protein Complexes
361Band alignment of Al2O3 with (-201) β-Ga2O3
362Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
363Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
364Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
365Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
366Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
367Fabrication and Characterization of Flexible Thin Film Transistors on Thin Solution-Cast Substrates
368Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
369Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
370Symmetrical Al2O3-based passivation layers for p- and n-type silicon
371Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
372Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
373Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
374Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
375Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
376Electrical Characteristics of Multilayer MoS2 FET's with MoS2/Graphene Heterojunction Contacts
377Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
378Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
379Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
380Tribological properties of thin films made by atomic layer deposition sliding against silicon
381Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
382Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
383Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
384Controlling threshold voltage and leakage currents in vertical organic field-effect transistors by inversion mode operation
385AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
386Hanle-effect measurements of spin injection from Mn5Ge3C0.8/Al2O3-contacts into degenerately doped Ge channels on Si
387New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
388Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
389Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
390Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
391Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
392On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
393Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
394Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
395Photo-Patternable ZnO Thin Films Based on Cross-Linked Zinc Acrylate for Organic/Inorganic Hybrid Complementary Inverters
396Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
397Fast PEALD ZnO Thin-Film Transistor Circuits
398Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
399Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
400Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
401Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
402Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
403Dynamic threshold voltage influence on Ge pMOSFET hysteresis
404Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
405Theoretical and Experimental Investigation of Graphene/High-κ/p-Si Junctions
406Charge effects of ultrafine FET with nanodot type floating gate
407Two-stage permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
408Damage evaluation in graphene underlying atomic layer deposition dielectrics
409Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
410Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
411On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
412Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
413Lithium-Iron (III) Fluoride Battery with Double Surface Protection
414Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
415Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
416Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
417Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
418Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
419Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
420The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
421Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
422Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
423Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
424Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
425Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
426Optical in situ monitoring of plasma-enhanced atomic layer deposition process
427Impact of interface materials on side permeation in indirect encapsulation of organic electronics
428Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
429Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
430Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
431Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
432Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
433Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
434Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
435MANOS performance dependence on ALD Al2O3 oxidation source
436Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
437Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
438In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
439Experimental verification of electro-refractive phase modulation in graphene
440Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
441Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
442Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
443Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
444Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
445Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
446Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
447Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
448Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
449Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
450Low-Power Double-Gate ZnO TFT Active Rectifier
451Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
452Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
453Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
454Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
455Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
456Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
457Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
458Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
459Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
460Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
461Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
462Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
463Passivation effects of atomic-layer-deposited aluminum oxide
464Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
465Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
466Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
467The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
468Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
469Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
470Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
471Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
472Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
473Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
474Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
475Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
476High-efficiency embedded transmission grating
477Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
478Fast Flexible Plastic Substrate ZnO Circuits
479Al2O3/TiO2 nanolaminate gate dielectric films with enhanced electrical performances for organic field-effect transistors
480Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
481On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
482Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
483Residual stress study of thin films deposited by atomic layer deposition
484Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
485Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
486Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer