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Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure

Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 858, 2021, Pages 157713
Date:
2020-10-23

Author Information

Name Institution
A. M. MumlyakovRussian Academy of Sciences
Max V. ShibalovRussian Academy of Sciences
I. V. TrofimovRussian Academy of Sciences
M.G. VerkholetovRussian Academy of Sciences
Alexei P. OrlovRussian Academy of Sciences
G.D. DiudbinRussian Academy of Sciences
S.A. EvlashinSkolkovo Institute of Science and Technology
P.A. NekludovaRussian Academy of Sciences
Y. V. AnufrievRussian Academy of Sciences
A. M. TagachenkovRussian Academy of Sciences
E. V. ZenovaRussian Academy of Sciences
Michael A. TarkhovRussian Academy of Sciences

Films

Plasma Al2O3


Plasma HfO2



Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Mo

Notes

1581