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Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 169 records.

NumberTitle
1Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
2Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
3Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
4Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
5Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
6Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
7On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
8Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
9Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
10Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
11Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
12On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
13Propagation Effects in Carbon Nanoelectronics
14Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
15Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
16Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
17Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
18Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
19Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
20Densification of Thin Aluminum Oxide Films by Thermal Treatments
21Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
22Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
23Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
24Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
25Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
26Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
27Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
28Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
29Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
30Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
31PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
32Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
33Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
34Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
35Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
36Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
37Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
38Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
39Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
40Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
41Energy-enhanced atomic layer deposition for more process and precursor versatility
42The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
43Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
44High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
45Sub-10-nm ferroelectric Gd-doped HfO2 layers
46Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
47Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
48Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
49Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
50Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
51Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
52Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
53Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
54Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
55Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
56Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
57Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
58Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
59Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
60Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
61Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
62Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
63Microwave properties of superconducting atomic-layer deposited TiN films
64Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
65Atomic Layer Deposition of the Conductive Delafossite PtCoO2
66A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
67Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
68Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
69Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
70Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
71Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
72Ferroelectricity in hafnia controlled via surface electrochemical state
73Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
74Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
75NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
76Plasma-enhanced atomic layer deposition of BaTiO3
77Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
78Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
79Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
80Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
81Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
82Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
83Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
84Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
85Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
86Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
87Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
88Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
89Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
90Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
91The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
92Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
93Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
94Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
95Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
96Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
97Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
98Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
991D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
100Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
101In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
102Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
103Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
104Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
105Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
106Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
107Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
108Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
109Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
110Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
111Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
112Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
113Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
114Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
115Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
116Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
117Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
118Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
119Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
120Top-down fabricated ZnO nanowire transistors for application in biosensors
121Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
122High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
123Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
124Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
125Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
126Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
127Comparative study of ALD SiO2 thin films for optical applications
128Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
129Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
130Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
131Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
132Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
133Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
134Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
135Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
136Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
137A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
138A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
139Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
140Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
141Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
142Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
143Topographically selective deposition
144Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
145Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
146Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
147Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
148Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
149Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
150Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
151Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
152Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
153Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
154Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
155The important role of water in growth of monolayer transition metal dichalcogenides
156Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
157Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
158Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
159Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
160Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
161Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
162Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
163Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
164Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
165Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
166The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
167Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
168Plasma-Assisted ALD of LiPO(N) for Solid State Batteries