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Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 169 records.

NumberTitle
1Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
2Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
3Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
4A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
5Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
6Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
7Densification of Thin Aluminum Oxide Films by Thermal Treatments
8Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
9Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
10Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
11Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
12Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
13Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
14Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
15Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
16Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
17Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
18High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
19Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
20Energy-enhanced atomic layer deposition for more process and precursor versatility
21Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
22Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
23Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
24Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
25Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
26Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
27Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
28Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
29A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
30Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
31Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
32Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
33Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
34Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
35Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
36Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
37Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
38Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
39Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
40Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
41Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
42Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
43Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
44Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
45Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
46PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
47Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
48Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
49Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
50Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
51Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
52Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
53Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
54Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
55Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
56Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
57Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
58Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
59Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
60NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
611D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
62Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
63Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
64Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
65Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
66Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
67The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
68Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
69Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
70Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
71Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
72Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
73The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
74Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
75The important role of water in growth of monolayer transition metal dichalcogenides
76Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
77Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
78Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
79Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
80Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
81A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
82Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
83Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
84Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
85Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
86Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
87Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
88Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
89Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
90Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
91Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
92Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
93Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
94Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
95Sub-10-nm ferroelectric Gd-doped HfO2 layers
96Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
97Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
98Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
99Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
100Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
101Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
102Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
103The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
104Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
105Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
106Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
107Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
108Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
109Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
110Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
111Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
112Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
113Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
114Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
115Top-down fabricated ZnO nanowire transistors for application in biosensors
116Propagation Effects in Carbon Nanoelectronics
117Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
118Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
119Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
120Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
121Plasma-enhanced atomic layer deposition of BaTiO3
122Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
123Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
124On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
125Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
126Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
127Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
128Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
129Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
130Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
131Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
132Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
133Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
134Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
135On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
136Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
137Ferroelectricity in hafnia controlled via surface electrochemical state
138Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
139Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
140Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
141Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
142Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
143High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
144Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
145Comparative study of ALD SiO2 thin films for optical applications
146Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
147Microwave properties of superconducting atomic-layer deposited TiN films
148Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
149Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
150In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
151Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
152Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
153Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
154Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
155Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
156Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
157Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
158Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
159Atomic Layer Deposition of the Conductive Delafossite PtCoO2
160Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
161Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
162Topographically selective deposition
163Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
164Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
165Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
166Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
167Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
168Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks