About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Topographically selective deposition

Type:
Journal
Info:
Applied Physics Letters 114, 043101 (2019)
Date:
2019-01-12
DOI:
http://dx.doi.org/10.1063/1.5065801

Author Information

Name Institution
Ahmad ChakerGrenoble Alps University (UGA)
Christophe ValléeGrenoble Alps University (UGA)
Vincent PesceGrenoble Alps University (UGA)
Samia BelahcenGrenoble Alps University (UGA)
Rémi VallatGrenoble Alps University (UGA)
Rémy GassilloudCEA - LETI MINATEC
Nicolas PossemeCEA - LETI MINATEC
Marceline BonvalotGrenoble Alps University (UGA)
Ahmad BsiesyGrenoble Alps University (UGA)

Films

Plasma Ta2O5

Hardware used: Oxford Instruments FlexAL
Tert-Butylimido,Tris(diMEthylamino)Tantalum, Ta[N(CH3)2]3[=NC(CH3)3], TBTMET, TBTDMT
CAS#: 69039-11-8
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Film Sense FS-1 MWE

Characteristic: Sputter Rate
Analysis: Ellipsometry
Diagnostic: Film Sense FS-1 MWE

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Selectivity
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Silicon

Notes

1485