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O2, Oxygen, CAS# 7782-44-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1279 record(s).

NumberTitle
1Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition
2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
3Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
4Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
5Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
6TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
7In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
8Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
9Optimization of the Surface Structure on Black Silicon for Surface Passivation
10Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
11Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition
12Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
13Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
14Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
15Room-Temperature Atomic Layer Deposition of Platinum
16Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
17Optical and Electrical Properties of TixSi1-xOy Films
18Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
19Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
20The size effect of titania-supported Pt nanoparticles on the electrocatalytic activity towards methanol oxidation reaction primarily via the bifunctional mechanism
21All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
22Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
23Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
24Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
25From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
26Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
27Influence of Precursor Density and Conversion Time on the Orientation of Vapor-Deposited ZIF-8
28Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
29Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
30ZrO2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
31Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
32Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
33Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
34Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
35Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
36Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
37Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
38Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
39Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
40Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
41Spectroscopy and control of near-surface defects in conductive thin film ZnO
42Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
43Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
44A Microwave Driven PE-ALD for Ultrathin Al2O3/ZnO Synthesis over Perovskite Layer
45Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
46Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
47Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
48Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
49Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
50Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
51Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
52Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
53Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
54Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
55Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
56Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
57Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
58Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
59Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
60Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
61Electrical characterizations of MIS structures based on variable-gap n(p)-HgCdTe grown by MBE on Si(0 1 3) substrates
62Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
63Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
64Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
65Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
66Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
67Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
68Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
69Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
70Method of Fabrication for Encapsulated Polarizing Resonant Gratings
71Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
72Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
73Optical properties of Y2O3 thin films doped with spatially controlled Er3+ by atomic layer deposition
74Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
75Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
76Graphene based on-chip variable optical attenuator operating at 855 nm wavelength
77Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
78Experimental verification of electro-refractive phase modulation in graphene
79Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
80Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
81PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
82Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
83Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
84Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge(100) prepared by PEALD
85Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
86Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
87Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al2O3 intermediate layer
88Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
89Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
90Symmetrical Al2O3-based passivation layers for p- and n-type silicon
91Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
92'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
93Highly efficient and bending durable perovskite solar cells: toward a wearable power source
94Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
95Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics
96Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
97Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
98Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
99High-efficiency embedded transmission grating
100Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
101Tuning the phase transitions of VO2 thin films on silicon substrates using ultrathin Al2O3 as buffer layers
102Growth of silica nanowires in vacuum
103Densification of Thin Aluminum Oxide Films by Thermal Treatments
104Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
105Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
106Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
107Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
108Remote Plasma ALD of Platinum and Platinum Oxide Films
109Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
110Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
111Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition
112Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
113Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
114A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
115Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4
116Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
117Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
118Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
119Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor
120Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
121Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
122Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
123Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
124Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
125Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
126Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
127Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
128Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
129Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
130Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
131Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
132Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
133Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
134Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
135HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
136Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
137Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
138Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme
139Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
140Normally-off AlGaN/GaN recessed MOS-HEMTs on normally-on epitaxial structures for microwave power applications
141Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
142Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
143MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
144Radical Enhanced Atomic Layer Deposition of Metals and Oxides
145Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
146Damage evaluation in graphene underlying atomic layer deposition dielectrics
147Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
148Effects of N2 RPN on the Structural and Electrical Characteristics of Remote Plasma Atomic Layer-Deposited HfO2 Films
149Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
150Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
151Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
152Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
153Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
154Gate Insulator for High Mobility Oxide TFT
155Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
156Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
157Influence of Al2O3 layer insertion on the electrical properties of Ga-In-Zn-O thin-film transistors
158Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
159Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
160Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
161Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
162Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
163Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
164Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
165Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
166Bipolar resistive switching characteristics of low temperature grown ZnO thin films by plasma-enhanced atomic layer deposition
167Threshold voltage controlled by gate area and gate recess in inverted trapezoidal trigate AlGaN/GaN MOS high-electron-mobility transistors with photoenhanced chemical and plasma-enhanced atomic layer deposition oxides
168Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
169Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
170Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
171Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
172Interfacial Self-Cleaning during PEALD HfO2 Process on GaAs Using TDMAH/O2 with Different (NH4)2S Cleaning Time
173Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
174Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
175Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma
176Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
177Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
178Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
179Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
180Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISHFET
181Atomic layer deposition of ultrathin blocking layer for low-temperature solid oxide fuel cell on nanoporous substrate
182Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
183Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
184Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
185Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
186Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
187Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
188Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films
189Plasma-enhanced atomic layer deposition of zinc phosphate
190Topographically selective deposition
191Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
192A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
193Improved understanding of recombination at the Si/Al2O3 interface
194Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
195Nanostructure and temperature-dependent photoluminescence of Er-doped Y2O3 thin films for micro-optoelectronic integrated circuits
196Modeling of positional plasma characteristics by inserting body tube of optical emission spectroscopy for plasma assisted atomic layer deposition system
197Modal properties of a strip-loaded horizontal slot waveguide
198The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
199Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
200Effect of hydrogen peroxide pretreatment on ZnO-based metal-semiconductor-metal ultraviolet photodetectors deposited using plasma-enhanced atomic layer deposition
201Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
202Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
203Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
204Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
205Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
206Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
207Energy-enhanced atomic layer deposition for more process and precursor versatility
208Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
209Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
210The Effects of Radio Frequency Plasma Power on Al2O3 Films Deposited at Room-Temperature by Remote Plasma Atomic Layer Deposition
211Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
212The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
213Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
214Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
215Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
216Impact of interface materials on side permeation in indirect encapsulation of organic electronics
217Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
218Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell
219Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
220Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
221Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition
222Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
223Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
224Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
225Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
226In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
227Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
228Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
229Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
230Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
231Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
232Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
233Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
234Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
235Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
236Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
237A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
238Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
239Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides
240Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
241Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
242Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
243Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
244Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
245Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
246Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
247Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
248Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
249AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
250Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
251Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
252Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
253New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
254Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
255The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
256TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
257Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
258Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
259Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material
260Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
261Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
262Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
263HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
264Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
265Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
266Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
267Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
268AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
269Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
270Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
271Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
272Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
273Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
274Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
275Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
276Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
277Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
278Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
279The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
280Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
281Plasma-enhanced atomic layer deposition of BaTiO3
282Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
283Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
284Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation
285Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
286Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
287Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
288Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
289A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
290Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
291Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
292Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
293Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
294Remote Plasma Atomic Layer Deposition of HfO2 Thin Films Using the Alkoxide Precursor Hf(mp)4
295Radical Enhanced Atomic Layer Deposition of Metals and Oxides
296Comparative study of ALD SiO2 thin films for optical applications
297Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
298Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
299Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
300Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
301Passivation effects of atomic-layer-deposited aluminum oxide
302Electron Cyclotron Resonance Plasma-Assisted Atomic Layer Deposition of Amorphous Al2O3 Thin Films
303Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
304Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
305Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
306Characteristics of HfO2 thin films grown by plasma atomic layer deposition
307Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
308Remote Plasma Atomic Layer Deposition of Co3O4 Thin Film
309High Performance and Low power Monolithic Three-Dimensional Sub-50 nm Poly Si Thin film transistor (TFTs) Circuits
310Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
311Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
312Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
313Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
314High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
315Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
316Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
317Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
318Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
319Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
320Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
321Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory application
322Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
323In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
324Toward reliable MIS- and MOS-gate structures for GaN lateral power devices
325The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
326Structural characteristics of epitaxial SnO2 films deposited on a- and m-cut sapphire by ALD
327Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
328Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
329Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
330Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
331Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
332Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
333Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
334Optical properties and bandgap evolution of ALD HfSiOx films
335Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
336Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
337In-gap states in titanium dioxide and oxynitride atomic layer deposited films
338Composite materials and nanoporous thin layers made by atomic layer deposition
339The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
340Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
341Bipolar resistive switching in amorphous titanium oxide thin film
342Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO2 Thin Films
343Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
344Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
345Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
346Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
347Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
348High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
349Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
350On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
351Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
352Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
353Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
354Atomic structure of conducting nanofilaments in TiO2 resistive switching memory
355Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
356Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
357Deposition of Al2O3 by Using ECR-ALD for Organic Substrate Devices
358Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
359Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
360Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
361Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
362Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
363Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
364Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
365Charge effects of ultrafine FET with nanodot type floating gate
366Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
367Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
368Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
369Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
370X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
371Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
372Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
373Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
374On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
375Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
376Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
377Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
378Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
379Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
380Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
381Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
382Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
383Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
384Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
385Effects of surface nature of different semiconductor substrates on the plasma enhanced atomic layer deposition growth of Al2O3 gate dielectric thin films
386Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
387Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
388Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
389Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
390Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
391Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
392Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
393Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
394High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
395Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
396Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
397Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
398A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
399Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
400Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2
401Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
402Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
403Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
404Atomic Layer Deposition Al2O3 Thin Films in Magnetized Radio Frequency Plasma Source
405Organic thin-film transistors with sub-10-micrometer channel length with printed polymer/carbon nanotube electrodes
406Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
407Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
408Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
409Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
410Understanding the EOT-Jg degradation in Ru/SrTiOx/Ru metal-insulator-metal capacitors formed with Ru atomic layer deposition
411Mechanical properties of thin-film Parylene-metal-Parylene devices
412Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
413Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
414Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
415A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
416Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
417Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
418On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
419Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
420Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
421Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
422Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
423Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
424PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
425Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
426Magnetic Properties of CoFe2O4 Thin Films Synthesized by Radical-Enhanced Atomic Layer Deposition
427Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
428Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
429Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
430Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
431Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
432Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
433Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
434Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
435Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
436Controlled erbium incorporation and photoluminescence of Er-doped Y2O3
437Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
438In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
439Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
440The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
441In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
442Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
443Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
444Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
445Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
446High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane
447The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
448Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
449Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
450Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
451AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
452Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
453Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
454Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth
455Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells
456The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
457Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
458Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells
459Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
460Impact of Post Fabrication Annealing PEALD ZrO2 for GaN MOSFETs
461Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
462Plasma enhanced atomic layer deposition of Fe2O3 thin films
463Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
464RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
465Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
466Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
467Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
468Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
469Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
470Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
471Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
472Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
473Sub-7-nm textured ZrO2 with giant ferroelectricity
474Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing
475Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
476Plasma-enhanced atomic layer deposition of SnO2 thin films using SnCl4 and O2 plasma
477Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
478Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
479Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
480Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
481Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
482DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors
483Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
484Toward plasma enhanced atomic layer deposition of oxides on graphene: Understanding plasma effects
485Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
486Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
487Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
488Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
489Synthesis and Characterization of BiFeO3 Thin Films for Multiferroic Applications by Radical Enhanced Atomic Layer Deposition
490Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
491XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
492Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
493Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
494Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
495Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
496Ferroelectricity in hafnia controlled via surface electrochemical state
497Terahertz Quantum Plasmonics of Nanoslot Antennas in Nonlinear Regime
498Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
499High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
500Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
501Top-down fabricated ZnO nanowire transistors for application in biosensors
502Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
503Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
504Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
505High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
506Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
507Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
508High-efficiency embedded transmission grating
509Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
510Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
511Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
512Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
513α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
514N-doped TiO2 nanotubes coated with a thin TaOxNy layer for photoelectrochemical water splitting: dual bulk and surface modification of photoanodes
515Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
516Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
517High-Reflective Coatings For Ground and Space Based Applications
518Optical properties and bandgap evolution of ALD HfSiOx films
519Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
520Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
521Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors
522A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
523Optical and Electrical Properties of AlxTi1-xO Films
524Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
525Plasma-Enhanced Atomic Layer Deposition of Zirconium Oxide Thin Films and Its Application to Solid Oxide Fuel Cells
526Remote Plasma ALD of Platinum and Platinum Oxide Films
527Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
528Very high frequency plasma reactant for atomic layer deposition
529Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
530Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
531Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
532Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
533The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
534Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
535Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
536Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
537Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
538Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
539Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
540Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
541Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
542Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
543Integrated Semiconductor/Catalyst Assemblies for Sustained Photoanodic Water Oxidation
544Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
545On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
546Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
547Electrical characterization of the slow boron oxygen defect component in Czochralski silicon
548TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
549Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
550In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
551Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
552Formation of Al2O3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique
553Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
554Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
555Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
556Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium
557Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
558Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
559Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
560On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
561Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
562Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
563Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance-Voltage Measurement
564Nonvolatile Capacitive Crossbar Array for In-Memory Computing
565Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
566On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
567Low Temperature Atomic Layer Deposition of Crystalline In2O3 Films
568Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
569Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
570Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
571Atomic Layer Deposition of Gold Metal
572Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
573Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
574Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
575Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
576Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
577In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
578Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
579Epitaxial 1D electron transport layers for high-performance perovskite solar cells
580Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
581Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
582Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
583Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
584All-oxide thin-film transistors with channels of mixed InOx-ZnOy formed by plasma-enhanced atomic layer deposition process
585Band alignment of Al2O3 with (-201) β-Ga2O3
586Plasma-enhanced atomic layer deposition: Correlating O2 plasma parameters and species to blister formation and conformal film growth
587Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
588In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
589Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
590Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
591Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
592Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
593Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
594Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
595Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
596Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
597Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
598Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
599Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
600Characteristics of Metal-Oxide-Semiconductor Field-Effect Transistors with HfO2/SiO2/Si and HfO2/SiOxNy/Si Stack Structures Formed by Remote Plasma Technique
601Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
602Lithium-Iron (III) Fluoride Battery with Double Surface Protection
603Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
604Synthesis of Pt@TiO2@CNTs Hierarchical Structure Catalyst by Atomic Layer Deposition and Their Photocatalytic and Photoelectrochemical Activity
605Impact of oxygen plasma postoxidation process on Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitors
606Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
607Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
608Properties of nanostructured undoped ZrO2 thin film electrolytes by plasma enhanced atomic layer deposition for thin film solid oxide fuel cells
609Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
610Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
611The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
612Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
613Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
614Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
615Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
616Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
617PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
618Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
619In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
620HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
621Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
622Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
623Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
624Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
625Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
626Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
627An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
628Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
629On the composition of luminescence spectra from heavily doped p-type silicon under low and high excitation
630Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
631Atomic layer deposition of Y2O3 thin films with a high growth per cycle by Ar multiple boost injection
632Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
633Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
634Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
635Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
636Bias stress and humidity exposure of amorphous InGaZnO thin-film transistors with atomic layer deposited Al2O3 passivation using dimethylaluminum hydride at 200°C
637Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
638Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
639Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
640Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
641Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
642Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
643Plasma-enhanced atomic layer deposition of silicon dioxide films using plasma-activated triisopropylsilane as a precursor
644ZrO2 on GaN metal oxide semiconductor capacitors via plasma assisted atomic layer deposition
645Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
646Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
647Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
648In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices
649The effects of layering in ferroelectric Si-doped HfO2 thin films
650Hafnia and alumina on sulphur passivated germanium
651Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
652Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
653Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
654Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
655Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
656Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
657Improvement of smooth surface of RuO2 bottom electrode on Al2O3 buffer layer and characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 capacitors
658Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
659Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
660Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
661Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
662Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
663Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films
664Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
665Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
666Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
667Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
668Al2O3/TiO2 multilayer thin films grown by plasma enhanced atomic layer deposition for organic light-emitting diode passivation
669Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
670Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
671Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
672Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
673Electrical properties of SrTa2O6 thin films by plasma enhanced atomic layer deposition (PEALD)
674Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
675High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
676Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
677Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
678Electrical characteristics of Ga2O3-TiO2 nanomixed films grown by plasma-enhanced atomic-layer deposition for gate dielectric applications
679Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
680Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
681SnO2 nanotubes fabricated using electrospinning and atomic layer deposition and their gas sensing performance
682Transient characterization of the electroforming process in TiO2 based resistive switching devices
683Electrical Characteristics of n, p-In0.53Ga0.47As MOSCAPs With In Situ PEALD-AlN Interfacial Passivation Layer
684Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
685Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
686Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
687Characteristics of Atomic-Layer-Deposited HfO2 Films by Using a Remote Plasma on Pre-Deposited Hf Metal Layer
688Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
689Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
690IrO2 Nanodot Formation by Plasma Enhanced Atomic Layer Deposition as a Charge Storage Layer
691Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
692Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
693Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide
694Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
695Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
696Damage evaluation in graphene underlying atomic layer deposition dielectrics
697Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
698Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
699Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
700Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
701Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
702Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
703Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
704The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
705Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
706Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
707Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density
708Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
709Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications
710PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
711Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
712Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
713Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
714Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
715(Invited) Characteristics of RuO2/TiO2/Al2O3/TiO2/RuO2 Capacitors
716Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
717Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
718Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
719Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition
720Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
721Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
722Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
723Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
724Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
725On the equilibrium concentration of boron-oxygen defects in crystalline silicon
726Electrical characterization and reliability analysis of Al2O3/AlGaN/GaN MISH structure
727Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
728Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
729Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
730Ultra-thin Al2O3 coating on the acid-treated 0.3Li2MnO3·0.7LiMn0.60Ni0.25Co0.15O2 electrode for Li-ion batteries
731Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
732Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2
733Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
734Enhanced electrochemical performance of surface-treated Li[Ni0.8Co0.1Mn0.1]O2 cathode material for lithium-ion batteries
735Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition
736Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
737Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
738Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
739Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
740Dynamic tuning of plasmon resonance in the visible using graphene
741PEALD ZrO2 Films Deposition on TiN and Si Substrates
742Plasma-Enhanced Atomic Layer Deposition of Nanoscale Yttria-Stabilized Zirconia Electrolyte for Solid Oxide Fuel Cells with Porous Substrate
743Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
744Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
745Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
746Capacitance spectroscopy of gate-defined electronic lattices
747Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
748Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
749A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
750Characteristics of remote plasma atomic layer-deposited HfO2 films on O2 and N2 plasma-pretreated Si substrates
751Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
752Plasma-enhanced atomic layer deposition of BaTiO3
753Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
754Moisture barrier and chemical corrosion protection of silver-based telescope mirrors using aluminum oxide films by plasma-enhanced atomic layer deposition
755Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
756Leakage Current Reduction in ALD-Al2O3 Dielectric Deposited on Si by High Pressure Deuterium Oxide Annealing
757Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
758Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
759Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber
760Photovoltaic Rudorffites: Lead-Free Silver Bismuth Halides Alternative to Hybrid Lead Halide Perovskites
761Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
762Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
763Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries
764Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
765Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
766Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
767Fabrication and Properties of GaN MIS Capacitors with a Remote-Plasma Atomic-Layer-Deposited Al2O3 Gate Dielectric
768Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma
769Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
770Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
771Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
772Optical properties and bandgap evolution of ALD HfSiOx films
773Flexible, light trapping substrates for organic photovoltaics
774Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
775Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
776Study on deposition of Al2O3 films by plasma-assisted atomic layer with different plasma sources
777Low temperature temporal and spatial atomic layer deposition of TiO2 films
778Encapsulation method for atom probe tomography analysis of nanoparticles
779Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
780Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
781ZnO Thin Films Fabricated by Plasma-Assisted Atomic Layer Deposition
782Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition
783Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
784Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
785Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
786Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
787Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
788Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
789Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
790The reaction pathways of the oxygen plasma pulse in the hafnium oxide atomic layer deposition process
7911D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
792Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
793Tuning the Ge(Sn) Tunneling FET: Influence of Drain Doping, Short Channel, and Sn Content
794Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
795Tuning size and coverage of Pd nanoparticles using atomic layer deposition
796Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
797DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
798Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
799ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
800Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
801An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
802Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
803Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
804Impact of interface materials on side permeation in indirect encapsulation of organic electronics
805Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
806Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
807Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
808Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
809Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
810Effect of Al2O3 insertion on the electrical properties of SrTiO3 thin films: A comparison between Al2O3-doped SrTiO3 and SrTiO3/Al2O3/SrTiO3 sandwich structure
811Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
812Residual stress study of thin films deposited by atomic layer deposition
813Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer
814Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
815Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
816Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate
817Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
818Trilayer Tunnel Selectors for Memristor Memory Cells
819Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
820Plasma-enhanced atomic layer deposition of SiO2 for channel isolation of colloidal quantum dots phototransistors
821Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
822Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
823Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
824Surface and sensing properties of PE-ALD SnO2 thin film
825Metal-insulator-semiconductor structure using Ga2O3 layer by plasma enhanced atomic layer deposition
826Field-Plated Ga2O3 MOSFETs With a Breakdown Voltage of Over 750 V
827Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
828XPS study of homemade plasma enhanced atomic layer deposited La2O3/ZrO2 bilayer thin films
829Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
830Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
831Stability of effective lifetime of float-zone silicon wafers with AlOx surface passivation schemes under illumination at elevated temperature
832Co/CoP Nanoparticles Encapsulated Within N, P-Doped Carbon Nanotubes on Nanoporous Metal-Organic Framework Nanosheets for Oxygen Reduction and Oxygen Evolution Reactions
833Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate
834Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
835Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
836Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
837Energy-enhanced atomic layer deposition for more process and precursor versatility
838Optical in situ monitoring of plasma-enhanced atomic layer deposition process
839Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
840Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
841PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases
842Patterned deposition by plasma enhanced spatial atomic layer deposition
843Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
844Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
845'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
846Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
847Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
848Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
849Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
850Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition
851Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
852Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
853Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
854Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
855Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
856Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
857Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
858Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
859Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
860Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
861Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
862Deposition and Plasma Measurements of Zr-Oxide Films with Low Impurity Concentrations by Remote PEALD
863Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
864Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
865Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
866First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
867Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process
868Atomic layer deposition of YMnO3 thin films
869Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
870Radical Enhanced Atomic Layer Deposition of Metals and Oxides
871Plasma enhanced atomic layer deposition and laser plasma deposition of ultra-thin ZnO films for Schottky barrier devices
872Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
873Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
874Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
875The important role of water in growth of monolayer transition metal dichalcogenides
876Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
877In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
878Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
879A sub-1-volt analog metal oxide memristive-based synaptic device with large conductance change for energy-efficient spike-based computing systems
880Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
881Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
882A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
883Effects of an Al2O3 capping layer on La2O3 deposited by remote plasma atomic layer deposition
884Designing high performance precursors for atomic layer deposition of silicon oxide
885An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
886The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
887Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
888Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
889Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
890Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
891Multi-functional touch sensors with strained P(VDF-TrFE) deposited on metal oxide thin film transistor
892Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
893Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
894Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
895Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
896Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
897Defect-sealing of Al2O3/ZrO2 multilayer for barrier coating by plasma-enhanced atomic layer deposition process
898Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
899AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
900Radical Enhanced Atomic Layer Deposition of Metals and Oxides
901High-Reflective Coatings For Ground and Space Based Applications
902Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
903Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
904A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
905Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
906Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
907A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
908The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
909Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
910Influence of infrared radiation on the electrical characteristics of the surface-barrier nanostructures based on MBE HgCdTe
911Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
912Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
913Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
914Nonvolatile Capacitive Crossbar Array for In-Memory Computing
915Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
916Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
917Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
918The Effects of Annealing Ambient on the Characteristics of La2O3 Films Deposited by RPALD
919Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
920Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
921Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition
922Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
923Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
924Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
925Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
926Plasma-enhanced atomic layer deposition of BaTiO3
927Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
928Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
929Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
930Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
931Effect of anode morphology on the performance of thin film solid oxide fuel cell with PEALD YSZ electrolyte
932Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
933Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
934A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
935Hafnia and alumina on sulphur passivated germanium
936Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
937A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
938The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
939Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
940Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
941Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
942Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
943Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
944Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
945The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
946A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
947Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
948Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
949Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
950MANOS performance dependence on ALD Al2O3 oxidation source
951Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
952Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
953Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
954Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions
955Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials
956Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
957Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
958Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
959Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
960Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
961Advances in the fabrication of graphene transistors on flexible substrates
962Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
963Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
964Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
965Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
966Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
967Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
968The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
969Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
970ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
971Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
972Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
973Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
974Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
975Influence of Al2O3 Gate Dielectric on Transistor Properties for IGZO Thin Film Transistor
976Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
977Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
978Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
979Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
980Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
981Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
982MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
983Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
984Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
985Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
986Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
987Thermal Stability of ALD HfO2 Thin Films and Interfacial Layers on the Oxynitride Underlayer Formed Using Remote Plasma
988Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
989Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
990Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%
991Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
992Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
993Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
994Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
995Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
996Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
997Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
998Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
999Tube-type plasma-enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%
1000Electrical and optical properties of TiO2 thin films prepared by plasma-enhanced atomic layer deposition
1001Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study
1002Fixed-Gap Tunnel Junction for Reading DNA Nucleotides
1003Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
1004Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
1005Employing Overlayers To Improve the Performance of Cu2BaSnS4 Thin Film based Photoelectrochemical Water Reduction Devices
1006Trapped charge densities in Al2O3-based silicon surface passivation layers
1007Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
1008Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers
1009Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma
1010The "Pure Marriage" between 3D Printing and Well-Ordered Nanoarrays by Using PEALD Assisted Hydrothermal Surface Engineering
1011Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
1012Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
1013Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
1014Minority carrier lifetime limitations in Si wafer solar cells with gallium phosphide window layers
1015Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
1016Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
1017Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1018Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
1019Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
1020Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1021Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping
1022Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum
1023Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
1024Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
1025Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
1026Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
1027Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
1028Characteristics of ZrO2 gate dielectric deposited using Zr(t –butoxide) and Zr(NEt2)4 precursors by plasma enhanced atomic layer deposition method
1029Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
1030Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
1031Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
1032Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
1033Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
1034Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1035Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
1036Radical Enhanced Atomic Layer Deposition of Metals and Oxides
103746-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor
1038Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
1039Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations
1040Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1041Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
1042Systematic efficiency study of line-doubled zone plates
1043Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
1044Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
1045Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
1046Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
1047Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
1048Analysis of dispersive interactions at polymer/TiAlN interfaces by means of dynamic force spectroscopy
1049Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1050Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
1051Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
1052High-Mobility Indium Oxide Thin-Film Transistors by Means of Plasma-Enhanced Atomic Layer Deposition
1053Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
1054ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
1055Permeation barrier properties of an Al2O3/ZrO2 multilayer deposited by remote plasma atomic layer deposition
1056Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
1057Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
1058Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
1059Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
1060Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition
1061Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
1062Energy-enhanced atomic layer deposition for more process and precursor versatility
1063Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
1064Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte
1065Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
1066Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
1067Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
1068Ultraviolet photodetector based on MgxZn1-xO films using plasma-enhanced atomic layer deposition
1069Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1070High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
1071Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
1072Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
1073Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
1074Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
1075Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
1076Atomic Layer Deposition of the Conductive Delafossite PtCoO2
1077Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
1078Effects of N2 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics grown using remote plasma atomic layer deposition methods
1079Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
1080Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
1081Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
1082Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
1083Highly reflective polymeric substrates functionalized utilizing atomic layer deposition
1084Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
1085Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
1086Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1087Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
1088Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
1089Co3O4 as Anode Material for Thin Film µBatteries prepared by Remote Plasma Atomic Layer Deposition
1090Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor
1091Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
1092TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
1093Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1094Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy
1095Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
1096Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
1097Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1098Anti-stiction coating for mechanically tunable photonic crystal devices
1099Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
1100Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
1101Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
1102Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
1103Fiber-matrix interface reinforcement using Atomic Layer Deposition
1104Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
1105Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
1106Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
1107Annealing behavior of ferroelectric Si-doped HfO2 thin films
1108Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
1109Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1110Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1111Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
1112Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
1113Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
1114Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
1115Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1116An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
1117Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
1118Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
1119Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
1120Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
1121Conformality of Al2O3 and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
1122Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
1123Breakdown and Protection of ALD Moisture Barrier Thin Films
1124Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
1125Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
1126Plasma enhanced atomic layer deposition of Ga2O3 thin films
1127Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
1128Innovative remote plasma source for atomic layer deposition for GaN devices
1129Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
1130Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
1131Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
1132Biofilm prevention on cochlear implants
1133Role of low-energy ion irradiation in the formation of an aluminum germanate layer on a germanium substrate by radical-enhanced atomic layer deposition
1134Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
1135Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition
1136Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1137Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
1138Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
1139Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
1140Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
1141Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
1142In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
1143Selective Deposition of Low Temperature AlN Ohmic Contacts for GaN Devices
1144Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
1145Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
1146Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
1147Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
1148Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
1149Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
1150Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
1151Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
1152Enhancement of mobility in ultra-thin-body GeOI p-channel metal-oxide-semiconductor field effect transistors with Si-passivated back interfaces
1153Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
1154Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
1155Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1156Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition
1157Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
1158Oxygen migration in TiO2-based higher-k gate stacks
1159Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
1160Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
1161Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
1162Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
1163Er coordination in Y2O3 thin films studied by extended x-ray absorption fine structure
1164Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
1165Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
1166Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
1167Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
1168Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
1169Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
1170Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
1171Macro-conformality of coatings deposited using high-speed spatial plasma-enhanced atomic layer deposition
1172Surface treatments on AlGaN/GaN heterostructures for gate dielectric Al2O3 thin films grown by Atomic Layer Deposition
1173The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation
1174Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
1175Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
1176Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
1177Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3
1178Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
1179Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
1180Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
1181In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
11823D structure evolution using metastable atomic layer deposition based on planar silver templates
1183Breakdown and Protection of ALD Moisture Barrier Thin Films
1184Effect of an Al2O3/TiO2 Passivation Layer on the Performance of Amorphous Zinc-Tin Oxide Thin-Film Transistors
1185Impedance spectroscopy analysis on the effects of TiO2 interfacial atomic layers in ZnO nanorod polymer solar cells: Effects of interfacial charge extraction on diffusion and recombination
1186Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
1187Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
1188Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
1189Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
1190Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
1191Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
1192Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
1193Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
1194Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
1195Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
1196Flexible Memristive Memory Array on Plastic Substrates
1197Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
1198Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
1199Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
1200Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
1201Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
1202Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
1203Single-Cell Photonic Nanocavity Probes
1204Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
1205Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
1206Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
1207Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
1208Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
1209Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
1210Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
1211Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1212Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
1213Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
1214Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
1215High Energy Density Capacitor By Plasma-Treated ALD BaTiO3 Thin Films
1216Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories
1217Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
1218ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
1219Atomic layer deposition of metal-oxide thin films on cellulose fibers
1220Enhancement-mode AlGaN/GaN MIS-HEMTs with low threshold voltage hysteresis using damage-free neutral beam etched gate recess
1221Effect of annealing conditions on formation of SrRuO3 films by interfacial reaction of SrO/RuO2 bi-layer films
1222Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
1223Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
1224Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
1225Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
1226Electrical Properties of Atomic Layer Deposition HfO2 and HfOxNy on Si Substrates with Various Crystal Orientations
1227Sub-10-nm ferroelectric Gd-doped HfO2 layers
1228Effects of Remote Plasma Pre-oxidation of Si Substrates on the Characteristics of ALD-Deposited HfO2 Gate Dielectrics
1229Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
1230Radical Enhanced Atomic Layer Deposition of Metals and Oxides
1231Structure of Ru/Pt Nanocomposite Films Fabricated by Plasma-Enhanced Atomic Layer Depositions
1232Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
1233Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
1234Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
1235Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
1236The important role of water in growth of monolayer transition metal dichalcogenides
1237Optical display film as flexible and light trapping substrate for organic photovoltaics
1238Optimization of Al2O3/TiO2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
1239Electrical Comparison of HfO2 and ZrO2 Gate Dielectrics on GaN
1240Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
1241Effects of carbon contaminations on Y2O3-stabilized ZrO2 thin film electrolyte prepared by atomic layer deposition for thin film solid oxide fuel cells
1242On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
1243Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
1244Junctionless Gate-All-Around pFETs Using In-situ Boron-Doped Ge Channel on Si
1245Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
1246Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
1247Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
1248Lithium-Iron (III) Fluoride Battery with Double Surface Protection
1249Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
1250Characterizations of Al2O3 gate dielectric deposited on n-GaN by plasma-assisted atomic layer deposition
1251Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
1252Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
1253Residual stress study of thin films deposited by atomic layer deposition
1254Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
1255Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
1256Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
1257Effect of Buffer Layer for HfO2 Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition
1258Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
1259Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
1260On the determination of χ(2) in thin films: a comparison of one-beam second-harmonic generation measurement methodologies
1261Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
1262In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
1263The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
1264Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
1265Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
1266Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
1267Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
1268ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
1269Radical-enhanced atomic layer deposition of Y2O3 via a beta-diketonate precursor and O radicals
1270High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
1271Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
1272Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
1273HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
1274Study on the resistive switching time of TiO2 thin films
1275Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
1276Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
1277Propagation Effects in Carbon Nanoelectronics