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Photochemical Reaction Patterns on Heterostructures of ZnO on Periodically Poled Lithium Niobate

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2016, 8 (39), pp 26365-26373
Date:
2016-09-07
DOI:
http://dx.doi.org/10.1021/acsami.6b06060

Author Information

Name Institution
Manpuneet KaurArizona State University
Qianlang LiuArizona State University
Peter A. CrozierArizona State University
Robert J. NemanichArizona State University

Films

Plasma ZnO

Hardware used: Unknown
DMZ, DiMethylZinc, ZnMe2, Zn(CH3)2
CAS#: 544-97-8
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 130C

Film/Plasma Properties

Characteristic: Thickness
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Ferroelectricity
Analysis: PFM Piezo Force Microscopy
Diagnostic: Asylum Research MFP-3D

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Nova

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: JEOL JEM ARM 200

Substrates

LiNbO3

Notes

887