Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
Info:
The Journal of Chemical Physics 151, 204701 (2019)
Author Information
Films
Film/Plasma Properties
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XRR, X-Ray Reflectivity
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: SEM, Scanning Electron Microscopy
Analysis: SEM, Scanning Electron Microscopy
Analysis: AFM, Atomic Force Microscopy
Analysis: Four-point Probe
Substrates
Notes