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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

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Picosun R200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun R200 hardware returned 72 records.

NumberTitle
1Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
2Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
3Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
4Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
5Measurement and compensation of misalignment in double-sided hard X-ray Fresnel zone plates
6Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
7Exploiting atomic layer deposition for fabricating sub-10nm X-ray lenses
8Light response behaviors of amorphous In-Ga-Zn-O thin-film transistors via in situ interfacial hydrogen doping modulation
9In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
10The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
11Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
12Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
13Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High Efficiency Precursor Design
14Atomic layer deposition of InN using trimethylindium and ammonia plasma
15Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
16Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
17Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
18Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
19Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
20Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
21Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
22The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
23Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2
24Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
25Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
26Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor
27Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
28In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
29Comparative study of ALD SiO2 thin films for optical applications
30Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
31Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition
32AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
33Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
34Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment
35Atomic Layer Deposition of Gold Metal
36High-resolution, high-aspect-ratio iridium-nickel composite nanoimprint molds
37Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition
38Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
39Characterization of CVD graphene permittivity and conductivity in micro-/millimeter wave frequency range
40HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
41High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
42New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell
43Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia
44Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
45Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
46Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
47Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
48Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
49Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
50Tribological properties of thin films made by atomic layer deposition sliding against silicon
51Study of Atomic Layer Deposition of Indium Oxy-sulfide films for Cu(In,Ga)Se2 solar cells
52Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
53Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
54Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
55Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
56Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy
57Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
58Epitaxial GaN using Ga(NMe2)3 and NH3 plasma by atomic layer deposition
59Systematic efficiency study of line-doubled zone plates
60Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
61Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
62Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
63Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode
64Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
65PEALD AlN: controlling growth and film crystallinity
66Plasma enhanced atomic layer deposited platinum thin film on Si substrate with TMA pretreatment
67Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
68Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
69In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
70Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
71Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
72Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor