Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition

Type:
Journal
Info:
Materials 2021, 14, 690
Date:
2021-01-26

Author Information

Name Institution
Pao-Hsun HuangJimei University
Zhi-Xuan ZhangXiamen University
Chia-Hsun HsuXiamen University
Wan-Yu WuDa-Yeh University
Chien-Jung HuangNational University of Kaohsiung
Shui-Yang LienXiamen University

Films

Plasma SnO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy

Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements

Characteristic: Carrier Concentration
Analysis: Hall Measurements

Characteristic: Mobility
Analysis: Hall Measurements

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

soda lime glass
Si(100)

Notes

1646