Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide, CAS# 1066-77-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 23 record(s).

NumberTitle
1Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells
2A New Hole Transport Material for Efficient Perovskite Solar Cells With Reduced Device Cost
3Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
4Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
5Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
6Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
7Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
8Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
9Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
10Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
11Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
12Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
13A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
14In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
15Low-bandgap mixed tin-lead iodide perovskite absorbers with long carrier lifetimes for all-perovskite tandem solar cells
16Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
17Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition
18A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
19Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
20Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
21Water Vapor Treatment of Low-Temperature Deposited SnO2 Electron Selective Layers for Efficient Flexible Perovskite Solar Cells
22Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
23Cost-effective hole transporting material for stable and efficient perovskite solar cells with fill factors up to 82%