A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
Info:
Ceramics International 47 (2021) 34774-34782
Author Information
Films
Film/Plasma Properties
Analysis: XRD, X-Ray Diffraction
Analysis: XRR, X-Ray Reflectivity
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: TEM, Transmission Electron Microscope
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Analysis: AFM, Atomic Force Microscopy
Analysis: UV-VIS Spectroscopy
Substrates
| Silicon |
| PEN, Polyethylene Napthalate |
Notes
| Used one of many available ISAC Research Inc. PEALD systems. |
| 1644 |