Jin-Seong Park Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jin-Seong Park returned 24 record(s).

Number	Title
1	Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N,N'-tert-butyl-1,1-dimethylethylenediamine silylene]
2	A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
3	Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
4	Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
5	Surface and sensing properties of PE-ALD SnO₂ thin film
6	Effect of process parameters on surface morphology and characterization of PE-ALD SnO₂ thin films for gas sensing
7	Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
8	Low temperature SiO_x thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
9	Investigating the interface characteristics of high-k ZrO₂/SiO₂ stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
10	Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
11	Enhancement of the TiO₂ Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
12	Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application
13	Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex
14	Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
15	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
16	Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
17	Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
18	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl₄ , SiH₄, and N₂/H₂/Ar Plasma
19	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl₄ and N₂/H₂/Ar radicals
20	Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
21	A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon-tin oxide by atomic layer deposition
22	Characteristics of Plasma-Enhanced Atomic-Layer Deposited (PEALD) SnO₂ Thin Films
23	Chemistry of SiN_x thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N₂ plasma
24	The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor