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Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Ceramics International 43 (2017) 6580-6584
Date:
2017-02-20
DOI:
https://doi.org/10.1016/j.ceramint.2017.02.089

Author Information

Name Institution
Seung-Hwan LeeHanyang University
Jung-Dae KwonKorea Institute of Materials Science
Ji-Hoon AhnKorea Maritime and Ocean University
Jin-Seong ParkHanyang University

Films

Plasma Nb

Hardware used: Unknown
Niobium Pentafluoride, Niobium(V) fluoride, NbF5
CAS#: 7783-68-8
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 250C

Thermal Nb2O5

Hardware used: Unknown
Niobium Pentafluoride, Niobium(V) fluoride, NbF5
CAS#: 7783-68-8
O3, Ozone
CAS#: 10028-15-6
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Ellipso Technology, UV-FM8

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Advanced Instrument Technology

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Em4sys NX-II

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Diagnostic: ULVAC PHI Inc., PHI 700

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Synchrotron

Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-3600

Characteristic: Carrier Concentration
Analysis: Hall Measurements
Diagnostic: Ecopia HMS-3000

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Diagnostic: Ecopia HMS-3000

Substrates

SiO2
soda lime glass

Notes

1620