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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s).

NumberTitle
1AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
2Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
3Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
4Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
5Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
6RF Characterization of Novel Superconducting Materials and Multilayers
7Evaluation of plasma parameters on PEALD deposited TaCN
8High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
9New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
10Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
11The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
12Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
13Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
14Radical Enhanced Atomic Layer Deposition of Metals and Oxides
15Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
16Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
17Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
18Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
19Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
20Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
21Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
22Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
23Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
24Tuning size and coverage of Pd nanoparticles using atomic layer deposition
25Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
26Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
27Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
28Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
29Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
30Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
31Radical Enhanced Atomic Layer Deposition of Metals and Oxides
32Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
33Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
34Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
35Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
36P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
37Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
38Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
39Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
40Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
41Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
42Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
43Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
44Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
45Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
46Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
47Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
48Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
49RF Characterization of Novel Superconducting Materials and Multilayers
50Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
51New materials for memristive switching
52Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
53Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
54Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
55Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
56Plasma-enhanced atomic layer deposition of Co on metal surfaces
57GeSbTe deposition for the PRAM application
58Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
59The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
60Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
61Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
62Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
63Trilayer Tunnel Selectors for Memristor Memory Cells
64Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
65Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
66Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
67In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
68Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
69ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
70Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
71Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
72Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
73Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
74Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
75Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
76Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
77Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
78Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
79In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
80Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
81Sub-10-nm ferroelectric Gd-doped HfO2 layers
82Nitride memristors
83Gadolinium nitride films deposited using a PEALD based process
84Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
85The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
86Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
87Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
88Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
89Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
90Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
91Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
92Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
93Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
94High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
95Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
96Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
97Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
98Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
99Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
100Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
101Sub-nanometer heating depth of atomic layer annealing
102New materials for memristive switching
103Self-limiting diamond growth from alternating CFx and H fluxes
104Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
105Radical Enhanced Atomic Layer Deposition of Metals and Oxides
106Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
107Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
108Copper-ALD Seed Layer as an Enabler for Device Scaling
109Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
110GeSbTe deposition for the PRAM application
111Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
112Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
113Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
114Radical Enhanced Atomic Layer Deposition of Metals and Oxides
115Atmospheric pressure plasma enhanced spatial ALD of silver
116Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
117Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
118Atomic layer epitaxy of germanium
119Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
120Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
121Radical Enhanced Atomic Layer Deposition of Metals and Oxides
122Nitride memristors
123Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
124Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
125Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
126Plasma enhanced atomic layer deposition of aluminum sulfide thin films
127PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
128Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
129Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
130AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
131Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
132Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
133High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
134Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
135Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
136Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
137Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
138Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
139Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
140Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
141Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
142Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
143Film Uniformity in Atomic Layer Deposition
144Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
145Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
146Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
147Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
148A route to low temperature growth of single crystal GaN on sapphire
149Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
150Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
151Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
152Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
153Remote Plasma ALD of Platinum and Platinum Oxide Films
154Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
155Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
156Plasma-Assisted Atomic Layer Deposition of Palladium
157Radical Enhanced Atomic Layer Deposition of Metals and Oxides
158Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
159AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
160Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
161Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
162Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
163Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
164Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
165Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
166The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
167Structural and optical characterization of low-temperature ALD crystalline AlN
168Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
169Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
170Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
171Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
172Radical Enhanced Atomic Layer Deposition of Metals and Oxides
173Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
174A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
175A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
176Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
177Plasma-Enhanced Atomic Layer Deposition of Ni
178Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
179Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
180Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
181Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
182Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
183The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
184XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
185Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
186Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
187Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
188Plasma-enhanced atomic layer deposition of superconducting niobium nitride
189Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
190Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
191Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
192Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
193Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
194Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
195Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
196In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
197Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
198Study on the characteristics of aluminum thin films prepared by atomic layer deposition
199Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
200Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
201Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
202Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
203ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
204HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
205Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
206Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
207Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
208Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
209Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
210Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
211Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
212Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
213Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
214Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
215Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
216Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
217Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
218Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
219Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
220Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
221Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
222Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
223GeSbTe deposition for the PRAM application
224Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
225In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
226Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
227High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
228Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
229Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
230Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
231Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
232Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
233HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
234Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
235Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
236Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
237Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
238Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
239Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
240Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
241High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
242Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
243Atomic Layer Deposition of Niobium Nitride from Different Precursors
244Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
245In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
246A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
247Formation of aluminum nitride thin films as gate dielectrics on Si(100)
248Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
249Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
250Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
251Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
252Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
253Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
254Hydrogen plasma-enhanced atomic layer deposition of copper thin films
255Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
256GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
257Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
258Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
259TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
260Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
261Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
262Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
263Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
264Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
265Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
266Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
267Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
268Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
269Performance of Samples with Novel SRF Materials and Growth Techniques
270The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
271Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
272Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
273Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
274Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
275Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
276Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
277Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
278Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
279Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
280Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
281Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
282Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
283Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
284A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
285Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
286Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
287Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
288Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
289Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
290Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
291Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
292Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
293WS2 transistors on 300 mm wafers with BEOL compatibility
294Atomic Layer Deposition of Nanolayered Carbon Films
295Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
296Atomic layer epitaxy for quantum well nitride-based devices
297Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
298Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
299Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
300Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
301Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
302Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
303Radical Enhanced Atomic Layer Deposition of Metals and Oxides
304Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
305Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
306Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
307Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
308Room-Temperature Atomic Layer Deposition of Platinum
309A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
310Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
311Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
312Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
313In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
314Atomic layer epitaxy of Si using atomic H
315Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
316Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
317Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
318High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
319In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
320Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
321Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
322The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
323Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
324Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
325GeSbTe deposition for the PRAM application
326Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
327Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
328Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
329Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
330Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
331Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
332Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
333Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
334Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
335Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
336Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
337Microwave properties of superconducting atomic-layer deposited TiN films
338Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
339Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
340Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
341Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
342Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
343Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
344Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
345Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
346Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
347Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
348Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
349Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
350Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
351Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
352Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
353Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
354Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
355Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
356Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
357Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
358Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
359Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
360Fabrication and deformation of three-dimensional hollow ceramic nanostructures
361Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
362Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
363AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
364Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
365Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
366TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
367Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
368Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
369Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
370Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
371Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
372P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
373Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
374Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
375Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
376Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
377Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
378Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
379In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
380Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
381Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
382Plasma-enhanced atomic layer deposition of tungsten nitride
383A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
384Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
385Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
386Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
387Radical Enhanced Atomic Layer Deposition of Metals and Oxides
388Atomic layer epitaxy for quantum well nitride-based devices
389A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
390Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
391In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
392Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
393A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
394Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
395PEALD of Copper using New Precursors for Next Generation of Interconnections
396Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
397Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
398Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
399Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
400Atomic layer epitaxy for quantum well nitride-based devices
401Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
402Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
403Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
404Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
405Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
406Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
407The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
408Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
409Atomic hydrogen-assisted ALE of germanium
410Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
411Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
412P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
413Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
414Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
415Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
416The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
417Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
418In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
419Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
420Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
421Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage