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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s).

NumberTitle
1Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
2Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
3Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
4In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
5Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
6Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
7Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
8P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
9High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
10Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
11Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
12Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
13Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
14Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
15RF Characterization of Novel Superconducting Materials and Multilayers
16Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
17The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
18Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
19Plasma enhanced atomic layer deposition of aluminum sulfide thin films
20Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
21Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
22Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
23Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
24Atmospheric pressure plasma enhanced spatial ALD of silver
25Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
26Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
27The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
28Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
29Formation of aluminum nitride thin films as gate dielectrics on Si(100)
30Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
31Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
32Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
33WS2 transistors on 300 mm wafers with BEOL compatibility
34Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
35Radical Enhanced Atomic Layer Deposition of Metals and Oxides
36Trilayer Tunnel Selectors for Memristor Memory Cells
37Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
38A route to low temperature growth of single crystal GaN on sapphire
39Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
40Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
41Atomic layer epitaxy for quantum well nitride-based devices
42Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
43Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
44Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
45Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
46Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
47Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
48Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
49Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
50Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
51Atomic layer epitaxy of Si using atomic H
52Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
53Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
54Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
55Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
56Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
57Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
58Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
59Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
60Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
61Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
62Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
63Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
64Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
65Remote Plasma ALD of Platinum and Platinum Oxide Films
66Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
67The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
68Radical Enhanced Atomic Layer Deposition of Metals and Oxides
69A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
70Radical Enhanced Atomic Layer Deposition of Metals and Oxides
71XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
72Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
73Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
74In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
75Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
76Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
77Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
78Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
79Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
80Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
81Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
82Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
83Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
84Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
85Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
86Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
87Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
88Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
89Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
90Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
91Atomic Layer Deposition of Niobium Nitride from Different Precursors
92P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
93Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
94Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
95Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
96Study on the characteristics of aluminum thin films prepared by atomic layer deposition
97Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
98Plasma-Assisted Atomic Layer Deposition of Palladium
99Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
100Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
101Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
102Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
103Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
104GeSbTe deposition for the PRAM application
105Plasma-enhanced atomic layer deposition of tungsten nitride
106Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
107Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
108Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
109In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
110Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
111Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
112Atomic layer epitaxy for quantum well nitride-based devices
113Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
114Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
115Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
116Nitride memristors
117Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
118Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
119Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
120Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
121Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
122Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
123Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
124Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
125Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
126Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
127Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
128Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
129In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
130Nitride memristors
131Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
132In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
133Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
134Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
135Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
136Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
137Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
138Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
139Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
140Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
141Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
142Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
143Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
144Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
145Fabrication and deformation of three-dimensional hollow ceramic nanostructures
146Radical Enhanced Atomic Layer Deposition of Metals and Oxides
147Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
148Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
149Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
150Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
151AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
152Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
153Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
154Gadolinium nitride films deposited using a PEALD based process
155AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
156Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
157Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
158Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
159Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
160Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
161Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
162Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
163Room-Temperature Atomic Layer Deposition of Platinum
164Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
165Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
166Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
167High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
168Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
169Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
170Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
171Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
172Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
173Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
174Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
175Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
176GeSbTe deposition for the PRAM application
177Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
178Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
179Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
180GeSbTe deposition for the PRAM application
181Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
182Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
183Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
184Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
185Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
186Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
187Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
188Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
189Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
190Hydrogen plasma-enhanced atomic layer deposition of copper thin films
191Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
192Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
193Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
194Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
195Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
196Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
197Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
198Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
199Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
200Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
201Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
202Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
203Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
204Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
205Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
206Plasma-enhanced atomic layer deposition of Co on metal surfaces
207New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
208Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
209Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
210Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
211Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
212Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
213Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
214Evaluation of plasma parameters on PEALD deposited TaCN
215Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
216The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
217Microwave properties of superconducting atomic-layer deposited TiN films
218Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
219Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
220Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
221Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
222A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
223Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
224Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
225Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
226Atomic hydrogen-assisted ALE of germanium
227Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
228Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
229Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
230Radical Enhanced Atomic Layer Deposition of Metals and Oxides
231Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
232Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
233Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
234Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
235Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
236A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
237New materials for memristive switching
238Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
239Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
240Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
241Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
242Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
243Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
244Sub-10-nm ferroelectric Gd-doped HfO2 layers
245PEALD of Copper using New Precursors for Next Generation of Interconnections
246Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
247Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
248Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
249Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
250In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
251GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
252P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
253A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
254Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
255Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
256Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
257Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
258Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
259Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
260Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
261Atomic layer epitaxy for quantum well nitride-based devices
262Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
263Sub-nanometer heating depth of atomic layer annealing
264Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
265Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
266Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
267Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
268Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
269A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
270In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
271Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
272High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
273Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
274Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
275Film Uniformity in Atomic Layer Deposition
276Plasma-Enhanced Atomic Layer Deposition of Ni
277Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
278Tuning size and coverage of Pd nanoparticles using atomic layer deposition
279Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
280HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
281TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
282Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
283Radical Enhanced Atomic Layer Deposition of Metals and Oxides
284Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
285Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
286A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
287Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
288Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
289The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
290Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
291In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
292Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
293Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
294Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
295Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
296Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
297Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
298Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
299Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
300Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
301Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
302Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
303Plasma-enhanced atomic layer deposition of superconducting niobium nitride
304Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
305Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
306Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
307Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
308Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
309AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
310Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
311Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
312Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
313Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
314Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
315Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
316Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
317Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
318High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
319Atomic layer epitaxy of germanium
320Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
321Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
322Copper-ALD Seed Layer as an Enabler for Device Scaling
323Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
324Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
325Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
326Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
327Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
328TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
329Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
330Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
331The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
332Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
333Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
334Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
335Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
336Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
337Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
338Atomic Layer Deposition of Nanolayered Carbon Films
339Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
340Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
341HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
342Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
343Radical Enhanced Atomic Layer Deposition of Metals and Oxides
344Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
345Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
346Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
347Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
348Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
349High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
350Structural and optical characterization of low-temperature ALD crystalline AlN
351RF Characterization of Novel Superconducting Materials and Multilayers
352Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
353Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
354Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
355Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
356Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
357ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
358Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
359Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
360High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
361Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
362Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
363The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
364The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
365Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
366The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
367Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
368Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
369New materials for memristive switching
370Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
371In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
372Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
373In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
374Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
375Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
376Radical Enhanced Atomic Layer Deposition of Metals and Oxides
377Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
378Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
379Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
380Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
381Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
382Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
383Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
384Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
385Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
386PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
387Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
388Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
389Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
390Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
391Self-limiting diamond growth from alternating CFx and H fluxes
392A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
393Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
394AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
395Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
396ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
397Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
398Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
399Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
400Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
401Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
402Performance of Samples with Novel SRF Materials and Growth Techniques
403Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
404Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
405Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
406Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
407Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
408Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
409GeSbTe deposition for the PRAM application
410Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
411Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
412Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
413Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
414Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
415Radical Enhanced Atomic Layer Deposition of Metals and Oxides
416Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
417Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
418Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
419A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
420Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
421Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition