About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

H2, Hydrogen, CAS# 1333-74-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 461 record(s).

NumberTitle
1The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
2Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
3Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
4Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
5Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
6Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
7Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
8Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
9Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
10Optical emission spectroscopy of gallium phosphide plasma-enhanced atomic layer deposition
11The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
12Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy
13Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
14Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
15Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
16Remote plasma atomic layer deposited Al2O3 4H-SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing
17Gadolinium nitride films deposited using a PEALD based process
18Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
19Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature
20Baking and plasma pretreatment of sapphire surfaces as a way to facilitate the epitaxial plasma-enhanced atomic layer deposition of GaN thin films
21A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
22Plasma-enhanced atomic layer deposition of Cu–Mn films with formation of a MnSixOy barrier layer
23Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
24Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
25Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
26Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
27Metallic Copper Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition of Air Stable Precursors
28TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
29Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
30Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
31Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD
32Highly-Conformal Amorphous W-Si-N Thin Films by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization
33Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
34Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
35Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
36Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
37Plasma Enhanced Atomic Layer Deposition of TiCxNy Film with Various Reactive Gases
38Hydrogen plasma-enhanced atomic layer deposition of copper thin films
39A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
40A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu
41Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
42A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
43Radical Enhanced Atomic Layer Deposition of Metals and Oxides
44Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
45Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
46Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
47Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
48Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
49Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
50Atomic layer epitaxy of germanium
51Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
52Evaluation of Low Temperature Silicon Nitride Spacer for High-k Metal Gate Integration
53Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation
54A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
55Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
56Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
57Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
58High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
59Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
60Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
61Atomic Layer Deposition of Nanolayered Carbon Films
62In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
63Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
64Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
65Plasma-enhanced atomic layer deposition of Ir thin films for copper adhesion layer
66Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
67Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
68AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
69Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
70Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
71Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs
72Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition
73High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
74Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
75Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects
76Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
77GeSbTe deposition for the PRAM application
78Radical Enhanced Atomic Layer Deposition of Metals and Oxides
79New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
80Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition
81AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
82Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
83Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
84Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
85Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
86Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
87The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
88Performance of Samples with Novel SRF Materials and Growth Techniques
89Sub-nanometer heating depth of atomic layer annealing
90Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
91Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
92High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
93Shuffling Atomic Layer Deposition Gas Sequences to Modulate Bimetallic Thin Films and Nanoparticle Properties
94Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas
95Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma
96Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
97Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
98Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
99ALD-grown Ultrathin AlN Film for Passivation of AlGaN/GaN HEMTs
100Radical Enhanced Atomic Layer Deposition of Metals and Oxides
101P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
102Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
103Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
104Radical Enhanced Atomic Layer Deposition of Metals and Oxides
105Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
106Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
107Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
108Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
109Plasma enhanced atomic layer deposition of aluminum sulfide thin films
110Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
111Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
112Advanced characterizations of fluorine-free tungsten film and its application as low resistance liner for PCRAM
113Atomic layer epitaxy of Si using atomic H
114A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
115Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
116Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
117Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
118Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization
119Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
120Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
121Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
122Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
123Alloyed 2D Metal-Semiconductor Atomic Layer Junctions
124Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
125Structural and optical characterization of low-temperature ALD crystalline AlN
126High temperature phase transformation of tantalum nitride films deposited by plasma enhanced atomic layer deposition for gate electrode applications
127Effect of Surface Reduction Treatments of Plasma-Enhanced Atomic Layer Chemical Vapor Deposited TaNx on Adhesion with Copper
128Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
129Plasma-enhanced atomic layer deposition of tantalum nitride thin films using tertiary-amylimido-tris(dimethylamido)tantalum and hydrogen plasma
130Low temperature epitaxial growth of GaP on Si by atomic-layer deposition with plasma activation
131Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
132Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
133A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
134Self-limiting diamond growth from alternating CFx and H fluxes
135Fabrication and deformation of three-dimensional hollow ceramic nanostructures
136Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
137Atmospheric pressure plasma enhanced spatial ALD of silver
138Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
139Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
140Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
141Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
142Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
143Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
144Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
145Radical Enhanced Atomic Layer Deposition of Metals and Oxides
146Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
147Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
148Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
149Work function tuning of plasma-enhanced atomic layer deposited WCxNy electrodes for metal/oxide/semiconductor devices
150TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
151The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
152Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
153Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
154Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
155Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
156Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
157Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
158Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
159Remote Plasma and Thermal ALD of Platinum and Platinum Oxide Films
160Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
161Atomic layer epitaxy for quantum well nitride-based devices
162A route to low temperature growth of single crystal GaN on sapphire
163Radical Enhanced Atomic Layer Deposition of Metals and Oxides
164Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
165Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
166Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
167Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
168HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
169Plasma-enhanced atomic layer deposition of Co on metal surfaces
170In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
171Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents
172Electrical characteristics and step coverage of ZrO2 films deposited by atomic layer deposition for through-silicon via and metal-insulator-metal applications
173Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics
174Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
175Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu
176Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
177Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
178Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
179Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
180Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
181Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
182Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
183PEALD-Grown Crystalline AlN Films on Si(100) with Sharp Interface and Good Uniformity
184Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
185Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
186Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H2-plasma
187Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
188Film Uniformity in Atomic Layer Deposition
189Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
190Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films
191Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
192PEALD of Copper using New Precursors for Next Generation of Interconnections
193Structure-property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition
194Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
195Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
196Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
197Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
198Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
199Tuning size and coverage of Pd nanoparticles using atomic layer deposition
200Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition
201A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
202Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
203Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition
204Influence of plasma on electrophysical properties of the GaP/n-Si isotype heterojunction grown by PE-ALD
205Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
206Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
207Plasma-enhanced atomic layer deposition of palladium on a polymer substrate
208Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
209Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
210Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
211Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
212Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
213Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
214Nitride memristors
215Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
216Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
217Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
218Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
219Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
220P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
221Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
222High performance graphene field effect transistors on an aluminum nitride substrate with high surface phonon energy
223Plasma-Enhanced Atomic Layer Deposition of Ni
224HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
225In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
226Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
227Effects of H2 plasma and annealing on atomic-layer-deposited Al2O3 films and Al/Al2O3/Si structures
228Crystal AlN deposited at low temperature by magnetic field enhanced plasma assisted atomic layer deposition
229Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
230Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
231Polarization charge properties of low-temperature atomic layer deposition of AlN on GaN
232RF Characterization of Novel Superconducting Materials and Multilayers
233Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma
234Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
235Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper
236Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
237GeSbTe deposition for the PRAM application
238Atomic Layer Deposition of Niobium Nitride from Different Precursors
239Hot-wire assisted ALD of tungsten films: In-situ study of the interplay between CVD, etching, and ALD modes
240Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
241Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
242In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
243In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
244Effective work function tunability and interfacial reactions with underlying HfO2 layer of plasma-enhanced atomic layer deposited TaCxNy films
245Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
246Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
247Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
248Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
249Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
250Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
251Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
252Plasma-enhanced atomic layer deposition of superconducting niobium nitride
253Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl
254New materials for memristive switching
255Radical Enhanced Atomic Layer Deposition of Metals and Oxides
256XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
257Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
258In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
259Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
260Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
261Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
262Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
263Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces
264Radical Enhanced Atomic Layer Deposition of Metals and Oxides
265Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
266Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
267Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
268WS2 transistors on 300 mm wafers with BEOL compatibility
269Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
270Electron Enhanced Growth of Crystalline Gallium Nitride Thin Films at Room Temperature and 100°C Using Sequential Surface Reactions
271Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
272Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
273Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
274Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
275Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
276Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
277The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
278Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
279Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
280AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
281Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
282Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
283Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
284Atomic layer epitaxy of gallium arsenide with the use of atomic hydrogen
285Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
286Low temperature depositions of GaN thin films by plasma-enhanced atomic layer deposition
287Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
288Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
289Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
290Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
291Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
292Improved electrical performances of plasma-enhanced atomic layer deposited TaCxNy films by adopting Ar/H2 plasma
293Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
294Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
295Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
296Atomic layer epitaxy for quantum well nitride-based devices
297Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers
298Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
299Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
300Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
301Atomic Layer Epitaxy of Group IV Materials: Surface Processes, Thin Films, Devices and Their Characterization
302Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
303In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
304Plasma-Assisted Atomic Layer Deposition of Palladium
305Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
306Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
307Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
308Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition
309ZrO2-coated SiC nanowires prepared by plasma-enhanced atomic layer chemical vapor deposition
310Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
311Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
312Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant
313Copper-ALD Seed Layer as an Enabler for Device Scaling
314Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
315Characterization of Ultrathin PEALD-Grown RuCo Films for Diffusion Barrier and Copper Direct-Plate Applications
316Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
317In Situ Two-Step Plasma Enhanced Atomic Layer Deposition of Ru/RuNx Barriers for Seedless Copper Electroplating
318GeSbTe deposition for the PRAM application
319Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
320The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
321Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
322Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
323Remote Plasma ALD of Platinum and Platinum Oxide Films
324Fabrication and properties of AlN film on GaN substrate by using remote plasma atomic layer deposition method
325Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
326Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
327Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
328Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
329RF Characterization of Novel Superconducting Materials and Multilayers
330The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
331Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
332Atomic layer epitaxy for quantum well nitride-based devices
333Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
334Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
335Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering
336High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
337Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
338Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
339Comparison of tungsten films grown by CVD and hot-wire assisted atomic layer deposition in a cold-wall reactor
340Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
341Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
342Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
343Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
344Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
345New materials for memristive switching
346Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
347Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
348In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
349Formation of aluminum nitride thin films as gate dielectrics on Si(100)
350Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition
351Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
352Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
353Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
354Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
355In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
356Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
357Atomic hydrogen-assisted ALE of germanium
358Trilayer Tunnel Selectors for Memristor Memory Cells
359AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
360Radical Enhanced Atomic Layer Deposition of Metals and Oxides
361Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
362Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
363Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
364GeSbTe deposition for the PRAM application
365P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
366Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications
367Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
368Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
369Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
370Direct Plating of Cu on Pd Plasma Enhanced Atomic Layer Deposition Coated TaN Barrier
371Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
372Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
373Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
374Atomic layer epitaxy of Si on Ge(100) using Si2Cl6 and atomic hydrogen
375Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
376Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates
377Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
378Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
379Sub-10-nm ferroelectric Gd-doped HfO2 layers
380Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
381Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
382Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
383Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
384Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
385Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
386Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
387Gas-phase-reaction-controlled atomic-layer-epitaxy of silicon
388Plasma-enhanced atomic layer deposition of tungsten nitride
389The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
390Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
391Characteristics of Cobalt Thin Films Deposited by Remote Plasma ALD Method with Dicobalt Octacarbonyl
392Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition
393Remote Plasma Atomic Layer Deposition of SiNx Using Cyclosilazane and H2/N2 Plasma
394Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
395Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
396Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
397Plasma Enhanced Atomic Layer Deposition of TaN Films for Advanced Interconnects
398Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
399Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
400Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
401Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]
402Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
403Hydrogen-plasma-assisted hybrid atomic layer deposition of Ir thin film as novel Cu diffusion barrier
404Enhanced Methanol Oxidation with Annealed Atomic Layer Deposited Platinum Nanoparticles on Carbon Nanotubes
405Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
406Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5 Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
407Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor
408Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
409Nitride memristors
410GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
411Atomic-layer selective deposition of silicon nitride on hydrogen-terminated Si surfaces
412Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
413Microwave properties of superconducting atomic-layer deposited TiN films
414The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
415Room-Temperature Atomic Layer Deposition of Platinum
416Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
417Study on the characteristics of aluminum thin films prepared by atomic layer deposition
418Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
419Evaluation of plasma parameters on PEALD deposited TaCN
420Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
421Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma