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Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology

Type:
Journal
Info:
J. Phys. Chem. C, 2021, 125 (17), pp 9383-9390
Date:
2021-04-21
DOI:
http://dx.doi.org/10.1021/acs.jpcc.1c00429

Author Information

Name Institution
Julia D. LenefUniversity of Michigan
Jaesung JoUniversity of Michigan
Orlando TrejoUniversity of Michigan
David J. MandiaUniversity of Michigan
Rebecca L. PetersonUniversity of Michigan
Neil P. DasguptaUniversity of Michigan

Films

Plasma CuOx

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Bis(N,N'-di-sec-butylacetamidinato)dicopper(I), copper(I)-N,N'-di-sec-butylacetamidinate
CAS#: 695188-31-9
O2, Oxygen
CAS#: 7782-44-7
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: Rigaku Smartlab

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Optical Bandgap
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Hitachi SU-8000

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova NanoSEM 650

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension ICON

Characteristic: Chemical Composition, Impurities
Analysis: XANES, X-ray Absorption Near-Edge Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Diagnostic: HP 4156A

Substrates

SiO2

Notes

1663