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Veeco - Ultratech - Cambridge NanoTech Fiji Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Veeco - Ultratech - Cambridge NanoTech Fiji hardware returned 272 records.

NumberTitle
1Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
2Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures
3Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
4Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
5Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
6RF Characterization of Novel Superconducting Materials and Multilayers
7Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
8Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
9Effects of Fast Neutrons on the Electromechanical Properties of Materials Used in Microsystems
10Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
11Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
12Investigation of AlGaN/GaN HEMTs Passivated by AlN Films Grown by Atomic Layer Epitaxy
13Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
14ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
15Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
16Nonvolatile Capacitive Crossbar Array for In-Memory Computing
17AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
18New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
19Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
20Effects of radiation and cryogenic temperatures on the electromechanical properties of materials used in microsystems
21Parallel preparation of plan-view transmission electron microscopy specimens by vapor-phase etching with integrated etch stops
22The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells
23Structural properties of AlN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
24Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties
25Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
26Suppression of GeOx interfacial layer and enhancement of the electrical performance of the high-K gate stack by the atomic-layer-deposited AlN buffer layer on Ge metal-oxide-semiconductor devices
27Gate-tunable high mobility remote-doped InSb/In1-xAlxSb quantum well heterostructures
28Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
29Damage evaluation in graphene underlying atomic layer deposition dielectrics
30On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
31Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
32Improving Thermal Stability and Interface State Density of High-k Stacks by Incorporating Hf into an Interfacial Layer on p-Germanium
33Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
34Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
35Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
36Sub-nanometer heating depth of atomic layer annealing
37Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
38Self-limiting growth of GaN using plasma-enhanced atomic layer deposition
39Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
40Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
41Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
42Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
43Plasma-enhanced atomic layer deposition of vanadium nitride
44Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
45Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
46Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
47Atomic layer epitaxy for quantum well nitride-based devices
48Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
49Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
50DC characteristics of ALD-grown Al2O3/AlGaN/GaN MIS-HEMTs and HEMTs at 600°C in air
51Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
52Efficient Modification of Metal Oxide Surfaces with Phosphonic Acids by Spray Coating
53Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
54Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
55Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure
56Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors
57Induction of ferroelectricity in nanoscale ZrO2 thin films on Pt electrode without post-annealing
58P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
59Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
60Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
61Integration of microwave-annealed oxidation on germanium metal-oxide-semiconductor devices
62Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
63In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
64Aluminum Oxide at the Monolayer Limit via Oxidant-Free Plasma-Assisted Atomic Layer Deposition on GaN
65Characterization of hafnium oxide resistive memory layers deposited on copper by atomic layer deposition
66Annealing behavior of ferroelectric Si-doped HfO2 thin films
67Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
68Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
69Self-aligned tip deinsulation of atomic layer deposited Al2O3 and parylene C coated Utah electrode array based neural interfaces
70Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
71AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
72Enhanced electron field emission properties of high aspect ratio silicon nanowire-zinc oxide core-shell arrays
73Plasma-assisted atomic layer deposition of Al2O3 and parylene C bi-layer encapsulation for chronic implantable electronics
74Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
75Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
76Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
77Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
78Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
79Biofilm prevention on cochlear implants
80Mechanical properties of thin-film Parylene-metal-Parylene devices
81Phase Control of Crystalline Ga2O3 Films by Plasma-Enhanced Atomic Layer Deposition
82Excellent surface passivation of crystalline silicon by ternary AlxMg1-xOy thin films
83Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
84Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
85Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
86Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
87Single-Cell Photonic Nanocavity Probes
88Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods
89Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
90AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
91Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
92Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
93Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
94Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
95Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
96Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers
97Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
98Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
99ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
100ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
101Programmable on-chip DNA compartments as artificial cells
102Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
103Band alignment of Al2O3 with (-201) β-Ga2O3
104Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
105Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
106Tailoring Electron-Transfer Barriers for Zinc Oxide/C60 Fullerene Interfaces
107Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
108Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
109Plasma-enhanced atomic layer deposition of tungsten nitride
110Ultrathin Surface Coating Enables the Stable Sodium Metal Anode
111Atomic layer deposited Al2O3 and parylene C dual-layer encapsulation for biomedical implantable devices
112Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
113Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
114Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
115Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
116GaN metal-insulator-semiconductor high-electron-mobility transistor with plasma enhanced atomic layer deposited AlN as gate dielectric and passivation
117Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
118Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
119In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
120Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
121Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
122Aluminum oxide – n-Si field effect inversion layer solar cells with organic top contact
123Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
124High breakdown voltage in AlN/GaN metal-insulator-semiconductor high-electron-mobility transistors
125Atomic layer deposition of metal-oxide thin films on cellulose fibers
126Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
127Atomic Layer Deposition of the Solid Electrolyte LiPON
128Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
129Using top graphene layer as sacrificial protection during dielectric atomic layer deposition
130Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
131Atomic layer deposition of titanium nitride for quantum circuits
132Plasma-enhanced atomic layer deposition of titanium vanadium nitride
133Use of a passivation layer to improve thermal stability and quality of a phosphorene/AZO heterojunction diode
134Design and development of nanoimprint-enabled structures for molecular motor devices
135Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
136Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
137Near room-temperature direct encapsulation of organic photovoltaics by plasma-based deposition techniques
138Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
139Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
140Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers Via Plasma-Enhanced Atomic Layer Deposition
141Plasma-enhanced atomic layer deposition of superconducting niobium nitride
142Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
143Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries
144Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
145Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
146The influence of N2/H2 and ammonia N source materials on optical and structural properties of AlN films grown by plasma enhanced atomic layer deposition
147Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
148Fiber-matrix interface reinforcement using Atomic Layer Deposition
149Atomic Layer Epitaxy AlN for Enhanced AlGaN/GaN HEMT Passivation
150Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
151Self-Limiting Growth of GaN at Low Temperatures
152Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
153The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
154Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
155Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
156Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
157Lytic enzymes as selectivity means for label-free, microfluidic and impedimetric detection of whole-cell bacteria using ALD-Al2O3 passivated microelectrodes
158Rutile-structured TiO2 deposited by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium precursor on in-situ oxidized Ru electrode
159In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics
160Atomic layer deposition of GaN at low temperatures
161Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy
162Lithium-Iron (III) Fluoride Battery with Double Surface Protection
163Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition
164Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
165Nanocrystallite Seeding of Metastable Ferroelectric Phase Formation in Atomic Layer-Deposited Hafnia-Zirconia Alloys
166Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
167Influence of the polymeric substrate on the water permeation of alumina barrier films deposited by atomic layer deposition
168Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
169Evaluating the Impact of Thermal Annealing on Al2O3/c-Si Interface Properties by Non-Destructive Measurements
170The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
171Atomic layer deposited (ALD) SnO2 anodes with exceptional cycleability for Li-ion batteries
172The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
173Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
174Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
175Conformal Fe, Co and Ni Films from Oxides and Nitrides Grown by Atomic Layer Deposition
176Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
177ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent
178Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
179Impact of interface materials on side permeation in indirect encapsulation of organic electronics
180Perspectives on future directions in III-N semiconductor research
181Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
182Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
183Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
184Plasma-induced sub-10nm Au-SnO2-In2O3 heterostructures fabricated by atomic layer deposition for highly sensitive ethanol detection on ppm level
185A high-density carbon fiber neural recording array technology
186Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
187Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
188Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
189Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
190Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
191Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
192The effects of layering in ferroelectric Si-doped HfO2 thin films
193Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200°C
194Comparison of passivation layers for AlGaN/GaN high electron mobility transistors
195Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes
196Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
197Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
198Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
199ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
200Fully CMOS-compatible titanium nitride nanoantennas
201Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
202Performance of Samples with Novel SRF Materials and Growth Techniques
203Low temperature deposition of Ga2O3 thin films using trimethylgallium and oxygen plasma
204Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
205Synthesis of bio-inspired multilayer polarizers and their application to anti-counterfeiting
206Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
207The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
208Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
209A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition
210Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
211A Capacitance-to-Frequency Converter with On-Chip Passivated Microelectrodes for Bacteria Detection in Saline Buffers up to 575 MHz
212Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
213Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition
214The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain
215Incorporating Yttrium into a GeO Interfacial Layer with HfO2-Based Gate Stack on Ge
216Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors
217Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic application
218An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
219High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
220Serpentine geometry for enhanced performance of nanometer-thin platinum bolometers
221Improved Electrical Properties of Crystalline ZrO2/Al2O3 Buffer Gate Stack with Double Nitridation
222Impact of degradable nanowires on long-term brain tissue responses
223Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
224Passivation effects of atomic-layer-deposited aluminum oxide
225Preparation of Al2O3 and AlN Nanotubes by Atomic Layer Deposition
226Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
227Tuning The Photoactivity of Zirconia Nanotubes-Based Photoanodes via Ultrathin Layers of ZrN: An Effective Approach toward Visible-Light Water Splitting
228AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
229Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
230Sub-7-nm textured ZrO2 with giant ferroelectricity
231Plasma-enhanced atomic layer deposition of ruthenium metal on free-standing carbon nanotube forest for 3D flexible binder-less supercapacitor electrodes
232Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
233Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
234Low-Leakage Tetragonal ZrO2 (EOT < 1 nm) With In Situ Plasma Interfacial Passivation on Germanium
235Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
236Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
237Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
238TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
239Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
240Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
241Long-Term Bilayer Encapsulation Performance of Atomic Layer Deposited Al2O3 and Parylene C for Biomedical Implantable Devices
242Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
243Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films
244Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
245Effect of postdeposition annealing on the electrical properties of beta-Ga2O3 thin films grown on p-Si by plasma-enhanced atomic layer deposition
246A fully integrated electronic platform for multiplexed intermolecular force spectroscopy