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Plasma-Enhanced Atomic Layer Deposition of Ultrathin Oxide Coatings for Stabilized Lithium-Sulfur Batteries

Type:
Journal
Info:
Advanced Energy Materials Volume 3, Issue 10, pages 1308-1315, October, 2013
Date:
2013-06-12
DOI:
http://dx.doi.org/10.1002/aenm.201300253

Author Information

Name Institution
Hyea KimGeorgia Institute of Technology
Jung Tae LeeGeorgia Institute of Technology
Dong-Chan LeeGeorgia Institute of Technology
Alexandre MagasinskiGeorgia Institute of Technology
Won-il ChoKorea Institute of Science and Technology
Gleb YushinGeorgia Institute of Technology

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 170C

Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: Zeiss Ultra 60 FE-SEM

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Ultra 60 FE-SEM

Substrates

Carbon Fiber

Notes

Ultratech Fiji PEALD Al2O3 for enhanced Li-S battery cycle stability.
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