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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Lithium-Iron (III) Fluoride Battery with Double Surface Protection

Type:
Journal
Info:
Advanced Energy Materials Volume 8, Issue 26, 2018
Date:
2018-06-15

Author Information

Name Institution
Enbo ZhaoGeorgia Institute of Technology
Oleg BorodinU.S. Army Research Laboratory
Xiaosi GaoGeorgia Institute of Technology
Danni LeiGeorgia Institute of Technology
Yiran XiaoGeorgia Institute of Technology
Xiaolei RenGeorgia Institute of Technology
Wenbin FuGeorgia Institute of Technology
Alexandre MagasinskiGeorgia Institute of Technology
Kostiantyn TurcheniukGeorgia Institute of Technology
Gleb YushinGeorgia Institute of Technology

Films

Plasma Al2O3




Film/Plasma Properties

Characteristic: Battery Properties
Analysis: Charge/Discharge Cycling

Substrates

CNTs, Carbon NanoTubes
FeF3

Notes

1426