Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
Author Information
| Name | Institution |
|---|---|
| Hyo Jin Kim | Stanford University |
| Kirsten E. Kaplan | Stanford University |
| Peter Schindler | Stanford University |
| Shicheng Xu | Stanford University |
| Martin M. Winterkorn | Stanford University |
| David B. Heinz | Stanford University |
| Timothy S. English | Stanford University |
| J Provine | Stanford University |
| Fritz B. Prinz | Stanford University |
| Thomas W. Kenny | Stanford University |
Films
Plasma Al2O3
Plasma TiO2
Plasma Pt
Film/Plasma Properties
Substrates
| Al2O3 |
| TiO2 |
Notes
| 1251 |