Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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ALD Protection of Li-Metal Anode Surfaces - Quantifying and Preventing Chemical and Electrochemical Corrosion in Organic Solvent

Type:
Journal
Info:
Adv. Matls. Interfaces 3(21) 2016
Date:
2016-08-24
DOI:
http://dx.doi.org/10.1002/admi.201600426

Author Information

Name Institution
Chuan-Fu LinUniversity of Maryland
Alexander Campbell KozenUniversity of Maryland
Malachi NokedUniversity of Maryland
Chanyuan LiuUniversity of Maryland
Gary W. RubloffUniversity of Maryland

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Substrates

Li

Notes

916