Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
Type:
Journal
Info:
J. Vac. Sci. Technol. A 36(6), Nov/Dec 2018
Date:
2018-10-18
Author Information
| Name | Institution |
|---|---|
| Igor Krylov | Technion-Israel Institute of Technology |
| Xianbin Xu | Technion-Israel Institute of Technology |
| Ekaterina Zoubenko | Technion-Israel Institute of Technology |
| Kamira Weinfeld | Technion-Israel Institute of Technology |
| Santiago Boyeras | National Scientific and Technical Research Council (CONICET)/National Technology University (UTN-FRBA) |
| Felix Palumbo | National Scientific and Technical Research Council (CONICET)/National Technology University (UTN-FRBA) |
| Moshe Eizenberg | Technion-Israel Institute of Technology |
| Dan Ritter | Technion-Israel Institute of Technology |
Films
Plasma TiN
Plasma TiN
Plasma TiN
Plasma TiN
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| SiO2 |
Notes
| 1197 |