Moshe Eizenberg Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Moshe Eizenberg returned 10 record(s).

Number	Title
1	Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
2	Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
3	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
4	Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
5	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
6	A comparative study of AlN and Al₂O₃ based gate stacks grown by atomic layer deposition on InGaAs
7	Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
8	A comparison between HfO₂/Al₂O₃ nano-laminates and ternary Hf_xAl_yO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
9	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
10	Work function tuning of plasma-enhanced atomic layer deposited WC_xN_y electrodes for metal/oxide/semiconductor devices