Igor Krylov Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Igor Krylov returned 9 record(s).

Number	Title
1	Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
2	Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
3	Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
4	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
5	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
6	A comparison between HfO₂/Al₂O₃ nano-laminates and ternary Hf_xAl_yO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
7	A comparative study of AlN and Al₂O₃ based gate stacks grown by atomic layer deposition on InGaAs
8	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
9	Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications