About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Nanotextured surfaces for surface enhanced Raman spectroscopy and sensors

Type:

Journal

Info:

Proc. SPIE 9736, Laser-based Micro- and Nanoprocessing X

Date:

2016-02-13

DOI:

http://dx.doi.org/10.1117/12.2218461

Author Information

Name	Institution
Armandas Balčytis	Swinburne University of Technology
Jurga Juodkazytė	Center for Physical Sciences and Technology
Gediminas Seniutinas	Swinburne University of Technology
Xijun Li	Swinburne University of Technology
Gediminas Niaura	Center for Physical Sciences and Technology
Saulius Juodkazis	Swinburne University of Technology