Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Single-Cell Photonic Nanocavity Probes

Type:
Journal
Info:
Nano Lett, 2013, 13(11), pp 4999-5005
Date:
2013-02-06
DOI:
http://dx.doi.org/10.1021/nl304602d

Author Information

Name Institution
Gary ShambatStanford University
Sri-Rajasekhar KothapalliStanford University
J ProvineStanford University
Tomas SarmientoStanford University
James HarrisStanford University
Sanjiv Sam GambhirStanford University
Jelena VuckovicStanford University

Films

Thermal ZrO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMAZr, (Me2N)4Zr, [(CH3)2N]4Zr, Tetrakis(DiMethylAmido) Zirconium, Zirconium Dimethylamide
CAS#: 19756-04-8
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 200C

Thermal Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 200C

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

GaAs

Notes

46