3DMASi, (Me₂N)₃SiH, [(CH₃)₂N]₃SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s).

Number	Title
1	Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
2	Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
3	Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
4	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
5	Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
6	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
7	Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
8	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
9	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
10	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
11	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
12	Composite materials and nanoporous thin layers made by atomic layer deposition
13	Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
14	Atomic layer deposition of metal-oxide thin films on cellulose fibers
15	Optical properties and bandgap evolution of ALD HfSiOx films
16	Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
17	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
18	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
19	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
20	Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
21	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
22	3D structure evolution using metastable atomic layer deposition based on planar silver templates
23	The effects of layering in ferroelectric Si-doped HfO2 thin films
24	Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
25	Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
26	Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
27	Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
28	Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
29	Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
30	Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
31	Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
32	TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
33	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
34	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
35	Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
36	Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
37	Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
38	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
39	Comparative study of ALD SiO2 thin films for optical applications
40	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
41	Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
42	Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
43	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
44	Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
45	Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
46	Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
47	High-Reflective Coatings For Ground and Space Based Applications
48	Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
49	HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
50	Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
51	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
52	Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
53	Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
54	Single-Cell Photonic Nanocavity Probes
55	Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
56	Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
57	Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
58	Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
59	Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
60	Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
61	Optical properties and bandgap evolution of ALD HfSiOx films
62	An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
63	Annealing behavior of ferroelectric Si-doped HfO2 thin films
64	Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
65	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
66	Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
67	Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
68	Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
69	Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
70	Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
71	Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor