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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane, CAS# 15112-89-7

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 71 record(s).

NumberTitle
1Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
2Poly-Si gate electrodes for AlGaN/GaN HEMT with high reliability and low gate leakage current
3Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
4Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
5Irradiation effects of graphene-enhanced gallium nitride (GaN) metal-semiconductor-metal (MSM) ultraviolet photodetectors
6Smart Surface for Elution of Protein-Protein Bound Particles: Nanonewton Dielectrophoretic Forces Using Atomic Layer Deposited Oxides
7Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
8Thermal conductivity measurement of amorphous dielectric multilayers for phase-change memory power reduction
9Engineering Interfacial Silicon Dioxide for Improved Metal-Insulator-Semiconductor Silicon Photoanode Water Splitting Performance
10Capacitance-voltage characteristics of gamma irradiated Al2O3, HfO2, and SiO2 thin films grown by plasma-enhanced atomic layer deposition
11Optical properties and bandgap evolution of ALD HfSiOx films
12Annealing Effects on the Band Alignment of ALD SiO2 on (InxGa1-x)2O3 for x = 0.25-0.74
13Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
14Applications of nanoNewton dielectrophoretic forces using atomic layer deposited oxides for microfluidic sample preparation and proteomics
15Band alignment of atomic layer deposited SiO2 and HfSiO4 with $(\bar{2}01)$ β-Ga2O3
16HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
17Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
18Band offset of Al1-xSixOy mixed oxide on GaN evaluated by hard X-ray photoelectron spectroscopy
19Photoluminescence and electroluminescence from Ge/strained GeSn/Ge quantum wells
20Correlation between SiO2 growth rate and difference in electronegativity of metal-oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor
21Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
22Annealing behavior of ferroelectric Si-doped HfO2 thin films
23The effects of layering in ferroelectric Si-doped HfO2 thin films
24Comparative study of ALD SiO2 thin films for optical applications
25Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
26Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
27Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
28Single-Cell Photonic Nanocavity Probes
29Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
30An ultra-thin SiO2 ALD layer for void-free bonding of III-V material on silicon
31Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
32Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
33Al2O3 Insertion Layer for Improved PEALD SiO2/(Al)GaN Interfaces
343D structure evolution using metastable atomic layer deposition based on planar silver templates
35Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
36Nanoshape Imprint Lithography for Fabrication of Nanowire Ultracapacitors
37Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
38Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
39Band Offsets for Atomic Layer Deposited HfSiO4 on (Al0.14Ga0.86)2O3
40Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
41Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
42Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
43Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
44Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
45Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
46Influence of Substrate on Hafnium Silicate Metal-Insulator-Metal Capacitors Grown by Atomic Layer Deposition
47Composite materials and nanoporous thin layers made by atomic layer deposition
48Atomic layer deposition of metal-oxide thin films on cellulose fibers
49Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
50TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
51High-Reflective Coatings For Ground and Space Based Applications
52Ferroelectric phenomena in Si-doped HfO2 thin films with TiN and Ir electrodes
53Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
54Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
55Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
56Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
57Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
58Optical properties and bandgap evolution of ALD HfSiOx films
59Al2O3/SiO2 nanolaminate for a gate oxide in a GaN-based MOS device
60Al2O3 and SiO2 Atomic Layer Deposition Layers on ZnO Photoanodes and Degradation Mechanisms
61Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
62Localized dielectric breakdown and antireflection coating in metal-oxide-semiconductor photoelectrodes
63Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
64Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid
65Steady-state Thermal Conductivity Measurement of Dielectric Stacks for Phase-Change Memory Power Reduction
66Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
67Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology
68Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
69Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
70Effect of deposition conditions and composition on band offsets in atomic layer deposited HfxSi1-xOy on InGaZnO4
71Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride