Inductively coupled plasma sources from Plasma ALD, LLC.


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Multiplexed actuation using ultra dielectrophoresis for proteomics applications: a comprehensive electrical and electrothermal design methodology

Type:
Journal
Info:
Lab Chip, 2014,14, 2105-2114
Date:
2014-04-10
DOI:
http://dx.doi.org/10.1039/C4LC00036F

Author Information

Name Institution
Sam EmaminejadStanford University
Robert W. DuttonStanford University
Ronald W. DavisStanford University
Mehdi JavanmardStanford University

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Au
Cr

Notes

1388