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Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features

Type:
Journal
Info:
Nanotechnology 29 (jul) 405302
Date:
2018-07-26
DOI:
http://dx.doi.org/10.1088/1361-6528/aad393

Author Information

Name Institution
Stefano DallortoLawrence Berkeley National Laboratory
Daniel StaaksLawrence Berkeley National Laboratory
Adam M. SchwartzbergLawrence Berkeley National Laboratory
XiaoMin YangSeagate Technology
Kim Y LeeSeagate Technology
Ivo W RangelowIlmenau University of Technology
Stefano CabriniLawrence Berkeley National Laboratory
Deirdre L. OlynickLawrence Berkeley National Laboratory

Films

Thermal TiO2

Hardware used: Oxford Instruments FlexAL
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 200C

Plasma TiO2

Hardware used: Oxford Instruments FlexAL
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Thermal SiO2

Hardware used: Oxford Instruments FlexAL
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 40-300C

Plasma SiO2

Hardware used: Oxford Instruments FlexAL
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Nucleation
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

SiO2
Cr
Carbon

Notes

1578