Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Daniel Staaks Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Daniel Staaks returned 1 record(s).

NumberTitle
1Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features