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H2O, Water, CAS# 7732-18-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s).

NumberTitle
1Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
2Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
3Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
4Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
5ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
6Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
7Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
8New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
9Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
10Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
11Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
12Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
13Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
14Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
15Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
16AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
17Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
18In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
19Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
20Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
21A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
22Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
23Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
24On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
25Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
26High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
27Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
28Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
29Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
30Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
31Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
32Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
33Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
34Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
35Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
36Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
37Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
38Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
39A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
40Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
41Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
42AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
43Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
44Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
45Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
46Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
47Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
48Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
49Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
50Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
51Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
52Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
53Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
54Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
55Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
56Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
57Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
58Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
59Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
60Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
61Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
62Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
63Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
64Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
65In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
66Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
67In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
68Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
69Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
70Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
71Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
72Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
73Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
74Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
75Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
76Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
77Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
78Room temperature atomic layer deposition of TiO2 on gold nanoparticles
79Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
80Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
81Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
82Symmetrical Al2O3-based passivation layers for p- and n-type silicon
83Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
84Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
85Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
86Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
87Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
88The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
89Protective capping and surface passivation of III-V nanowires by atomic layer deposition
90Protective capping and surface passivation of III-V nanowires by atomic layer deposition
91The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
92Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
93Fast Flexible Plastic Substrate ZnO Circuits
94P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
95Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
96Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
97Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
98Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
99Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
100Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
101Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
102Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
103Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
104Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
105On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
106Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
107Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
108On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
109Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
110Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
111P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
112Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
113Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
114Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
115Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
116Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
117Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
118Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
119Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
120Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
121In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
122Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
123Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
124Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
125Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
126Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
127Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
128Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
129Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
130Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
131An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
132Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
133Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
134Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
135AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
136High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
137Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
138Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
139High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
140Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
141Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
142Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
143Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
144Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
145Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
146Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
147Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
148Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
149Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
150Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
151Breakdown and Protection of ALD Moisture Barrier Thin Films
152Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
153Plasma enhanced atomic layer deposition of Ga2O3 thin films
154Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
155AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
156Trapped charge densities in Al2O3-based silicon surface passivation layers
157Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
158Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
159Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
160P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
161In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
162Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
163Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
164Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
165Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
166Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
167Passivation effects of atomic-layer-deposited aluminum oxide
168Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
169Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
170Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
171Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
172Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
173Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
174Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
175Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
176Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
177Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
178Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
179Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
180Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
181Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
182Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
183A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
184Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
185Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
186Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
187Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
188Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
189Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
190Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
191Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
192Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
193Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
194Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
195RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
196Tribological properties of thin films made by atomic layer deposition sliding against silicon
197Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
198Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
199Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
200Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
201Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
202Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
203A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
204Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
205Encapsulation method for atom probe tomography analysis of nanoparticles
206Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
207Atomic layer deposition of metal-oxide thin films on cellulose fibers
208Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
209Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
210Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
211Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
212Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
213The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
214Experimental verification of electro-refractive phase modulation in graphene
215Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
216A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
217Breakdown and Protection of ALD Moisture Barrier Thin Films
218Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
219Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
220Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
221Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
222Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
223Atomic Layer Deposition of Gold Metal
224Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
225Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
226Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
227Nitride passivation of the interface between high-k dielectrics and SiGe
228Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
229Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
230AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
231Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
232Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
233AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
234Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
235The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
236Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
237Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
238Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
239Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
240Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
241Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
242Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
243Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
244Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
245Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
246Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
247Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
248Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
249Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
250RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
251Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
252Improved understanding of recombination at the Si/Al2O3 interface
253The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
254Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
255Low temperature temporal and spatial atomic layer deposition of TiO2 films
256Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
257Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
258Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
259Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
260Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
261In-gap states in titanium dioxide and oxynitride atomic layer deposited films
262Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
263Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
264Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
265Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
266Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
267Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
268Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
269Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
270Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
271Tribological properties of thin films made by atomic layer deposition sliding against silicon
272Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
273Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
274Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
275Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
276P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
277Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
278Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
279Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
280Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
281Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
282Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
283Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
284Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
285Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
286Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
287Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
288Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
289Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
290Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
291Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
292Trapped charge densities in Al2O3-based silicon surface passivation layers
293Gate Insulator for High Mobility Oxide TFT
294Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
295Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
296A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
297Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
298X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
299Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
300Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
301High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
302Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
303Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
304Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
305MANOS performance dependence on ALD Al2O3 oxidation source
306Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
307The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
308Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
309Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
310Single-Cell Photonic Nanocavity Probes
311Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
312Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
313A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
314In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
315Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
316Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
317Hafnia and alumina on sulphur passivated germanium
318Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
319RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
320Atomic Layer Deposition of the Solid Electrolyte LiPON
321A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
322Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
323Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
324Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
325Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
326Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
327Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
328Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
329Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
330Symmetrical Al2O3-based passivation layers for p- and n-type silicon
331Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
332Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
333Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
334Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
335Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
336Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
337In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
338Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
339Fiber-matrix interface reinforcement using Atomic Layer Deposition
340Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
341Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
342Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
343Hafnia and alumina on sulphur passivated germanium
344Single-Cell Photonic Nanocavity Probes
345Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
346The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
347Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
348Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
349AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
350Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
351Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
352Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization