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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s).

NumberTitle
1Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
2Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
3On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
4Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
5Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
6Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
7Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
8Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
9Nitride passivation of the interface between high-k dielectrics and SiGe
10Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
11Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
12Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
13Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
14Single-Cell Photonic Nanocavity Probes
15Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
16Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
17The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
18In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
19Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
20Tribological properties of thin films made by atomic layer deposition sliding against silicon
21Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
22Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
23Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
24Improved understanding of recombination at the Si/Al2O3 interface
25Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
26Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
27Low temperature temporal and spatial atomic layer deposition of TiO2 films
28Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
29Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
30Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
31Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
32Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
33The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
34Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
35Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
36In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
37Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
38Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
39Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
40Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
41Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
42Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
43Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
44Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
45Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
46Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
47Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
48The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
49Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
50Fiber-matrix interface reinforcement using Atomic Layer Deposition
51Plasma enhanced atomic layer deposition of Ga2O3 thin films
52Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
53AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
54Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
55Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
56Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
57Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
58Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
59Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
60Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
61Symmetrical Al2O3-based passivation layers for p- and n-type silicon
62Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
63An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
64Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
65Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
66AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
67Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
68The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
69A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
70A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
71Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
72Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
73Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
74Experimental verification of electro-refractive phase modulation in graphene
75Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
76Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
77Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
78AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
79Single-Cell Photonic Nanocavity Probes
80High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
81Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
82Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
83Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
84Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
85Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
86Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
87Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
88Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
89Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
90Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
91Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
92Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
93Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
94Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
95Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
96Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
97Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
98Passivation effects of atomic-layer-deposited aluminum oxide
99Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
100Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
101Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
102Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
103High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
104Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
105Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
106Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
107Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
108Atomic layer deposition of metal-oxide thin films on cellulose fibers
109Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
110Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
111Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
112Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
113Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
114Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
115Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
116Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
117Hafnia and alumina on sulphur passivated germanium
118Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
119Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
120Room temperature atomic layer deposition of TiO2 on gold nanoparticles
121Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
122Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
123Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
124Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
125Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
126P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
127Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
128Protective capping and surface passivation of III-V nanowires by atomic layer deposition
129Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
130Breakdown and Protection of ALD Moisture Barrier Thin Films
131Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
132Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
133Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
134Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
135Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
136Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
137Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
138High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
139Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
140Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
141In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
142Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
143Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
144Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
145Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
146Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
147Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
148Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
149Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
150Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
151Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
152Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
153Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
154Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
155In-gap states in titanium dioxide and oxynitride atomic layer deposited films
156New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
157Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
158Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
159Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
160Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
161Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
162Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
163Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
164A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
165Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
166Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
167Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
168Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
169The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
170Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
171Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
172Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
173Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
174Trapped charge densities in Al2O3-based silicon surface passivation layers
175Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
176Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
177Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
178Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
179Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
180Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
181P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
182Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
183Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
184Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
185Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
186Protective capping and surface passivation of III-V nanowires by atomic layer deposition
187Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
188The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
189Gate Insulator for High Mobility Oxide TFT
190Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
191Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
192Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
193P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
194AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
195Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
196AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
197Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
198Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
199Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
200Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
201Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
202Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
203A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
204Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
205Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
206Atomic Layer Deposition of the Solid Electrolyte LiPON
207Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
208Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
209Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
210Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
211Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
212Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
213A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
214In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
215A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
216Hafnia and alumina on sulphur passivated germanium
217Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
218Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
219Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
220Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
221Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
222Breakdown and Protection of ALD Moisture Barrier Thin Films
223Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
224Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
225Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
226Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
227Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
228Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
229Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
230Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
231Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
232Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
233Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
234Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
235Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
236Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
237Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
238Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
239Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
240Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
241Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
242Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
243Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
244Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
245Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
246Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
247Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
248Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
249Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
250Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
251Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
252Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
253Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
254Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
255Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
256Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
257Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
258Trapped charge densities in Al2O3-based silicon surface passivation layers
259Atomic Layer Deposition of Gold Metal
260On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
261MANOS performance dependence on ALD Al2O3 oxidation source
262RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
263Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
264Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
265Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
266Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
267Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
268Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
269Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
270Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
271On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
272X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
273Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
274Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
275Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
276RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
277Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
278In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
279P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
280Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
281Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
282Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
283High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
284Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
285Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
286Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
287Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
288Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
289Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
290Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
291Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
292Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
293In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
294Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
295Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
296Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
297Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
298Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
299Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
300Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
301Fast Flexible Plastic Substrate ZnO Circuits
302ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
303Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
304Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
305Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
306Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
307AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
308A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
309Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
310The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
311Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
312Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
313Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
314Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
315Symmetrical Al2O3-based passivation layers for p- and n-type silicon
316In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
317Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
318Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
319Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
320Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
321Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
322Tribological properties of thin films made by atomic layer deposition sliding against silicon
323Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
324Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
325Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
326Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
327Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
328Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
329Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
330Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
331Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
332Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
333Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
334Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
335Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
336AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
337Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
338RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
339Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
340Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
341Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
342Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
343Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
344A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
345Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
346Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
347Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
348Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
349Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
350Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
351Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
352Encapsulation method for atom probe tomography analysis of nanoparticles