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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 354 record(s).

NumberTitle
1Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
2Electrical Properties of Al2O3 Films Grown by the Electron Cyclotron Resonance Plasma-Enhanced Atomic Layer Deposition (ECR-PEALD) and Thermal ALD Methods
3Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
4Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
5Trapped charge densities in Al2O3-based silicon surface passivation layers
6Plasma enhanced atomic layer deposition of Ga2O3 thin films
7Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
8Structural, optical, electrical and resistive switching properties of ZnO thin films deposited by thermal and plasma-enhanced atomic layer deposition
9Infrared Study of Room Temperature Atomic Layer Deposition of SnO2 Using Sn(CH3)4 and Plasma Excited Humidified Argon
10Hafnia and alumina on sulphur passivated germanium
11Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
12Highly stable all-inorganic CsPbBr3 nanocrystals film encapsulated with alumina by plasma-enhanced atomic layer deposition
13Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
14Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
15Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
16Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
17On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
18Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
19Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
20AlGaN/GaN MIS-HEMTs With High Quality ALD-Al2O3 Gate Dielectric Using Water and Remote Oxygen Plasma As Oxidants
21Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
22Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks
23Evaluation of V2O5 Coatings Grown By Plasma Enhanced and Thermal Atomic Layer Deposition
24Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
25Protective capping and surface passivation of III-V nanowires by atomic layer deposition
26Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
27Gate Insulator for High Mobility Oxide TFT
28Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
29Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
30Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
31Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets
32Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
33Fundamental reaction of RT gallium oxide atomic layer deposition investigated by IR absorption spectroscopy
34Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
35Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
36Single-Cell Photonic Nanocavity Probes
37Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
38Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
39Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
40RT Ga2O3 atomic layer deposition by using trimethylgallium and water-oxygen plasma
41Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
42Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
43Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
44Breakdown and Protection of ALD Moisture Barrier Thin Films
45Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
46Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
47Atomic layer deposition of ultrathin platinum films on tungsten atomic layer deposition adhesion layers: Application to high surface area substrates
48Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
49Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
50In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
51On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
52Performance of Nanocrystal ZnO Thin-Film Schottky Contacts on Cu by Atomic Layer Deposition
53Investigation and optimization of HfO2 gate dielectric on N-polar GaN: Impact of surface treatments, deposition, and annealing conditions
54Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
55Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
56Practical Challenges of Processing III-Nitride/Graphene/SiC Devices
57Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
58Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
59Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
60Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
61Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
62Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
63Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
64Toward Understanding Positive Bias Temperature Instability in Fully Recessed-Gate GaN MISFETs
65Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
66Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
67Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
68Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
69In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
70Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
71Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene
72Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
73A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
74Synthesis of indium oxi-sulfide films by atomic layer deposition: The essential role of plasma enhancement
75Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
76Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
77Electrical and physical characteristics of high-k gated MOSFETs with in-situ H2O and O2 plasma formed interfacial layer
78Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
79Effects of Surface Passivation and Deposition Methods on the 1/f Noise Performance of AlInN/AlN/GaN High Electron Mobility Transistors
80Comparative study on interface and bulk charges in AlGaN/GaN metal-insulator-semiconductor heterostructures with Al2O3, AlN, and Al2O3/AlN laminated dielectrics
81Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
82Atomic Layer Deposition and In-situ Characterization of Ultraclean Lithium Oxide and Lithium Hydroxide
83Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
84Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
85The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
86AlGaN/GaN MIS-HEMT gate structure improvement using Al2O3 deposited by plasma-enhanced ALD
87Fast Flexible Plastic Substrate ZnO Circuits
88Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
89Effect of in situ hydrogen plasma on the ferroelectricity of hafnium zirconium oxide films
90Atomic Layer Deposition of Gold Metal
91Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
92Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
93A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
94Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
95Field-effect passivation of Si by ALD-Al2O3: Second harmonic generation monitoring and simulation
96Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
97Ultraviolet Electroluminescence from Nitrogen-Doped ZnO-Based Heterojuntion Light-Emitting Diodes Prepared by Remote Plasma in situ Atomic Layer-Doping Technique
98Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
99Oxide Charge Engineering of Atomic Layer Deposited AlOxNy/Al2O3 Gate Dielectrics: A Path to Enhancement Mode GaN Devices
100Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
101Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
102The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO
103ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
104Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
105Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
106The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
107Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
108Symmetrical Al2O3-based passivation layers for p- and n-type silicon
109Solid Electrolyte Lithium Phosphous Oxynitride as a Protective Nanocladding Layer for 3D High-Capacity Conversion Electrodes
110Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
111Symmetrical Al2O3-based passivation layers for p- and n-type silicon
112Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
113Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
114Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
115Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
116Low temperature temporal and spatial atomic layer deposition of TiO2 films
117P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
118Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
119Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
120Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
121Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
122AxBAxB... pulsed atomic layer deposition: Numerical growth model and experiments
123Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
124AlGaN/GaN MIS-HEMT Gate Structure Improvement Using Al2O3 Deposited by PEALD
125Stabilization of Lithium Metal Anodes by Hybrid Artificial Solid Electrolyte Interphase
126A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
127Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
128Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
129High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
130P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
131Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
132Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
133Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
134Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
135Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
136Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
137Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
138Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
139Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
140High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
141Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
142Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
143Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
144Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition
145Nitride passivation of the interface between high-k dielectrics and SiGe
146Hydrophilic/hydrophobic surface of Al2O3 thin films grown by thermal and plasma-enhanced atomic layer deposition on plasticized polyvinyl chloride (PVC)
147Encapsulation method for atom probe tomography analysis of nanoparticles
148Atomic Layer Engineering of Er-Ion Distribution in Highly Doped Er:Al2O3 for Photoluminescence Enhancement
149In-gap states in titanium dioxide and oxynitride atomic layer deposited films
150The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
151Evaluation of Thermal Versus Plasma-Assisted ALD Al2O3 as Passivation for InAlN/AlN/GaN HEMTs
152Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
153A study of the impact of in-situ argon plasma treatment before atomic layer deposition of Al2O3 on GaN based metal oxide semiconductor capacitor
154RT Atomic Layer Deposition of Al2O3 By Using Remote Plasma Excited Water Vapor
155A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
156Fiber-matrix interface reinforcement using Atomic Layer Deposition
157Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr(C11H19O2)2, Ti(Oi-C3H7)4, and H2O
158Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
159Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
160Passivation effects of atomic-layer-deposited aluminum oxide
161Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
162Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
163Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
164Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
165Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices
166Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
167AlN passivation by plasma-enhanced atomic layer deposition for GaN-based power switches and power amplifiers
168Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
169Experimental verification of electro-refractive phase modulation in graphene
170Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
171Hafnia and alumina on sulphur passivated germanium
172Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
173Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
174Enhanced X-ray reflectivity from Pt-coated silicon micropore optics prepared by plasma atomic layer deposition
175Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
176Efficiency Enhancement of Nanotextured Black Silicon Solar Cells Using Al2O3/TiO2 Dual-Layer Passivation Stack Prepared by Atomic Layer Deposition
177Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
178Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
179Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
180Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
181Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
182Plasma activation and atomic layer deposition of TiO2 on polypropylene membranes for improved performances of lithium-ion batteries
183Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
184The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
185Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
186P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
187Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
188Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition
189In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
190Characteristics of ALD-GZO Films with Driven-in Zn and Zn/Mg Sources for the Applications to Optoelectronic Devices
191Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
192Tin Oxynitride Anodes by Atomic Layer Deposition for Solid-State Batteries
193Ultra low density of interfacial traps with mixed thermal and plasma enhanced ALD of high-k gate dielectrics
194Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
195Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
196Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
197Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells
198Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
199Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
200Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
201Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
202Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
203Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
204Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
205Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
206Room Temperature Atomic Layer Deposition of Gallium Oxide Investigated by IR Absorption Spectroscopy
207Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing
208Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
209Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
210High quality HfO2/p-GaSb(001) metal-oxide-semiconductor capacitors with 0.8nm equivalent oxide thickness
211Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
212Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma
213Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
214Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
215Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
216Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
217Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
218Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
219Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
220Large area photoelectrodes based on hybrids of CNT fibres and ALD-grown TiO2
221Understanding the mechanisms of interfacial reactions during TiO2 layer growth on RuO2 by atomic layer deposition with O2 plasma or H2O as oxygen source
222A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
223In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
224Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
225Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
226Improved understanding of recombination at the Si/Al2O3 interface
227Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition
228On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus
229Hydrogen plasma enhanced oxide removal on GaSb planar and nanowire surfaces
230Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
231Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
232Chemically conformal deposition of SrTiO3 thin films by Atomic Layer Deposition using conventional metal organic precursors and remote-plasma activated H2O
233Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
234Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells
235Tribological properties of thin films made by atomic layer deposition sliding against silicon
236Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
237Growth of controllable ZnO film by atomic layer deposition technique via inductively coupled plasma treatment
238Oxide semiconductor thin film transistors on thin solution-cast flexible substrates
239Atomic Layer Deposition of the Solid Electrolyte LiPON
240Room temperature atomic layer deposition of TiO2 on gold nanoparticles
241Atomic Layer Deposited Electron Transport Layers in Efficient Organometallic Halide Perovskite Devices
242Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
243Growth of V2O5 Films for Battery Applications by Pulsed Chemical Vapor Deposition
244Efficiency enhancement of InGaN/GaN blue light-emitting diodes with top surface deposition of AlN/Al2O3
245Plasma Modeling of a PEALD System for the Deposition of TiO2 and HfO2
246Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
247Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
248Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
249Atomic layer deposition of stoichiometric In2O3 films using liquid ethylcyclopentadienyl indium and combinations of H2O and O2 plasma
250Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
251Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
252Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
253Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
254Atomic layer deposition of metal-oxide thin films on cellulose fibers
255Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
256Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
257The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
258Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
259Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
260In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
261Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
262Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
263Role of the (Ta/Nb)Ox/Al2O3 interface on the flatband voltage shift for Al2O3/(Ta/Nb)Ox/Al2O3 multilayer charge trap capacitors
264Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
265Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
266Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition
267Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
268Effect of Process Parameters on Remote PEALD for Highly Transparent ZnO Film Growth
269Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
270Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
271Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
272MANOS performance dependence on ALD Al2O3 oxidation source
273Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors
274Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor
275Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor
276Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
277Protective capping and surface passivation of III-V nanowires by atomic layer deposition
278Performance enhancement of InAsSb QW-MOSFETs with in-situ H2 plasma cleaning for gate stack formation
279Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
280Metallic nanoparticle-based strain sensors elaborated by atomic layer deposition
281Graphene oxide monolayers as atomically thin seeding layers for atomic layer deposition of metal oxides
282Supportless Platinum Nanotubes Array by Atomic Layer Deposition as PEM Fuel Cell Electrode
283AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition
284Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions
285Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
286Fermi level unpinning of GaSb (100) using plasma enhanced atomic layer deposition of Al2O3
287Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
288Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
289Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
290Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
291Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
292Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
293Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
294Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
295Interrogation of Electrochemical Properties of Polymer Electrolyte Thin Films with Interdigitated Electrodes
296Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
297Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
298Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
299P-type Conductivity of MgZnO:(N:Ga) Thin Films Prepared by Remote Plasma In-Situ Atomic Layer Doping
300Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
301Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
302Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
303Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
304Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
305Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
306Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source
307Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
308Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
309Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
310Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
311An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
312Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
313Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
314Tribological properties of thin films made by atomic layer deposition sliding against silicon
315Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
316Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
317Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
318Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatment
319Breakdown and Protection of ALD Moisture Barrier Thin Films
320Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
321In situ plasma enhanced atomic layer deposition half cycle study of Al2O3 on AlGaN/GaN high electron mobility transistors
322Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
323Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
324Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
325High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
326Single-Cell Photonic Nanocavity Probes
327Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment
328Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen
329Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
330A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
331Uniform Growth of Sub-5-Nanometer High-κ Dielectrics on MoS2 Using Plasma-Enhanced Atomic Layer Deposition
332X-ray Photoelectron Spectroscopy Analyses of Atomic Layer Deposition-Prepared Titanium-Dioxide Thin Films with Oxygen Sources and Their Annealing Effect
333Local Electronic Structures and Electrical Characteristics of Well-Controlled Nitrogen-Doped ZnO Thin Films Prepared by Remote Plasma In situ Atomic Layer Doping
334In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
335A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
336Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
337Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
338Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
339The effect of oxygen remote plasma treatment on ZnO TFTs fabricated by atomic layer deposition
340Enhanced electrical and reliability characteristics in HfON gated Ge p-MOSFETs with H2 and NH3 plasma treated interfacial layers
341Trapped charge densities in Al2O3-based silicon surface passivation layers
342Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
343Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
344Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
345Improvement of interfacial and electrical properties of Al2O3/n-Ga0.47In0.53As for III-V impact ionization MOSFETs
346Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
347Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
348Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors
349Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
350AC-Capacitance Techniques for Interface Trap Analysis in GaN-Based Buried-Channel MIS-HEMTs
351RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
352New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping